Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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10/26/2006 | US20060240646 Method of removing residual contaminants from an environment |
10/26/2006 | US20060240272 Stabilized aluminum laminate having aluminum and stabilizing layer laminated thereon |
10/26/2006 | US20060240271 A1 composite material being crumbled with water, a1 film and a1 power comprising the material and methods for preparation thereof, constitutional member for film-forming chamber method for recovering film-forming material |
10/26/2006 | US20060240260 Cover, mobile communications apparatus and method for producing a coated cover |
10/26/2006 | US20060238286 Carrier device for magnetizable substrate |
10/26/2006 | US20060237849 Electronic device, method of manufacture of the same, and sputtering target |
10/26/2006 | US20060237404 Laser annealer and laser thin-film forming apparatus |
10/26/2006 | US20060237309 Arc evaporator with a powerful magnetic guide for targets having a large surface area |
10/26/2006 | US20060237303 Sputtering target, method of manufacturing a multilayer reflective film coated substrate, method of manufacturing a reflective mask blank, and method of manufacturing a reflective mask |
10/26/2006 | US20060236942 Sealing lock for an in vacuo line for deposition on a flat product |
10/26/2006 | DE102006010872A1 Magnetron-powered surface coating assembly has internal heat bath clamped to base brackets within bulkhead container |
10/26/2006 | DE102005019101A1 Magnetron-driven atomization and sputtering coating process predetermines target atomization condition and modifies magnet array rotation |
10/26/2006 | DE102005019100A1 Magnetic system for dissipation cathode, with ferromagnetic yoke plates and several groups of magnets with opposite polarity, magnets of first group forming closed,, while magnets of second group form closed, outer magnet row |
10/25/2006 | EP1715505A1 Method and device for manipulating particles in plasma |
10/25/2006 | EP1715078A1 Continuous OLED coating apparatus |
10/25/2006 | EP1715077A1 Copper or copper alloy target/copper alloy backing plate assembly |
10/25/2006 | EP1715076A1 Method and apparatus for positioning a mask |
10/25/2006 | EP1715075A1 Magnetic mask holder |
10/25/2006 | EP1715069A1 Enhanced formulation of cobalt alloy matrix compositions |
10/25/2006 | EP1713949A1 Method and apparatus for manufacturing a functional layer consisting of at least two components |
10/25/2006 | EP1713948A2 Vacuum deposition method and sealed-type evaporation source apparatus for vacuum deposition |
10/25/2006 | EP1713945A1 Semifinished product made of a composite material and method for producing a semifinished product from a composite material |
10/25/2006 | EP1713736A1 Graded photocatalytic coatings |
10/25/2006 | EP1713586A1 Method of producing a layer of material on a support |
10/25/2006 | EP1568069A4 Active matrix backplane for controlling controlled elements and method of manufacture thereof |
10/25/2006 | EP1404460B1 Masking article for use in vehicle manufacturing |
10/25/2006 | CN1853277A Method for manufacturing field effect semiconductor device |
10/25/2006 | CN1853000A Homogeneous mixtures of organic materials |
10/25/2006 | CN1852998A High-purity Ni-V alloy, target therefrom, high-purity Ni-V alloy thin film and process for producing high-purity Ni-V alloy |
10/25/2006 | CN1851860A Bottom electrode assembly for semiconductor device |
10/25/2006 | CN1851853A Device and method for reducing thin-film type capacitance vacuum gauge zero-point drift |
10/25/2006 | CN1851058A Method for reinforcing-depositing composite modified titanium alloy surface using electric spark with ion beam |
10/25/2006 | CN1851044A Master-slave integrated control system structure |
10/25/2006 | CN1851043A Base plate holding device |
10/25/2006 | CN1851042A Magnesium-alloy surface ion injection modifying method |
10/25/2006 | CN1851041A Bearing outer ring ball track ion injection and deposition combined treatment method |
10/25/2006 | CN1851040A Continuous preparation method of dual-face superconducting strip cushion |
10/25/2006 | CN1851039A Method for preparing lead zirconate titanate ferroelectric film material |
10/25/2006 | CN1851038A Method for preparing chromium oxide composite coating |
10/25/2006 | CN1851037A Movable universal eva porating source apparatus for vacuum system |
10/25/2006 | CN1850402A TiN two-layer film cladding for cutting tool material surface and its preparing method |
10/25/2006 | CN1282252C 电子电路 Electronic circuit |
10/25/2006 | CN1282216C 一种灯丝及其制备方法 One kind of filament and its preparation method |
10/25/2006 | CN1281783C Method for mfg. organic film device using pair-target type sputtering device |
10/25/2006 | CN1281782C System and method for making thin-film structures using stepped profile mask |
10/25/2006 | CN1281781C 溅射方法 Sputtering method |
10/25/2006 | CN1281780C Cylindrical target and method of mfg. same |
10/25/2006 | CN1281779C External heating type high temperature electric heater for high vacuum thin film settling chamber |
10/25/2006 | CN1281544C Target for transparent electroconductive film, transparent electroconductive material, transparent electroconductive glass and transparent electroconductive film |
10/25/2006 | CN1281410C Process for producing transparent conductive laminate |
10/24/2006 | US7126138 Electron flood apparatus and ion implantation system |
10/24/2006 | US7125587 Covering the slit with a polymeric sheet to maintain a vacuum within the fixture, allowing the ion beam exiting the vacuum fixture; for alignment of the liquid crystals |
10/24/2006 | US7125581 A rotator is above the central portion of the substrate, and a heater with a circular evaporation source on it is placed below a defined circular trace below the substrate so that the supplying direction is parallel to the tangential direction of the circular trace; improved uniformity |
10/24/2006 | US7125503 Transparent conductive thin film, process for producing the same, sintered target for producing the same, and transparent, electroconductive substrate for display panel, and organic electroluminescence device |
10/24/2006 | US7124929 Friction stir welding of metal matrix composites, ferrous alloys, non-ferrous alloys, and superalloys using a superabrasive tool |
10/19/2006 | WO2006110667A2 Biased target ion beam deposition (btibd) for the production of combinatorial materials libraries |
10/19/2006 | WO2006109615A1 Stacked permanent magnet |
10/19/2006 | WO2006109562A1 Apparatus for film formation and method for film formation |
10/19/2006 | WO2006108547A1 Device for plasma-treating and/or coating work pieces |
10/19/2006 | WO2006108502A1 Method for producing tubular sputter targets, produced sputter targets and use thereof |
10/19/2006 | WO2006087558A3 Apparatus and method for the application of a material layer to display devices |
10/19/2006 | WO2006083734A3 Controllably feeding organic material in making oleds |
10/19/2006 | WO2006075997A3 Biaxially-textured film deposition for superconductor coated tapes |
10/19/2006 | WO2006044166A3 Method of making coated article having ir reflecting layer with predetermined target-substrate distance |
10/19/2006 | US20060234091 Enhanced multi-component oxide-containing sputter target alloy compositions |
10/19/2006 | US20060234088 Sputtering target, sintered compact, electrically conductive film produced by using the same, and organic EL device and substrate used for the same |
10/19/2006 | US20060234071 Evaporation material for the production of average refractive optical layers |
10/19/2006 | US20060234064 Dielectric-layer-coated substrate and installation for production thereof |
10/19/2006 | US20060233969 Hybrid beam deposition system and methods for fabricating metal oxide-zno films, p-type zno films, and zno-based II-VI compound semiconductor devices |
10/19/2006 | US20060233965 Process and apparatus for the manufacture of a sputtering target |
10/19/2006 | US20060231759 Uniform broad ion beam deposition |
10/19/2006 | US20060231395 Control for an excimer emitter |
10/19/2006 | US20060231394 Cylindrical AC/DC Magnetron with Compliant Drive System and Improved Electrical and Thermal Isolation |
10/19/2006 | US20060231393 Target backing plate for sputtering system |
10/19/2006 | US20060231392 Cross-contaminant shield in sputtering system |
10/19/2006 | US20060231391 Top shield for sputtering system |
10/19/2006 | US20060231390 Temperature control of pallet in sputtering system |
10/19/2006 | US20060231389 Insulated pallet in cleaning chamber |
10/19/2006 | US20060231388 Multi-station sputtering and cleaning system |
10/19/2006 | US20060231384 Back-biased face target sputtering |
10/19/2006 | US20060231383 copolymer of N-methoxyethylacrylamide and N-ethoxyethylacrylamide in aqueous medium; microarrays; electrophoresis |
10/19/2006 | US20060231382 for depositing on multiple wafers and/or display panels in vacuum chamber; robotics |
10/19/2006 | US20060231033 Tape-manufacturing system having extended operational capabilities |
10/19/2006 | DE19735803B4 Elektrode-Elektrolyt-Anordnung, Verfahren zur Herstellung einer Elektrode-Elektrolyt-Anordnung und Verwendung einer Elektrode-Elektrolyt-Anordnung Electrode-electrolyte arrangement, process for preparing an electrode-electrolyte arrangement and use of an electrode-electrolyte arrangement |
10/19/2006 | DE112004000720T5 Aluminiumoxidschutzfilm und Herstellungsverfahren dafür Aluminum oxide protective film and production method thereof |
10/19/2006 | DE102005017742A1 Method for coating optical substrate e.g. for semiconductor components manufacture, involves generating a plasma for interaction with coating material |
10/19/2006 | DE102005017632A1 Method of controlling local etching or deposition in modification of surfaces with pulsed determination of a removal or deposition profile ion streams useful in the high accuracy forming of optical component surfaces involving |
10/19/2006 | DE102005017191A1 Tube-shaped sputter target useful in production of TFT liquid crystal displays has tube region devoid of shocks (sic) and seams (sic) and made from Al or Al alloy |
10/19/2006 | DE102005017190A1 Verfahren zum Herstellen von rohrförmigen Sputtertargets, danach hergestellte Sputtertargets und deren Verwendung A process for the manufacture of tubular sputtering target, the sputtering target produced thereby, and their use |
10/19/2006 | DE102005016406A1 Transporteinrichtung, insbesondere zum Transport flächiger Substrate durch eine Beschichtungsanlage Transport device, especially for transporting flat substrates through a coating installation |
10/18/2006 | EP1713110A1 Device for coating a substrate and module |
10/18/2006 | EP1712655A1 Apparatus for plasma treatment and/or coating of a work piece |
10/18/2006 | EP1712654A1 Multi-layer coating having excellent adhesion and sliding properties and production method thereof |
10/18/2006 | EP1712531A2 Use of material having ultrahydrohilic and photocatalytic surface |
10/18/2006 | EP1712530A2 Method of photocatalytically making the surface of base material ultrahydrophilic, base material having ultrahydrophilic and photocatalytic surface, and process for producing said material |
10/18/2006 | EP1712367A1 Phase-change information recording medium and process for producing the same, sputtering target, method for using phase-change information recording medium and optical recorder |
10/18/2006 | EP1712349A1 Gas barrier film and gas barrier laminate |
10/18/2006 | EP1712108A1 Cylindrical microwave chamber |
10/18/2006 | EP1711646A2 Physical vapor deposition target constructions |
10/18/2006 | EP1711645A1 Method and apparatus for monitoring optical characteristics of thin films in a deposition process |