Patents for C30B 29 - Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape (27,107)
05/2005
05/04/2005CN1199846C Pure silver nano tube array and its preparation method
05/03/2005CA2213115C Process for producing a current limiter having a high-temperature superconductor, and current limiter
04/2005
04/29/2005CA2491242A1 Method of manufacturing n-type semiconductor diamond, and n-type semiconductor diamond
04/28/2005WO2005038899A1 Process for producing high resistance silicon wafer, and process for producing epitaxial wafer and soi wafer
04/28/2005WO2005038889A1 The method for allngan epitaxial growth on silicon substrate
04/28/2005WO2005038099A1 Lithium tantalate substrate and method for producing same
04/28/2005WO2005038098A1 Lithium tantalate substrate and method for producing same
04/28/2005WO2005038097A1 Lithium tantalate substrate and process for producing the same
04/28/2005WO2005037710A1 Method for the synthesis of filament structures on a nanometre scale and electronic components comprising such structures
04/28/2005WO2005022120A3 Process for producing nanocrystals and nanocrystals produced thereby
04/28/2005WO2005019104A3 Controlled nanotube fabrication and uses
04/28/2005WO2004054922A3 Nanostructure, electronic device and method of manufacturing the same
04/28/2005US20050090079 Method for gettering transition metal impurities in silicon crystal
04/28/2005US20050089680 3C-sic nanowhisker and synthesizing method and 3c-sic nanowhisker
04/28/2005US20050089467 Process control during (plasma enhanced) chemical vapor deposition independent of the catalyst particle size by controlling the residence time of reactive gases in the reactor
04/27/2005EP1525340A2 Method for producing by vapour-phase epitaxy a gallium nitride film with low defect density
04/27/2005EP1230421B1 Method of modifying source chemicals in an ald process
04/27/2005EP1222325B1 Method for producing czochralski silicon free of agglomerated self-interstitial defects
04/27/2005CN2695450Y Device for preparing zinc oxide whiskers array material
04/27/2005CN1610020A Magnetic material with bidirectional shape memory effect and single-crystal producing method thereof
04/27/2005CN1609287A Blended ytterbium boric acid Gd yttrium oxygen calcium self-frequency doubling laser crystal
04/27/2005CN1609286A Solar energy level silicon single crystal producing process
04/27/2005CN1609285A New CuI Crystal and growing method thereof
04/27/2005CN1609045A Prepn process of non-aggregate nanometer doped YAG powder
04/27/2005CN1608998A Prepn process of metal oxide and sulfide nanometer linear array
04/27/2005CN1608724A No-nitric acid extraction process of artificial diamond and boron nitride monocrystal
04/27/2005CN1198973C Apparatus and method for making single crystal
04/27/2005CN1198760C Method for removing templat agent from synthetic zeolite
04/26/2005US6885031 Integrated circuit including single crystal semiconductor layer on non-crystalline layer
04/26/2005US6884478 Including solvent and semiconductor particles in solvent in an effective amount to form liquid crystal phase
04/26/2005CA2352545C Single-crystal ferrite fine powder
04/21/2005WO2005036593A2 Deposition of silicon-containing films from hexachlorodisilane
04/21/2005WO2005035840A1 Piezoelectric single crystal, piezoelectric single crystal element and method for preparation thereof
04/21/2005WO2005035839A1 Semiconductor single crystal manufacturing apparatus
04/21/2005WO2005035838A1 Process for producing single crystal, single crystal and single crystal production apparatus
04/21/2005WO2005035837A1 Compound semiconductor single crystal and production process thereof
04/21/2005WO2005035174A1 Diamond tool, synthetic single crystal diamond and method for synthesizing single crystal diamond, and diamond jewelry
04/21/2005US20050085394 Superconductor; oxides of cobalt, nickel, barium, strontium, sodium, potassium, rubidium
04/21/2005US20050084443 Preparation of nanocrystallites
04/21/2005US20050082615 Epitaxial ferroelectric thin-film device and method of manufacturing the same
04/21/2005US20050082563 Group iii nitride semiconductor device and its method of manufacture
04/21/2005US20050082542 Methods of forming power semiconductor devices using boule-grown silicon carbide drift layers and power semiconductor devices formed thereby
04/21/2005US20050082348 Method for bonding glass or metal fluoride optical materials to metal
04/21/2005US20050081912 Zinc oxide with acicular structure, process for its production, and photoelectric conversion device
04/21/2005US20050081780 Fabrication method for polycrystalline silicon thin film and apparatus using the same
04/21/2005US20050081779 Heater for crystal formation, apparatus for forming crystal and method for forming crystal
04/20/2005EP1524248A1 A method for bonding glass or metal fluoride optical materials to metal
04/20/2005EP1523463A2 Diamondoid-based components in nanoscale construction
04/20/2005CN1608148A Apparatus and method for diamond production
04/20/2005CN1608147A Heat shield assembly for crystal puller
04/20/2005CN1607683A Nitride semiconductors on silicon substrate and method of manufacturing the same
04/20/2005CN1607641A Process for producing an epitaxial layer of gallium nitride
04/20/2005CN1197645C Growth of diamond clusters
04/19/2005US6881686 Low-fluence irradiation for lateral crystallization enabled by a heating source
04/19/2005US6881651 Methods and devices using group III nitride compound semiconductor
04/19/2005US6881635 Strained silicon NMOS devices with embedded source/drain
04/19/2005US6881259 In-situ monitoring and control of germanium profile in silicon-germanium alloy films and temperature monitoring during deposition of silicon films
04/14/2005WO2005034219A1 Production method for silicon epitaxial wafer, and silicon epitaxial wafer
04/14/2005WO2005033000A1 Method for producing carbon nitrides in the form of tubes
04/14/2005WO2005007934A3 Method for producing piezoelectric monocrystals having a polydomain structure for accurate positioning devices
04/14/2005WO2004105098A3 P-type group ii-vi semiconductor compounds
04/14/2005WO2004031732A3 Nanocrystals in ligand boxes exhibiting enhanced chemical, photochemical, and thermal stability, and methods of making the same
04/14/2005US20050079736 Fabrication method for polycrystalline silicon thin film and display device fabricated using the same
04/14/2005US20050079735 Substrate for electronic device, method for manufacturing substrate for electronic device, and electronic device
04/14/2005US20050079690 Method for producing silicon epitaxial wafer
04/14/2005US20050079359 High purity carbonaceous material and ceramic coated high purity carbonaceous material
04/14/2005US20050079294 When an excimer laser heats amorphous silicon layer to crystallize silicon, nucleation sites are formed in the amorphous silicon layer on the heat sink layer; laterally expanding crystallization occurs in amorphous silicon layer on the substrate to form polylsilicon having a crystal size of a micrometer
04/14/2005US20050077512 Nitride semiconductors on silicon substrate and method of manufacturing the same
04/14/2005US20050076828 Process for fabrication of III nitride-based compound semiconductors
04/14/2005US20050076826 Silicon seed crystal and method for manufacturing silicon single crystal
04/14/2005DE10343522A1 Verfahren zur Steuerung der Behandlung eines Kristalls mit einer Flüssigkeit A method of controlling the treatment of a crystal with a liquid
04/14/2005CA2539618A1 Method to reduce stacking fault nucleation sites and reduce vf drift in bipolar devices
04/13/2005EP1523034A2 Method of manufacturing silicon carbide film
04/13/2005EP1523033A1 Group iii nitride crystal and method for producing same
04/13/2005EP1522612A1 Iii-v compound semiconductor crystal and method for production thereof
04/13/2005EP1522611A1 Diamond composite substrate and process for producing the same
04/13/2005EP1522530A1 Method for preparing diamond from graphite by inner shell electron excitation
04/13/2005EP1522523A1 High purity carbonaceous material
04/13/2005CN1605660A La#-[1-x]Ca#-[x]MnO#-[3] compound monocrystal nanowire and method for making same
04/13/2005CN1196817C Growth of high curie point lead niobate lead indate-lead titanate single crystal using crucible descending method
04/13/2005CN1196816C Gallium-lanthanum silicate crystal growth technology of crucible descending process
04/12/2005US6878630 Method of manufacturing a wafer
04/12/2005US6878202 Method for growing single crystal of compound semiconductor and substrate cut out therefrom
04/07/2005WO2005032217A1 Epitaxial organic layered structure and method for making
04/07/2005WO2005031825A1 Method for treating heteroepitaxially grown semi-conductor layers on semi-conductor substrates, semi-conductor substrate comprising a treated semi-conductor layer and semi-conductor component made of said type of semi-conductor substrate
04/07/2005WO2005031344A1 Method for controlling the treatment of a crystal by means of a liquid
04/07/2005WO2005031033A1 Method of making enhanced cvd diamond
04/07/2005US20050075482 Array for crystallizing protein, device for crystallizing protein and method of screening protein crystallization using the same
04/07/2005US20050074911 Fabricationof nano-object array
04/07/2005US20050073027 Nitride semiconductor substrate and method of producing same
04/07/2005US20050072353 Method of manufacturing gallium nitride-based single crystal substrate
04/07/2005US20050072352 Single crystals of lead magnesium niobate-lead titanate
04/07/2005US20050072351 Direct synthesis of oxide nanostructures of low-melting metals
04/07/2005DE10344015A1 Kristalline Verbindungen in den Systemen CN, BN und BCN Crystalline compounds in the systems CN, BN and BCN
04/07/2005DE10216609B4 Verfahren zur Herstellung der Halbleiterscheibe A process for producing the semiconductor wafer
04/07/2005DE10194370T5 Verfahren zum Züchten eines Kristalls A method for growing a crystal of
04/06/2005EP1521310A2 Nitride semiconductor substrate and method of producing same
04/06/2005EP1521295A2 Method for forming an epitaxial layer sequence in a component and optoelectronic semiconductor chip
04/06/2005CN1604344A Nitride semiconductor substrate and method of producing same
04/06/2005CN1196172C Method for producing semiconductor structure with metal oxide interface between silicons