| Patents for B24B 57 - Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents (2,579) |
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| 09/18/2002 | CN1370207A Polishing system and method of its use |
| 09/18/2002 | CN1369355A Lapping liquid feeder of lens abrasive working appts |
| 09/12/2002 | WO2002071445A2 Polishing chemical delivery for small head chemical mechanical planarization |
| 09/12/2002 | WO2002053320A3 Wafer support for chemical mechanical planarization |
| 09/12/2002 | US20020127860 Filter apparatus and method therefor |
| 09/12/2002 | US20020124475 CMP polishing slurry dewatering and reconstitution |
| 09/11/2002 | EP1238417A1 Semiconductor processing silica soot abrasive slurry method for integrated circuit microelectronics |
| 09/11/2002 | EP1237691A1 Method for separating a machining suspension into fractions |
| 09/10/2002 | US6447381 Polishing apparatus |
| 09/10/2002 | US6447375 Chemical mechanical polishing; drying, solidifying, batch processing, packaging |
| 09/10/2002 | US6447374 Chemical mechanical planarization system |
| 09/06/2002 | WO2002068151A1 Random-orbit head with lock-up feature |
| 09/06/2002 | CA2432950A1 Random-orbit head with lock-up feature |
| 09/03/2002 | US6443822 Wafer processing apparatus |
| 08/29/2002 | US20020119733 See attached list (k. yasui et al) |
| 08/29/2002 | US20020119732 Random-orbit head with concentric lock-up feature |
| 08/29/2002 | US20020119286 Conductive polishing article for electrochemical mechanical polishing |
| 08/28/2002 | EP1234010A2 Use of cesium hydroxide in a dielectric cmp slurry |
| 08/28/2002 | EP1234009A1 Composition and method for planarizing surfaces |
| 08/28/2002 | CN1366549A Polishing compound and method for preparation thereof, and polishing method |
| 08/28/2002 | CN1366547A Polishing composition and magnetic recording disk substrate polished with polishing composition |
| 08/27/2002 | US6439978 Substrate polishing system using roll-to-roll fixed abrasive |
| 08/27/2002 | US6439977 Rotational slurry distribution system for rotary CMP system |
| 08/27/2002 | US6439019 Roller cage for a deep rolling work roller |
| 08/22/2002 | US20020112758 Pressure vessel systems and methods for dispensing liquid chemical compositions |
| 08/20/2002 | US6436830 Delivering processed slurry to the polishing device. the slurry processor including a metal separator for separating metal particles, polished from the semiconductor wafer, from the used slurry. the slurry can be continuously recirculated |
| 08/20/2002 | US6435950 Pressurized delivery method for abrasive particulate material |
| 08/15/2002 | WO2001041973A9 Chemical-mechanical polishing method |
| 08/15/2002 | US20020111027 Polishing compositions for noble metals |
| 08/13/2002 | US6431957 Directional flow control valve with recirculation for chemical-mechanical polishing slurries |
| 08/08/2002 | WO2002060643A2 Spherical drive assembly for chemical mechanical planarization |
| 08/07/2002 | EP1228159A1 Improved cmp products |
| 08/07/2002 | CN1362907A Dual CMP pad conditioner |
| 08/06/2002 | US6429131 CMP uniformity |
| 08/06/2002 | US6428400 Drainage structure in polishing plant |
| 08/06/2002 | US6428387 Method for chemical mechanical polishing using a high selective slurry |
| 08/01/2002 | WO2002058885A1 Pressure vessel systems and methods for dispensing liquid chemical compositions |
| 08/01/2002 | US20020102930 Grinding fluid supply device of lens grinding apparatus |
| 08/01/2002 | US20020102853 Articles for polishing semiconductor substrates |
| 08/01/2002 | DE10103062A1 Chemisch-mechanisches Polierverfahren für emulsionsfreie feste Schleifkissen Chemical mechanical polishing method for emulsion-free solid abrasive pad |
| 07/31/2002 | EP1226220A1 Polishing system and method of its use |
| 07/31/2002 | CN1361923A Polishing mixture and process for reducing the incorporation of copper into silicon wafers |
| 07/30/2002 | US6426295 Mixing surfactant of at least 100 parts per million to slurries to form polishing solution, chemical-mechanical planarizing of semiconductor wafer using polishing solution to form microelectronic substrate |
| 07/30/2002 | US6425804 Pressurized delivery system for abrasive particulate material |
| 07/30/2002 | US6425802 Apparatus for supplying flush fluid |
| 07/25/2002 | WO2001089767A3 A chemical-mechanical polishing system for the manufacture of semiconductor devices |
| 07/25/2002 | US20020098702 Apparatus and methods for chemical-mechanical polishing of semiconductor wafers |
| 07/23/2002 | US6423638 Filter apparatus and method therefor |
| 07/23/2002 | US6422067 Slurry useful for wire-saw slicing and evaluation of slurry |
| 07/18/2002 | WO2002056356A1 Polishing method, polishing device, and semiconductor device producing method |
| 07/16/2002 | US6419567 Retaining ring for chemical-mechanical polishing (CMP) head, polishing apparatus, slurry cycle system, and method |
| 07/11/2002 | WO2002053490A2 Method of making optical fluoride laser crystal components |
| 07/11/2002 | WO2002053320A2 Wafer support for chemical mechanical planarization |
| 07/11/2002 | WO2002053273A2 Process and apparatus for blending and distributing a slurry solution |
| 07/11/2002 | US20020090893 Method for improving curvature of the polished surface by chemical mechanical polishing |
| 07/10/2002 | CN1087493C Process for polishing semiconductor substrate |
| 07/04/2002 | WO2002051955A1 Prevention of precipitation defects on copper interconnects during cmp by use of solutions containing organic compounds with silica adsorption and copper corrosion inhibiting properties |
| 07/04/2002 | WO2002051589A1 Method and apparatus for chemical-mechanical polishing (cmp) using upstream and downstream fluid dispensing means |
| 07/04/2002 | US20020086617 Rotary union for semiconductor wafer applications |
| 07/04/2002 | US20020085447 Process and apparatus for blending and distributing a slurry solution |
| 07/04/2002 | US20020083650 Polishing of semiconductor substrates |
| 07/03/2002 | EP1218565A1 Cemented carbide wear part and lapping method |
| 07/03/2002 | EP1218465A1 Polishing system with stopping compound and method of its use |
| 07/03/2002 | EP1218464A1 Chemical mechanical polishing systems and methods for their use |
| 07/03/2002 | EP1218082A1 Process and filter for filtering a slurry |
| 07/03/2002 | CN1356369A Apparatus for preparing grinding liquid |
| 07/03/2002 | CN1356184A Transfer apparatus and method for recovering solid substance |
| 07/02/2002 | US6413873 System for chemical mechanical planarization |
| 07/02/2002 | US6413288 CMP polishing slurry dewatering and reconstitution |
| 07/02/2002 | US6413154 Polishing apparatus |
| 07/02/2002 | US6413151 CMP slurry recycling apparatus and method for recycling CMP slurry |
| 06/26/2002 | EP1217322A2 Heat Exchanger |
| 06/26/2002 | EP1216316A1 Polishing of fluoride crystal optical lenses and preforms using cerium oxide for microlithography |
| 06/26/2002 | EP1216118A1 Polishing pad treatment for surface conditioning |
| 06/25/2002 | US6410441 Auto slurry deliver fine-tune system for chemical-mechanical-polishing process and method of using the system |
| 06/25/2002 | US6409936 Integrated circuit; corundum abrasive particles; etchant; nonionic surfactant brij (polyoxyethylene cetyl ether) |
| 06/25/2002 | US6409579 Method and apparatus for conditioning a polish pad at the point of polish and for dispensing slurry at the point of polish |
| 06/20/2002 | US20020077047 Barrel polishing apparatus |
| 06/20/2002 | US20020076932 Method of polishing or planarizing a substrate |
| 06/19/2002 | CN2495411Y Automatic device for dropping liquid grinding agent |
| 06/18/2002 | US6407000 Microelectronics |
| 06/18/2002 | US6406364 Polishing solution feeder |
| 06/13/2002 | US20020072310 Abrasive liquid feed apparatus, method for feeding additive to abrasive liquid feed apparatus, and polishing apparatus |
| 06/13/2002 | US20020069967 Planarizing machines and methods for mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies |
| 06/12/2002 | EP1212789A1 Polishing mixture and process for reducing incorporation of copper into silicon wafers |
| 06/11/2002 | US6402884 Planarizing solutions, planarizing machines and methods for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies |
| 06/11/2002 | US6402602 Rotary union for semiconductor wafer applications |
| 06/11/2002 | US6402599 Slurry recirculation system for reduced slurry drying |
| 06/06/2002 | WO2002043923A1 Cleaning device for cleaning polishing cloths used for polishing semiconductor wafers |
| 06/06/2002 | US20020068516 Apparatus and method for controlled delivery of slurry to a region of a polishing device |
| 06/06/2002 | US20020068508 Directional flow control valve with recirculation for chemical-mechanical polishing slurries |
| 06/05/2002 | EP1210395A1 Compositions for insulator and metal cmp and methods relating thereto |
| 06/04/2002 | US6399501 Method and apparatus for detecting polishing endpoint with optical monitoring |
| 06/04/2002 | US6398627 Slurry dispenser having multiple adjustable nozzles |
| 05/30/2002 | US20020065022 Polishing solution supply system, method of supplying polishing solution, apparatus for and method of polishing semiconductor substrate and method of manufacturing semiconductor device |
| 05/23/2002 | US20020061722 Apparatus for producing polishing solution and apparatus for feeding the same |
| 05/23/2002 | US20020061651 Polishing agent, method of producing same, and method of polishing |
| 05/21/2002 | US6390891 Method and apparatus for improved stability chemical mechanical polishing |
| 05/16/2002 | WO2002038335A1 Methods, apparatus and slurries for chemical mechanical planarization |
| 05/16/2002 | US20020056548 Heat exchanger |