Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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05/25/1988 | EP0268203A2 Process and arrangement for the modification of the image format in X-ray lithography |
05/25/1988 | EP0268116A1 Method of providing a planarized polymer coating on a substrate wafer |
05/25/1988 | EP0138754B1 Photocurable compositions |
05/24/1988 | US4747030 Illumination system |
05/24/1988 | US4746958 Method and apparatus for projection printing |
05/24/1988 | US4746800 Positioning device comprising a z-manipulator and a θ-manipulator |
05/24/1988 | US4746799 Atomic jet radiation source |
05/24/1988 | US4746597 Image deletion fluid for printing plate |
05/24/1988 | US4746596 Chlorinated polyvinyltoluene |
05/24/1988 | US4746595 Polyurea or polybiuret |
05/24/1988 | US4746588 Method for preparing a photosensitive film on a glass surface |
05/24/1988 | CA1237145A1 Acetylenic compounds containing urea moieties useful as environmental indicating materials |
05/19/1988 | WO1988003703A1 Multilayer resist structure |
05/19/1988 | WO1988003668A1 Selective metallization process, additive method for manufacturing printed circuit boards, and composition for use therein |
05/19/1988 | EP0247153A4 Thermally stabilized photoresist images. |
05/19/1988 | DE3737455A1 Einrichtung und verfahren zum erzeugen von farbmustern Means and methods to generate patterns of color |
05/18/1988 | EP0267807A2 Improved photosensitive laminate |
05/18/1988 | EP0267766A2 Catoptric reduction imaging systems |
05/18/1988 | EP0267721A2 Determination of best focus for step and repeat projection aligners |
05/18/1988 | EP0267600A2 Method for selectively curing a liquid photosensitive resin by masking exposure |
05/18/1988 | EP0267599A2 Fly eye lens unit for illumination |
05/18/1988 | EP0267540A2 Stripping compositions and their use for stripping resists from substrates |
05/18/1988 | EP0267437A2 Means and process for the removal of photo-resists |
05/17/1988 | US4745422 Automatic developing apparatus |
05/17/1988 | US4745169 Resistant to oxygen plasma |
05/17/1988 | US4745045 Integrated circuits; lessening light scattering and reflection |
05/17/1988 | US4745044 Multilayer resists with improved sensitivity and reduced proximity effect |
05/17/1988 | US4745042 Water-soluble photopolymer and method of forming pattern by use of the same |
05/17/1988 | US4744847 Film trimming of laminated photosensitive layer |
05/17/1988 | US4744834 Photoresist stripper comprising a pyrrolidinone, a diethylene glycol ether, a polyglycol and a quaternary ammonium hydroxide |
05/17/1988 | US4744663 Pattern position detection apparatus using laser beam |
05/17/1988 | US4744662 Apparatus for measuring dimensions of micropattern |
05/17/1988 | US4744615 Laser beam homogenizer |
05/11/1988 | EP0267037A2 Presensitized lithographic plate |
05/11/1988 | EP0266760A2 High speed reticle change system |
05/11/1988 | EP0266654A2 Light sensitive composition, material containing it and process for producing positive or negative relief copies by using this material |
05/10/1988 | US4743766 Method of drawing a desired pattern on a target through exposure thereof with an electron beam |
05/10/1988 | US4743531 Dye sensitized photographic imaging system |
05/10/1988 | US4743530 Film former, quaternized azinium salt activator, photosensitizer dye |
05/10/1988 | US4743529 Negative working photoresists responsive to shorter visible wavelengths and novel coated articles |
05/10/1988 | US4743528 Enhanced imaging composition containing an azinium activator |
05/10/1988 | US4743527 Lithography |
05/10/1988 | US4743525 Diffusion transfer, lime treated gelatin |
05/10/1988 | US4743380 Solvent recovery system |
05/10/1988 | CA1236421A1 Anodic oxidation of aluminum in phosphoric acid containing aluninum ions for printing plates |
05/04/1988 | EP0266203A2 An illumination device |
05/04/1988 | EP0266094A1 Self-weeding dry transfer article |
05/04/1988 | EP0266069A2 Photopolymerizable composition useful for printing plates |
05/04/1988 | EP0266045A2 An apparatus for applying an emulsion screen film of screen-printing |
05/04/1988 | EP0266019A2 Near-photographic method of forming an image on chocolate |
05/04/1988 | EP0265954A2 Light-sensitive material containing silver halide, reducing agent and polymerizable compound |
05/04/1988 | EP0265939A2 Apparatus and method for curing photosensitive coatings |
05/04/1988 | EP0265917A2 Illumination apparatus for exposure |
05/04/1988 | EP0265638A2 Lithographic image size reduction |
05/04/1988 | EP0265619A2 Planarization through silylation |
05/03/1988 | US4742286 Gas bearing X-Y-θ stage assembly |
05/03/1988 | US4742233 Method and apparatus for automated reading of vernier patterns |
05/03/1988 | US4741989 Positive photoresist aqueous developer solution containing quaternary ammonium hydroxide with aliphatic ketone or cyclic ether alone or with amine as development modifier |
05/03/1988 | US4741988 Patterned polyimide film, a photosensitive polyamide acid derivative and an electrophoretic image-display cell |
05/03/1988 | US4741987 Photopolymerizable composition including benzotriazole carboxylic acid |
05/03/1988 | US4741986 High-resolution photosensitive composition which can be developed by plasma and a photolithographic method of using said composition |
05/03/1988 | US4741985 Light-sensitive composition comprising a diazonium salt condensate and a modified polyvinyl acetal polymer. |
05/03/1988 | US4741926 Nonuniform |
05/03/1988 | US4741920 Mesh and printing screen for screen printing and a method for the preparation thereof |
05/03/1988 | US4741622 Method and apparatus for detecting diversion |
05/03/1988 | CA1236236A1 Photopolymerizable resin composition |
05/03/1988 | CA1236045A1 Anodically oxidized aluminum treated with silicate and vinylphosphonic acid polymer |
04/27/1988 | EP0265387A2 Method of forming images |
04/27/1988 | EP0265375A1 Photoresist compositions |
04/27/1988 | EP0265373A1 Process for curing polyisocyanate coatings |
04/27/1988 | EP0265135A2 Antistatic photo-resist |
04/27/1988 | EP0265089A2 Image deletion fluid for printing plate |
04/27/1988 | EP0265034A2 Liquid jet recording head |
04/27/1988 | EP0265033A2 Liquid jet recording head |
04/27/1988 | EP0264908A2 High sensitivity resists having autodecomposition temperatures greater than about 160 C |
04/27/1988 | EP0264845A2 Multilayer positive-registration material |
04/27/1988 | EP0264678A1 Polyamides with hexafluoroisopropylidene groups, positively acting photosensitive compositions, and recording materials using them |
04/27/1988 | EP0264650A1 Anti-reflective coating |
04/26/1988 | US4740812 Single channel masking camera & projector |
04/26/1988 | US4740809 Optical printing system |
04/26/1988 | US4740451 Photosensitive compositions and a method of patterning using the same |
04/26/1988 | US4740450 Coating with photosensitive layer containing scratch improver; drying, migration |
04/26/1988 | US4740449 Phase transition of gelled polymer by light modification of organo-compound |
04/26/1988 | US4740410 Micromechanical elements and methods for their fabrication |
04/26/1988 | US4740075 Device for processing photosensitive materials |
04/26/1988 | US4739780 Printed circuit board chemical in line processing system |
04/26/1988 | CA1235831A1 Positive-working radiation-sensitive mixture |
04/21/1988 | WO1988002879A1 VISIBLE LIGHT CURABLE FREE RADICAL COMPOSITIONS CONTAINING pi-ARENE METAL COMPLEXES |
04/21/1988 | WO1988002878A1 Image reversal system and process |
04/20/1988 | EP0264095A2 Plate thickness adjusting apparatus in photosensitive resin plate making machine |
04/20/1988 | EP0264037A2 UV-curable dielectric compositions |
04/20/1988 | EP0263921A2 Positive-working photoresist elements containing antireflective dyes |
04/19/1988 | US4739158 Apparatus for the detection of pattern edges |
04/19/1988 | US4739052 Phenyl ketone derivatives |
04/19/1988 | US4738916 Intermediate layer material of three-layer resist system |
04/19/1988 | US4738915 Positive-working O-quinone diazide photoresist composition with 2,3,4-trihydroxybenzophenone |
04/19/1988 | US4738910 Method of applying a resist |
04/19/1988 | US4738886 Resin printing plate and preparation thereof |
04/13/1988 | EP0263609A2 Image forming apparatus |
04/13/1988 | EP0263434A2 Photosensitive composition and a photosensitive registration material prepared therefrom |