Patents for C30B 33 - After-treatment of single crystals or homogeneous polycrystalline material with defined structure (6,009)
01/1999
01/07/1999WO1999000538A1 SINGLE CRYSTAL SiC AND PROCESS FOR PREPARING THE SAME
01/05/1999US5855668 Superconductor substrates
12/1998
12/30/1998WO1998059099A1 SINGLE CRYSTAL SiC AND PROCESS FOR PREPARING THE SAME
12/30/1998EP0887105A1 Device and method for comminution of semiconductive material
12/22/1998US5852622 Solid state lasers with composite crystal or glass components
12/22/1998US5851303 Method for removing metal surface contaminants from silicon
12/22/1998US5851283 Method and apparatus for production of single crystal
12/22/1998CA2097472C Method for the manufacture of large single crystals
12/17/1998WO1998056966A1 Corner cube arrays and manufacture thereof
12/17/1998WO1998056575A1 Eutectic bonding of single crystal components
12/15/1998US5849669 High temperature superconducting Josephson device and method for manufacturing the same
12/15/1998US5849093 Process for surface treatment with ions
12/15/1998US5849079 Diamond film growth argon-carbon plasmas
12/09/1998EP0605650B1 Radio frequency automatic identification system
12/08/1998US5846638 Composite optical and electro-optical devices
12/02/1998CN1041003C Method for producing large polycrystalline plates from optical and scintillation material
12/01/1998US5843226 Etch process for single crystal silicon
11/1998
11/26/1998WO1998053125A1 Single crystal silicon carbide and process for preparing the same
11/25/1998CN2298265Y 快速退火装置 Rapid annealing device
11/24/1998US5840117 Method for surface flattening a crystal substrate
11/24/1998US5839424 Process for the orientation of several single crystals disposed side by side on a cutting support for their simultaneous cutting in a cutting machine and device for practicing this process
11/17/1998US5838716 Leak check procedure for a dry oxidation furnace tube
11/10/1998US5834374 Method for controlling tensile and compressive stresses and mechanical problems in thin films on substrates
11/10/1998US5834322 Heat treatment of Si single crystal
11/05/1998WO1998048944A1 Method for enhancing the color of minerals useful as gemstones
10/1998
10/28/1998CN1197212A Method of analyzing semiconductor ingot
10/27/1998US5827779 Method of manufacturing semiconductor mirror wafers
10/22/1998WO1998046813A1 Etching method
10/15/1998WO1998045511A1 MECHANO-CHEMICAL POLISHING OF CRYSTALS AND EPITAXIAL LAYERS OF GaN AND Ga1-x-yAlxInyN
10/15/1998WO1998045510A1 Low defect density, self-interstitial dominated silicon
10/15/1998WO1998045509A1 Low defect density silicon
10/15/1998WO1998045508A1 Low defect density, vacancy dominated silicon
10/15/1998WO1998045507A1 Low defect density, ideal oxygen precipitating silicon
10/14/1998EP0871042A1 Radio frequency automatic identification system
10/13/1998US5820688 Method for the treatment of semiconductor material
10/08/1998WO1998044549A1 Flattening process for epitaxial semiconductor wafers
10/07/1998CN1195038A High-temperature heat treatment method for mercury cadmium telluride material
10/06/1998US5817174 Semiconductor substrate and method of treating semiconductor substrate
10/06/1998US5817171 Apparatus and method for producing single crystal using Czochralski technique
10/01/1998WO1998042620A1 Process for producing carbon nanotubes, process for producing carbon nanotube film, and structure provided with carbon nanotube film
09/1998
09/30/1998EP0867539A2 Method for poling a ferroelectric crystal
09/30/1998CN1194623A Silicon carbide gemstones
09/29/1998US5814194 Forming clusters, acceleration and radiation
09/24/1998DE19711550A1 Edge zone-free polycrystalline silicon article production
09/22/1998US5810936 Plasma-inert cover and plasma cleaning process and apparatus employing same
09/22/1998US5810929 Pyrogenic wet thermal oxidation of semiconductor wafers
09/17/1998DE19810546A1 Notch-free marked wafer production
09/17/1998DE19810545A1 Wafer with mirror polished bevelled edge
09/11/1998WO1998039502A1 METHOD FOR GROWING MONOCRYSTALS OF HIGH-TEMPERATURE SUPRACONDUCTORS MADE OF RARE EARTH-CUPRATES OF FORM SE1+xBa2-xCu3O¿7-δ?
09/09/1998EP0863231A1 A process for dicing a preform made of an oxide single crystal, and a process for producing functional devices
09/09/1998EP0863117A2 A process for forming a microstructure in a substrate of a ferroelectric single crystal
09/08/1998US5804321 Long term support in high temperature homoepitaxial growth; metal carbides; alloys of platinum family metals contacting and bound on side of substrate.
09/08/1998US5803967 Repeatedly cycling between first and second growth parameters; etching at intermediate stages to remove defects
09/03/1998DE19708711C1 Verfahren zur Züchtung von Einkristallen von Hochtemperatursupraleitern aus Seltenerd-Kupraten der Form SE¶1¶¶+¶¶x¶Ba¶2¶¶-¶¶x¶Cu¶3¶0¶7¶¶-¶¶delta¶ und nach dem Verfahren hergestellte Kristalle Method for growing single crystals of high-temperature superconductors from rare-earth cuprates the form SE¶1¶¶ + ¶¶x¶Ba¶2¶¶-¶¶x¶Cu¶3¶0¶7¶¶-¶¶delta¶ and after method produced crystals
09/01/1998US5801069 Method of fabricating thin film piezoelectric device
08/1998
08/25/1998US5798075 Adjustment of mosaic spread for highly oriented pyrolytic graphite
08/18/1998US5796762 Room temperature stable color center laserLiF:F2 +** material and method of lasing
08/18/1998US5796079 Rapid thermal processing method for ferroelectric, high dielectric, electrostrictive, semiconductive, or conductive ceramic thin film using microwaves
08/18/1998US5795653 Method for polishing a diamond or carbon nitride film by reaction with oxygen transported to the film through a superionic conductor in contact with the film
08/11/1998US5792566 Single crystal wafers
08/11/1998US5792253 Heating to below melting point of alkali halide, applying pressure to compress
08/04/1998US5788763 High quality by controlling the oxygen deposits
07/1998
07/29/1998EP0349633B1 Polysilicon thin film process
07/29/1998CN1188823A Thermal processor for semiconductor wafers
07/22/1998EP0853690A2 Silicon carbide gemstones
07/22/1998EP0853600A2 A method of biaxially aligning crystalline material
07/14/1998US5779822 Having a carbide phase produced by aging heat treatment of single crystal austenitic phase; nuclear reactor cores; nuclear fusion reactors; stress corrosion cracking resistance; high strength; durability
07/14/1998US5779791 Process for controlling thermal history of Czochralski-grown silicon
07/07/1998US5777300 Reduced pressure wet oxidation system; burning hydrogen and oxygen gases to generate water vapor, pressure differential
07/01/1998EP0851465A1 Method of separation of at least two elements joined by ion implantation
07/01/1998EP0851043A1 Optical single crystal film, process for producing the same and optical element comprising the same
06/1998
06/30/1998US5772760 Method for the preparation of nanocrystalline diamond thin films
06/25/1998WO1998027578A1 Very long and highly stable atomic wires, method for making these wires, application in nano-electronics
06/25/1998WO1998027252A1 Method for preparing a gemstone for polishing
06/23/1998US5769944 Vertical gradient freeze and vertical Bridgman compound semiconductor crystal growth apparatus capable of applying axial magnetic field
06/17/1998EP0848088A1 A method for treating a suface of a silicon single crystal and a method for manufacturing a silicon single crystal thin film
06/16/1998US5766976 Method for detecting crystal defects in a silicon single crystal substrate
06/16/1998US5766340 Method for post-poling mobile ion redistribution in lithium niobate
06/11/1998WO1998025299A1 Method for manufacturing semiconductor silicon epitaxial wafer and semiconductor device
06/09/1998US5763288 Method for producing semiconductor substrate by wafer bonding
06/09/1998US5762896 Single crystal gems hardness, refractive index, polishing and crystallization
06/03/1998EP0845803A1 SiC ELEMENT AND PROCESS FOR ITS PRODUCTION
05/1998
05/28/1998WO1998022978A1 Method of preparing silicon carbide wafers for epitaxial growth
05/19/1998US5753038 Method for the growth of industrial crystals
05/19/1998US5752819 Exhaust system for high temperature furnace
05/14/1998WO1998020524A1 Forming a crystalline semiconductor film on a glass substrate
05/06/1998CN1180902A Adjustment of mosaic spread for HOPG material
05/06/1998CN1180726A Sawing suspension and method for cutting wafers from crystal
05/05/1998US5747364 Mirror chamfering or etching the periferal portions of the wafers after the non-wax polishing step
05/05/1998US5746829 Window-containing sealed containers for concentrating impurities in semiconductors by radiating a specified position with a laser beam at an energy level below that of the energy of vaporization of the crystal
04/1998
04/22/1998EP0837115A1 Slicing slurry and method for cutting wafers from a crystal
04/14/1998US5738942 Semiconductor silicon wafer and process for producing it
04/09/1998DE19641070A1 Silicon wafer defects determining method for manufacture
04/08/1998CN1178391A Heat treating apparatus for mercury self sealed mercury-cadmium tellurid for switching transistors
04/07/1998US5736226 Wafer and method of producing a wafer
04/07/1998US5735949 Vapor depositing a monocrystalline layer on substrate, separated by a dielectric amorphous layer
04/01/1998EP0801606A4 Cleaning method
03/1998
03/19/1998DE19637220A1 Passivation of surface defects on diamond
03/18/1998EP0829559A1 Method for producing silicon wafers with a low defect-density
03/17/1998US5728214 Surface treatment of an oxide LNBA2CU307-X single crystal
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