| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 11/24/2005 | WO2005111180A1 Assembly of mutually co-operating machine parts, lubricated with biologically decomposable lubricant |
| 11/24/2005 | WO2005110698A2 Coating with hard wear and non-stick characteristics |
| 11/24/2005 | WO2005110599A1 Photocatalytic laminated film |
| 11/24/2005 | WO2005091329A3 Sputtering device for manufacturing thin films |
| 11/24/2005 | WO2005073427A3 Method for the production of an ultra barrier layer system |
| 11/24/2005 | WO2005071131A3 Transparent and conductive oxide layer, production and use thereof in a thin film solar cell |
| 11/24/2005 | WO2005068680A3 Melting and vaporizing apparatus and method |
| 11/24/2005 | US20050260837 Methods for stable and repeatable ion implantation |
| 11/24/2005 | US20050260824 Semiconductor device manufacturing method and manufacturing line thereof |
| 11/24/2005 | US20050260505 Preparation of photomask blank and photomask |
| 11/24/2005 | US20050260332 Formation of combinatorial arrays of materials using solution-based methodologies |
| 11/24/2005 | US20050258753 Plasma display panel, method for producing same and material for protective layer of such plasma display panel |
| 11/24/2005 | US20050258541 Semiconductor device and manufacturing method thereof |
| 11/24/2005 | US20050258377 Radiation image conversion panel |
| 11/24/2005 | US20050258164 Hot plate |
| 11/24/2005 | US20050258033 Sputtering target |
| 11/24/2005 | US20050258030 Effects of methods of manufacturing sputtering targets on characteristics of coatings |
| 11/24/2005 | US20050258029 Coated article with oxidation graded layer proximate IR reflecting layer(s) and corresponding method |
| 11/24/2005 | US20050258028 Thin-film coating for wheel rims |
| 11/24/2005 | US20050258027 Back-biased face target sputtering based programmable logic device |
| 11/24/2005 | US20050257746 Clamp member, film deposition apparatus, film deposition method, and semiconductor device manufacturing method |
| 11/24/2005 | US20050257745 Film formation source, vacuum film formation apparatus, method of manufacturing organic EL device, and organic EL device |
| 11/24/2005 | US20050257744 Apparatus for directing plasma flow to coat internal passageways |
| 11/24/2005 | DE19651592B4 Beschichtetes Schneidwerkzeug The coated cutting tool |
| 11/24/2005 | DE102005019456A1 Target used in sputtering processes comprises a slanted surface formed around the body of the target in a region in which a sputtering surface and a peripheral surface of the body of the target cross each other |
| 11/24/2005 | DE102004041855A1 Vorrichtung und Verfahren zur kontinuierlichen thermischen Vakuumbeschichtung Apparatus and method for continuous thermal vacuum coating |
| 11/24/2005 | DE102004041854A1 Verfahren und Vorrichtung zur thermischen Vakuumbeschichtung Method and device for the thermal vacuum coating |
| 11/24/2005 | DE102004041846A1 Verdampfungseinrichtung und Verfahren zum Verdampfen von Beschichtungsmaterial Evaporation device and method for vaporizing coating material |
| 11/24/2005 | DE102004019061A1 Selectiver Absorber zur Umwandlung von Sonnenlicht in Wärme, ein Verfahren und eine Vorrichtung zu dessen Herstellung Selectiver absorber for the conversion of sunlight into heat, a method and apparatus for its production |
| 11/24/2005 | DE102004019060A1 Vorrichtung zum Einbringen von abschmelzenden Elektroden für Lichtbogenverdampfungsvorrichtungen in eine Beschichtungskammer für große Substrate oder Bänder A device for introducing consumable electrodes for arc evaporation devices in a coating chamber for large substrates or tapes |
| 11/23/2005 | EP1598844A1 Alkali metal generating agent, alkali metal generator, photoelectric surface, secondary electron emission surface, electron tube, method for manufacturing photoelectric surface, method for manufacturing secondary electron emission surface, and method for manufacturing electron tube |
| 11/23/2005 | EP1598818A1 Optical recording medium, manufacturing method of the same, and sputtering target |
| 11/23/2005 | EP1598660A1 Measuring device for measuring the optical characteristics of coated substrates |
| 11/23/2005 | EP1598441A1 Amorphous carbon film, process for producing the same and amorphous carbon film-coated material |
| 11/23/2005 | EP1597939A1 Heavy-duty, resistant, flexible heating foil |
| 11/23/2005 | EP1597568A2 Method of and apparatus for measurement and control of a gas cluster ion beam |
| 11/23/2005 | EP1597408A2 Dielectric barrier layer films |
| 11/23/2005 | EP1597407A1 Process and apparatus for the manufacture of a sputtering target |
| 11/23/2005 | EP1597406A2 Foodware with multilayer stick resistant ceramic coating and method of making |
| 11/23/2005 | EP1597212A1 Vaporizing material for producing highly refractive optical layers |
| 11/23/2005 | EP1597068A1 Heat treatable coated article with niobium chromium nitride ir reflecting layer and method of making same |
| 11/23/2005 | EP1597066A2 Heat treatable coated article with chromium nitride ir reflecting layer and method of making same |
| 11/23/2005 | EP1383939B1 Use of perfluoroketones as vapor reactor cleaning, etching, and doping gases |
| 11/23/2005 | EP1218689B1 Method and apparatus for in-situ monitoring of plasma etch and deposition processes using a pulsed broadband light source |
| 11/23/2005 | CN1701406A Alkali metal generating agent, alkali metal generator, photoelectric surface, secondary electron emission surface, electron tube, method for manufacturing photoelectric surface, method for manufacturi |
| 11/23/2005 | CN1701131A Film-forming apparatus and film-forming method |
| 11/23/2005 | CN1700321A One time write optical recording media |
| 11/23/2005 | CN1699964A Measuring device for measuring the optical characteristics of coated substrates |
| 11/23/2005 | CN1699619A Film formation source, vacuum film formation apparatus, method of manufacturing organic EL device, and organic EL device |
| 11/23/2005 | CN1699262A Target for transparent electroconductive film, transparent electroconductive material, transparent electroconductive glass and transparent electroconductive film |
| 11/23/2005 | CN1228810C Method and apparatus for physical vapor phase deposit |
| 11/23/2005 | CN1228657C Film wave-filter for optical multiplying device/demultiplying device and manufacturing method thereof |
| 11/23/2005 | CN1228466C Multihead ion film-plating method for ceramic product |
| 11/23/2005 | CN1228266C Magnetic control sputtering hot-bending coated glass and its production method |
| 11/22/2005 | US6967771 Antireflection coating for ultraviolet light at large angles of incidence |
| 11/22/2005 | US6967334 Ion source and ion beam device |
| 11/22/2005 | US6967163 Metal film and manufacturing method therefor, and laminated ceramic electronic component and manufacturing method therefor |
| 11/22/2005 | US6967060 layer of metallic, oxide and/or nitride of NbZr; silver infrared reflecting layer; insulating glass window units, laminated windows, architectural or residential monolithic window units, vehicle window units |
| 11/22/2005 | US6966952 Apparatus of depositing thin film with high uniformity |
| 11/22/2005 | CA2184738C Ion beam process for deposition of highly abrasion-resistant coatings |
| 11/22/2005 | CA2184736C Highly abrasion-resistant, flexible coatings for soft substrates |
| 11/17/2005 | WO2005109963A1 Deposition apparatus for temperature sensitive materials |
| 11/17/2005 | WO2005109472A2 Mobile pvd/cvd coating center |
| 11/17/2005 | WO2005109466A1 Method for depositing carbide coatings of high-fusion metals |
| 11/17/2005 | WO2005109449A1 Conductive film for touch panel and method for producing conductive film for touch panel |
| 11/17/2005 | WO2005108646A2 Rotary target locking ring assembly |
| 11/17/2005 | WO2005108640A1 Method and apparatus for forming combinatorial film |
| 11/17/2005 | WO2005108639A1 Sputter targets and methods of forming same by rotary axial forging |
| 11/17/2005 | WO2005108638A1 Substrate dome |
| 11/17/2005 | WO2005108637A1 Reinforcing structure of vacuum tank for preventing deformation |
| 11/17/2005 | WO2005108064A2 Coating stack comprising a layer of barrier coating |
| 11/17/2005 | WO2005107392A2 System for vaporizing materials onto substrate surface |
| 11/17/2005 | WO2005071133A3 Vacuum deposition method and sealed-type evaporation source apparatus for vacuum deposition |
| 11/17/2005 | WO2005061404A3 Scratch resistant coated glass article resistant to fluoride-based etchant(s) |
| 11/17/2005 | WO2005024518A3 Phase shift mask blank with increased uniformity |
| 11/17/2005 | WO2004103693A3 Floor tile coating method and system |
| 11/17/2005 | WO2004102610A3 Generation of uniformly-distributed plasma |
| 11/17/2005 | US20050256011 System and method for quality testing of superconducting tape |
| 11/17/2005 | US20050255700 Controlled multi-step magnetron sputtering process |
| 11/17/2005 | US20050255691 Self-ionized and inductively-coupled plasma for sputtering and resputtering |
| 11/17/2005 | US20050255370 Vapor deposited catalysts and their use in fuel cells |
| 11/17/2005 | US20050255329 Superalloy article having corrosion resistant coating thereon |
| 11/17/2005 | US20050255313 Carbon nanotube composite material, magnetic material and production thereof |
| 11/17/2005 | US20050255242 Apparatus and method for high rate uniform coating, including non-line of sight |
| 11/17/2005 | US20050254410 Optical recording medium, manufacturing method of the same, and sputtering target |
| 11/17/2005 | US20050254155 ND filter and aperture diaphragm apparatus |
| 11/17/2005 | US20050253285 Supporting unit for semiconductor manufacturing device and semiconductor manufacturing device with supporting unit installed |
| 11/17/2005 | US20050252768 Coater with a large-area assembly of rotatable magnetrons |
| 11/17/2005 | US20050252767 Sputtering device |
| 11/17/2005 | US20050252766 Cathode apparatus to selectively bias pallet during sputtering |
| 11/17/2005 | US20050252765 Method and apparatus for forming a barrier layer on a substrate |
| 11/17/2005 | US20050252763 increased sputtering yield increases the deposition rate; without an occurrence of arcing between the anode and the cathode assembly; increase density of ions in the strongly ionized plasma |
| 11/17/2005 | US20050252584 Sputtering target, Al wiring film and electronic component |
| 11/17/2005 | US20050252268 High integrity sputtering target material and method for producing bulk quantities of same |
| 11/17/2005 | US20050252242 Fusion cast articles and methods of manufacture |
| 11/17/2005 | US20050251980 Method for manufacturing dielectric ceramic layer and internal polar layer of multiple layer ceramic capacitors (mlcc) by vacuum sputtering |
| 11/17/2005 | DE102004020768A1 Plasmareaktor mit hoher Produktivität Plasma reactor with high productivity |
| 11/17/2005 | DE102004020558A1 Adjusting mechanical, optical and/or electrical properties of a layer comprises sputtering in a vacuum chamber, injecting energy in pulse form and periodically changing the pulse packets with respect to the electrode |
| 11/17/2005 | DE102004020466A1 Verfahren zum Beschichten von Substraten in Inline-Anlagen A process for coating substrates in inline installations |
| 11/17/2005 | DE102004020404A1 Trägerplatte für Sputtertargets Backing plate for sputtering targets |