Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
12/2005
12/08/2005DE202005015206U1 Covering mask for plasma coating cylinder bores of a crankcase or I.C. engines comprises a pressure part in a hole with a thread and openings for a wear ring made from sheet steel strips whose ends are welded together
12/08/2005DE102004024980A1 Reactive coating unit comprises a work chamber with at least one magnetron, a primary measurement unit and a control circuit
12/08/2005DE102004024351A1 Application of a system of thin films with complex physical functions onto substrates by medium frequency pulsed magnetron pulverisation, notably in the fabrication of optical components
12/08/2005DE102004024137A1 Protective screen for vacuum coating installations, comprises a material coating which adheres well to the screen
12/07/2005EP1603129A1 Silver alloy sputtering target for forming reflective layer of optical recording medium
12/07/2005EP1602919A1 Measuring device for the survey of the transmittance of a coating
12/07/2005EP1602747A1 Copper alloy sputtering target, process for producing the same and semiconductor element wiring
12/07/2005EP1602746A1 Sputtering target and process for producing the same, thin film for optical information recording medium and process for producing the same
12/07/2005EP1602745A1 Hafnium alloy target and process for producing the same
12/07/2005EP1601800A1 Suface hardened stainless steel with improved wear resistance and low static friction properties
12/07/2005EP1601528A2 Thermal barrier coating having low thermal conductivity
12/07/2005EP1601471A2 Gas gate for isolating regions of differing gaseous pressure
12/07/2005EP1481110B1 Getter metal alloy coating and device and method for the production thereof
12/07/2005EP1315845B1 Method for producing a coating of fluorescent material
12/07/2005EP1072055B1 Means for controlling target erosion and sputtering in a magnetron
12/07/2005CN1705770A Stabilized aluminum laminate having aluminum and stabilizing layer laminated thereon
12/07/2005CN1705766A Multilayer film-coated substrate and process for its production
12/07/2005CN1704717A Measuring device for measuring the degree of transmission of a coating
12/07/2005CN1704501A Film formation source, vacuum film formation apparatus, organic EL panel and method of manufacturing the same
12/07/2005CN1704211A Web treatment machine with at least one vacuum chamber
12/07/2005CN1230802C System and method for controlling passive bipolar electric arc
12/06/2005US6972914 Optical lens holder
12/06/2005US6972418 Ion doping apparatus, and multi-apertured electrode for the same
12/06/2005US6972146 Structure having holes and method for producing the same
12/06/2005US6972136 positioning lens in vacuum chamber of vacuum deposition apparatus; providing source of at least one high index of refraction composition and at least one low index of refraction composition, applying in layers to lens
12/06/2005US6972079 Dual magnetron sputtering apparatus utilizing control means for delivering balanced power
12/06/2005US6972076 Thin film formation use sputtering target material, thin film formed using same, and optical recording medium
12/06/2005US6971151 Methods of treating physical vapor deposition targets
12/06/2005CA2292437C Pulsed-vapor phase aluminide process for high temperature oxidation-resistant coating applications
12/01/2005WO2005113853A1 Methods and apparatuses for transferring articles through a load lock chamber under vacuum
12/01/2005WO2005113851A2 Fusion cast articles and methods of manufacture
12/01/2005WO2005113164A2 Superconductor fabrication processes
12/01/2005WO2005113143A1 Fine particles
12/01/2005WO2005112603A2 Durable thermal barrier coating having low thermal conductivity
12/01/2005WO2005091283A8 Method and apparatus for separating disc-shaped substrates
12/01/2005WO2005024088A8 A method and apparatus for deposition of films of coating materials, in particular of superconductive oxides
12/01/2005WO2005021826A3 Titanium foil metallization product and process
12/01/2005WO2005010228A3 High peak power plasma pulsed supply with arc handling
12/01/2005US20050267253 vapor-deposited organosiloxane copolymer film; first organosiloxane monomer with cyclosiloxane backbone and the second organosiloxane monomer with straight-chain siloxane backbone as raw materials
12/01/2005US20050267000 Method for producing substantially planar films
12/01/2005US20050266682 Methods and apparatus for forming barrier layers in high aspect ratio vias
12/01/2005US20050266261 Method for improving electrical conductivity of metals, metal alloys and metal oxides
12/01/2005US20050266250 Waterdrop slidable surface structure
12/01/2005US20050266173 Method and apparatus of distributed plasma processing system for conformal ion stimulated nanoscale deposition process
12/01/2005US20050266163 Extremely strain tolerant thermal protection coating and related method and apparatus thereof
12/01/2005US20050266157 Method of manufacturing or repairing a coating on a metallic substrate
12/01/2005US20050266152 Depositing an organic layer for use in OLEDs
12/01/2005US20050264829 Measuring device for measuring the degree of transmission of a coating
12/01/2005US20050263390 A tantalum nitride/Ta barrier is first sputter deposited with high target power and wafer bias, argon etching is performed with even higher wafer bias. a flash step is applied with reduced target power and wafer bias; different magnetic field distributions
12/01/2005US20050263389 Variable quadruple electromagnet array in plasma processing
12/01/2005US20050263388 Flexible emitter using high molecular compound and method for fabricating the same
12/01/2005US20050263217 High purity niobium and products containing the same, and methods of making the same
12/01/2005US20050263078 Drive mechanism for a vacuum treatment apparatus
12/01/2005US20050263075 Delivery systems for efficient vaporization of precursor source material
12/01/2005US20050263074 Film formation source, vacuum film formation apparatus, organic EL panel and method of manufacturing the same
12/01/2005DE4310941B4 Vacuum treatment chamber - with a low voltage discharge with arcing on treatment chamber walls prevented
12/01/2005DE19902908B4 Verfahren zur Herstellung von Chalkogenidschichten durch chemische Umsetzung von Schichten aus Metallen oder Metallverbindungen im niederenergetischen Chalkogen-Ionenstrahl A process for preparing chalcogenide layers by chemical reaction of layers of metals or metal compounds in the low energy ion beam chalcogen
12/01/2005DE10340703B4 Vorrichtung und Verfahren zur nahtlosen Beschichtung von Substraten sowie beschichtetes Substrat Apparatus and method for seamless coating substrates and coated substrate
12/01/2005DE102005022812A1 ND-Filter und Aperturblendenvorrichtung ND filter and aperture device
12/01/2005DE102004063691A1 Semiconductor device ion implanting method, involves nonuniformly implanting dose of implanted ions in central portion and edge portions of semiconductor substrate with different scanning speed in different directions
12/01/2005DE102004022297A1 Verfahren und System zum selektiven Beschichten oder Ätzen von Oberflächen A method and system for selectively coating or etching surfaces
12/01/2005DE102004021734A1 Verfahren und Vorrichtung zur kontinuierlichen Beschichtung flacher Substrate mit optisch aktiven Schichtssystemen Method and apparatus for continuous coating of flat substrates with optically active layer systems
12/01/2005CA2549091A1 Durable thermal barrier coating having low thermal conductivity
11/2005
11/30/2005EP1600526A1 Sputtering target and process for producing the same
11/30/2005EP1600525A1 Process for making or repairing a coating on a metallic substrate
11/30/2005EP1600429A2 Waterdrop slidable surface structure
11/30/2005EP1284833A4 Scalpel blade having high sharpness and toughness
11/30/2005EP1272683B1 Dlc layer system and method for producing said layer system
11/30/2005EP0833956B1 Method of forming a solar selective surface coating
11/30/2005CN2743367Y Sensing device of vacuum film plating substrate constant tension winding
11/30/2005CN2743366Y Vacuum film plating machine having orientation and self control function
11/30/2005CN1703772A Transparent oxide semiconductor thin film transistors
11/30/2005CN1703746A Silver alloy for reflective film of optical recording medium
11/30/2005CN1703532A Polycrystalline mgo vapor deposition material
11/30/2005CN1703531A Method to recover spent components of a sputter target
11/30/2005CN1702192A Driving mechanism for vacuum process equipment
11/30/2005CN1702191A Method for preparing alloy sheet
11/30/2005CN1702190A Rotation device for vacuum vertical planet clamp
11/30/2005CN1702024A Vacuum treating device
11/30/2005CN1229763C Sign forming method
11/30/2005CN1229660C Method and apparatus for making array waveguide device
11/30/2005CN1229515C Recessed sputter target
11/30/2005CN1229514C Multicolour filming process of one piece filter and coloured rotary wheel set fitted with said filter
11/30/2005CN1229513C Vacuum chamber for plain substrate
11/30/2005CN1229279C Array structure of nm-class carbon tubes and its preparing process
11/29/2005US6969558 Low sulfur article having a platinum-aluminide protective layer, and its preparation
11/29/2005US6969448 Method for forming a metallization structure in an integrated circuit
11/29/2005US6969447 Thin film protective layer with buffering interface
11/29/2005US6968630 Vacuum processing apparatus and operating method therefor
11/28/2005CA2508821A1 Process for manufacturing or repairing a coating on a metallic substrate
11/24/2005WO2005112067A1 New material for vapor sources of alkali and alkaline earth metals and a method of its production
11/24/2005WO2005111265A1 Method and system of dry cleaning a processing chamber
11/24/2005WO2005111264A1 Dlc coatings for loaded machine parts, intended for use in boundary-lubrication conditions
11/24/2005WO2005111263A1 Vacuum processing apparatus
11/24/2005WO2005111262A1 Vacuum treatment device and method of manufacturing optical disk
11/24/2005WO2005111261A1 Spattering target and method of manufacturing the same
11/24/2005WO2005111260A1 Method and apparatus for applying a substance to a substrate
11/24/2005WO2005111259A1 Organic material evaporation source and organic vapor deposition device
11/24/2005WO2005111258A1 Device equipped with cooling means and cooling method
11/24/2005WO2005111257A2 Effects of methods of manufacturing sputtering targets on characteristics of coatings