C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
12/2004
12/07/2004	US6827788 Substrate processing device and through-chamber
12/07/2004	US6827759 Providing a mixture of cobalt and a degassifying agent, heating and degassing mixture such that degassifying agent and initial oxygen content react producing a second oxygen content of about 1-170 wppm
12/07/2004	US6827622 Method of manufacturing electroluminescence display apparatus
12/02/2004	WO2004105095A2 Thin-film deposition evaporator
12/02/2004	WO2004105054A1 Amorphous transparent conductive film, sputtering target as its raw material, amorphous transparent electrode substrate, process for producing the same and color filter for liquid crystal display
12/02/2004	WO2004104264A1 Sealing lock for an in vacuo line for deposition on a flat product
12/02/2004	WO2004104263A1 A method for forming a superhard amorphous carbon coating in vacuum
12/02/2004	WO2004104262A1 Film-forming apparatus and film-forming method
12/02/2004	WO2004103693A2 Floor tile coating method and system
12/02/2004	WO2004072959A3 Disk coating system
12/02/2004	WO2004038870A3 Selectable area laser assisted processing of substrates
12/02/2004	US20040242953 Endocurietherapy
12/02/2004	US20040242435 Machine tool is, when lubricated with the cutting oil , capable of machining a workpiece with high accuracy and efficiency while attaining a long tool life even in a semi-dry machining
12/02/2004	US20040241976 Thin metal oxide film and process for producing the same
12/02/2004	US20040241570 Method of forming patterned films
12/02/2004	US20040241490 Substrates coated with mixtures of titanium and aluminum materials, methods for making the substrates, and cathode targets of titanium and aluminum metal
12/02/2004	US20040241457 Glass substrates coated with a stack of thin layers having reflective properties in the infra-red and/or solar ranges
12/02/2004	US20040241454 thermoplastic polymer, a cross-linked acrylate polymer and an additional barrier film such as a continuous coating of aluminum applied by vacuum metallizing or metal oxide such as alumina or silica
12/02/2004	US20040241075 Silicon monoxide vapor deposition material and method for preparation thereof
12/02/2004	US20040240093 Optical element and production method therefor, and band pass filter, near infrared cut filter and anti-reflection film
12/02/2004	US20040238985 Masking article for use in vehicle manufacturing
12/02/2004	US20040238828 Semiconductor optical integrated device
12/02/2004	US20040238491 Fine-dimension masks and related processes
12/02/2004	US20040238356 Silver alloy sputtering target and process for producing the same
12/02/2004	US20040238346 Transparent electroconductive film and process for poducing same
12/02/2004	US20040238126 Plasma processing apparatus with reduced parasitic capacity and loss in RF power
12/02/2004	US20040237840 Hard film for cutting tools, cutting tool coated with hard film, process for forming hard film, and target used to form hard film
12/02/2004	US20040237324 Dual wedge fixture locator
12/02/2004	DE202004011179U1 Trough for handling workpieces in CVD and PVD coating operations has supporting units arranged so that small parts can be placed in row flush with through-holes to enable simultaneous positioning of row of parts
12/02/2004	DE10320554A1 Device for coating workpieces with thermal barriers layers comprises a evacuated transfer chamber, a rotating holder for the workpieces and secondary chambers for charging, heating and coating the workpieces
12/02/2004	DE10320237A1 Verfahren zur Herstellung durchleuchtbarer, galvanisch veredelter Thermoplastteile und durchleuchtbare Thermoplastteile mit galvanisch veredelter Oberfläche Process for the preparation radiotranslucent, galvanically refined thermoplastic parts and transilluminable thermoplastic parts with galvanically finished surface
12/01/2004	EP1482076A1 Hard coating for cutting tool
12/01/2004	EP1482068A1 MgO VAPOR DEPOSITION MATERIAL AND METHOD FOR PREPARATION THEREOF
12/01/2004	EP1482067A2 Vacuum evaporation apparatus
12/01/2004	EP1481757A1 Dual wedge fixture locator
12/01/2004	EP1481726A1 The combinatorial hydrothermal synthesis of novel materials
12/01/2004	EP1481284A1 Method of passivating of low dielectric materials in wafer processing
12/01/2004	EP1481111A2 Aperture masks for circuit fabrication
12/01/2004	EP1481110A1 Getter metal alloy coating and device and method for the production thereof
12/01/2004	EP1480921A1 Thin film coating having niobium-titanium layer
12/01/2004	EP1480920A1 Thin film coating having transparent base layer
12/01/2004	EP1254478A4 A chemical sensor using chemically induced electron-hole production at a schottky barrier
12/01/2004	CN1552097A Ionized PVD with sequential deposition and etching
12/01/2004	CN1552087A Flat magnetron
12/01/2004	CN1551927A Physical vapor deposition components and methods of formation
12/01/2004	CN1551687A Shadow mask for fabricating organic electroluminescent device
12/01/2004	CN1551390A Method for manufacturing alkaline battery
12/01/2004	CN1551375A Laminated photoelectric element and its manufacturing method
12/01/2004	CN1551371A Semiconductor device and method of manufacturing semiconductor device
12/01/2004	CN1550573A Ag-Bi-base alloy sputtering target, and method for producing the same
12/01/2004	CN1550572A Evaporation apparatus
12/01/2004	CN1550571A Evaporation apparatus
12/01/2004	CN1550570A Fixing member for evaporation apparatus
12/01/2004	CN1550569A Evaporation apparatus
12/01/2004	CN1550568A 制造装置和发光装置 Devices and light-emitting device manufacturing
12/01/2004	CN1177950C Device for vacuum coating slide bearings
12/01/2004	CN1177949C Zone-selecting polymer film-coating method
12/01/2004	CN1177948C Sputtering apparatus capable of changing distance between substrate and deposition prevention plate used for film formation
11/2004
11/30/2004	US6825904 Liquid crystal device, color filter substrate with vapor deposited metal oxide insulating layer under transparent conductor, method for manufacturing liquid crystal device, and method for manufacturing color filter substrate
11/30/2004	US6825597 Ion source, ion implanting device, and manufacturing method of semiconductor devices
11/30/2004	US6825555 Hot plate
11/30/2004	US6825515 Ferroelectric capacitor with electrode formed in separate oxidizing conditions
11/30/2004	US6825482 Ion implantation system for manufacturing semiconductor device
11/30/2004	US6825135 Elimination of dendrite formation during metal/chalcogenide glass deposition
11/30/2004	US6824827 Method of making a polyimide film having a thin metal layer
11/30/2004	US6824817 Alternating iron, platinum layers
11/30/2004	US6824658 In a semiconductor fabrication chamber for generating a plasma and sputter depositing coil material onto a substrate can exhibit reduced rf voltages.
11/30/2004	US6824653 Compensating for aging changes in sputtering characteristics of targets; forming uniform thickness films on wafers
11/30/2004	US6824652 Sputtering target assembly and sputtering apparatus using the same
11/30/2004	US6824617 Input/output valve switching apparatus of semiconductor manufacturing system
11/30/2004	US6824601 Hard film for cutting tools, cutting tool coated with hard film, process for forming hard film, and target used to form hard film
11/29/2004	CA2468682A1 Dual wedge fixture locator
11/25/2004	WO2004102610A2 Generation of uniformly-distributed plasma
11/25/2004	WO2004102605A1 Plasma display panel, method for producing same and material for protective layer of such plasma display panel
11/25/2004	WO2004102553A1 Silver alloy sputtering target for forming reflection layer of optical recording medium
11/25/2004	WO2004101937A2 Coated article with niobium zirconium inclusive layer(s) and method of making same
11/25/2004	WO2004101843A1 Process for the preparation of a composite material
11/25/2004	WO2004101842A1 Wurtzrite thin film, laminate containing wurtzrite crystal layer, and method for production thereof
11/25/2004	WO2004101662A1 Process for preparing a composite material
11/25/2004	WO2004101254A1 Film forming mold, film forming method using mold, and film forming control system
11/25/2004	WO2004101253A1 Method of forming film on molded body, method of producing molded body with film formed thereon, mold for producing molded body with film formed thereon
11/25/2004	WO2004101146A1 Titanium oxide thin film exhibiting high photocatalytic activity under weak ultraviolet ray
11/25/2004	WO2004100827A2 Metallic implantable grafts and method of making same
11/25/2004	WO2004067791A3 Transparent titanium oxide-aluminum and/or aluminum oxide coating with rutile structure
11/25/2004	WO2003061884A8 Surface coated cutting tool member having hard coating layer exhibiting excellent abrasion resistance in high-speed cutting, and method for forming said hard coating layer on surface of cutting tool
11/25/2004	US20040235235 Co-sputter deposition of metal-doped chalcogenides
11/25/2004	US20040234785 Boride thin films on silicon
11/25/2004	US20040234780 Ultra low residual reflection, low stress lens coating
11/25/2004	US20040234736 Control of stress in metal films by controlling the temperature during film deposition
11/25/2004	US20040234704 Carbiding, nitriding, carbonitriding, metallization; atomic- or chemical vapor deposition of nitrides, carbides, carbonitrides, metal silicon nitrides or carbides from organometallic compounds; adhesion promoter comprising compound of nitrogen, silicon, and/or carbon
11/25/2004	US20040232832 Display panel with enhanced shielding capability made of polyimidesand polyureas with vapor deposition
11/25/2004	US20040232350 Ion implanting method and apparatus
11/25/2004	US20040232109 Mask unit and film deposition apparatus using the same
11/25/2004	US20040231981 Sputtering target for forming high-resistance transparent conductive film, and method for producing the film
11/25/2004	US20040231980 Sputtering device
11/25/2004	US20040231973 Both magnetic field forming devices and each target are moved with respect to a substrate so that a film of homogeneous quality and thickness distribution is formed; a large area of the targets can be sputtered
11/25/2004	US20040231972 Asymmetric alternating voltage between targets having a coaxial relationship to uniformly deposit material, eliminate dielectric material from the target surfaces, provide a single ignition of the targets and eliminate subsequent ignitions, and reduce the substrate temperature by using "cold" electrons
11/25/2004	US20040231971 Photo mask blank, photo mask, method and apparatus for manufacturing of a photo mask blank
11/25/2004	US20040231595 High-throughput thin-film fabrication vacuum flange
11/25/2004	US20040231159 Soft metal and method for preparation thereof, and exterior part of watch and method for preparation thereof

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