Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
08/1985
08/15/1985WO1985003460A1 Method and apparatus for the gas jet deposition of conducting and dielectric thin solid films and products produced thereby
08/14/1985EP0151233A2 Apparatus for the coating of a metallic dental prosthesis part and process for the bonding of a metallic dental prosthesis part with a synthetic dental material
08/14/1985EP0151200A1 Raw material supply device
08/13/1985US4535228 Heater assembly and a heat-treatment method of semiconductor wafer using the same
08/13/1985US4535227 Method for heating semiconductor wafer by means of application of radiated light
08/13/1985US4535000 Chemical vapor deposition of titanium nitride and like films
08/13/1985US4534842 Process and device for producing a homogeneous large-volume plasma of high density and of low electronic temperature
08/13/1985CA1191975A1 Glow discharge deposition apparatus including a non- horizontally disposed cathode
08/07/1985EP0150878A2 Process for the manufacture of a thin film strain gage system
08/07/1985EP0150578A1 Manufacture of optical fibre preforms
08/07/1985EP0150204A1 Non-iridescent glass structure and coating process for making same.
08/06/1985US4533820 Radiant heating apparatus
08/06/1985US4533564 Method of manufacturing an electrophotographic photoreceptor
07/1985
07/30/1985US4532199 Method of forming amorphous silicon film
07/30/1985US4532150 Method for providing a coating layer of silicon carbide on the surface of a substrate
07/30/1985US4532022 Process of producing a semiconductor device
07/30/1985US4532015 Depositing conductive metal onto polyarylene sulfide substrate by electroless plating, aging to improve adhesion
07/30/1985CA1191107A1 Isolation valve
07/24/1985EP0149408A2 Method and apparatus for the deposition of a thin layer on a substrate by a reactive plasma
07/24/1985EP0149044A1 Boron nitride containing titanium nitride, method of producing the same and composite ceramics produced therefrom
07/24/1985EP0149024A2 Surface-coated wear-resistant member of cermet and process for producing same
07/24/1985EP0148898A1 Apparatus for plasma treatment of plate-shaped substrats.
07/18/1985WO1985003088A1 Material vapor deposition technique
07/16/1985US4529617 Continuously depositing amorphous element on support; radiation with electromagnetic waves
07/16/1985US4529474 Using gas mixture of carbon tetrafluoride and oxygen
07/16/1985US4529427 Method for making low-loss optical waveguides on an industrial scale
07/10/1985EP0147967A2 Induction heated reactor system for chemical vapor deposition
07/10/1985EP0147663A1 Gas supplying apparatus
07/09/1985CA1190043A1 Conductive silicon carbide
07/03/1985EP0147182A1 Method of coating nuclear fuel with boron nitride
07/02/1985US4526805 Decomposing raw gas to form molecular species, depositing thin film on substrate
07/02/1985US4526673 Exposing negatively biased parts to ion beam from excited plasma
07/02/1985US4526644 Treatment device utilizing plasma
07/01/1985EP0088074A4 Plasma reactor and method therefor.
06/1985
06/25/1985US4525415 Sintered hard metal products having a multi-layer wear-resistant coating
06/25/1985US4525389 Method for conveying and treating a gas employed for the coating of workpieces by means of a chemical, heterogeneous vapor-phase reaction
06/25/1985US4525382 Electric plasma discharge generating uv rays, grid or wire-nettingmetal
06/25/1985US4525381 Photochemical vapor deposition apparatus
06/25/1985US4525376 Optical methods for controlling layer thickness
06/25/1985US4525375 Method of controllong the deposition of hydrogenated amorphous silicon and apparatus therefor
06/25/1985US4524719 Substrate loading means for a chemical vapor deposition apparatus
06/25/1985US4524718 Reactor for continuous coating of glass
06/25/1985CA1189602A1 Apparatus for uniformly heating a substrate
06/19/1985EP0145403A2 Semiconducting multilayered structures and systems and methods for synthesizing the structures and devices incorporating the structures
06/19/1985EP0145346A2 Reactor and susceptor for chemical vapor deposition process
06/18/1985US4524090 Low temperature thermolysis
06/18/1985US4523544 Apparatus for glow discharge deposition of a thin film
06/18/1985CA1189174A1 Magnetic apparatus for reducing substrate warpage
06/12/1985EP0144229A2 Improvements in or relating to coating apparatus
06/12/1985EP0144055A2 Process and apparatus for producing a continuous insulated metallic substrate
06/12/1985EP0143889A2 Coated hard metal body
06/11/1985US4522849 Reacting diborane with ammonia in stream of inert gas
06/11/1985US4522845 Process for producing a layer of a metal silicide by applying multichromatic radiation
06/11/1985US4522842 Annealing
06/11/1985US4522663 Method for optimizing photoresponsive amorphous alloys and devices
06/11/1985US4522453 Tribological coatings for the protection of moving machine parts from wear and corrosion
06/11/1985US4522149 Reactor and susceptor for chemical vapor deposition process
06/06/1985WO1985002417A1 Method and apparatus for chemical vapor deposition
06/05/1985EP0143701A1 Process for depositing amorphous silicon by low-temperature thermal decomposition, and apparatus for carrying out this process
06/05/1985EP0143697A2 Modular V-CVD diffusion furnace
06/05/1985EP0143611A1 Bubbling evaporator
06/05/1985EP0143479A1 Plasma-stimulated chemical vapour deposition device and, in particular, a substrate supporting and electrode disposition and associated components
06/04/1985US4521717 Apparatus for producing a microwave plasma for the treatment of substrates, in particular for the plasma-polymerization of monomers thereon
06/04/1985US4521447 Method and apparatus for making layered amorphous semiconductor alloys using microwave energy
06/04/1985US4520757 Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus
06/04/1985CA1188398A1 Method and apparatus for continuously producing tandem amorphous photovoltaic cells
05/1985
05/29/1985EP0143053A2 Apparatus for providing depletion-free uniform thickness cvd thin-film on semiconductor wafers
05/29/1985EP0142495A1 Inverted positive vertical flow chemical vapor deposition reactor chamber.
05/28/1985US4519339 Continuous amorphous solar cell production system
05/22/1985EP0142450A2 Device for manufacturing thin dielectric layers on the surfaces of solid bodies
05/22/1985EP0142176A1 Cubic carbon
05/22/1985EP0142083A2 Method and apparatus for the production of metallic coatings
05/21/1985US4518628 Hermetic coating by heterogeneous nucleation thermochemical deposition
05/21/1985CA1187622A1 Semiconductor device having a body of amorphous silicon
05/15/1985EP0141561A2 A process for producing devices having semi-insulating indium phosphide based compositions
05/14/1985US4517223 Method of making amorphous semiconductor alloys and devices using microwave energy
05/14/1985US4517220 Deposition and diffusion source control means and method
05/14/1985US4517027 Bulk production of alloys by deposition from the vapor phase and apparatus therefor
05/14/1985US4516527 Photochemical vapor deposition apparatus
05/08/1985EP0140793A2 Process of making glass sheets with filtering bands and apparatus therefor
05/08/1985EP0140791A1 Apparatus for providing uniform thickness CVD thin-film on semiconductor substrates
05/08/1985EP0140660A2 Method of forming amorphous polymeric halosilane films and products produced therefrom
05/08/1985EP0140625A1 Tellurides
05/08/1985EP0140294A2 Plasma processing method and apparatus for carrying out the same
05/08/1985EP0140130A2 Process and apparatus for preparing semiconductor layer
05/07/1985US4515107 Apparatus for the manufacture of photovoltaic devices
05/07/1985CA1186787A1 Magnetic gas gate
05/02/1985EP0139134A2 Deposition and diffusion source control means and method
04/1985
04/30/1985US4514441 Layer of mixed oxides
04/30/1985US4513684 Upstream cathode assembly
04/30/1985CA1186280A1 Multiple chamber deposition and isolation system and method
04/24/1985EP0138332A1 Methods of using selective optical excitation in deposition processes and the detection of new compounds
04/24/1985EP0137923A1 Electroconductive film system for aircraft windows
04/23/1985US4513057 Process for forming sulfide layers
04/23/1985US4513026 Vapor deposition using reaction mixture or silicon compound phosphorus compound, and oxidizing gas
04/23/1985US4513022 Process for amorphous silicon films
04/23/1985US4513021 Plasma reactor with reduced chamber wall deposition
04/23/1985US4512825 Recovery of fragile layers produced on substrates by chemical vapor deposition
04/23/1985US4512812 Method for reducing phosphorous contamination in a vacuum processing chamber
04/23/1985US4512284 Glow discharge apparatus for use in coating a disc-shaped substrate