Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
12/2004
12/28/2004US6836400 Structures based on ceramic tantalum nitride
12/28/2004US6836312 Optically transparent film, method of manufacturing optically transparent film, alignment film, and liquid crystal panel and display including alignment film
12/28/2004US6835696 Made with magnesium and boron ejected from magnesium target and boron target each in simultaneously sputtering process; film can be applied to fabricate integrated circuit without high temperature annealing
12/28/2004US6835660 Method of manufacturing semiconductor device having metal alloy interconnection that has excellent EM lifetime
12/28/2004US6835465 Thermal barrier layer and process for producing the same
12/28/2004US6835434 Method for manufacturing disc-shaped optical recording medium and disc-shaped substrate for optical recording medium
12/28/2004US6835426 Providing fabrication tool; initiating relative motion between source of energy and substrate with a first speed; initiating relative motion between source of energy and material carrier with second speed; generating pulses of energy
12/28/2004US6835290 System and method for controlling thin film defects
12/28/2004US6835289 Particle implantation apparatus and particle implantation method
12/28/2004US6835251 >/= 99.999 weight% aluminum and having a grain structure >/= 99% recrystallized and size of < 125 mu m
12/23/2004WO2004112079A1 Magnetron sputter cathode comprising a cooling plate
12/23/2004WO2004111295A1 Method of forming sputtering acticles by multidirectional deformation
12/23/2004WO2004111294A1 Deflection magnetic field type vacuum arc vapor deposition device
12/23/2004WO2004033743B1 Homogenous solid solution alloys for sputter-deposited thin films
12/23/2004US20040259362 Thin film magnetic recording media
12/23/2004US20040259337 Method for fabricating a metallic oxide of high dielectric constant, metallic oxide of high dielectric constant, gate insulating film and semiconductor element
12/23/2004US20040259305 Energy conversion and storage films and devices by physical vapor deposition of titanium and titanium oxides and sub-oxides
12/23/2004US20040258947 Coated object
12/23/2004US20040258946 Reflective coatings to reduce radiation heat transfer
12/23/2004US20040258920 Method for producing smooth indium-tin-oxide layers on substrates and a substrate coating of indium-tin-oxide
12/23/2004US20040258890 Presence indicator for removable transparent film
12/23/2004US20040258851 Apparatus for high-throughput ion beam-assisted deposition (IBAD)
12/23/2004US20040258840 [method of stabilizing material layer]
12/23/2004US20040256973 Method for forming film, method of manufacturing electronic device, film forming system, electronic device, and electronic apparatus
12/23/2004US20040256353 Method and system for deep trench silicon etch
12/23/2004US20040256226 Method and design for sputter target attachment to a backing plate
12/23/2004US20040256218 Ablating material from an Equal Channel Angular Extrusion target to form a layer over a substrate surface having a thickness that varies less than or equal to 1% of 1-sigma across the surface, including a method of forming a tunnel junction
12/23/2004US20040256217 Coils for generating a plasma and for sputtering
12/23/2004US20040256215 Sputtering chamber liner
12/23/2004US20040256214 Process for forming decorative films and resulting products
12/23/2004US20040256035 Target of high-purity nickel or nickel alloy and its producing method
12/23/2004US20040255857 Thin-film deposition evaporator
12/23/2004US20040255751 Musical instrument strings with polymer treated surface
12/23/2004DE10326719A1 Verdichterschaufelfuß für Triebwerksschaufeln von Flugzeugtriebwerken Verdichterschaufelfuß for turbine blades of aircraft engines
12/23/2004DE10323258A1 Magnetron sputter cathode has cooling plate on vacuum side located between substrate plate and sputter target
12/23/2004DE102004012463A1 Verfahren zur Bildung eines Belages aus Nanoverbundstoff A method for forming a coating from the nanocomposite
12/22/2004EP1489653A2 Method for fabricating a metallic oxide of high dielectric constant, metallic oxide of high dielectric constant, gate insulating film and semiconductor element
12/22/2004EP1489643A2 Method and apparatus for ionized physical vapor deposition
12/22/2004EP1489196A1 Method for making indium tin oxide layers.
12/22/2004EP1489193A1 Silver alloy and its use
12/22/2004EP1488917A1 Thin-film laminated body, thin-film cell, capacitor, and method and equipment for manufacturing thin-film laminated body
12/22/2004EP1488458A2 Automatically adjusting serial connections of thick and thin layers and method for the production thereof
12/22/2004EP1488444A1 Vacuum plasma generator
12/22/2004EP1488023A1 Method for coating a substrate and device for carrying out the method
12/22/2004EP1114436B1 Physical vapor processing of a surface with non-uniformity compensation
12/22/2004CN1556874A Soft metal and method for preparation thereof, and exterior part of watch and method for preparation thereof
12/22/2004CN1556872A Thin film-forming apparatus
12/22/2004CN1556244A Multipair target thin film sputterying instrument
12/22/2004CN1181218C Magnetic tube sputtering device
12/21/2004US6833959 Color shifting carbon-containing interference pigments
12/21/2004US6833203 Thermal barrier coating utilizing a dispersion strengthened metallic bond coat
12/21/2004US6833194 Zinc stannate dielectric film; infrared reflective layer; metal primer and protective coating; chemical resistance, durability,transmittance, low emissivity
12/21/2004US6833159 Method for applying hydrophobic anti-reflection coatings to lenses and lens blanks
12/21/2004US6833155 Substrate for a semiconductor device is wound in a roll form together with an interleaf before or after treatment; especially chemical vapor deposition
12/21/2004US6833058 Titanium-based and zirconium-based mixed materials and sputtering targets
12/21/2004US6833052 Deposition chamber and method for depositing low dielectric constant films
12/21/2004US6833031 Method and device for coating a substrate
12/16/2004WO2004109347A1 Production method for chip-form film-forming component
12/16/2004WO2004108992A1 Fabricated titanium article having improved corrosion resistance
12/16/2004WO2004108983A2 Method for producing a low nickel content surface on nitinol
12/16/2004WO2004108982A2 Adaptable processing element for a processing system and a method of making the same
12/16/2004WO2004108981A1 Thin film forming method and forming device therefor
12/16/2004WO2004108980A1 Thin film forming device and thin film forming method
12/16/2004WO2004108979A1 Thin film forming device and thin film forming method
12/16/2004WO2004108977A2 Vacuum coating unit and a method for the differentiated coating of spectacle lenses
12/16/2004WO2004108879A2 Biological laser printing for tissue microdissection via indirect photon-biomaterial interactions
12/16/2004WO2004108878A2 Biological laser printing via indirect photon-biomaterial interactions
12/16/2004WO2004076704A3 Thermal barrier coating having low thermal conductivity
12/16/2004WO2004074538A3 Foodware with multilayer stick resistant ceramic coating and method of making
12/16/2004WO2004073893A3 Gas gate for isolating regions of differing gaseous pressure
12/16/2004US20040253815 Method for forming a conductive layer
12/16/2004US20040253476 Multilayer getter structures and methods for making same
12/16/2004US20040253382 Stainless steel tubes/plates function as holder with zinc/zinc alloy formed on surface
12/16/2004US20040253379 Coated body and process of manufacturing the coated body
12/16/2004US20040253137 Alloy and its use
12/16/2004US20040252624 Method of forming film on optical disk
12/16/2004US20040251815 Long life; exhibits little voltage increase at constant current driving time; improved adhesion by reducing surface defects
12/16/2004US20040251432 Ion implanter and method for controlling the same
12/16/2004US20040251312 Coatings for use in fuel injector components
12/16/2004US20040250924 Textured-grain-powder metallurgy tantalum sputter target
12/16/2004US20040250769 Pulsed laser deposition for mass production
12/16/2004US20040250764 Method and apparatus for production of high purity silicon
12/16/2004DE10324556A1 Cathode sputtering process comprises preparing components of a reactive gas mixture, controlling gas flows from the reservoirs, forming a reactive gas mixture, removing part of the mixture, and feeding to a vacuum chamber
12/16/2004DE10324202A1 Maskenhaltevorrichtung Mask holding device
12/16/2004DE10322935A1 Separating wall having a gap for dividing process chambers of a vacuum deposition installation comprises measuring devices, evaluating devices, and adjusting devices
12/16/2004DE10316228B3 Effusionszelle mit verbesserter Temperaturkontrolle des Tiegels Effusion cell with improved temperature control of the crucible
12/16/2004CA2528107A1 Fabricated titanium article having improved corrosion resistance
12/15/2004EP1486695A1 High friction sliding member
12/15/2004EP1486583A1 Method and device for manufacturing semiconductor or insulator/metallic laminar composite cluster
12/15/2004EP1486582A1 Low friction Micromechanical device
12/15/2004EP1486325A1 Laminated films as high barrier films and their use in vacuum insulation panels
12/15/2004EP1485520A1 Nanolayered coated cutting tool and method for making the same
12/15/2004EP1485517A1 System for vacuum metallization of objects treated in batches
12/15/2004EP1485516A1 Method for formation of titanium nitride films
12/15/2004EP1485515A2 Evaluation of chamber components having textured coatings chamber components
12/15/2004EP1099183A4 Material delivery system for miniature structure fabrication
12/15/2004CN2663431Y Rotating magnetic target type film glass magnetron sputtering equipment
12/15/2004CN1555554A Magnetic thin film disks with a nonuniform composition
12/15/2004CN1555088A Nano double phase composite structure Zr-Si-N diffusion barrier material and its preparing process
12/15/2004CN1554801A Preparing carbon germanium alloy film by ion/plasma auxliary evaporation method