Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/1991
11/26/1991US5068263 Resin composition curable with an active energy ray containing graft copolymerized polymer with trunk chain containing dicyclopentenyl group
11/26/1991US5068262 A resin curable with ultraviolet radiation or electron beams capable of forming patterns on copper coated laminates for use as a printed board
11/26/1991US5068260 A resin curable with ultraviolet radiation or electron beams capable of forming patterns on copper coated laminates for use as a printed board
11/26/1991US5068259 Resin composition curbable with an active energy ray containing epoxy resin and monomer with ethylenically unsaturated bond
11/26/1991US5068258 A resin curable with ultraviolet radiation or electron beams capable of forming patterns on copper coated laminates for use as a printed board
11/26/1991US5068257 A resin curable with ultraviolet radiation or electron beams capable of forming patterns on copper coated laminates for use as a printed board
11/26/1991US5068169 Process for production of semiconductor device
11/26/1991US5068168 Styrene, monoisobutyl maleate and mono-2-(butoxy)ethyl maleate terpolymer useful as alkali soluble binders for photoresists
11/26/1991US5068165 Lithographic aluminum offset printing plate made according to the dtr-process
11/26/1991US5068164 A support with a silver halide emulsion and a developmental nuclei layer, development of light sensitive layer with an alkali
11/26/1991US5068163 Radiation-sensitive positive working composition and copying material
11/26/1991US5068131 Applying a fluorinated polyimide, rotation, centrifuging and drying
11/26/1991US5068123 Process for producing recording medium and apparatus therefor
11/26/1991US5067811 Illuminance distribution measuring system
11/26/1991US5067798 Laser beam scanning system
11/26/1991US5067664 Photosensitive sheet positioning device
11/26/1991CA2042735A1 Image reversal negative working photoresist
11/26/1991CA1292542C Apparatus and methods for the production of large area electro-optic devices
11/26/1991CA1292409C Thin-film coating method and apparatus therefor
11/25/1991CA2042807A1 Positive resist composition
11/21/1991EP0457367A1 Radiation-sensitive resin composition
11/21/1991DE4016089A1 Device for removing dust from substrate surface for PCB mfr. - blows dust away by compressed air jets and removes by suction
11/20/1991CN1056279A Technology for making metal plate with sulfuric paper
11/19/1991US5066974 Auxiliary exposure device for image recording apparatus
11/19/1991US5066973 Image forming apparatus using an elongated web-like recording medium
11/19/1991US5066972 Image forming apparatus with positional adjustment of exposure area according to image size
11/19/1991US5066751 Resist material for energy beam lithography and method of using the same
11/19/1991US5066616 Method for improving photoresist on wafers by applying fluid layer of liquid solvent
11/19/1991US5066615 Photolithographic processes using thin coatings of refractory metal silicon nitrides as antireflection layers
11/19/1991US5066568 Method of developing negative working photographic elements
11/19/1991US5066567 Image reversal process utilizing a positive-working photosensitive composition containing a dye
11/19/1991US5066566 Cleavage of polymer forming acid used in development
11/19/1991US5066565 Selective protection of poly(tetra-fluoroethylene) from effects of chemical etching
11/19/1991US5066564 Printing plates and photoresists
11/19/1991US5066561 Method for producing and using a positive photoresist with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
11/19/1991US5066418 Binary azeotropic compositions of 3-chloro-1,1,1-trifluoropropane with methanol or ethanol, or trans-1,2-dichloroethylene
11/19/1991US5066131 Stage mechanism
11/19/1991CA1292339C Copolymers having o-nitrocarbinol ester groups, production of two-layer resists, and fabrication of semiconductor components
11/14/1991WO1991017488A2 Method of manufacturing an integrated circuit
11/14/1991WO1991017484A1 Photoresist stripper
11/14/1991WO1991017483A1 Illumination device
11/13/1991EP0456479A2 Pattern forming process, apparatus for forming said pattern and process for preparing semiconductor device utilizing said pattern forming process
11/13/1991EP0456469A2 Photosensitive heat-resistant polymer having hydroxyphenyl group
11/13/1991EP0456463A2 Photoimageable polyimide coating
11/13/1991EP0456380A2 Photocurable composition comprising maleic anhydride adduct of polybutadiene or butadiene copolydiene copolymers
11/13/1991EP0456336A2 Photocurable elements and flexographic printing plates prepared therefrom
11/13/1991EP0456075A1 Positive-working radiation-sensitive mixture and radiation-sensitive recording material for exposure using deep UV-radiation
11/13/1991EP0456073A2 Multifunctional compounds having alpha-diazo-beta-ketoester units and sulfonic acid ester units and process for their preparation.
11/13/1991EP0456040A1 Copolymerisable photoinitiators of the benzil ketal type
11/13/1991EP0436639A4 Multifunctional photolithographic compositions
11/13/1991CN1056187A Method for photolithographically forming self-aligned mask using back-side exposure and non-specular reflecting layer
11/13/1991CN1014692B Production of artificial-silk chinese-painting paper
11/12/1991US5065174 Developing machine for photosensitive films and developing method for photosensitive films
11/12/1991US5064959 Photoinitiators
11/12/1991US5064748 With well-defined edges, photoresists
11/12/1991US5064747 Sensitizers for photocrosslinkable polymers
11/12/1991US5064746 Sulfonium Compound, Nitrobenzyl Acrylate Copolymer
11/12/1991US5064745 Method for making lithographic printing plate
11/12/1991US5064744 Photosensitive material and image forming method
11/12/1991US5064741 Positive working light-sensitive composition containing a free radical generator and a discoloring agent
11/12/1991US5064269 Light collection method and apparatus
11/12/1991US5064070 Packaging container for containing developer sheets therein and method of packaging such sheets
11/12/1991CA1291894C Method of producing devices using nonplanar lithography
11/09/1991CA2040994A1 Photoimageable polyimide coating
11/06/1991EP0455240A2 Slot-coupling of optical waveguide to optical waveguide devices
11/06/1991EP0455228A1 Photoresist composition
11/06/1991EP0455223A2 Resist composition
11/06/1991EP0455032A2 Process for forming multi-level coplanar conductor/insulator films employing photosensitive polyimide polymer compositions
11/06/1991EP0380591A4 Fiber/resin composites, and method of making the same
11/05/1991US5063586 Apparatus for semiconductor lithography
11/05/1991US5063582 Liquid cooled x-ray lithographic exposure apparatus
11/05/1991US5063405 Apparatus for forming images
11/05/1991US5063138 Positive-working photoresist process employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent during photoresist coating
11/05/1991US5063134 Silicon-containing novolaks for multilayer photoresists developed by an aqueous alkaline solution; oxygen-plasma resistance; resolution
11/05/1991US5062705 Apparatus for evaluating a lens
11/05/1991US5062692 Exposure apparatus
11/05/1991US5062681 Slot-coupling of optical waveguide to optical waveguide devices
11/03/1991CA2041434A1 Resist composition
11/03/1991CA2041128A1 Slot-coupling of optical waveguide to optical waveguide devices
10/1991
10/31/1991WO1991017549A1 X-ray imaging system
10/31/1991WO1991016724A1 Resist processing device, resist processing method and resist pattern
10/31/1991WO1991016719A2 Photovoltaic cells
10/31/1991WO1991016668A1 Method and device for making photosensitive resin form plate
10/31/1991WO1991016360A1 Compositions containing organic-soluble xanthene dye photoinitiators
10/31/1991WO1991016200A1 A rotogravure printing media and methods of manufacturing a rotogravure printing device employing the media
10/31/1991DE4113968A1 Mask structure for semiconductor component prodn. - has transparent support plate on which are periodically set given groups of component structures with phase shift structures
10/31/1991DE4108496A1 Dry photosensitive plate for lithographic printing - comprises polyether (meth)acrylate] light sensitive coat, photopolymerisation initiator and film forming polymer covered by silicon rubber
10/31/1991DE4102252A1 Negative photoresist for sub-micron structurising - contains mixed cresol formaldehyde condensate as binder and specified quinone di:azide cpd., developed using dry process
10/31/1991CA2049946A1 X-ray imaging system
10/31/1991CA2039321A1 Process for forming multi-level coplanar conductor/insulator films employing photosensitive polyimide polymer compositions
10/30/1991EP0454335A2 Photoresist composition
10/30/1991EP0454334A2 Photoresist composition
10/30/1991EP0454314A2 Method and apparatus for applying a layer of fluid material on a semiconductor wafer
10/30/1991EP0454169A2 Photomask and method of treating the same
10/30/1991EP0453953A2 Process for the production of printing plates or photoresist by imagewise exposure of a photopolymerisable registration material
10/30/1991EP0453950A2 Process for the production of negative relief images
10/30/1991EP0453946A2 Method of focusing optical head on object body and optical inspection system comprising an automatic focusing device
10/30/1991EP0453838A2 Use of aqueous solutions or dispersions of oligourethanes containing (meth)acryloyl groups and aqueous solutions or dispersions suitable for this use
10/30/1991EP0453753A2 Method and apparatus for enhancing the depth of focus in projection lithography
10/30/1991EP0453610A1 Process for obtaining resist structures
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