Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
11/2006
11/08/2006EP1719823A1 Ion implantation system and ion implantation system
11/08/2006EP1719822A1 Sputtering target, optical information recording medium and process for producing the same
11/08/2006EP1719614A2 Aerogel substrate and process for producing the same
11/08/2006EP1718782A2 Treatment process for improving the mechanical , catalytic, chemical and biological activity of surfaces and articles treated therewith
11/08/2006EP1718574A1 Method for cleaning a substrate
11/08/2006EP1718460A2 Coated article with low-e coating including ir reflecting layer(s) and corresponding method
11/08/2006EP1448806A4 Method and apparatus for multi-target sputtering field of the invention
11/08/2006EP1301652A4 Improving effectiveness of artificial hip by gcib
11/08/2006EP1274874B1 Methods of bonding a target to a backing plate
11/08/2006EP0796355A4 Apparatus for generating plasma by plasma-guided microwave power
11/08/2006CN2835254Y Anode device with on-line cleaning function and coating machine having the same
11/08/2006CN1860597A 配线结构的形成方法以及半导体装置 The method of forming a wiring structure and a semiconductor device
11/08/2006CN1860382A Reflective article and method for the preparation thereof
11/08/2006CN1860250A Aluminum base target and process for producing the same
11/08/2006CN1858296A Composite reinforcing and treating method for alumium or alumium alloy substrate surface through ion implantation and deposition
11/08/2006CN1858295A Protective coating and its preparing method
11/08/2006CN1857848A Superalloy repair methods and inserts
11/08/2006CN1857847A Superalloy repair methods and inserts
11/08/2006CN1284215C Nano double phase composite structure Zr-Si-N diffusion barrier material and its preparing process
11/08/2006CN1283831C 溅射靶和透明导电膜 Sputtering target and a transparent conductive film
11/08/2006CN1283830C Tantalum sputtering target and method for forming metal article
11/07/2006US7133218 Optical system
11/07/2006US7132692 Nanosilicon light-emitting element and manufacturing method thereof
11/07/2006US7132373 Thin metal oxide film and process for producing the same
11/07/2006US7132219 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
11/07/2006US7132130 Method for providing a chrome finish on a substrate
11/07/2006US7132040 Matching unit for semiconductor plasma processing apparatus
11/07/2006US7132016 System for and method of manufacturing a large-area backplane by use of a small-area shadow mask
11/07/2006US7131392 Vacuum evaporator
11/07/2006US7131189 Continuous processing of thin-film batteries and like devices
11/07/2006CA1341514C Silicon-containing sputtering target
11/02/2006WO2006115236A1 Vapor deposition
11/02/2006WO2006114886A1 Method of mask forming and method of three-dimensional microfabrication
11/02/2006WO2006114686A1 A method and apparatus for coating objects
11/02/2006WO2006114228A2 Process and device for coating substrates
11/02/2006WO2006114227A2 Process and device for coating disk-shaped substrates for optical data carriers
11/02/2006WO2006055513B1 Methods of forming three-dimensional pvd targets
11/02/2006WO2006052931A3 Physical vapor deposition chamber having a rotatable substrate pedestal
11/02/2006WO2005089272B1 Pulsed cathodic arc plasma source
11/02/2006US20060246323 Epitaxially grown non-oxide magnetic layers for granular perpendicular magnetic recording media applications
11/02/2006US20060246321 Layer system comprising a titanium-aluminium-oxide layer
11/02/2006US20060246320 High wear resistance that improves the service life; cemented carbide, cermet, hard material, and tool steel having coating of titanium-aluminum-tantalum nitride
11/02/2006US20060246290 cathode-arc ion plated carbon layer on a base from a solid carbon as raw material, has an interlayer metallic intermediate layer for increasing adhesion; high hardness, wear resistance and durability; used to coat tools, dies, machine parts, electric and electronic parts, optical parts
11/02/2006US20060246226 Cerium/zirconium oxide based; improved shock resistance
11/02/2006US20060246211 Method of forming film upon a substrate
11/02/2006US20060243209 Substrate susceptors for receiving semiconductor substrates to be deposited upon
11/02/2006US20060243208 Substrate susceptors for receiving semiconductor substrates to be deposited upon
11/02/2006US20060242844 Colored razor blades
11/02/2006EP1717846A1 Vapor-phase deposition method
11/02/2006EP1717837A2 Plasma display panels
11/02/2006EP1717347A2 Coated insert
11/02/2006EP1717339A2 Continuous coating apparatus
11/02/2006EP1717338A1 Thin film forming apparatus
11/02/2006EP1717337A2 Enhanced multi-component oxide-containing sputter target alloy compositions
11/02/2006EP1717336A1 Sputtering target, optical information recording medium and process for producing the same
11/02/2006EP1717335A1 Sputtering target, optical information recording medium and process for producing the same
11/02/2006EP1717334A1 Method for producing optically transparent noble metal films
11/02/2006EP1716268A1 Coating plant with a charging lock and device therefor
11/02/2006EP1716202A1 Polypropylene modification for improved adhesion of polypropylene-based multilayer packaging film structure to vacuum deposited aluminum
11/02/2006EP1480920B1 Thin film coating having transparent base layer
11/02/2006DE102005020250A1 Sputtering target, e.g. tubular target with carrier and sputtering material, useful in coating large surface substrates such as architectural glass or flat screen plates has free flowing heat and electricity
11/02/2006DE102005018984A1 Verfahren und Vorrichtung zum Herstellen von elektronischen Bauteilen Method and apparatus for the manufacture of electronic components
11/02/2006DE102005013875A1 Heizeinrichtung, Beschichtungsanlage und Verfahren zur Verdampfung oder Sublimation von Beschichtungsmaterialien Heating, coating machine and method for evaporation or sublimation of coating materials
11/01/2006CN2832829Y Vacuum coating machine
11/01/2006CN2832828Y Vacuum coating system
11/01/2006CN1856591A Sputtering target and process for producing si oxide film therewith
11/01/2006CN1856587A Silver alloy, sputtering target material thereof, and thin film thereof
11/01/2006CN1855375A Method for manufacturing semiconductor device
11/01/2006CN1854794A Method for producing near field optical generator
11/01/2006CN1854547A Self-lubricating friction-reducing bearing of multiple ionic mixed injection
11/01/2006CN1854333A Vacuum film plating method and apparatus
11/01/2006CN1854332A Multiple vacuum evaporation coating device and method for controlling the same
11/01/2006CN1854331A Material film plating method and device thereof
11/01/2006CN1854330A Continuous coating apparatus
11/01/2006CN1854329A Device for coating a substrate and module
11/01/2006CN1854318A Enhanced formulation of cobalt alloy matrix compositions
11/01/2006CN1853899A Decorative jetting process in mould
11/01/2006CN1853832A Cutting tool coated with hard alloy
11/01/2006CN1282879C Half-transmitting reflector and half-transmitting polarizer and its liquid crystal display
11/01/2006CN1282766C Tools for coating hard film
11/01/2006CN1282763C Sputtering apparatus capable of changing distance between substrate and deposition preventing plate used for film formation
11/01/2006CN1282762C Corrosion resistance and wear-resistance decoration coatings
10/2006
10/31/2006US7129633 Silicon oxynitride passivated rare earth activated thioaluminate phosphors for electroluminescent displays
10/31/2006US7129551 Electronic component having a praseodymium oxide layer and process for fabricating same
10/31/2006US7129161 Depositing a tantalum film
10/31/2006US7129123 SOI wafer and a method for producing an SOI wafer
10/31/2006US7128988 Magnetic material structures, devices and methods
10/31/2006US7128950 Coating a substrate, e.g., gas turbine engines, by having a ceramic melt in a crucible in a heated and depressurized chamber and projecting the beam at an angle to make the power distribution pattern such that high intensity is at edges of the coating surface and low intensity or none at the center
10/31/2006US7128787 Atomic layer deposition method
10/31/2006CA2277977C A coating comprising layers of diamond like carbon and diamond like nanocomposite compositions
10/31/2006CA2227507C Method of forming robust metal, metal oxide, and metal alloy layers on ion-conductive polymer membranes
10/26/2006WO2006113123A1 Method of coating a medical device utilizing an ion-based thin film deposition technique, a system for coating a medical device and a medical device produced by the method
10/26/2006WO2006112107A1 High reflection mirror and process for producing the same
10/26/2006WO2006111618A1 Source, an arrangement for installing a source, and a method for installing and removing a source
10/26/2006WO2006111278A1 Method and device for manipulating particles in plasma
10/26/2006WO2006068846A3 Dense coating formation by reactive deposition
10/26/2006WO2006057618A3 Product coated with a composite max-material and method of its production
10/26/2006WO2006041630A3 Low temperature selective epitaxial growth of silicon germanium layers
10/26/2006WO2005084242A3 Method of making sputtering target
10/26/2006US20060240974 Catalyst support substrate, method for growing carbon nanotubes using the same, and the transistor using carbon nanotubes