| Patents for B24B 57 - Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents (2,579) |
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| 03/24/2005 | DE10338520A1 Method for separating material splitting suspension of cooling lubricant, containing cutting grain and dispersed worked material abraded particles, with suspension treated with gas |
| 03/16/2005 | CN1192905C Method for making offset printing plate supporting body, offset printing plate supporting body and offset printing plate |
| 03/15/2005 | US6866784 Slurry recycling system and method for CMP apparatus |
| 03/15/2005 | US6866567 Activated slurry CMP system and methods for implementing the same |
| 03/10/2005 | US20050051913 Fluid mixing device and cutting device |
| 03/03/2005 | US20050048882 Polishing apparatus and method |
| 03/03/2005 | US20050048880 Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion |
| 02/24/2005 | US20050040050 Polishing apparatus |
| 02/22/2005 | US6857940 Electrodes configured to apply pressure to a fluid including dielectric abrasive particles on the workpiece and arrange the particles uniformly by a Coulomb force produced by applying an alternating current voltage; antiagglomerants |
| 02/17/2005 | DE19929929B4 Verfahren und Vorrichtung zum chemisch-mechanischen Polieren von Halbleiterscheiben Method and apparatus for chemical mechanical polishing of semiconductor wafers |
| 02/16/2005 | CN1189924C System for controlling instant-compensuted grinded curved surface |
| 02/15/2005 | US6855035 Apparatus and method for producing substrate with electrical wire thereon |
| 02/15/2005 | US6855031 Slurry flow rate monitoring in chemical-mechanical polisher using pressure transducer |
| 02/15/2005 | US6855030 Modular method for chemical mechanical planarization |
| 02/15/2005 | US6854484 Valve for a slurry outlet opening of a chemical mechanical polishing device and chemical mechanical polishing device having a valve |
| 02/09/2005 | EP1505639A1 Polishing fluid and polishing method |
| 02/08/2005 | US6852632 Method of polishing a multi-layer substrate |
| 02/03/2005 | US20050026551 Method to improve control in CMP processing |
| 02/03/2005 | US20050026549 Zone polishing using variable slurry solid content |
| 02/03/2005 | US20050026547 Semiconductor processor control systems, semiconductor processor systems, and systems configured to provide a semiconductor workpiece process fluid |
| 02/01/2005 | US6849547 Apparatus and process for polishing a workpiece |
| 02/01/2005 | US6849542 Method for manufacturing a semiconductor device that includes planarizing with a grindstone that contains fixed abrasives |
| 01/27/2005 | WO2005007342A1 Polishing apparatus |
| 01/27/2005 | US20050020194 Method and apparatus for polishing a workpiece |
| 01/27/2005 | US20050016936 Process and filter for filtering a slurry |
| 01/27/2005 | US20050016861 On a semiconductor wafer with an insulating layer of a field region and a plurality of features, forming a barrier layer overlying the field region; electrodepositing copper filling the features in the insulating layer, polishing to remove the copper layer and the barrier layer from the field region |
| 01/25/2005 | US6846227 Electro-chemical machining appartus |
| 01/20/2005 | WO2005005102A1 Application of heated slurry for cmp |
| 01/20/2005 | US20050011840 Process and filter for filtering a slurry |
| 01/13/2005 | US20050005629 Anti-stratification-solution delivery system for spin-on dielectrics |
| 01/11/2005 | US6840971 Chemical mechanical polishing systems and methods for their use |
| 01/11/2005 | US6840847 Device for polishing digital storage discs |
| 01/11/2005 | US6840846 Polishing station of a chemical mechanical polishing apparatus |
| 01/06/2005 | US20050003745 Apparatus and method for feeding slurry |
| 01/06/2005 | US20050003666 CMP slurry and method of manufacturing semiconductor device |
| 01/05/2005 | CN1561376A Polishing composition |
| 01/04/2005 | US6838149 Abrasive article for the deposition and polishing of a conductive material |
| 12/30/2004 | US20040266327 Conductive polishing article for electrochemical mechanical polishing |
| 12/30/2004 | US20040266321 Method and apparatus to add slurry to a polishing system |
| 12/30/2004 | US20040266319 Method and apparatus for measuring and controlling solids composition of a magnetorheological fluid |
| 12/30/2004 | US20040266192 Application of heated slurry for CMP |
| 12/29/2004 | WO2004113023A1 Chemical-solution supplying apparatus |
| 12/29/2004 | WO2004113022A1 Apparatus and method for controlling the film thickness on a polishing pad |
| 12/29/2004 | WO2004097929A3 Method and apparatus for reduction of defects in wet processed layers |
| 12/28/2004 | US6835117 Endpoint detection in chemical-mechanical polishing of patterned wafers having a low pattern density |
| 12/23/2004 | WO2004112091A2 Vacuum-assisted pad conditioning system and method utilizing an apertured conditioning disk |
| 12/23/2004 | US20040259482 Chemical mechanical polishing apparatus and method of chemical mechanical polishing |
| 12/21/2004 | US6833046 Planarizing machines and methods for mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies |
| 12/16/2004 | DE10323743A1 Freilegemasse, Freilegeverfahren und Freilegevorrichtung Uncovering compound, uncovering process and uncovering apparatus |
| 12/15/2004 | EP1486308A2 Process for the correction treatment of the pulp in a granite-cutting unit |
| 12/09/2004 | US20040248418 Fabrication method of semiconductor integrated circuit device |
| 12/09/2004 | US20040248411 Method and device for simulation, method and device for polishing, method and device for preparing control parameters or control program, polishing system, recording medium, and method of manufacturing semiconductor device |
| 12/07/2004 | US6827638 Polishing device and method |
| 12/07/2004 | US6827634 Ultra fine particle film forming method and apparatus |
| 12/02/2004 | WO2004103640A1 Exposing substance, exposing method, and exposing device |
| 12/02/2004 | US20040242127 Apparatus and method for feeding slurry |
| 12/02/2004 | US20040242126 CMP apparatus, CMP polishing method, semiconductor device and its manufacturing method |
| 12/02/2004 | US20040241989 Method of using multiple, different slurries in a CMP polishing process via a pad conditioning system |
| 11/25/2004 | DE19925696B4 Vorrichtung und Verfahren zum Filtern eines CMP-Breis Device and method for filtering a CMP slurry |
| 11/25/2004 | DE19905583B4 Vorrichtung für die Zufuhr flüssiger Hilfsmittel mit abrasiven Bestandteilen bei der Feinbearbeitung optischer Flächen Apparatus for supplying liquid containing abrasive tools for precision machining of optical surfaces |
| 11/24/2004 | CN2657856Y Super-precision free abrasive material honing machine |
| 11/23/2004 | US6821895 Dynamically adjustable slurry feed arm for wafer edge profile improvement in CMP |
| 11/23/2004 | US6821437 Forming reusable cutting fluid; complete removal of abrasive grains and attrition material |
| 11/18/2004 | US20040229551 Systems for making and using bi-modal abrasive slurries for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies |
| 11/18/2004 | US20040229549 Slurry delivery arm |
| 11/11/2004 | WO2004097929A2 Method and apparatus for reduction of defects in wet processed layers |
| 11/11/2004 | US20040222100 Process and system for providing electrochemical processing solution with reduced oxygen and gas content |
| 11/10/2004 | EP1474729A1 System and method for point of use delivery, control and mixing chemical and slurry for cmp/cleaning system |
| 11/09/2004 | US6814835 Apparatus and method for supplying chemicals in chemical mechanical polishing systems |
| 11/04/2004 | WO2004078410A3 Agent for increasing selection ratio of polishing rates |
| 11/04/2004 | US20040219867 Apparatus and method for controlling fluid material composition on a polishing pad |
| 11/04/2004 | DE10230146B4 Verfahren zum Bearbeiten eines scheibenförmigen Werkstückes A method for processing a disk-shaped workpiece |
| 11/02/2004 | US6811583 Polishing composition for a substrate for a magnetic disk and polishing method employing it |
| 11/02/2004 | US6811473 Process for machining a wafer-like workpiece |
| 11/02/2004 | US6811468 Polishing apparatus |
| 10/28/2004 | US20040214508 Apparatus and method for controlling film thickness in a chemical mechanical planarization system |
| 10/27/2004 | CN2650941Y Lapping liquid tank |
| 10/21/2004 | US20040209549 Planarizing machines and methods for dispensing planarizing solutions in the processing of microelectronic workpieces |
| 10/21/2004 | US20040209548 Planarizing machines and methods for dispensing planarizing solutions in the processing of microelectronic workpieces |
| 10/19/2004 | US6805615 Particle size distribution comprising ceria, alumina, titania, and/or tantalum oxide; abrasive slurry |
| 10/14/2004 | US20040203327 Grinding apparatus with splash protector and improved fluid delivery system |
| 10/13/2004 | EP1465750A1 Abrasive article for the deposition and polishing of a conductive material |
| 10/13/2004 | CN1537037A Multiport polishing fluid delivery system |
| 10/13/2004 | CN1170903C Ta barrier slurry containing organic additive |
| 10/12/2004 | US6802983 Preparation of high performance silica slurry using a centrifuge |
| 10/12/2004 | US6802762 Method for supplying slurry to polishing apparatus |
| 10/07/2004 | US20040199293 System and method for point of use delivery, control and mixing chemical and slurry for CMP/cleaning system |
| 10/07/2004 | US20040198195 Apparatuses for making and using bi-modal abrasive slurries for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies |
| 10/07/2004 | US20040198194 Methods for using bi-modal abrasive slurries for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies |
| 10/07/2004 | US20040198190 Method and apparatus for reduction of defects in wet processed layers |
| 10/07/2004 | US20040198184 Planarizing machines and methods for dispensing planarizing solutions in the processing of microelectronic workpieces |
| 10/07/2004 | US20040198183 Turbidity monitoring methods, apparatuses, and sensors |
| 10/07/2004 | US20040194937 Heat exchanger |
| 10/07/2004 | US20040194336 Pressure vessel systems and methods for dispensing liquid chemical compositions |
| 09/30/2004 | WO2004084287A1 Material for purification of semiconductor polishing slurry, module for purification of semiconductor polishing slurry and process for producing semiconductor polishing slurry |
| 09/30/2004 | WO2004030860A3 Flow control system |
| 09/30/2004 | US20040192176 Methods and apparatuses for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies on planarizing pads |
| 09/30/2004 | US20040192174 Method for controlling PH during planarization and cleaning of microelectronic substrates |
| 09/30/2004 | US20040188244 Electro-chemical machining apparatus |
| 09/30/2004 | US20040188083 Flow completion system |