Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/1984
11/08/1984WO1984004334A1 Inverted positive vertical flow chemical vapor deposition reactor chamber
11/06/1984US4481232 Reaction of copper silicide with carrier gas, deposition on filament
11/06/1984US4481230 Method of depositing a semiconductor layer from a glow discharge
11/06/1984US4481229 Method for growing silicon-including film by employing plasma deposition
11/06/1984US4480585 External isolation module
10/1984
10/30/1984US4479455 Process gas introduction and channeling system to produce a profiled semiconductor layer
10/24/1984EP0122339A2 Method of and apparatus for producing a controlled unsaturated vapour pressure of a volatile liquid in a liquid epitaxy or annealing process
10/23/1984US4478654 Amorphous silicon carbide method
10/23/1984US4478173 Method and apparatus for sensing and controlling the intensity of energy in a deposition system
10/16/1984USRE31708 Fluorine dopant
10/10/1984EP0121459A1 Process for applying a tin oxide coating to a substrate starting from gaseous tin compounds
10/09/1984US4476163 Method of making crucibles for flameless atomic absorption spectroscopy
10/09/1984US4476158 Countercurrent gas flow for vapor deposition
10/09/1984US4476150 Controlling laser beams by means of photoacoustic gas cells
10/03/1984EP0120632A1 Improved oxide bond for aluminum oxide coated cutting tools
10/03/1984EP0120373A1 Process for coating surfaces with carbon black
10/02/1984US4474849 Coated hard alloys
10/02/1984CA1175583A1 Silicon thin film and method of producing the same
10/02/1984CA1175308A1 Surface treatment for silicon carbide
09/1984
09/25/1984US4473596 Plasma method for coating the inside surface of a glass tube
09/19/1984EP0119103A2 Process gas introduction and channeling system
09/19/1984EP0119058A2 Method and apparatus for forming thin film
09/19/1984EP0118644A1 Cathode assembly for glow discharge deposition apparatus
09/19/1984EP0118643A1 Cathode assembly for glow discharge deposition apparatus
09/18/1984US4472622 Apparatus for thermal treatment of semiconductors
09/18/1984US4472476 Composite silicon carbide/silicon nitride coatings for carbon-carbon materials
09/18/1984CA1174438A1 Preferentially binder enriched cemented carbide bodies and method of manufacture
09/11/1984US4471003 Magnetoplasmadynamic apparatus and process for the separation and deposition of materials
09/11/1984US4470369 Apparatus for uniformly heating a substrate
09/05/1984EP0117542A2 Chemical vapor deposition of metal compound coatings utilizing metal sub-halides
09/04/1984US4469801 Titanium-containing silicon nitride film bodies and a method of producing the same
09/04/1984US4469715 P-type semiconductor material having a wide band gap
09/04/1984US4469045 Coating glass
08/1984
08/28/1984US4468443 Process for producing photoconductive member from gaseous silicon compounds
08/28/1984US4468283 Method for etching and controlled chemical vapor deposition
08/21/1984US4466992 Healing pinhole defects in amorphous silicon films
08/21/1984US4466991 Cutting tool hardening method
08/21/1984US4466876 Thin layer depositing apparatus
08/21/1984US4466381 Coating of semiconductor wafers and apparatus therefor
08/21/1984US4466380 Plasma deposition apparatus for photoconductive drums
08/21/1984CA1172918A1 Process for making glass surfaces abrasion-resistant and article produced thereby
08/15/1984EP0115970A1 Vessel for the processing and particularly etching of substrates by the reactive plasma method
08/14/1984CA1172742A1 Multiple cell photoresponsive amorphous alloys and devices
08/14/1984CA1172524A1 Manufacture of group iii-v compounds
08/07/1984US4464416 Method of forming metallic coatings on polymeric substrates
07/1984
07/31/1984US4463062 Oxidizing refractory carbide to form oxide, reducing, and protective coating
07/31/1984US4463033 Substrate of group 4,5, or 6 nitrides or carbides with group 6 or 8 metal, intermediate layer of titanium oxychloride and exterior of aluminum oxide
07/31/1984US4462333 Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus
07/31/1984US4462332 Magnetic gas gate
07/31/1984CA1171940A1 Vapor mass flow controller system
07/24/1984US4461783 Non-single-crystalline semiconductor layer on a substrate and method of making same
07/24/1984US4461237 Plasma reactor for etching and coating substrates
07/24/1984CA1171328A1 Method for forming conductive, transparent coating on a substrate
07/19/1984WO1984002804A1 Method of manufacturing hydrogenated amorphous silicon thin film and solar cell
07/18/1984EP0113518A2 Bubbler cylinder and dip tube device
07/17/1984US4460673 Plasma chemical vapor deposition
07/17/1984US4460618 Aluminum deposition on semiconductor bodies
07/17/1984US4460416 Method for fabricating in-situ doped polysilicon employing overdamped gradually increasing gas flow rates with constant flow rate ratio
07/10/1984US4459338 Radioactive wastes
07/10/1984US4459163 Amorphous semiconductor method
07/04/1984EP0112780A1 Process for applying a tin oxide coating to a substrate starting from gaseous tin compounds
07/03/1984CA1170213A1 Gaseous opalization process for electrical lamps
06/1984
06/27/1984EP0112132A2 Method of depositing a highly conductive, highly transmissive film
06/27/1984EP0111501A1 Process for forming sulfide layers.
06/26/1984CA1169887A1 Coating for metal-cutting tools
06/21/1984WO1984002426A1 Damped chemical vapor deposition of smooth doped films
06/20/1984EP0110882A1 Maskless growth of patterned films
06/19/1984US4454835 Apparatus for growing epitaxial layers by proteolysis
06/07/1984WO1984002128A1 Chemical vapor deposition of titanium nitride and like films
06/05/1984US4452828 Decomposition of silane or tetrafluorosilane by glow discharges
06/05/1984EP0075007A4 Amorphous semiconductor method and devices.
05/1984
05/30/1984EP0109808A2 An improved apparatus for the manufacture of photovoltaic devices
05/29/1984US4451547 Electrophotographic α-Si(H) member and process for production thereof
05/29/1984US4451538 High hydrogen amorphous silicon
05/29/1984US4451503 Photo deposition of metals with far UV radiation
05/29/1984US4451391 Germanium
05/29/1984US4450787 Glow discharge plasma deposition of thin films
05/29/1984US4450786 Grooved gas gate
05/24/1984WO1984002035A1 Method of forming amorphous silicon film
05/23/1984EP0109148A2 Substrate shield for preventing the deposition of nonhomogeneous films
05/22/1984US4450205 Vapor-deposited layer of titanium between substrate and layer of titanium carbide or nitride; bonding
05/22/1984US4450185 Process for forming amorphous silicon film
05/22/1984US4450031 Ion shower apparatus
05/22/1984CA1167951A1 Method of producing photoelectric transducer
05/15/1984US4448801 Process for forming deposition film
05/15/1984US4448797 Masking techniques in chemical vapor deposition
05/08/1984US4447904 Semiconductor devices with nonplanar characteristics produced in chemical vapor deposition
05/08/1984US4447469 Process for forming sulfide layers by photochemical vapor deposition
05/08/1984US4446817 Apparatus for vapor deposition of a film on a substrate
05/08/1984US4446815 Apparatus for continuously depositing a layer of a solid material on the surface of a substrate brought to a high temperature
05/08/1984CA1166937A1 Method and apparatus for performing growth of compound thin films
05/02/1984EP0107556A1 Process for manufacturing an electrical resistor having a polycrystalline semiconductor material, and integrated circuit device comprising this resistor
05/02/1984EP0107510A2 Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus
05/02/1984EP0107344A1 Susceptor for radiant absorption heater system
05/01/1984US4446168 Plasma vapor deposition
05/01/1984CA1166505A1 Electrophotographic photosensitive layer including amorphous silicon containing hydrogen
04/1984
04/25/1984EP0106817A1 Cutting insert and method of making the same
04/25/1984EP0106698A2 Method and apparatus for making layered amorphous semiconductor alloys using microwave energy
04/25/1984EP0106637A1 Infra red transparent optical components
04/25/1984EP0106537A2 Organometallic chemical vapour deposition of films