C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
11/2004
11/11/2004	WO2004096473A1 High-speed working tool
11/11/2004	WO2004073026A3 Mixed-phase compressive tantalum thin films and method for forming same
11/11/2004	WO2004066944A3 Products for treating and preventing chronic diseases: eliminating the autoimmune triggers that underly chronic disease
11/11/2004	WO2004051695A3 Arc evaporation device
11/11/2004	WO2004033743A3 Homogenous solid solution alloys for sputter-deposited thin films
11/11/2004	US20040224238 maintenance of photomasks by coating photoresist layers on masks, then aligning using optical projectors, exposing and developing; microelectronics
11/11/2004	US20040224167 Coated article with niobium zirconium inclusive layer(s) and method of making same
11/11/2004	US20040224084 Manufacturing method of phosphor or scintillator sheets and panels suitable for use in a scanning apparatus
11/11/2004	US20040224082 Room temperature luminescent erbium oxide thin films for photonics
11/11/2004	US20040223751 Evaporation apparatus
11/11/2004	US20040223750 Evaporation apparatus
11/11/2004	US20040222745 Generation of Uniformly-Distributed Plasma
11/11/2004	US20040222476 Highly reliable amorphous high-k gate dielectric ZrOxNy
11/11/2004	US20040222389 Method of and apparatus for measurement and control of a gas cluster ion beam
11/11/2004	US20040222383 Processing method and system
11/11/2004	US20040222090 Carbon fiber and copper support for physical vapor deposition target assemblies
11/11/2004	US20040222089 inhibits formation of nodules; excellent etching processability; indium oxide and tin oxide and zinc oxide;
11/11/2004	US20040222088 Electroformed sputtering target
11/11/2004	US20040222087 Magnetron executing planetary motion adjacent a sputtering target
11/11/2004	US20040222083 Pre-treatment for salicide process
11/11/2004	US20040222082 sputter etching of only selected portions of material deposited in and around high aspect-ratio holes; new tool at controlling the sputtering profile into challenging geometries; Ion sources may be specially designed for semiconductor processing to provide superior performance and fabricational results
11/11/2004	US20040221930 inducing stress to increase magnetic pass through flux exhibited by the component compared to that prior to inducing the stress; making sputtering targets; may also involve orienting a majority crystallographic structure
11/11/2004	US20040221806 Organic electroluminescent device for fabricating shadow mask
11/11/2004	US20040221802 Evaporation apparatus
11/11/2004	US20040221801 Fixing member for evaporation apparatus
11/11/2004	US20040221446 Anodes for batteries and cathodes. Silver oxide or mamganese oxidewih zinc or zinc oxide
11/11/2004	DE10319206A1 Verfahren und Vorrichtungen zur Spannungsreduzierung in dünnen Schichten Methods and devices for voltage reduction in thin layers
11/11/2004	DE10319205A1 Device for depositing particulate-free layers onto substrate using laser beams comprises target and substrate arranged in processing chamber so that target surface and substrate surface do not lie opposite each other
11/11/2004	DE102004006586A1 Photomaskenrohling, Photomaske sowie Verfahren und Vorrichtung zu deren Herstellung A photomask blank, a photomask and method and apparatus for the preparation thereof
11/10/2004	EP1476001A2 Shadow mask for fabricating an organic electroluminescent device
11/10/2004	EP1475795A1 Sputtering target containing zinc sulfide as major component, optical recording medium on which phase change optical disk protective film containing zinc sulfide as major component is formed by using the target, and method for manufacturing the sputtering target
11/10/2004	EP1475458A1 Apparatus for coating a substrate.
11/10/2004	EP1474829A1 Thin films, structures having thin films, and methods of forming thin films
11/10/2004	EP1474710A2 Optical component comprising submicron hollow spaces
11/10/2004	EP1474544A1 Elevated temperature oxidation protection coatings for titanium alloys and methods preparing the same
11/10/2004	EP1474543A2 In-line deposition processes for circuit fabrication
11/10/2004	EP1474542A1 Aperture masks for circuit fabrication
11/10/2004	EP1330561B1 Integrated phase separator for ultra high vacuum system
11/10/2004	EP0834594B1 Process for producing sputtering target
11/10/2004	CN1545733A Method of forming ferroelectric film, ferroelectric memory, method of manufacturing the same, semiconductor device, and method of manufacturing the same
11/10/2004	CN1545722A Plasma reactor coil magnet
11/10/2004	CN1545569A Silver alloy sputtering target and its producing method
11/10/2004	CN1545568A Topologically tailored sputtering targets
11/10/2004	CN1545567A Sputtering target, transparent conductive film, and their manufacturing method
11/10/2004	CN1544685A Preparation of low-resistance / high-resistance composite film through plasma technology
11/10/2004	CN1544315A Unidimensional aluminium nitride nanometer structure array and its preparation method
11/10/2004	CN1175471C Manufacturing method of lining processor and semiconductor device
11/10/2004	CN1175470C Method and apparatus for supercritical processing of multiple workpieces
11/10/2004	CN1175126C Method and apparatus for coating substrate in vacuum
11/10/2004	CN1175124C Ball full orientation ion implantation and sedimentation surface strengthening treatment method and installation
11/09/2004	US6816219 Liquid crystal panel and method for manufacturing same
11/09/2004	US6815880 Method and apparatus for simultaneously depositing and observing materials on a target
11/09/2004	US6815697 Ion beam charge neutralizer and method therefor
11/09/2004	US6815696 Beam stop for use in an ion implantation system
11/09/2004	US6815690 Ion beam source with coated electrode(s)
11/09/2004	US6815225 Method for forming capacitor of nonvolatile semiconductor memory device
11/09/2004	US6815084 Discontinuous high-modulus fiber metal matrix composite for thermal management applications
11/09/2004	US6815015 Jetting behavior in the laser forward transfer of rheological systems
11/09/2004	US6815003 Method for fabricating electrode for lithium secondary battery
11/09/2004	US6814927 Fabrication method of nanostructured tungsten carbide bulk material
11/09/2004	US6814839 Interference layer system
11/09/2004	US6814838 Induction coil generates treatment plasma in discharge chamber located in interior of coil; with slotted screen; semiconductors
11/09/2004	US6814837 Controlled gas supply line apparatus and process for infilm and onfilm defect reduction
11/09/2004	US6814814 Cleaning residues from surfaces in a chamber by sputtering sacrificial substrates
11/09/2004	US6814239 High-purity standard particle production apparatus, method and particles
11/09/2004	CA2356465C Thermoelectric material and method of manufacturing the same
11/09/2004	CA2356217C Laminated structure, and method of manufacture thereof
11/04/2004	WO2004095544A2 Substrate with multiple conductive layers and methods for making and using same
11/04/2004	WO2004095513A2 A method for plasma deposition of a substrate barrier layer
11/04/2004	WO2004095498A2 High-density plasma source using excited atoms
11/04/2004	WO2004094688A1 Pvd target/backing plate constructions; and methods of forming pvd target/backing plate constructions
11/04/2004	WO2004094687A1 Copper oxide thin film low-friction material and film-forming method therefor
11/04/2004	WO2004094138A1 Process for producing packaging laminate material
11/04/2004	WO2004085699A3 Contacting of an electrode with a device in vacuum
11/04/2004	WO2004070787A3 Method for making multifunctional organic thin films
11/04/2004	WO2004067792A3 A coated article having a sealed layered edge to impede corrosion of a coating at the edge and method of making same
11/04/2004	WO2004059604A3 Method and system for fabricating an oled
11/04/2004	WO2004027684A3 Photolithography mask repair
11/04/2004	WO2004027108A3 Process of controllable synthesis of carbon films with composite structures
11/04/2004	WO2003007411A3 Method for producing a plasma-polymerized polymer electrolyte membrane and a polyazol membrane coated by plasma-polymerization
11/04/2004	US20040220667 Biocompatibility and biodurability properties
11/04/2004	US20040219789 Cleaning of native oxide with hydrogen-containing radicals
11/04/2004	US20040219754 Method for fabricating semiconductor device using high dielectric material
11/04/2004	US20040219737 Method and apparatus for processing a workpiece with a plasma
11/04/2004	US20040219434 Apparatus and method for fracture absorption layer
11/04/2004	US20040219395 Cutting tool coated using PVD process
11/04/2004	US20040219369 Diffusion barrier layers and methods comprising same for depositing metal films by CVD or ALD processes
11/04/2004	US20040219304 Amorphous hydrogenated carbon film
11/04/2004	US20040219294 DLC coating system and process and apparatus for making coating system
11/04/2004	US20040219289 producing phosphor or scintillator plates or panels, the layer thickness is constant over large surface areas, panels produced on very large flexible substrates which are cut into size and protected against physical, chemical or mechanical damage, high energy radiation detection and imaging, radiography
11/04/2004	US20040217699 Organic light emitting full color display panel
11/04/2004	US20040216998 Cover ring and shield supporting a wafer ring in a plasma reactor
11/04/2004	US20040216993 An ionizer creating an ionization zone to selectively ionize target particles passing through while leaving the other particles unaffected; an electrostatic collimator to electrically steer the ionized target particles toward the substrate
11/04/2004	US20040216992 Uniform and high precision optical thin film of desired thickness distribution on substrates of various shapes; gas phase growth including three or more axes for independently varying position
11/04/2004	US20040216677 Film formation apparatus and film formation method
11/04/2004	US20040216673 Manufacturing apparatus
11/04/2004	DE19922557B4 Verfahren zum Abscheiden einer TaN/Ta-Zweischicht-Diffusionsbarriere A process for depositing a TaN / Ta two-layer diffusion barrier
11/04/2004	DE10316379A1 Verfahren zur Herstellung von Metall-Polymer-Nanokompositen A process for preparing metal-polymer nanocomposites
11/04/2004	CA2522849A1 Substrate with multiple conductive layers and methods for making and using same
11/03/2004	EP1473761A1 Method for depositing metal films

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