Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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11/08/1984 | WO1984004334A1 Inverted positive vertical flow chemical vapor deposition reactor chamber |
11/06/1984 | US4481232 Reaction of copper silicide with carrier gas, deposition on filament |
11/06/1984 | US4481230 Method of depositing a semiconductor layer from a glow discharge |
11/06/1984 | US4481229 Method for growing silicon-including film by employing plasma deposition |
11/06/1984 | US4480585 External isolation module |
10/30/1984 | US4479455 Process gas introduction and channeling system to produce a profiled semiconductor layer |
10/24/1984 | EP0122339A2 Method of and apparatus for producing a controlled unsaturated vapour pressure of a volatile liquid in a liquid epitaxy or annealing process |
10/23/1984 | US4478654 Amorphous silicon carbide method |
10/23/1984 | US4478173 Method and apparatus for sensing and controlling the intensity of energy in a deposition system |
10/16/1984 | USRE31708 Fluorine dopant |
10/10/1984 | EP0121459A1 Process for applying a tin oxide coating to a substrate starting from gaseous tin compounds |
10/09/1984 | US4476163 Method of making crucibles for flameless atomic absorption spectroscopy |
10/09/1984 | US4476158 Countercurrent gas flow for vapor deposition |
10/09/1984 | US4476150 Controlling laser beams by means of photoacoustic gas cells |
10/03/1984 | EP0120632A1 Improved oxide bond for aluminum oxide coated cutting tools |
10/03/1984 | EP0120373A1 Process for coating surfaces with carbon black |
10/02/1984 | US4474849 Coated hard alloys |
10/02/1984 | CA1175583A1 Silicon thin film and method of producing the same |
10/02/1984 | CA1175308A1 Surface treatment for silicon carbide |
09/25/1984 | US4473596 Plasma method for coating the inside surface of a glass tube |
09/19/1984 | EP0119103A2 Process gas introduction and channeling system |
09/19/1984 | EP0119058A2 Method and apparatus for forming thin film |
09/19/1984 | EP0118644A1 Cathode assembly for glow discharge deposition apparatus |
09/19/1984 | EP0118643A1 Cathode assembly for glow discharge deposition apparatus |
09/18/1984 | US4472622 Apparatus for thermal treatment of semiconductors |
09/18/1984 | US4472476 Composite silicon carbide/silicon nitride coatings for carbon-carbon materials |
09/18/1984 | CA1174438A1 Preferentially binder enriched cemented carbide bodies and method of manufacture |
09/11/1984 | US4471003 Magnetoplasmadynamic apparatus and process for the separation and deposition of materials |
09/11/1984 | US4470369 Apparatus for uniformly heating a substrate |
09/05/1984 | EP0117542A2 Chemical vapor deposition of metal compound coatings utilizing metal sub-halides |
09/04/1984 | US4469801 Titanium-containing silicon nitride film bodies and a method of producing the same |
09/04/1984 | US4469715 P-type semiconductor material having a wide band gap |
09/04/1984 | US4469045 Coating glass |
08/28/1984 | US4468443 Process for producing photoconductive member from gaseous silicon compounds |
08/28/1984 | US4468283 Method for etching and controlled chemical vapor deposition |
08/21/1984 | US4466992 Healing pinhole defects in amorphous silicon films |
08/21/1984 | US4466991 Cutting tool hardening method |
08/21/1984 | US4466876 Thin layer depositing apparatus |
08/21/1984 | US4466381 Coating of semiconductor wafers and apparatus therefor |
08/21/1984 | US4466380 Plasma deposition apparatus for photoconductive drums |
08/21/1984 | CA1172918A1 Process for making glass surfaces abrasion-resistant and article produced thereby |
08/15/1984 | EP0115970A1 Vessel for the processing and particularly etching of substrates by the reactive plasma method |
08/14/1984 | CA1172742A1 Multiple cell photoresponsive amorphous alloys and devices |
08/14/1984 | CA1172524A1 Manufacture of group iii-v compounds |
08/07/1984 | US4464416 Method of forming metallic coatings on polymeric substrates |
07/31/1984 | US4463062 Oxidizing refractory carbide to form oxide, reducing, and protective coating |
07/31/1984 | US4463033 Substrate of group 4,5, or 6 nitrides or carbides with group 6 or 8 metal, intermediate layer of titanium oxychloride and exterior of aluminum oxide |
07/31/1984 | US4462333 Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus |
07/31/1984 | US4462332 Magnetic gas gate |
07/31/1984 | CA1171940A1 Vapor mass flow controller system |
07/24/1984 | US4461783 Non-single-crystalline semiconductor layer on a substrate and method of making same |
07/24/1984 | US4461237 Plasma reactor for etching and coating substrates |
07/24/1984 | CA1171328A1 Method for forming conductive, transparent coating on a substrate |
07/19/1984 | WO1984002804A1 Method of manufacturing hydrogenated amorphous silicon thin film and solar cell |
07/18/1984 | EP0113518A2 Bubbler cylinder and dip tube device |
07/17/1984 | US4460673 Plasma chemical vapor deposition |
07/17/1984 | US4460618 Aluminum deposition on semiconductor bodies |
07/17/1984 | US4460416 Method for fabricating in-situ doped polysilicon employing overdamped gradually increasing gas flow rates with constant flow rate ratio |
07/10/1984 | US4459338 Radioactive wastes |
07/10/1984 | US4459163 Amorphous semiconductor method |
07/04/1984 | EP0112780A1 Process for applying a tin oxide coating to a substrate starting from gaseous tin compounds |
07/03/1984 | CA1170213A1 Gaseous opalization process for electrical lamps |
06/27/1984 | EP0112132A2 Method of depositing a highly conductive, highly transmissive film |
06/27/1984 | EP0111501A1 Process for forming sulfide layers. |
06/26/1984 | CA1169887A1 Coating for metal-cutting tools |
06/21/1984 | WO1984002426A1 Damped chemical vapor deposition of smooth doped films |
06/20/1984 | EP0110882A1 Maskless growth of patterned films |
06/19/1984 | US4454835 Apparatus for growing epitaxial layers by proteolysis |
06/07/1984 | WO1984002128A1 Chemical vapor deposition of titanium nitride and like films |
06/05/1984 | US4452828 Decomposition of silane or tetrafluorosilane by glow discharges |
06/05/1984 | EP0075007A4 Amorphous semiconductor method and devices. |
05/30/1984 | EP0109808A2 An improved apparatus for the manufacture of photovoltaic devices |
05/29/1984 | US4451547 Electrophotographic α-Si(H) member and process for production thereof |
05/29/1984 | US4451538 High hydrogen amorphous silicon |
05/29/1984 | US4451503 Photo deposition of metals with far UV radiation |
05/29/1984 | US4451391 Germanium |
05/29/1984 | US4450787 Glow discharge plasma deposition of thin films |
05/29/1984 | US4450786 Grooved gas gate |
05/24/1984 | WO1984002035A1 Method of forming amorphous silicon film |
05/23/1984 | EP0109148A2 Substrate shield for preventing the deposition of nonhomogeneous films |
05/22/1984 | US4450205 Vapor-deposited layer of titanium between substrate and layer of titanium carbide or nitride; bonding |
05/22/1984 | US4450185 Process for forming amorphous silicon film |
05/22/1984 | US4450031 Ion shower apparatus |
05/22/1984 | CA1167951A1 Method of producing photoelectric transducer |
05/15/1984 | US4448801 Process for forming deposition film |
05/15/1984 | US4448797 Masking techniques in chemical vapor deposition |
05/08/1984 | US4447904 Semiconductor devices with nonplanar characteristics produced in chemical vapor deposition |
05/08/1984 | US4447469 Process for forming sulfide layers by photochemical vapor deposition |
05/08/1984 | US4446817 Apparatus for vapor deposition of a film on a substrate |
05/08/1984 | US4446815 Apparatus for continuously depositing a layer of a solid material on the surface of a substrate brought to a high temperature |
05/08/1984 | CA1166937A1 Method and apparatus for performing growth of compound thin films |
05/02/1984 | EP0107556A1 Process for manufacturing an electrical resistor having a polycrystalline semiconductor material, and integrated circuit device comprising this resistor |
05/02/1984 | EP0107510A2 Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus |
05/02/1984 | EP0107344A1 Susceptor for radiant absorption heater system |
05/01/1984 | US4446168 Plasma vapor deposition |
05/01/1984 | CA1166505A1 Electrophotographic photosensitive layer including amorphous silicon containing hydrogen |
04/25/1984 | EP0106817A1 Cutting insert and method of making the same |
04/25/1984 | EP0106698A2 Method and apparatus for making layered amorphous semiconductor alloys using microwave energy |
04/25/1984 | EP0106637A1 Infra red transparent optical components |
04/25/1984 | EP0106537A2 Organometallic chemical vapour deposition of films |