Patents for C30B 33 - After-treatment of single crystals or homogeneous polycrystalline material with defined structure (6,009)
03/1997
03/18/1997US5611855 Method for manufacturing a calibration wafer having a microdefect-free layer of a precisely predetermined depth
03/13/1997WO1997009471A1 Surface-coated whisker
03/13/1997WO1997009470A2 Silicon carbide gemstones
03/12/1997EP0761599A2 Method of purifying alkaline solution and method of etching semiconductor wafers
03/04/1997CA2076334C Ambient-free processing system
02/1997
02/20/1997WO1997006548A2 Isotope separation method for preparing novel semiconductors, and semiconductor junctions containing the novel semiconductor
02/11/1997US5601428 Vertical heat-treating apparatus and heat insulator
01/1997
01/22/1997EP0754785A1 Method of manufacturing semiconductor mirror wafers
01/21/1997US5595627 Plasma etching method
01/14/1997US5593783 Aminated
01/14/1997US5593494 Precision controlled precipitation of oxygen in silicon
12/1996
12/31/1996US5588994 Method of producing sheets of crystalline material and devices made therefrom
12/31/1996US5588831 Furnace system equipped with protected combustion nozzle used in fabrication of semiconductor device
12/27/1996EP0750057A2 Method for the preparation of a silicon single crystal rod with uniform distribution of crystal defects and an apparatus therefor
12/24/1996US5587590 Sample of metal silicide film for facilitating inspection of crystal structure by x-ray inspection
12/11/1996EP0747515A2 Apparatus and method for producing single crystal using Czochralski technique
12/11/1996EP0747513A2 Silicon single crystal with low defect density and method of producing same
12/04/1996EP0746017A2 Method of forming connection hole
12/04/1996EP0745707A1 Method for the growth of large single crystals
12/04/1996EP0745704A2 Process for preparing an epitaxially coated semiconducting wafer
12/04/1996CN1137298A Method of producing large polycrystalline plates from optical and scintillation materials
12/03/1996US5581257 Radio frequency automatic identification system
11/1996
11/27/1996CN1136604A Precision control oxygen precipitation in silicone
11/12/1996US5573609 Hot isostatic pressing of single crystal superalloy articles
11/06/1996EP0741118A2 Method of synthetic diamond ablation with an oxygen plasma and synthetic diamonds etched accordingly
11/06/1996EP0642425A4 Method of fabricating group iii-v compound semiconductor devices using selective etching.
11/05/1996US5572725 Epitaxially strengthened single crystal aluminum garnet reinforcement fibers
10/1996
10/22/1996US5567149 Exhaust system for high temperature furnace
10/08/1996US5563899 Composite solid state lasers of improved efficiency and beam quality
10/02/1996DE19611043A1 Silicon wafer with stepped inclined surface
10/01/1996US5560241 Synthetic single crystal diamond for wire drawing dies
09/1996
09/18/1996EP0732739A1 Improvements in crystal substrate processing
09/18/1996EP0732431A1 Precision controlled precipitation of oxygen in silicon
09/17/1996US5556204 Method and apparatus for detecting the temperature of a sample
09/12/1996DE19609107A1 Prodn. of silicon@ wafers with defect-free surface layer
09/11/1996EP0731493A2 Method for formation of a polycrystalline semiconductor film
09/04/1996EP0730048A1 Method for vapor-phase growth of single crystal silicon
09/03/1996US5553110 X-ray mask structure, process for production thereof, apparatus and method for X-ray exposure with the X-ray mask structure, and semiconductor device produced by the X-ray exposure method
08/1996
08/27/1996US5549747 Method of producing sheets of crystalline material and devices made therefrom
08/22/1996DE19545518A1 Semiconductor substrate e.g. single crystal silicon wafer
08/20/1996US5548606 Multiform crystal and apparatus for fabrication
08/14/1996EP0726596A2 Plasma etching method
08/07/1996EP0725155A2 Precipitation hardening type single crystal austenitic steel, and usage the same
07/1996
07/16/1996US5536360 Doping with carbon, silicon, or germanium
07/16/1996US5535699 Method of making II-VI semiconductor infrared light detector
07/16/1996CA2006218C Processes for enhancing fluorescence of tunable titanium-doped oxide laser crystals
07/09/1996US5534294 Process for producing Semiconductor silicon wafer
07/09/1996US5534107 Using fluorine in the presence of ultraviolet radiation to produce fluorine and chlorine or bromine as a second gas for etching
06/1996
06/26/1996EP0625218B1 Process and device for surface-modification by physico-chemical reactions of gases or vapours on surfaces, using highly-charged ions
06/25/1996US5529051 Method of preparing silicon wafers
06/25/1996CA2082021C Method of stabilizing the surface properties of objects to be thermally treated in a vacuum
06/04/1996US5523071 Increasing the strength by depressurizing and annealing in hydrogen gas
05/1996
05/21/1996US5518935 Hydrogenation of photoresponsive semiconductor devices
05/15/1996EP0633952B1 Process for reducing the damage susceptibility of optical quality crystals
05/07/1996US5514245 Method for chemical planarization (CMP) of a semiconductor wafer to provide a planar surface free of microscratches
05/01/1996EP0709878A1 Method for the preparation of discrete substrate plates of semiconductor silicon wafer
05/01/1996EP0709498A1 Heat-treatment method of groups III - V compound semiconductor materials
05/01/1996EP0708983A1 Chemical vapor deposition process for fabricating layered superlattice materials
04/1996
04/10/1996EP0706207A2 Process to reduce the surface recombination rate in silicon
04/09/1996US5505157 Low hydrogen-content silicon crystal with few micro-defects caused from annealing, and its manufacturing methods
04/03/1996EP0704887A2 A method and device for controlling tensile and compressive stresses and mechanical problems in thin films on substrates
04/03/1996EP0704886A1 Process for etching cobalt silicide layers
04/03/1996EP0704884A2 Highly selective silicon oxide etching method
04/03/1996EP0441958B1 X-ray phosphor imaging screen and method of making same
03/1996
03/26/1996US5502010 Method for heat treating a semiconductor substrate to reduce defects
03/19/1996US5500157 Hot templates of polycrystalline diamonds
03/19/1996US5500077 Method of polishing/flattening diamond
03/13/1996EP0701009A2 Surface treatment of an oxide LnBa2Cu3O7-x single crystal
03/13/1996CN1118518A Furnance for manufacturing a semiconductor device, and a method of forming a gate oxide film utilizing the same
03/06/1996EP0699776A1 Wafer and method of producing a wafer
03/05/1996US5495824 Method for forming semiconductor thin film
02/1996
02/27/1996US5494861 Disposing aluminum nitride as susceptor on surface
02/27/1996US5494835 Process for the production of a relief structure on a semiconductor material support
02/21/1996EP0697715A1 UV-enhanced dry stripping of silicon nitride films
02/15/1996WO1996004412A1 Process for producing decorative silicone
02/13/1996US5490477 Process for the production of semiconductor foils and their use
02/01/1996DE19526711A1 Silicon@ wafer mfr. for VLSI mfr.
01/1996
01/31/1996EP0597024B1 Ion exchanged crystalline waveguides and processes for their preparation
01/30/1996US5487794 Hot rolling; abutting and joining a surface of seed material against a coiled end face of steel sheet; annealing
01/23/1996US5486263 Etching a diamond body with a molten or partially molten metal
01/23/1996US5485803 Method of predicting crystal quality of semiconductor single crystal and apparatus thereof
01/17/1996EP0692690A1 Apparatus for annealing diamond water jet mixing tubes
01/16/1996US5484483 Thermal treatment apparatus
01/16/1996US5484326 Semiconductor ingot machining method
01/11/1996WO1996000804A1 Apparatus for uniformly heating a substrate
01/10/1996EP0691420A1 Plasma-inert cover and plasma cleaning process and apparatus employing same
01/09/1996US5483038 Method of working diamond with ultraviolet light
01/02/1996US5480300 Vertical heat-treating apparatus and heat insulator
12/1995
12/26/1995US5477807 Depositing cathode and anode via a semi-dielectric substance layer on c-plane of singl crystal of potassium niobate, applying voltage so as to pole(convert to single domain state)
12/20/1995EP0688055A2 Hydrogenation of photoresponsive semiconductor devices
12/20/1995EP0688045A1 Cleaning method
12/19/1995US5477055 Method of producing gemstone quality topaz
12/19/1995US5476836 Reactor vessel for manufacture of superconducting films
12/12/1995US5474641 Processing method and apparatus thereof
12/05/1995US5472909 Method for the preparation of discrete substrate plates of semiconductor silicon wafer
12/05/1995US5472562 Method of etching silicon nitride
11/1995
11/21/1995US5468934 Apparatus for annealing diamond water jet mixing tubes
11/21/1995US5468326 Apparatus for polishing a diamond or carbon nitride film by reaction with oxygen transported to the film through a superionic conductor in contact with the film
11/14/1995CA1337546C Bonding diamond to diamond
11/07/1995US5464313 Heat treating apparatus
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