Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
11/1996
11/26/1996US5578108 Ultrafine particles of amorphous metal and method for production thereof
11/21/1996WO1996036985A1 A method for fabricating electron multipliers
11/21/1996WO1996036746A1 Process for producing sputtering target
11/20/1996EP0743686A2 Precursor for semiconductor thin films and method for producing semiconductor thin films
11/20/1996EP0743377A1 Apparatus for chemical surface treatment of flat substrate using active gas
11/20/1996CN1136331A Magneto-optical alloy sputter targets
11/20/1996CN1136292A Diamond-coated tools and process for making
11/20/1996CN1136157A Film-like heating device, heat insulating seat pad, evaporizer and heating furnace
11/19/1996US5576111 Nonmagnetic base plate with surface texture and roughness, high density recording
11/19/1996US5576060 CVD process of forming hydrogenated a-Si films
11/19/1996US5575887 Semiconductors
11/19/1996US5575850 Processing system
11/14/1996WO1996036065A1 Sputtering apparatus with isolated coolant and sputtering target therefor
11/14/1996WO1996035826A1 Porous thermal barrier coating
11/14/1996WO1996035823A1 Transport system for thin film sputtering system
11/14/1996WO1996035822A1 Device and plant for coating a steel band
11/14/1996WO1996035821A1 Apparatus for reducing arcing during sputtering
11/14/1996WO1996035820A1 Disordered coating with cubic boron nitride dispersed therein
11/14/1996WO1996035650A1 Mixed oxide high index optical coating material and method
11/14/1996WO1996035579A1 Flexible plastic substrate with anti-reflection coating having low reflective color and method
11/14/1996WO1996029635A3 Apparatus and method for controlling high throughput sputtering
11/14/1996CA2220303A1 Disordered coating with cubic boron nitride dispersed therein
11/14/1996CA2218736A1 Sputtering apparatus with isolated coolant and sputtering target therefor
11/13/1996EP0742577A2 Inductively and multi-capacitively coupled plasma reactor
11/13/1996EP0741909A1 Methods for improving semiconductor processing
11/13/1996CN1135537A High-corrosion-resistant Zn-Mg series electro-plated steel plate and production method thereof
11/12/1996US5573864 Made by sputter-depositing carbon atoms from carbon target on substrate with magnetron sputter gun, while depositing nitrogen atoms on substrate from ion beam source in atmosphere of less than 2.5 pa nitrogen gas
11/12/1996US5573597 Plasma processing system with reduced particle contamination
11/07/1996WO1996035091A1 Unibody crucible
11/07/1996WO1996034994A1 Chemical vapor deposition method and apparatus
11/07/1996DE19545914C1 Ceramic boat for use in vaporising metals, esp. aluminium@, in coating processes
11/07/1996DE19516748A1 Coating material release container used in coating optical parts
11/07/1996DE19513918C1 Method of coating submicrometer structures for highly integrated circuits
11/06/1996EP0740710A1 Magnetron sputtering apparatus for compound thin films
11/06/1996EP0660773A4 Gold film for computer-aided sign making system.
11/06/1996CN2239438Y D.C magnetic control sputter power source
11/06/1996CN2239437Y Large return passage closing sputter locus column-shape magnetic controlling target
11/06/1996CN1135084A Method for mfg. soft magnetic film
11/05/1996US5572038 Charge monitor for high potential pulse current dose measurement apparatus and method
11/05/1996US5571574 Process for continuous reactive metal oxide formation in vacuum
11/05/1996US5571495 Dielectric thin film of substituted lead titanate
11/05/1996US5571393 Magnet housing for a sputtering cathode
11/05/1996US5571332 Electron jet vapor deposition system
11/05/1996US5571331 Vacuum treatment apparatus
10/1996
10/31/1996WO1996034129A1 Superalloy component with a protective coating system
10/31/1996WO1996034128A1 Metal substrate with an oxide layer and an anchoring layer
10/31/1996WO1996034125A1 Sputtering device
10/31/1996WO1996034124A1 Sputtering system using cylindrical rotating magnetron electrically powered using alternating current
10/31/1996WO1996034123A1 Device for vapour-depositing a material on high surface area substrates
10/31/1996WO1996034122A1 Processing for forming nitride, carbide and oxide protective coatings
10/31/1996WO1995003435A3 Method of ion bombarding a zinc or zinc alloy coated steel sheet before painting thereof
10/31/1996DE19605599C1 Substrate transfer appts. for vacuum chamber
10/31/1996DE19605598C1 Substrate hold and release mechanism for vacuum chamber
10/31/1996DE19535560C1 Monitoring ion-assisted boron nitride deposition process
10/31/1996CA2218279A1 Sputtering system using cylindrical rotating magnetron electrically powered using alternating current
10/30/1996EP0740207A1 Reduced stress tungsten deposition
10/30/1996EP0739250A1 Using lasers to fabricate coatings on substrates
10/30/1996EP0739219A1 Catheter having a long-lasting antimicrobial surface treatment
10/30/1996EP0706635A4 Apparatus for thermal treatment of thin film wafer
10/30/1996CN1134731A Electrode and preparation thereof
10/30/1996CN1134555A Multilayer antireflective coating with graded base layer
10/30/1996CN1134469A Cylindrical magnetron shield structure
10/30/1996CN1134367A Golden ornament and its producing method
10/30/1996CN1033175C Method of depositing conductors in high aspect ratio apertures
10/29/1996US5569506 Magnetic recording disk and disk drive with improved head-disk interface
10/29/1996US5569497 Protective coating of plastic substrates via plasma-polymerization
10/29/1996US5569362 Cathodic sputtering
10/29/1996US5569361 Method and apparatus for cooling a sputtering target
10/24/1996WO1996033507A1 Diamond thin film electron emitter
10/24/1996WO1996033352A1 Concave sliding element and production process therefor
10/24/1996WO1996033294A1 Method of making sputter target/backing plate assembly
10/24/1996WO1996033293A1 Modification of surfaces of polymers, metal or ceramic
10/24/1996WO1996033069A1 High temperature superconducting thick films
10/24/1996WO1996033026A1 Radiation cured island coating system
10/24/1996WO1996017171A3 Getter pump module and system
10/24/1996DE19514836A1 Concave-shaped bearing element
10/24/1996DE19513566A1 Industrial scale appts. implants tin ions into steel to reduce friction of alloy
10/24/1996CA2218627A1 High temperature superconducting thick films
10/24/1996CA2218022A1 Method of making sputter target/backing plate assembly
10/24/1996CA2193664A1 Radiation cured island coating system
10/23/1996EP0739001A2 Deposition of insulating thin film by plurality of ion beams
10/23/1996EP0738694A1 Process for the improvement of the abrasion resistance features and the chemical inertia of transparent thin coatings
10/23/1996CN1133900A Method for improving quality of titanium nitride layer including carbon and oxygen
10/23/1996CN1133899A Annealed low emissivity coating
10/23/1996CN1133894A Porous metal body, process for producing same and battery plate formed therefrom
10/23/1996CN1033100C Magnetically controlled sputtering source with symmetric magnets
10/23/1996CN1033082C Heat processable products with metallic vacuum coatings
10/22/1996US5567512 Wear resistance
10/22/1996US5567336 Laser ablation forward metal deposition with electrostatic assisted bonding
10/22/1996US5567288 Crystal-oriented thin film manufacturing apparatus
10/19/1996CA2174201A1 Process for the improvement of the abrasion resistance features and of the chemical inertia of transparent thin coatings
10/19/1996CA2147198A1 Low temperature ion-beam assisted deposition method for realizing sige/si heterostructures
10/17/1996WO1996032738A1 A METHOD FOR INTRODUCTION OF AN IMPURITY DOPANT IN SiC, A SEMICONDUCTOR DEVICE FORMED BY THE METHOD AND A USE OF A HIGHLY DOPED AMORPHOUS LAYER AS A SOURCE FOR DOPANT DIFFUSION INTO SiC
10/17/1996WO1996032520A1 Method for producing dielectric coatings
10/17/1996WO1996032360A1 Method for the chemical vapour infiltration of a material consisting of carbon and silicon and/or boron
10/17/1996WO1996032253A1 Composite barrier film and process for producing the same
10/17/1996WO1996032209A1 Method and apparatus for circuit board treatment
10/17/1996WO1996032201A1 Structures having enhanced biaxial texture and method of fabricating same
10/17/1996DE19612389A1 Applying abrasion-resistant adhesion promoting layer to substrate
10/17/1996CA2217702A1 Method for the chemical vapour infiltration of a material consisting of carbon and silicon and/or boron