Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/1991
10/30/1991EP0453488A1 Radiation-sensitive film comprising at least one monomolecular layer of fluorine-containing amphiphilic substances.
10/30/1991CN1055825A Positive-working photosonsitive electrostatic master
10/29/1991US5061956 Optically imaging method and apparatus
10/29/1991US5061606 Preparation of relief printing plates
10/29/1991US5061605 Improved sensitivity to long wavelengths
10/29/1991US5061604 Negative crystalline photoresists for UV photoimaging
10/29/1991US5061603 Photocurable compositions
10/29/1991US5061602 Photosensitive recording material of enhanced flexibility
10/29/1991US5061601 Radiation-sensitive composition containing a vinyl pyrrolidone polymer and use thereof in lithographic printing plates
10/29/1991US5061600 Radiation-sensitive composition containing both a vinyl pyrrolidone polymer and an unsaturated polyester and use thereof in lithographic printing plates
10/29/1991US5061599 Radiation sensitive materials
10/29/1991US5061598 PS plate for use in making lithographic printing plate requiring no dampening water
10/29/1991US5061596 Homogeneity, adhesion, stability
10/29/1991US5061592 Presensitized plate for use in making lithographic printing plates
10/29/1991US5061144 Resist process apparatus
10/29/1991US5061049 Spatial light modulator and method
10/29/1991CA1291588C No thermal cure dry film solder mask
10/29/1991CA1291480C Radiation-sensitive polycondensates, their preparation, material coated therewith and the use thereof
10/27/1991WO1991016662A1 Step and repeat camera/projector machine
10/27/1991CA2081331A1 Step and repeat camera/projector machine
10/27/1991CA2041201A1 Rotogravure printing media and methods of manufacturing a rotogravure printing device employing the media
10/27/1991CA2041191A1 Process for the production of printing forms or photoresists by imagewise irradiation of a photopolymerizable recording material
10/25/1991CA2039879A1 Method and apparatus for applying a layer of a fluid material on a semiconductor wafer
10/23/1991EP0453317A2 Image forming medium
10/23/1991EP0453307A2 Photocurable self-retainable gel, shaped article prepared therefrom, applications and preparations thereof
10/23/1991EP0453237A2 Photosensitive, heat-resistant resin composition and pattern formation process
10/23/1991EP0453235A2 Photosensitive resin composition and method of forming conductive pattern
10/23/1991EP0453169A2 Method of forming a mask and a thin-film transistor
10/23/1991EP0453126A2 Negative photoresist developable in aqueous base
10/23/1991EP0453125A2 Image forming method and image forming apparatus
10/23/1991EP0452986A2 Photosensitive amphiphilic high molecular weight polymers and process for their production
10/23/1991EP0452656A2 Photosensitive polymer composition for water developable flexographic printing plate
10/23/1991EP0452552A2 Film peeling method and apparatus for practicing same
10/23/1991EP0371123A4 Apparatus and process for processing printing plates
10/23/1991CN1055610A Improved elastomeric layer for multilayer tonable photosensitive elements
10/23/1991CN1055609A Aqueous processable photosensitive element
10/22/1991US5060011 Image recording apparatus
10/22/1991US5060010 Image forming apparatus and leader sheet therefor
10/22/1991US5060008 Image recording apparatus which reduces the wasting of photosensitive recording medium when operating in a plural image recording mode
10/22/1991US5059996 Apparatus for processing a photosensitive element
10/22/1991US5059988 Image forming apparatus
10/22/1991US5059698 Solution inhibitors for positive photoresists; light-curable polymers
10/22/1991US5059513 Exposing naphthoquinone diazide sulfonic acid ester with actinic radiation; uniformity; high thermal stability and resolution
10/22/1991US5059512 Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions
10/22/1991US5059511 Curable silicone rubber layer on light sensitive resin of (meth)acryloyl and allyl monomers, photoinitiators
10/22/1991US5059509 Multicolor image-forming method
10/22/1991US5059508 Diffusion transfer; exposure of silver halide emulsion to laser beams
10/22/1991US5059507 Positive resist composition containing quinone diazide sulfonic acid ester of a phenol compound and an alkali soluble resin
10/22/1991US5059506 Method of image formation
10/22/1991US5059500 Process for forming a color filter
10/22/1991US5059359 Methods and apparatus for production of three-dimensional objects by stereolithography
10/22/1991US5059021 Apparatus and method for correcting for drift in production of objects by stereolithography
10/22/1991US5059013 Illumination system to produce self-luminous light beam of selected cross-section, uniform intensity and selected numerical aperture
10/22/1991US5058988 Apparatus and method for profiling a beam
10/22/1991US5058982 Illumination system and inspection apparatus including same
10/22/1991US5058610 Fluid supplying and processing device
10/22/1991US5058500 Apparatus and printing system for developing lithographic plate for printing and measuring its image area rates
10/22/1991US5058499 Imparting an image on a substrate
10/20/1991CA2040619A1 Photocurable self-retainable gel, shaped article prepared therefrom, applications and preparations thereof
10/19/1991CA2037705A1 Method and apparatus for enhancing the depth of focus in projection lithography
10/17/1991WO1991015810A1 Resist material and process for use
10/17/1991WO1991015808A1 Resist material for use in thick film resists
10/17/1991WO1991015807A1 Resist material with carbazole diazonium salt acid generator and process for use
10/17/1991WO1991015333A2 Ultrafast electro-dynamic x, y and theta positioning stage
10/17/1991DE4110181A1 Photostatic lacquer soln. - contains ether cpd. contg. fluorinated alkyl gp. and siloxanyl gp., useful for microelectronic components
10/17/1991DE4105715A1 Photoresist soln. contg. acyclic or cyclic siloxane] cpd. - to reduce surface roughness of coating, useful for structurising microelectronic device
10/17/1991DE4105695A1 Positive photoresist soln. contg. siloxane with fluoroalkyl gps. - use to reduce surface roughness of coating, useful for structurising microelectronic device
10/17/1991DE4012208C1 Printing plate exposure system - incorporates spring mechanism on suction frame
10/17/1991CA2080365A1 Resist material and process for use
10/16/1991EP0452139A2 Urethane polymers for printing plate compositions
10/16/1991EP0452110A1 Photoreactive oligomer composition and printing plate
10/16/1991EP0452043A1 X-ray mask structure
10/16/1991EP0452041A1 Substrate conveying device and method of controlling the same
10/16/1991EP0452027A2 Correction of defects in colour filters
10/16/1991EP0451850A1 Positive photoresist composition
10/16/1991EP0451741A2 Positive-working photosensitive electrostatic master
10/16/1991EP0451736A2 Aqueous processable photosensitive element
10/16/1991EP0451735A2 Improved elastomeric layer for multilayer tonable photosensitive elements
10/16/1991EP0451561A1 Photopolymerisable mixture and recording material made from it
10/16/1991EP0451329A2 Controlling method of forming thin film, system for said controlling method, exposure method and system for said exposure method
10/16/1991EP0451311A1 Process for obtaining a resist pattern
10/16/1991EP0419518A4 X-ray lens and collimator
10/16/1991CN1055398A Process for forming membrane
10/16/1991CN1055325A Rapid matrix-making technique of cloisonne enamel
10/16/1991CN1014362B Colour holographic recording medium
10/15/1991US5057865 Burnout frame with uv-absorption
10/15/1991US5057861 Color image recorder and image projector useful therefor
10/15/1991US5057860 Pressure developing device provided in an image recording apparatus
10/15/1991US5057462 Compensation of lithographic and etch proximity effects
10/15/1991US5057401 Using photosensitivity photoresists
10/15/1991US5057400 Reacting unsaturated acid anhydride with conjugated diene polymer, then with unsaturated hydroxy-monocarboxylic acid yields non-tacky film for printed circuits
10/15/1991US5057399 Method for making polyimide microlithographic compositions soluble in alkaline media
10/15/1991US5057398 Photopolymerizable composition and photopolymerizable recording material containing same
10/15/1991US5057397 Electron beam-curable resist composition and method for fine patterning using the same
10/15/1991US5057396 Cyclic polymers containing cyclotrisiloxane and tetrasiloxane rings; polysilsesquisiloxanes; oxygen-plasma resistant photoresists; integrated circut; resolution; heat resistance
10/15/1991US5057394 Method of forming an image
10/15/1991US5057393 Complexed with cationic dyes
10/15/1991US5057390 Vinyl alcohol polymer, radically polymerizable ethylenic unsaturated compound
10/15/1991US5057371 Aziridine-treated articles
10/15/1991US5057348 Potted electrical/mechanical devices, and dual cure potting method