| Patents for B24B 57 - Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents (2,579) |
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| 03/21/2007 | CN1305547C Filter and using method thereof |
| 03/15/2007 | DE19839086B4 Rückhaltering für eine chemisch-mechanische Poliervorrichtung und chemisch-mechanische Poliervorrichtung damit Retaining ring for a chemical mechanical polishing apparatus, and chemical-mechanical polishing apparatus so that |
| 03/13/2007 | US7189146 Method for reduction of defects in wet processed layers |
| 03/01/2007 | US20070049183 Chemical-mechanical polishing apparatus and method of conditioning polishing pad |
| 02/28/2007 | EP1756253A1 Matrix liquid for producing a chip removal suspension, and used as a lubricating or machining liquid |
| 02/27/2007 | US7182668 Methods for analyzing and controlling performance parameters in mechanical and chemical-mechanical planarization of microelectronic substrates |
| 02/21/2007 | CN1915595A Method for batch processing polishing fluid in situ for chemico-mechanical polishing metal, and equipment utilized |
| 02/20/2007 | US7180591 Semiconductor processors, sensors, semiconductor processing systems, semiconductor workpiece processing methods, and turbidity monitoring methods |
| 02/14/2007 | CN1914004A Multi-step pad conditioning system and method for chemical planarization |
| 02/14/2007 | CN1299878C Apparatus for preparing grinding liquid |
| 02/06/2007 | US7172492 Polishing method and polishing system |
| 01/25/2007 | WO2007010717A1 Double side polishing method for wafer |
| 01/23/2007 | US7166018 Apparatus and method for feeding slurry |
| 01/23/2007 | US7166015 Apparatus and method for controlling fluid material composition on a polishing pad |
| 01/18/2007 | US20070015443 Semiconductor processor systems, systems configured to provide a semiconductor workpiece process fluid, semiconductor workpiece processing methods, methods of preparing semiconductor workpiece process fluid, and methods of delivering semiconductor workpiece process fluid to a semiconductor processor |
| 01/18/2007 | DE10323743B4 Freilegemasse, Freilegeverfahren und Freilegevorrichtung Uncovering compound, uncovering process and uncovering apparatus |
| 01/16/2007 | US7163438 Zone polishing using variable slurry solid content |
| 01/16/2007 | US7163053 Heat exchanger |
| 01/11/2007 | US20070007012 Flow completion system |
| 01/03/2007 | CN2853282Y Polishing equipment for ceramic product |
| 12/28/2006 | WO2006137098A1 Process and apparatus for treating exhausted abrasive slurries for the recovery of their reusable components |
| 12/28/2006 | CA2613475A1 Process and apparatus for treating exhausted abrasive slurries for the recovery of their reusable components |
| 12/26/2006 | US7153425 Process and filter for filtering a slurry |
| 12/26/2006 | US7153196 Method of polishing using a polishing agent |
| 12/06/2006 | CN1288093C Elimination method of eliminated article |
| 12/05/2006 | US7144312 Scratch removal tool and system |
| 12/05/2006 | US7144301 Method and system for planarizing integrated circuit material |
| 11/29/2006 | EP1726402A1 Wafer polishing apparatus and method for polishing wafers |
| 11/28/2006 | US7140955 Polishing apparatus |
| 11/23/2006 | US20060264157 Wafer polishing apparatus and method for polishing wafers |
| 11/22/2006 | CN1285979C Automatic control device and method for grinding slurry feed arm |
| 11/21/2006 | US7138073 Slurry for chemical mechanical polishing for copper and method of manufacturing semiconductor device using the slurry |
| 11/14/2006 | US7134947 Chemical mechanical polishing system |
| 11/09/2006 | US20060249134 Multi-wire saw |
| 11/08/2006 | CN2834785Y Liquid dripping device for metallographic polishing machine |
| 11/02/2006 | US20060246821 Method for controlling polishing fluid distribution |
| 11/02/2006 | EP1715979A2 Multi-step, in-situ pad conditioning system and method for chemical mechanical planarization |
| 10/31/2006 | US7128803 Integration of sensor based metrology into semiconductor processing tools |
| 10/26/2006 | US20060241006 Contains abrasive grains such as magnesium oxide (MnO, MnO2, Mn2O3, Mn3O4), with hydrogen peroxide as solvent, washing with hydrofluoric acid solution, spin drying |
| 10/26/2006 | DE10023002B4 Satz von Läuferscheiben sowie dessen Verwendung Set of carriers and the use thereof |
| 10/25/2006 | CN1852787A Chemical mechanical polishing (CMP) head, apparatus, and method and planarized semiconductor wafer produced thereby |
| 10/18/2006 | CN1280077C Method for separation, regeneration and reuse of exhausted glycol-based slurry |
| 10/17/2006 | US7122475 Methods for using bi-modal abrasive slurries for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies |
| 10/12/2006 | US20060229001 Exposing substance, exposing method, and exposing device |
| 10/12/2006 | US20060228991 Polishing method and apparatus |
| 10/11/2006 | EP1626838B1 Exposing substance, exposing method, and exposing device |
| 10/10/2006 | US7118456 Polishing head, retaining ring for use therewith and method fo polishing a substrate |
| 10/10/2006 | US7118455 Semiconductor workpiece processing methods |
| 10/10/2006 | US7118447 Semiconductor workpiece processing methods |
| 10/10/2006 | US7118445 Semiconductor workpiece processing methods, a method of preparing semiconductor workpiece process fluid, and a method of delivering semiconductor workpiece process fluid to a semiconductor processor |
| 09/28/2006 | US20060217049 Perforation and grooving for polishing articles |
| 09/28/2006 | US20060217039 Polishing apparatus and method of polishing work piece |
| 09/27/2006 | CN1839015A Apparatus and method for controlling film thickness and fluid material composition on a polishing pad |
| 09/20/2006 | CN1833821A Abrasive liquid feeder and abrasive liquid mixing method of chemical machinery abrasive machine |
| 09/19/2006 | US7108580 Method and device for simulation, method and device for polishing, method and device for preparing control parameters or control program, polishing system, recording medium, and method of manufacturing semiconductor device |
| 09/14/2006 | US20060205325 Material for purification of semiconductor polishing slurry, module for purification of semiconductor polishing slurry and process for producing semiconductor polishing slurry |
| 09/13/2006 | CN2815609Y Spiral-slice automatic drooling device |
| 09/13/2006 | CN2815608Y Sedimentation tank capable of efficiently purifying feed pulp |
| 09/13/2006 | CN2815607Y Auto-controlled feed pulp discharging device |
| 09/07/2006 | US20060199480 Apparatus and method for feeding slurry |
| 09/06/2006 | CN1828840A Multipurpose slurry delivery arm for chemical mechanical polishing |
| 09/05/2006 | US7101252 Polishing method and apparatus |
| 08/31/2006 | US20060194525 Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion |
| 08/29/2006 | US7097544 Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion |
| 08/29/2006 | US7096937 Flow completion system |
| 08/24/2006 | DE10157452B4 Verfahren zum chemisch-mechanischen Polieren von Wafern A method for chemical mechanical polishing of wafers |
| 08/23/2006 | EP1693152A1 Apparatus for finishing edge-strips of plate-like workpieces |
| 08/08/2006 | US7086933 Flexible polishing fluid delivery system |
| 08/03/2006 | WO2006054732A3 Polishing apparatus and polishing method |
| 08/02/2006 | EP1685927A1 Multi-wire saw |
| 07/27/2006 | WO2006076827A1 Blasting device for premixed abrasive slurry |
| 07/26/2006 | CN1807016A Method and system for lowering impurity content in abrasive slurry |
| 07/20/2006 | US20060160470 Methods and apparatuses for analyzing and controlling performance parameters in mechanical and chemical-mechanical planarization of microelectronic substrates |
| 07/18/2006 | US7077730 Method and apparatus for polishing a workpiece |
| 07/12/2006 | EP1536920B1 Polishing pad |
| 07/06/2006 | US20060148374 Transmitter for wireless control |
| 07/04/2006 | US7071108 Chemical mechanical polishing slurry containing abrasive particles exhibiting photocatalytic function |
| 07/04/2006 | US7070486 Polishing apparatus and method of polishing work piece |
| 07/04/2006 | US7070485 Polishing composition |
| 07/04/2006 | US7069988 Flow completion system |
| 06/28/2006 | CN1795074A Vacuum-assisted pad conditioning system and method utilizing an apertured conditioning disk |
| 06/27/2006 | US7066800 Conductive polishing article for electrochemical mechanical polishing |
| 06/21/2006 | EP1322450B1 Activated slurry cmp system and methods for implementing the same |
| 06/21/2006 | EP1278935B1 Tubing head seal assembly |
| 06/21/2006 | EP1180068B1 Method and device for rounding edges |
| 06/21/2006 | CN2788966Y 研磨机 Grinder |
| 06/21/2006 | CN1791497A Method for cleaning sic particles |
| 06/15/2006 | US20060128286 Polishing apparatus |
| 06/13/2006 | US7059948 Articles for polishing semiconductor substrates |
| 06/13/2006 | US7059943 Method and apparatus for recycling slurry |
| 06/07/2006 | CN1781971A Polishing composition |
| 06/01/2006 | WO2005072338A3 Multi-step pad conditioningh system and method for chemical planarization |
| 06/01/2006 | US20060112647 Polishing composition |
| 05/31/2006 | CN1780901A Slurry for slicing silicon ingot and method for slicing silicon ingot using same |
| 05/30/2006 | US7054719 System and method for point of use delivery, control and mixing chemical and slurry for CMP/cleaning system |
| 05/30/2006 | US7052620 Polishing slurry for aluminum-based metal, and method of manufacturing semiconductor device |
| 05/30/2006 | US7052599 Method and apparatus for reuse of abrasive fluid used in the manufacture of semiconductors |
| 05/30/2006 | US7052377 Apparatus and method for feeding slurry |
| 05/30/2006 | US7052371 Vacuum-assisted pad conditioning system and method utilizing an apertured conditioning disk |
| 05/24/2006 | EP1370392B1 Random-orbit head with lock-up feature |