Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
11/2006
11/21/2006US7138343 Method of producing a substrate with a surface treated by a vacuum treatment process, use of said method for the production of coated workpieces and plasma treatment chamber
11/21/2006US7138196 Layered thin-film media for perpendicular magnetic recording
11/21/2006US7138156 Filter design algorithm for multi-variate optical computing
11/21/2006US7138014 Electroless deposition apparatus
11/21/2006US7137352 Plasma processing system in which wafer is retained by electrostatic chuck
11/16/2006WO2006121573A1 Controlled vapor deposition of biocompatible coatings for medical devices
11/16/2006WO2006121336A1 A method for forming ferroelectric thin films, the use of the method and a memory with a ferroelectric oligomer memory material
11/16/2006WO2006120961A1 High strength sputtering target for forming phosphor film in electroluminescence element
11/16/2006WO2006120173A1 A reflector for an infrared radiating element
11/16/2006WO2006120017A1 Plain bearing composite material, use thereof and production methods therefor
11/16/2006WO2006120015A1 Plain bearing composite material, use thereof and production methods therefor
11/16/2006WO2005113164A3 Superconductor fabrication processes
11/16/2006US20060258539 Superconducting film and method of manufacturing the same
11/16/2006US20060258154 Methods of forming a reaction product and methods of forming a conductive metal silicide by reaction of metal with silicon
11/16/2006US20060257755 Phase-shift photomask-blank, phase-shift photomask and fabrication method thereof
11/16/2006US20060257695 Magnetic recording medium and method for manufacturing same
11/16/2006US20060257669 Method of producing transparent titanium oxide coatings having a rutile structure
11/16/2006US20060257585 Method of vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide
11/16/2006US20060257583 Method for producing a substrate having a resist layer in the form of a relief structure, which represents a diffraction structure, the substrate having a conductive layer which scatters the primary electrons and/or produces secondary electrons when the resist layer is exposed by an electron beam
11/16/2006US20060257562 wear and heat resistance; vapor deposition, lamination; for application to cutting tools
11/16/2006US20060257557 Method for treating antireflection coatings on an optical substrate, the thus obtained optical substrate and device for carrying gout said method
11/16/2006US20060255739 characterized in that a proportion of Al atoms in the coating in relation to a total number of metal atoms in the coating is in the range of 2 to 40%; heat resistance coating is provided on internal and/or external side of bulb; improved thermal and mechanical properties
11/16/2006US20060255727 Silver alloy thin film reflector and transparent electrical conductor
11/16/2006US20060255260 Method and apparatus for process monitoring and control
11/16/2006US20060254905 Method for operating a sputter cathode with a target
11/16/2006US20060254904 Ground shield for a PVD chamber
11/16/2006US20060254903 Polygonal barrel spattering device, polygonal, barrel spattering method, coated particle formed by the device and method, microcapsule, and method of manufacturing the micro- capsule
11/16/2006US20060254462 Sputtering target for forming thin phosphor film
11/16/2006DE102005023309A1 Gleitlagerverbundwerkstoff, Verwendung und Herstellungsverfahren Plain bearing composite material, use and production method
11/16/2006DE102005023307A1 Gleitlagerverbundwerkstoff, Verwendung und Herstellungsverfahren Plain bearing composite material, use and production method
11/16/2006DE102005021927A1 Legierter Körper als Target für das PVD-Verfahren, Verfahren zur Herstellung des legierten Körpers und PVD-Verfahren mit dem legierten Körper Alloy body as a target for the PVD method, method of producing the alloy body and PVD method with the alloy body
11/15/2006EP1722009A1 Thin wear resistant coating
11/15/2006EP1722006A1 Method for the anticorrosion surface treatment of containers for fluids, container provided by means of the method, and apparatus for performing the method
11/15/2006EP1722005A1 Method of using a sputtering cathode together with a target
11/15/2006EP1722004A1 Substrate with a metallization bonding layer
11/15/2006EP1722003A1 Alloy target for PVD-process, method for producing said alloy target and PVD-proces using said alloy target
11/15/2006EP1721997A1 Ni-Pt ALLOY AND TARGET COMPRISING THE ALLOY
11/15/2006EP1721026A1 Reactive metal sources and deposition method for thioaluminate phosphors
11/15/2006EP1721025A2 Vaporizing temperature sensitive materials for oled
11/15/2006EP1720699A2 Coated article with zinc oxide over ir reflecting layer and corresponding method
11/15/2006EP1337684A4 Vacuum metalization process for chroming substrates
11/15/2006EP1224684B1 Method and apparatus for eliminating displacement current from current measurements in a plasma processing system
11/15/2006EP0944480B2 Security element and method for producing same
11/15/2006CN1863938A Polysulfide thermal vapour source for thin sulfide film deposition
11/15/2006CN1863937A Metal thin film chip production method and metal thin film chip production device
11/15/2006CN1863936A Film deposition apparatus having hole-like rotary filter plate for capturing fine particles, and film deposition method
11/15/2006CN1862827A High-dielectric coefficient grid dielectric material titanium aluminate film and preparing method thereof
11/15/2006CN1862770A Apparatus capable of eliminating slip line and high stress zone in silicon gas phase epitaxial layer
11/15/2006CN1862766A Method for measuring parallel beam injection angle
11/15/2006CN1862377A Phase-shift photomask-blank, phase-shift photomask and fabrication method thereof
11/15/2006CN1861836A Magnet assembly for a planar magnetron
11/15/2006CN1861835A Method of using a sputtering cathode together with a target
11/15/2006CN1861834A Screen, evaporating plating apparatus using said screen and display panel mfg. process
11/15/2006CN1861833A Magnetic mask holder
11/15/2006CN1861301A Surface-coated carbide alloy cutting tool
11/15/2006CN1284880C Diamond coatings on reactor wall and method of manufacturing thereof
11/15/2006CN1284879C Film forming method and device for halogen and magnesia fluoride film
11/14/2006US7135820 Vane structure of magnetron
11/14/2006US7135399 Deposition method for wiring thin film
11/14/2006US7135238 improved fatigue properties by a titanium aluminide (Ti Al) coating made by diffusing the Al into the Ti at a temperature below the melting point of the Al; use in heat exchangers used in aircraft environmental control systems
11/14/2006US7135097 Box-shaped facing-targets sputtering apparatus and method for producing compound thin film
11/14/2006US7134183 Method of making a thin-film magnetic head
11/14/2006US7134182 Method to form an embedded micro-pedestal in a conductive layer
11/09/2006WO2006119403A2 Metering material to promote rapid vaporization
11/09/2006WO2006119367A2 Target assemblies, targets backing plates, and methods of target cooling
11/09/2006WO2006118903A2 Microporous article having metallic nanoparticle coating
11/09/2006WO2006118851A2 Method of making scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s)
11/09/2006WO2006118513A1 Cutting tool insert, solid end mill or drill coated with wear resistant layer.
11/09/2006WO2006117979A1 Infrared blocking filter
11/09/2006WO2006117949A1 Sputtering target
11/09/2006WO2006117884A1 Al-Ni-B ALLOY WIRING MATERIAL AND DEVICE STRUCTURE USING SAME
11/09/2006WO2006117625A2 Equipment and method for ion implantation processing of medical devices
11/09/2006WO2006117145A2 Coating process for manufacture or reprocessing of sputter targets and x-ray anodes
11/09/2006WO2006117119A1 Ceramic evaporator crucibles, method for the production thereof, and use thereof
11/09/2006WO2006117118A1 Method for coating substrates with copper or silver
11/09/2006WO2006098781A3 Methods for making sputtering targets
11/09/2006WO2006080968A3 Methods and equipment for depositing coatings having sequenced structures
11/09/2006WO2006063956A3 Device for the tempered storage of a container
11/09/2006WO2006055323A3 Scratch resistant coated glass article including carbide layer(s) resistant to fluoride-based etchant(s)
11/09/2006WO2006034019A3 Delivering particulate material to a vaporization zone
11/09/2006WO2004066276A3 Method and system for replicating film data to a metal substrate and article of manufacture
11/09/2006US20060252240 Process for forming a dielectric on a copper-containing metallization and capacitor arrangement
11/09/2006US20060252238 Transistor with shallow germanium implantation region in channel
11/09/2006US20060252176 Memory element and its method of formation
11/09/2006US20060251917 magnetron sputter depositing a nanostructured coating comprising Cr or a Cu-Cr mixture on a Cu alloy workpiece which is a hollowed structure such as a rocket or jet engine combustion chamber line; utilizing magnetron and an external sputter target material comprising Cr or Cu, Cr; plasma enhancement
11/09/2006US20060251912 forming a MoSi2 diffusion layer by chemical vapor deposition of silicon on a surface of a base material of Mo or alloy, transforming MoSi2 layer to Mo5Si3 diffusion layer by heating in pure H2 or Ar, chemical vapor depositing N2 on the surface of Mo5Si3 to form Mo2NSi3n4, finally vapor depositing silicon
11/09/2006US20060251814 Gravity-fed in-line continuous processing system and method
11/09/2006US20060251730 Anti-microbial sanitary ware and method for making the same
11/09/2006US20060249373 Sputtering targets and method for the preparation thereof
11/09/2006US20060249372 Biased target ion bean deposition (BTIBD) for the production of combinatorial materials libraries
11/09/2006US20060249371 Manufacturing of magnetic recording medium
11/09/2006US20060249370 creating a magnetic field so that the film-forming surface portion is placed in the magnetic field with the magnetic field induced normal to the substrate surface portion; back-biasing the back portion of the substrate; sputtering alloyed thin film
11/09/2006US20060249369 Process for physical vapor deposition of a chalcogenide material layer and chamber for physical vapor deposition of a chalcogenide material layer of a phase change memory device
11/09/2006US20060249368 System, method, and apparatus for making ohmic contact to silicon structures with low thermal loads
11/09/2006DE202006014136U1 Rapid, automatic evaporation coating apparatus, e.g. for coating bulk materials with metal, comprises chamber with openable wall section and movable external device for supplying coating material to evaporator
11/09/2006DE102005020946A1 Verfahren zum Beschichten von Substraten mit Kupfer oder Silber A process for coating substrates with copper or silver
11/09/2006DE102005020945A1 Keramische Verdampferschiffchen, Verfahren zu ihrer Herstellung und ihre Verwendung Ceramic evaporator boats, processes for their preparation and their use
11/09/2006CA2673326A1 Method of making scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s)
11/09/2006CA2607091A1 Coating process for manufacture or reprocessing of sputter targets and x-ray anodes
11/08/2006EP1720175A1 Transparent conductive film and transparent conductive base material utilizing the same