| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/08/1992 | EP0464402A2 A method of producing a screen for printing a heating line pattern and a method of forming a heating line pattern on a glass plate |
| 01/08/1992 | EP0464398A1 Process for dimensionally stabilizing photopolymer flexographic printing plates |
| 01/08/1992 | EP0464238A1 Method and apparatus for patch coating printed circuit boards |
| 01/08/1992 | EP0464224A1 Method of and material for forming thick filmy pattern |
| 01/08/1992 | EP0464131A1 Initiators for polymerization. |
| 01/08/1992 | EP0464081A1 Method of manufacturing an optical disc |
| 01/08/1992 | CN1057724A Solid imaging system using incremental photoforming |
| 01/08/1992 | CN1057723A Method and apparatus for fabricating three dimensional objects from photoformed precursor sheets |
| 01/07/1992 | US5079626 Digital picture image forming apparatus for eliminating cross talk between a plurality of colors |
| 01/07/1992 | US5079600 Metal plating paths on solid substrate |
| 01/07/1992 | US5079587 Image recording apparatus having device for adjusting position of mask members |
| 01/07/1992 | US5079586 Color image recording apparatus |
| 01/07/1992 | US5079430 Ultraviolet radiation projector and optical image forming apparatus |
| 01/07/1992 | US5079378 Preparation of diaryliodonium salt photoinitiators having long chain ester groups concatenated with aryl groups |
| 01/07/1992 | US5079214 Screen printing to coat support with polymeric dye image receiving layer; liquid crystal display device |
| 01/07/1992 | US5079187 Method for processing semiconductor materials |
| 01/07/1992 | US5079131 Dry Development Following Vapor Phase Treatment With Organometallic Reagents |
| 01/07/1992 | US5079129 Negative photoresist based on polyphenols and epoxy compounds or vinyl ethers |
| 01/07/1992 | US5079126 Photohardenable composition containing five member aromatic group with imine moiety |
| 01/07/1992 | US5079112 Device manufacture involving lithographic processing |
| 01/07/1992 | US5078824 Semiconductor device manufacturing apparatus |
| 01/07/1992 | US5078820 Method and apparatus for pressure sticking a thin film to a base plate |
| 01/07/1992 | US5078791 Siloxane protective coatings |
| 01/07/1992 | US5078482 Resolution confocal microscope, and device fabrication method using same |
| 01/07/1992 | US5078474 Exposure apparatus having a magnifying lens system |
| 01/07/1992 | US5077912 Process for drying coated web |
| 01/07/1992 | CA1294066C Guard ring for a differentially pumped seal apparatus |
| 01/07/1992 | CA1294065C Apparatus for preselecting and maintaining a fixed gap between a workpiece and a vacuum seal apparatus in particle beam lithography systems |
| 01/07/1992 | CA1294060C Pull-raising member and pull-raising unit for peeling thin-film |
| 01/07/1992 | CA1293879C Color filter arrays |
| 01/06/1992 | CA2045968A1 Solid imaging system using differential tension elastomeric film |
| 01/02/1992 | EP0463870A1 Plasma treating method using hydrogen gas |
| 01/02/1992 | EP0463853A1 Vacuum chuck |
| 01/02/1992 | EP0463486A2 Process for the production of flexographic relief printing plates |
| 01/02/1992 | EP0463485A2 Process for the production of flexographic relief printing plates |
| 01/02/1992 | EP0463016A1 Fluid compound for cleaning off polymeric materials adhering to a surface. |
| 01/02/1992 | DE4120417A1 Photosensitive electron-pptn. coating mass - obtd. using photosensitive cpd. contg. quinone di:azide sulphonic acid units and water-soluble or -dispersible resin |
| 12/31/1991 | US5077774 X-ray lithography source |
| 12/31/1991 | US5077580 Image forming apparatus |
| 12/31/1991 | US5077575 Image forming apparatus equipped with a bucket for accommodating a photosensitive sheet cartridge |
| 12/31/1991 | US5077574 Image forming apparatus |
| 12/31/1991 | US5077464 Method and apparatus for endpoint detection in a semiconductor wafer etching system |
| 12/31/1991 | US5077402 For photocuring pigmented systems; printing inks, lacquers |
| 12/31/1991 | US5077395 Substituted 1,2-naphthoquinone-2-diazide-4-sulfonic acids and processes for their preparation and use |
| 12/31/1991 | US5077378 Polyamide containing the hexafluoroisopropylidene group |
| 12/31/1991 | US5077263 Intermediate receiver release layer |
| 12/31/1991 | US5077234 Planarization process utilizing three resist layers |
| 12/31/1991 | US5077178 Light sensitive layers separated by barrier layers |
| 12/31/1991 | US5077177 Process for the production of relief forms with a developing solvent comprising phenol ether |
| 12/31/1991 | US5077176 Depositing photoresist layer, developing, sprayed with clearee r, etching solution and anti-tarnishing solution |
| 12/31/1991 | US5077175 Plasticized polyvinyl alcohol release layer for a flexographic printing plate |
| 12/31/1991 | US5077174 Aqueous development, stripping |
| 12/31/1991 | US5077173 Positive photoresist containing 2,3,4-trihydroxybenzophenone and 1,2-naphthoquinone-diazide-5-sulfonyl trisester of 1,3,5-trihydroxybenzene |
| 12/31/1991 | US5077157 Selective etching of silica, metal and photoresist layers; forming grid matrix insulated from anodes and cathode |
| 12/31/1991 | US5077156 Antistatic and electrically conductive relief images, processes for the production thereof, coating agents and radiation-sensitive polymers |
| 12/31/1991 | US5076669 Method and apparatus for selectively blocking light beams of different wavelengths with single color-sensitive filter |
| 12/31/1991 | CA1293835C Hardenable composition and its use |
| 12/31/1991 | CA1293825C Silicon grid as a reference and calibration standard in a particle beam lithography system |
| 12/28/1991 | CA2043799A1 Peel-developable, single sheet color proofing system with laminated adhesive layers |
| 12/27/1991 | EP0462756A2 X-ray exposure apparatus |
| 12/27/1991 | EP0462704A1 Photosensitive composition and printing plate |
| 12/27/1991 | EP0462698A2 Masks for high quality images from total internal reflection holograms |
| 12/27/1991 | EP0462550A2 Stripping method for removing resist from a printed circuit board |
| 12/27/1991 | EP0462391A2 Acid hardened photoresists |
| 12/27/1991 | EP0462330A1 Process and material for protecting images |
| 12/27/1991 | EP0462222A1 Free-radical curable compositions |
| 12/27/1991 | EP0462204A1 Free-radical curable compositions |
| 12/27/1991 | EP0462183A1 Free-radical curable compositions |
| 12/27/1991 | CA2045275A1 Solid imaging system using incremental photoforming |
| 12/27/1991 | CA2045216A1 Method and apparatus for fabricating three dimensional objects from photoformed precursor sheets |
| 12/26/1991 | WO1991020006A1 Color filter and method of manufacturing the same |
| 12/24/1991 | US5075718 Exposure apparatus |
| 12/24/1991 | US5075717 Image recording apparatus |
| 12/24/1991 | US5075711 Method of and apparatus for developing photosensitive lithographic plate |
| 12/24/1991 | US5075467 Reacting organotitanium halide with lithium amide |
| 12/24/1991 | US5075456 Monomers for acrylic esters; photoresists, prepregs |
| 12/24/1991 | US5075243 Cobalt silicide on silicon, forming amorphous or polycrystalli ne coating capable of controlled crystallization, exposure to focused electron beam, removing remaining coating while leavin g crystallized portion |
| 12/24/1991 | US5075199 Radiation sensitive mixture and production of relief patterns |
| 12/24/1991 | US5075194 Positive photoresist composition containing 4,4-diester, 4,5-diester, or 5,5-diester of spiroglycol and 1-oxo-2-diazonaphthalene-5-sulfonic acid chloride |
| 12/24/1991 | US5075193 Desensitized quinone diazide compounds utilizing microcrystalline cellulose as desensitizing agent |
| 12/24/1991 | US5075192 Aqueous processible photosensitive compositions containing core shell microgels |
| 12/24/1991 | US5074241 Developer material coating apparatus carry roller |
| 12/24/1991 | CA1293581C Copolymers formed from n-hydroxyphenylmaleinimide (derivatives) and allyl compounds |
| 12/24/1991 | CA1293488C Spin drying apparatus |
| 12/24/1991 | CA1293407C Imaging systems employing photosensitive microcapsules containing 3-substituted coumarins and other photobleachable sensitizers |
| 12/24/1991 | CA1293406C Developer compositions for lithographic printing plates |
| 12/24/1991 | CA1293404C Printing plate processor having recirculating water wash reclamation |
| 12/24/1991 | CA1293401C Mounting for high resolution projection lenses |
| 12/21/1991 | CA2044986A1 Positive-type photosensitive electrodeposition coating composition |
| 12/21/1991 | CA2044693A1 Stripping method for removing resist from a printed circuit board |
| 12/21/1991 | CA2039668A1 Photosensitive composition and printing plate |
| 12/21/1991 | CA2019583A1 Photoimaging process using water removable coatings |
| 12/19/1991 | DE4119686A1 Presensitised plate with little background staining - having low dyestuff concn. in positive photocopying coat, near roughened anodised aluminium base |
| 12/19/1991 | CA2044785A1 Photosensitive resin composition for flexographic printing |
| 12/18/1991 | EP0461932A2 Apparatus for exposing peripheral portion of substrate |
| 12/18/1991 | EP0461739A2 Method and apparatus for preparing relief image printing plates |
| 12/18/1991 | EP0461663A1 Method of manufacturing a semiconductor device, including a step of forming a pattern on a photo-resist film |
| 12/18/1991 | EP0461654A2 Radiation-sensitive positive resist composition |
| 12/18/1991 | EP0461651A1 Recording medium |
| 12/18/1991 | EP0461621A2 Image forming method |