Patents for B24B 57 - Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents (2,579)
03/2008
03/19/2008CN101143275A Bubble damper of slurry supply apparatus
03/13/2008US20080060525 Bubble damper of slurry supply apparatus
03/12/2008CN100374245C Grinding liquid reusing device and system thereof
03/06/2008US20080057831 Double face polishing apparatus
03/05/2008EP1894675A1 Double face polishing apparatus
03/05/2008EP1893385A1 Process and apparatus for treating exhausted abrasive slurries for the recovery of their reusable components
03/05/2008CN101134289A Apparatus of treating grinding water for processing periphery of eyeglass lens
02/2008
02/28/2008US20080047667 Substrate holding apparatus and substrate polishing apparatus
02/21/2008WO2008020507A1 Method of recovering abrasive from abrasive slurry waste liquid and apparatus therefor
02/19/2008US7331844 Polishing method
02/14/2008US20080038998 Method for processing a substrate using multiple fluid distribtuions on a polishing surface
02/13/2008CN201020653Y Internal wall surface polishing device for small diameter thin wall metal pipes
02/13/2008CN101121243A Chemical and mechanical grinding method
02/13/2008CN101121239A Chemical and mechanical grinding bench chemical liquid supplying device
02/13/2008CN100368496C Polishing system and method of its use
02/06/2008CN201015843Y Multiposition rotary pilot valve
01/2008
01/30/2008CN101112751A Chemical mechanical lapping system and chemical mechanical lapping method
01/30/2008CN101112750A Collocation method of pipes for transferring the grinding fluid and the de-ionized water in the chemical and mechanical grinder
01/30/2008CN100364721C 流体混合装置及切削装置 Fluid mixing device and cutting device
01/24/2008US20080016783 Matrix Liquid for Producing a Chip Removal Suspension and Used as a Lubricating or Machining Liquid
01/23/2008EP1881524A1 Polishing slurry and polishing method
01/23/2008CN201009167Y Constant temperature conveyer of polishing solution
01/23/2008CN201009164Y Liquid supplying mechanism of abrasive disk brush
01/23/2008CN101108472A Slurry dispensing system and mehtod thereof
01/23/2008CN101108470A LCD glass grinder
01/02/2008CN100358697C Wire sawing apparatus
12/2007
12/20/2007DE19849025B4 Kurbelwellen-Schleifmaschine Crankshaft grinding machine
12/19/2007CN200991855Y Device for automatically dripping grinding liquid for grinding-polishing machine
12/18/2007US7309618 Method and apparatus for real time metal film thickness measurement
12/11/2007US7307023 Polishing method of Cu film and method for manufacturing semiconductor device
12/11/2007US7306508 Multi-wire saw
12/06/2007US20070281592 Vacuum-assisted pad conditioning system and method utilizing an apertured conditioning disk
12/05/2007CN200984707Y Improved blow head structure for chemical and mechanical grinder
12/04/2007US7305275 Material supply system in semiconductor device manufacturing plant
11/2007
11/28/2007CN200981191Y Optical accessory fine-grinding polishing machine
11/27/2007US7300877 Method of manufacturing a semiconductor device
11/27/2007US7300521 Wall scrubber for blown insulation
11/22/2007US20070270086 Polishing solution supply system, method of supplying polishing solution, apparatus for and method of polishing semiconductor substrate and method of manufacturing semiconductor device
11/21/2007EP1857225A1 Blasting device for premixed abrasive slurry
11/21/2007EP1856586A2 An apparatus for dispensing precise volumes of fluid
11/21/2007CN101073881A Automatic polishing-fluid dropper
11/15/2007US20070264908 Polishing solution supply system, method of supplying polishing solution, apparatus for and method of polishing semiconductor substrate and method of manufacturing semiconductor device
10/2007
10/24/2007EP1144155B1 Ultrasonic transducer slurry dispenser
10/17/2007CN100343958C Polishing pad having slurry utilization enhancing grooves
10/11/2007US20070238399 Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion
10/10/2007EP1584365B1 Transmitter for wireless control
10/02/2007US7276446 Planarizing solutions, planarizing machines and methods for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies
09/2007
09/27/2007US20070221615 Liquid supply method, liquid supply apparatus, substrate polishing apparatus, and method of measuring supply flow rate of liquid
09/26/2007CN100339183C Two-site polishing machine
09/20/2007WO2007105714A1 Method of recovering rare earth element from composition containing rare earth fluoride
09/19/2007CN101037585A Polishing fluid and polishing method
09/19/2007CN100337791C Automatic fluid-supplying polishing machine
09/13/2007US20070212988 Polishing apparatus
09/12/2007EP1830985A2 Polishing apparatus and polishing method
09/12/2007CN200945579Y Material dropping device of grinding buffing machine
09/05/2007CN100336179C Polishing fluid and polishing method
09/05/2007CN100335580C Polishing system with stopping compound and method of its use
08/2007
08/29/2007EP1826411A1 Rotary pump, hydrodynamic mixer with a rotary pump and use of the rotary pump to process fluids
08/21/2007US7258600 Vacuum-assisted pad conditioning system
08/21/2007US7258598 Polishing solution supply system, method of supplying polishing solution, apparatus for and method of polishing semiconductor substrate and method of manufacturing semiconductor device
08/14/2007US7255632 Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion
08/09/2007WO2007087831A1 'universal' barrier cmp slurry for use with low dielectric constant interlayer dielectrics
08/09/2007WO2007087830A1 Initiating chemical mechanical polishing with slurries having small abrasive particles
08/01/2007CN101010166A Method of polishing the inner peripheral end surfaces of substrates
08/01/2007CN101007394A Controlling method for adjusting paper running of paper filter
08/01/2007CN101007393A Reversible drive device with two single action cylinder implemented by closed abrasive
07/2007
07/31/2007US7249995 Apparatus and method for feeding slurry
07/25/2007EP1811005A1 Polishing system and method of its use
07/12/2007US20070161338 Wafer polishing apparatus and wafer polishing method
07/05/2007US20070155294 Chemical mechanical polishing system
07/03/2007US7238090 Polishing apparatus having a trough
06/2007
06/27/2007CN1986158A Separating collector and collecting method for waste chemico-mechanical polishing liquid
06/21/2007US20070141845 Apparatus and method for supplying chemicals
06/19/2007US7232363 Polishing solution retainer
06/19/2007US7232360 Uninterrupted abrasive fluid supply
06/14/2007US20070135022 Apparatus for reduction of defects in wet procssed layers
06/13/2007CN2910478Y Automatic polishing cream applicator
06/07/2007US20070128982 Bubble suppressing flow controller with ultrasonic flow meter
06/06/2007EP1197293B1 Polishing device and method
05/2007
05/29/2007US7224064 Semiconductor device having conductive interconnections and porous and nonporous insulating portions
05/29/2007US7223344 Method for treating an exhausted glycol-based slurry
05/23/2007EP1347824B1 Process and apparatus for blending and distributing a slurry solution
05/23/2007CN1966210A Polishing apparatus and method of polishing work
05/18/2007WO2007054125A1 A system and method for removing particles from a polishing pad
05/17/2007US20070111639 Slurry supply unit for CMP apparatus
05/17/2007US20070108067 Polishing apparatus and method of polishing work
05/16/2007EP1785228A1 Apparatus and method for polishing work using electrolytic reduced water
05/09/2007EP1633527A4 Vacuum-assisted pad conditioning system and method utilizing an apertured conditioning disk
05/08/2007US7214125 Method for controlling pH during planarization and cleaning of microelectronic substrates
05/01/2007US7210989 Planarizing machines and methods for dispensing planarizing solutions in the processing of microelectronic workpieces
04/2007
04/26/2007US20070093064 Polishing method of Cu film and method for manufacturing semiconductor device
04/26/2007US20070090040 Flow control device for drain lines of a septic system interrupts flow in the event the proximate water table rises to a level of over-saturation resulting in the effluent flow being directed to the remaining drain lines; each drain line is provided with control box having float controlled inlet valve
04/24/2007US7208417 Apparatus and method for supplying chemicals
04/18/2007EP1226220B1 Polishing system and method of its use
04/18/2007CN1947945A Equipment for chemical-mechanical polishing, method for washing its polishing pad and flattening method
04/17/2007US7204679 Flow control system
04/03/2007US7198729 Slurry capable of reducing scratches on a region to be polished during Chemical Mechanical Polishing
03/2007
03/28/2007CN2882902Y Two-way driving gear realized by two acting cylinders through closed abrasive materials
03/27/2007US7195546 Polishing apparatus and method of polishing work piece
03/22/2007US20070066200 Perforation and grooving for polishing articles
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