Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
12/2010
12/23/2010US20100323205 Non-stoichiometric titanium nitride films
12/23/2010US20100323121 Method of preparing a diaphragm of high purity polysilicon with multi-gas microwave source
12/23/2010US20100323119 Process for the preparation of an organic film at the surface of a solid support with oxidizing treatment
12/23/2010US20100322840 Method of producing a layer by arc-evaporation from ceramic cathodes
12/23/2010US20100320456 Method for Fabricating a Doped and/or Alloyed Semiconductor
12/23/2010US20100320450 Semiconductor substrate, semiconductor device, light emitting device and electronic device
12/23/2010US20100320085 Sputtering Target for Producing Metallic Glass Membrane and Manufacturing Method Thereof
12/23/2010US20100320084 Sputtering Target of Nonmagnetic-Particle-Dispersed Ferromagnetic Material
12/23/2010US20100320077 Method for production of cubic boron nitride-containing films
12/23/2010US20100320076 Low resistance tunneling magnetoresistive sensor with natural oxidized double MgO barrier
12/23/2010US20100320075 High-Temperature Ionic State Compound Crystallization Technology
12/23/2010US20100319900 Composite material having high thermal conductivity nd process of fabricating same
12/23/2010DE202008016404U1 Elektronischer Verdampfer Electronic evaporator
12/23/2010DE10393131B4 Verfahren zum Herstellen von Maskenrohlingen A method for producing mask blanks
12/23/2010DE10314929B9 Körper mit einer Beschichtung in R-3c Struktur, Verfahren und Vorrichtung zur PVD-Beschichtung Body with a coating in R-3c structure, method and device for PVD coating
12/23/2010DE102009049953A1 Apparatus for transporting plate-shaped substrate into the elongated vacuum treatment systems, comprises transport rollers lying transverse to the longitudinal extension of the vacuum treatment system, and supporting rollers
12/23/2010DE102006025751B4 Verfahren zur Abdichtung einer Vakuumkammer und Schleuseneinrichtung für eine Vakuumkammer A method of sealing a vacuum chamber and lock device for a vacuum chamber
12/23/2010DE102004059200B4 Vorrichtung und Verfahren zum Kühlen von Substraten Apparatus and method for cooling of substrates
12/22/2010EP2264225A1 Molecular beam epitaxy apparatus for producing wafers of semiconductor material
12/22/2010EP2264217A1 Corrosion-resistant coating
12/22/2010EP2264216A2 Process for manufacturing an Sb-Te alloy sintered compact target
12/22/2010EP2264215A2 Copper alloy sputtering target, process for producing the same and semiconductor element wiring
12/22/2010EP2264214A1 Thin film deposition apparatus
12/22/2010EP2264213A1 Thin film deposition apparatus
12/22/2010EP2264212A1 Thin film deposition apparatus
12/22/2010EP2264211A1 Sputtering target, transparent conductive film, and their manufacturing method
12/22/2010EP2264210A1 Method of making low-e coating using ceramic zinc inclusive target
12/22/2010EP2264209A2 Method of making a coated cutting tool
12/22/2010EP2263982A2 Scratch resistant coated glass article resistant to fluoride-based etchant(s)
12/22/2010EP2262925A1 Oxide coated cutting insert
12/22/2010EP2262924A1 Thermally stabilized (ti, si)n layer for cutting tool insert
12/22/2010EP2262923A1 Oxide coated cutting inser
12/22/2010EP2262919A2 Treatment of metal components
12/22/2010EP2088220B1 Deposition apparatus and method for manufacturing film by using deposition apparatus
12/22/2010EP1730322B1 Method and apparatus for producing a metal wire coated with a layer of metal alloy
12/22/2010EP1442793B1 Photocatalyst and method for preparing the same
12/22/2010EP1163543B1 Adhesion layer for metal oxide uv filters
12/22/2010CN201678730U Door-valve transmission structure of plated film equipment
12/22/2010CN201678729U Circulating evaporation mechanism
12/22/2010CN201678728U Warning device for physical gas phase deposition equipment
12/22/2010CN201678727U Seal cavity observation window mechanism and seal cavity provided with same
12/22/2010CN201678726U Observation window baffle component
12/22/2010CN201678725U Ion implantation control device
12/22/2010CN101925837A Dense homogeneous fluoride films for DUV elements and method of preparing same
12/22/2010CN101925689A Vacuum coating apparatus and method
12/22/2010CN101925688A Method and devices for controlling vapour flow in vacuum evaporation
12/22/2010CN101925555A Polycrystalline MgO sintered compact, process for producing polycrystalline mgo sintered compact, and MgO target for sputtering
12/22/2010CN101925247A Film deposition apparatus and film deposition method
12/22/2010CN101924180A Antimony-rich Si-Sb-Te sulfur group compound phase-change material for phase change memory
12/22/2010CN101924015A Gas input device and semiconductor processing device
12/22/2010CN101924006A Shield usable in a sputtering plasma reactor
12/22/2010CN101922816A Solar selective absorbing coating and preparation method thereof
12/22/2010CN101922514A Bearing bush with vacuum sputtering plating layer and production method thereof
12/22/2010CN101922513A Bearing bush with vacuum sputtering film and production method thereof
12/22/2010CN101921992A Carrying device
12/22/2010CN101921991A Plasma immersion ion injection method for improving anti-oxidation property of copper film
12/22/2010CN101921990A Ion implanter
12/22/2010CN101921989A Method for improving utilization rate of target of sputtering technology
12/22/2010CN101921988A Silicon-base alloy rotary target material and preparation method thereof
12/22/2010CN101921987A Film sputtering and coating device
12/22/2010CN101921986A Zinc oxide doped PN homojunction and preparation method thereof
12/22/2010CN101921985A High-transmissivity transparent conductive glass of touch screen and preparation method thereof
12/22/2010CN101921984A Self-lubricating antifriction composite thin film based on MoS2-TiC-C and preparation method thereof
12/22/2010CN101921983A Method for preparing W-S-C composite membrane
12/22/2010CN101921982A Method for preparing nano-structured nitrogen silicon zirconium coating on surface of hard alloy substrate
12/22/2010CN101920495A Precise positioning and sputtering-coating mechanical arm and positioning method thereof
12/22/2010CN101920396A Cooling plate and manufacturing method therefor
12/22/2010CN101476103B Method for preparing organic semiconductor material rubrene micro-nano wire
12/22/2010CN101469398B Film coating material and preparation thereof
12/22/2010CN101423907B Sn-Ge-As alloy as well as preparation method and use thereof
12/22/2010CN101397665B Method for forming colorful decoration film on metal surface
12/22/2010CN101310970B Aluminum/aluminum oxide diffusion blocking layer for titanium-aluminum alloy
12/22/2010CN101285169B Device for increasing utilization ratio of high vacuum ion beam sputter target
12/22/2010CN101198716B Chromium oxide powder for spattering target and sputtering target
12/22/2010CN101182631B Magnetron sputtering source, sputter coating system and method for coating a substrate
12/22/2010CN101171360B Microporous article having metallic nanoparticle coating
12/22/2010CN101144149B Continuous vacuum preparation device without time delay and vacuum processing method
12/22/2010CN101096750B Tubular target material for pvd
12/21/2010US7855036 Sputtering target used for production of reflective mask blank for EUV lithography
12/21/2010US7854966 Coating process for fatigue critical components
12/21/2010CA2486841C Method for repairing coated components using nial bond coats
12/16/2010WO2010143602A1 Co-fe-ni alloy for soft magnetic film layer in perpendicular magnetic recording medium, sputtering target material, and perpendicular magnetic recording medium
12/16/2010WO2010143430A1 Organic electroluminescent element and method for manufacturing same
12/16/2010WO2010143371A1 Vacuum processing apparatus and method for manufacturing optical component
12/16/2010WO2010104656A3 Rapid crystallization of heavily doped metal oxides and products produced thereby
12/16/2010WO2010092471A3 Method and device for coating planar substrates with chalcogens
12/16/2010WO2008133752A3 Nanoscale oxide coatings
12/16/2010US20100317197 Heat Shield for Heater in Semiconductor Processing Apparatus
12/16/2010US20100314552 Ion implanter
12/16/2010US20100314247 Filtered cathodic arc device and carbon protective film deposited using the device
12/16/2010US20100314246 Sputter-coating apparatus having heating unit
12/16/2010US20100314245 Ionized Physical Vapor Deposition for Microstructure Controlled Thin Film Deposition
12/16/2010US20100314244 Ionized Physical Vapor Deposition for Microstructure Controlled Thin Film Deposition
12/16/2010US20100313875 High temperature solar selective coatings
12/16/2010US20100313758 Gas absorption membranes and the manufacture thereof
12/16/2010US20100313603 Method for manufacturing molding die, method for manufacturing glass gob, and method for manufacturing glass molded article
12/16/2010DE202010011941U1 Substratbehandlungsanlage Substrate treatment plant
12/16/2010DE102009025950A1 Coating structure for 3C-product with metal-like glossiness and without any weakening of the radio frequencies, comprises a substrate, a reflection increased adhesive layer applied on the substrate, and a germanium or germanium alloy layer
12/16/2010DE102009024471A1 Metallizing a semiconductor substrate, comprises depositing a metal layer on a surface of the substrate, and heating the substrate during the deposition at a specified temperature, at which liquefaction of the substrate takes place
12/16/2010DE102007061777B4 Verfahren zur Vakuumbeschichtung von zu beschichtenden Substraten und Vakkumbeschichtungsanlage A process for vacuum coating of substrates to be coated and Vakkumbeschichtungsanlage
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