| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/22/1988 | US4732473 Apparatus for, and methods of, determining the characteristics of semi-conductor wafers |
| 03/22/1988 | US4732173 Printed circuit board chemical processing system |
| 03/22/1988 | CA1234311A1 Apparatus for forming relief plates from liquid photo- sensitive resin |
| 03/17/1988 | DE3630995A1 Method of fabricating heat-resistant structured layers |
| 03/16/1988 | EP0260129A2 Process useful in providing transparencies or reproductions having a controlled gloss finish |
| 03/16/1988 | EP0260124A2 Transfer recording medium and process for production thereof |
| 03/16/1988 | EP0259853A2 Lamination of photopolymerizable film onto a substrate employing an intermediate photosensitive layer |
| 03/16/1988 | EP0259812A2 Photopolymerizable compositions containing inorganic fillers |
| 03/16/1988 | EP0259728A2 Stabilized solutions of photopolymers |
| 03/16/1988 | EP0259727A2 Process for obtaining heat-resistant structural layers based on epoxy resins |
| 03/16/1988 | EP0259726A2 Photopolymers on the basis of epoxyde |
| 03/16/1988 | EP0259723A2 Process for obtaining heat-resistant structural layers |
| 03/16/1988 | EP0259418A1 Methods for applying simultaneously on a plurality of integrated circuit boards a film having a uniform thickness and consisting of arsenic or germanium selenide glass sensitized by a silver salt |
| 03/15/1988 | US4731319 Positive-working naphthoquinone diazide photoresist composition with two cresol novolac resins |
| 03/15/1988 | US4731317 Laser imagable lithographic printing plate with diazo resin |
| 03/15/1988 | US4731316 Diazo resin, oleophilic, high molecular weight acid |
| 03/15/1988 | US4730900 Projection optical apparatus |
| 03/15/1988 | CA1234242A1 Sensitizers for photopolymerisation |
| 03/10/1988 | WO1988001757A1 Uv stabilizer for polyacetylenic recording media |
| 03/09/1988 | EP0258727A1 Process for the preparation of an o-naphthoquinone diazide sulfonic-acid ester |
| 03/09/1988 | EP0258719A2 Two-layer system |
| 03/09/1988 | EP0258497A1 High resolution liquid photopolymer coating patterns over irregular printed wiring board surface conductors |
| 03/09/1988 | EP0258417A1 Photoresist stripper composition and process of use |
| 03/09/1988 | EP0258284A1 Installation for coating and drying both sides of printed circuit boards or similar structures. |
| 03/08/1988 | US4729941 Photoresist processing solution with quaternary ammonium hydroxide |
| 03/08/1988 | US4729938 Optical disc base plate having a primer layer formed of an ultraviolet-cured resin composition |
| 03/08/1988 | US4729935 Process for the production of photographic images utilizing a negative working diazo contact film |
| 03/08/1988 | CA1233931A1 Photosensitive hydroxyalkylphenones |
| 03/08/1988 | CA1233628A1 Wafer transferring chuck assembly |
| 03/02/1988 | EP0258079A1 Composition based on methylene chloride and its use in photoresist stripping |
| 03/02/1988 | EP0257737A2 Printed circuit precursor |
| 03/02/1988 | EP0257574A2 Photo/pressure sensitive sheet exposing apparatus |
| 03/02/1988 | EP0257529A2 Apparatus and method for optical radiation exposure |
| 03/02/1988 | EP0257505A2 Presensitized printing plate and process for the production of dry lithographic printing plates |
| 03/02/1988 | EP0257504A2 Presensitized printing plate and process for the production of dry lithographic printing plates |
| 03/02/1988 | EP0257255A2 Photoresist process for reactive ion etching of metal patterns for semiconductor devices |
| 03/02/1988 | EP0257038A1 Method and apparatus for the production of high resolution images |
| 03/01/1988 | US4728799 Height measurement and correction method for electron beam lithography system |
| 03/01/1988 | US4728594 Photoresists for making semiconductors |
| 03/01/1988 | US4728591 Self-assembled nanometer lithographic masks and templates and method for parallel fabrication of nanometer scale multi-device structures |
| 03/01/1988 | CA1233361A1 Apparatus for isolating offset printing plates and removing intermediate paper layers |
| 02/25/1988 | WO1988001308A1 Photoengraving articles and methods of producing such articles |
| 02/25/1988 | DE3701922C1 Exposure device with burner shieldings which are adjustable in open/closed position |
| 02/24/1988 | EP0256986A2 Process for obtaining images |
| 02/24/1988 | EP0256981A2 Titanocenes and their use |
| 02/24/1988 | EP0256938A2 Lithographic technique using laser for fabrication of electronic components and the like |
| 02/24/1988 | EP0256381A2 Light-sensitive material comprising light-sensitive layer provided on support |
| 02/24/1988 | EP0256309A1 Post treatment process for relief images |
| 02/24/1988 | EP0256284A2 Composition for use in the production of integrated circuits and method for its preparation and use |
| 02/24/1988 | EP0256256A2 Process for the manufacture of lithographic printing plates |
| 02/24/1988 | EP0256031A1 Method for developing poly(methacrylic anhydride) resists. |
| 02/23/1988 | US4727392 Pressure development apparatus for imaging sheets employing photosensitive microcapsules |
| 02/23/1988 | US4727381 Appartus for, and methods of, inscribing patterns on semiconductor wafers |
| 02/23/1988 | US4727013 Method for creating a design in relief in a hard smooth substrate and apparatus for use in the method |
| 02/23/1988 | US4726877 Addition polymerizable ethylenically unsaturated monomer, initiating system and polymer binder |
| 02/23/1988 | CA1233181A1 Ring-substituted derivatives of pyrogallol |
| 02/17/1988 | EP0255989A1 Negative photoresist on the basis of polyphenols and epoxide compounds or vinyl ethers |
| 02/17/1988 | CN86105537A Printing technology of art work of flannelette and silk screen |
| 02/16/1988 | US4725533 Silver halide photographic material for wash-off relief image |
| 02/16/1988 | US4725528 Bromine aftertreatment and washing with surfactant |
| 02/16/1988 | US4725527 Semiconductor grains having absorbed on surface spipopyran complexes, crosslinkable polymer and free radical catalyst |
| 02/16/1988 | US4725526 Process for reducing halations using lubricant in the course of irradiating and developing reproduction layers used for preparing printing plates |
| 02/16/1988 | US4725524 Dry film resist and production of resist images |
| 02/16/1988 | US4725523 Resistance to dry etching |
| 02/16/1988 | US4725511 Computer-generated diffraction pattern on semiconductor substrate |
| 02/16/1988 | EP0231207A4 Contrast enhancement layer. |
| 02/16/1988 | CA1232981A1 Apparatus for imaging a mask pattern on a substrate |
| 02/16/1988 | CA1232973A1 System for contact printing with liquid photopolymers |
| 02/16/1988 | CA1232915A1 Photosensitive resin compositions |
| 02/11/1988 | WO1988001070A2 A method for making a precision patterned mirror |
| 02/11/1988 | DE3626708A1 Method for producing printed circuit boards |
| 02/10/1988 | EP0255802A2 Copolymers from N-hydroxyphenyl maleimide derivatives and allylic compounds |
| 02/10/1988 | EP0255557A2 Process for forming metal images |
| 02/09/1988 | US4724466 Exposure apparatus |
| 02/09/1988 | US4724465 Photofabrication using laser light to expose photoresist |
| 02/09/1988 | US4724222 Holding semiconductor piece to be lithographically patterened |
| 02/09/1988 | US4724195 Perfluoroalkyl group-containing copolymers and reproduction layers produced therefrom |
| 02/09/1988 | US4724174 Applications for hydrophobic organo aluminum compounds |
| 02/09/1988 | US4723846 Optical path length compensating optical system in an alignment apparatus |
| 02/09/1988 | CA1232489A1 Planographic printing plate |
| 02/04/1988 | DE3723012A1 Bilderzeugungsverfahren und uebertragungsaufzeichnungsmaterial zur durchfuehrung dieses verfahrens The image forming method and uebertragungsaufzeichnungsmaterial for implementing this method |
| 02/03/1988 | EP0255486A2 Titanocenes and their use |
| 02/03/1988 | EP0255396A1 Adhesive papers for copying |
| 02/03/1988 | EP0255303A1 Negative resist material, method for its manufacture and method for using it |
| 02/03/1988 | EP0255286A2 Visible light-cured impression material |
| 02/03/1988 | EP0255138A2 Image recording apparatus provided with plural types of recording sheets |
| 02/03/1988 | EP0255129A2 Film peeling apparatus |
| 02/03/1988 | EP0255032A2 Process for the production of multicolor proofs using precolored toning films |
| 02/03/1988 | EP0254853A2 Lithographic method employing thermally stable photoresists with high sensitivity forming a hydogen-bonded network |
| 02/03/1988 | CN87105308A Management of photoresist materials containing waste solution |
| 02/02/1988 | US4722988 Organopolysilazane composition containing free radical generators and capable of being crosslinked by an energy input |
| 02/02/1988 | US4722883 Process for producing fine patterns |
| 02/02/1988 | US4722882 Dry etching using etch resistant photoresist |
| 02/02/1988 | US4722881 Oxidation resistant phenolic resins, quinone diazides; aqueous alkali solution |
| 02/02/1988 | US4722355 Machine and method for stripping photoresist from wafers |
| 02/02/1988 | US4722256 Method and apparatus for gripping and cutting a lamination film |
| 02/02/1988 | CA1232373A1 Deep-uv lithography |
| 01/28/1988 | WO1988000767A1 Multi-mode narrow-band oscillation excimer laser |
| 01/28/1988 | WO1988000720A1 Process and device for fine focussing an image on a projection surface |
| 01/27/1988 | EP0254644A2 Mask alignment and measurement of critical dimensions in integrated circuits |