C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
11/1994
11/24/1994	CA2162473A1 Metallic films and articles using same
11/24/1994	CA2156716A1 Sputter coating collimator with integral reactive gas distribution
11/23/1994	EP0625792A1 Apparatus and process for increasing uniformity of sputtering rate in sputtering apparatus
11/23/1994	EP0625401A2 Laser system for laser ablation process and laser ablation process for preparing thin film of oxide superconductor material thereby
11/23/1994	CN2183373Y Multi-chip multi-function slide-glass mechanism for sputtering equipment
11/23/1994	CN1095428A Forming mould for platinum film deposition by ion beam and its technology
11/22/1994	US5366817 Production of aluminum and alloys
11/22/1994	US5366764 Environmentally safe methods and apparatus for depositing and/or reclaiming a metal or semi-conductor material using sublimation
11/22/1994	US5366607 Ferromagnetic inner, outer pole producing magnetic flux extended across and inner, outer alloy rings joined to pole and a shunts; magnetrons; magnetic recording media
11/22/1994	US5366564 Hard wear-resistant film and method for production thereof
11/22/1994	US5366559 Processing the surface of a substrate in a chamber then projecting a laser beam along a trajectory such that contaminant particles are captured by the laser beam
11/22/1994	US5366556 Process and apparatus for production of diamond-like films
11/22/1994	CA1333139C Highly erosive and abrasive wear resistant composite coating system
11/17/1994	EP0624868A2 Magnetoresistance effect elements and method of fabricating the same
11/17/1994	EP0605444A4 Process and apparatus for surface hardening of refractory metal workpieces.
11/17/1994	EP0447556B1 Surface-coated hard member having excellent abrasion resistance
11/15/1994	US5364835 Method of adding a halogen element into oxide superconducting materials by ion injection or thermal diffusion
11/15/1994	US5364818 Sog with moisture resistant protective capping layer
11/15/1994	US5364707 Metal-film laminate resistant to delamination
11/15/1994	US5364666 Process for barrier coating of plastic objects
11/15/1994	US5364654 Process for production of a thin film electrode and an electroluminescence device
11/15/1994	US5364518 Magnetron cathode for a rotating target
11/15/1994	US5364248 Sliding member, a method for producing same, and usages of same
11/15/1994	US5364209 Nitrides over refractory carbides or carbonitrides for inner layer adjuscent to substrate in order to minimize formation of eta phase at cemented carbide based substrate peripheral boundries; improved rupture strength
11/15/1994	CA1333039C Molecular beam epitaxy apparatus
11/15/1994	CA1333038C Molecular beam epitaxy apparatus
11/10/1994	WO1994025863A2 Process for depositing a large-surface layer through a mask and optional closure of said mask
11/10/1994	WO1994025637A1 Method of coating medical devices and devices coated thereby
11/10/1994	DE4412902A1 Method for increasing the deposition rate, method for reducing the dust density in a plasma discharge chamber, and plasma chamber
11/10/1994	DE4405747A1 Sputtering arrangement, supported by a magnetic field, and vacuum treatment plant equipped therewith
11/10/1994	DE4329268A1 Method and device for producing semiconductor layers
11/10/1994	DE4315023A1 Cathodic sputtering device
11/09/1994	EP0623950A2 Process for manufacturing tubular microstructures in solid state bodies
11/09/1994	EP0623807A1 Microstructure for vibratory gyroscope
11/09/1994	EP0623689A1 Carrier for optical recording substrates
11/09/1994	EP0623688A1 Decomposable masking member
11/09/1994	EP0623415A1 Method of making cathode targets comprising silicon
11/09/1994	CN1094848A Laser vaporizing apparatus and Method for formation of semiconductor applying same
11/09/1994	CN1094834A Multilayered sendust films utilizing gas doping and optimized sendust seed layers
11/09/1994	CN1094759A Cylindrical magnetron shield structure
11/09/1994	CN1094758A Damp-proof film for potassium chloride crystal
11/08/1994	US5363400 Physical vapor deposition method
11/08/1994	US5362672 Method of forming a monocrystalline film having a closed loop step portion on the substrate
11/08/1994	US5362372 Self cleaning collimator
11/08/1994	US5361967 Monolithic circuit fabrication method
11/03/1994	DE4414729A1 Material for a line frame and line frame for semiconductor components
11/03/1994	DE4314251A1 Process and device for the vapour deposition of thin absorbent layers onto a substrate
11/02/1994	EP0622823A1 Sputtering targets having life alarm function
11/02/1994	EP0581774B1 PROCESS AND DEVICE FOR VACUUM EVAPORATING SiOx COATINGS ON A SUBSTRATE
11/02/1994	EP0489889B1 Process for depositing thin layers by laser pulse vapour deposition
11/02/1994	EP0486489B1 High-temperature-resistant, corrosion-resistant coating, in particular for components of gas turbines
11/02/1994	EP0478777B1 Coated dielectric material for an ozone generator
11/02/1994	EP0434797B1 Device for coating substrates by cathode sputtering
11/02/1994	EP0344316B1 Method for producing an electrolytic capacitor
11/01/1994	US5361275 Apparatus for removing material from a target
11/01/1994	US5360785 In-situ laser ablation method for forming oxide superconducting films
11/01/1994	US5360766 Semiconductors
11/01/1994	US5360764 Method of fabricating laser controlled nanolithography
11/01/1994	US5360524 Method for planarization of submicron vias and the manufacture of semiconductor integrated circuits
10/1994
10/27/1994	WO1994024696A1 Enhanced quality thin film cu(in,ga)se2 for semiconductor device applications by vapor-phase recrystallization
10/27/1994	WO1994024330A1 Method for planarization of submicron vias and the manufacture of semiconductor integrated circuits
10/27/1994	WO1994024198A1 Polylactide coated with metal or silicon oxide for use as packaging material
10/27/1994	WO1994024074A1 Pyrotechnic material
10/27/1994	DE4414107A1 Corrosion-resistant silver@-magnesium@ alloy used in sputter coating
10/27/1994	DE4336682C1 Method for electron-beam vapour coating (vapour depositing, vacuum depositing) with multi-component evaporation material
10/27/1994	DE4313284A1 Slot lock for introducing or discharging substrates from one treatment chamber into an adjacent one
10/27/1994	CA2160555A1 Pyrotechnic material
10/27/1994	CA2159648A1 Method for planarization of submicron vias and the manufacture of semiconductor integrated circuits
10/26/1994	EP0621648A2 Electrode
10/26/1994	EP0621351A1 Method for evaporating metal using a resistance heated, pyrolytic boron nitrided coated graphite boat
10/26/1994	EP0621350A1 Metallic article possessing a brightly colored surface of low reflectivity and process for producing such surface
10/26/1994	EP0620868A1 Process for ionising thermally generated material vapours and device for implementing it.
10/26/1994	EP0620867A1 Procedure and apparatus for improving a plasma accelerator plating apparatus used for diamond plating.
10/26/1994	EP0600070A4 Improved planar magnetron sputtering magnet assembly.
10/26/1994	CN1094094A Manufacturing method for high-purity chrome plate/target for film plating on glass
10/26/1994	CN1093892A Golden decorative part and process for producing the same
10/25/1994	US5358926 Epitaxial thin superconducting thallium-based copper oxide layers
10/25/1994	US5358736 Method of forming a thin and continuous film of conductive material
10/25/1994	US5358615 Process for forming a sputter deposited metal film
10/20/1994	DE4312552A1 Substrate holder
10/20/1994	DE4312444A1 Device for coating substrates, in particular with magnetisable materials
10/20/1994	DE4312014A1 Device for coating and/or etching substrates in a vacuum chamber
10/19/1994	EP0620583A1 Sputtering apparatus having a rotating magnet array and fixed electromagnets
10/19/1994	EP0620290A1 Process for forming a film on a substrate by reactive sputtering
10/19/1994	EP0620092A1 Bodies having microstructure and process for the production thereof
10/19/1994	EP0619916A1 Extended lifetime collimator.
10/19/1994	EP0619776A1 Magnetic recording media employing soft magnetic material
10/18/1994	US5357389 Alumina material useful with thin film heads
10/18/1994	US5357115 Processing method for wafers
10/18/1994	US5356870 Irradiation to form damaged layer, etching with halogen solution to remove, forming groove
10/18/1994	US5356839 Enhanced quality thin film Cu(In,Ga)Se2 for semiconductor device applications by vapor-phase recrystallization
10/18/1994	US5356836 Aluminum plug process
10/18/1994	US5356833 Process for forming an intermetallic member on a semiconductor substrate
10/18/1994	US5356724 Excellent far-infrared radiating material
10/18/1994	US5356684 Optical recording medium and method of manufacturing thereof
10/18/1994	US5356673 Evaporation system and method for gas jet deposition of thin film materials
10/18/1994	US5356522 Sputtering metals onto moving substrate, alloying
10/18/1994	US5356511 Forming layer of at least two different elements by sputtering or vapor deposition; selectively etching to remove at least one of these
10/13/1994	WO1994023440A1 Reactive dc sputtering system
10/13/1994	DE4311396A1 Vacuum-coating installation

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