| Patents for B24B 57 - Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents (2,579) |
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| 03/25/2004 | US20040055998 Method for providing a smooth wafer surface |
| 03/23/2004 | US6709313 Apparatus for producing polishing solution and apparatus for feeding the same |
| 03/18/2004 | US20040053570 Novel finishing pad design for multidirectional use |
| 03/18/2004 | US20040052154 Chemical solution feeding apparatus and method for preparing slurry |
| 03/17/2004 | CN1482943A Process and apparatus for blending and distributing a slurry solution |
| 03/16/2004 | US6706140 Control system for in-situ feeding back a polish profile |
| 03/16/2004 | US6705928 Through-pad slurry delivery for chemical-mechanical polish |
| 03/11/2004 | US20040048555 Apparatus for processing a lens and process for processing a lens |
| 03/11/2004 | US20040048550 Modular method for chemical mechanical planarization |
| 03/10/2004 | CN1141202C Retaining device for grinded basilar plate |
| 03/04/2004 | WO2002053320A9 Wafer support for chemical mechanical planarization |
| 03/04/2004 | US20040043709 Process for machining a wafer-like workpiece |
| 03/04/2004 | US20040043708 Grinding apparatus with splash protector and improved fluid delivery system |
| 03/03/2004 | CN1479665A Actived slurry chemical mechanical planarization system and method for implenting the same |
| 02/25/2004 | EP1390184A1 Method for treating an exhausted glycol-based slurry |
| 02/19/2004 | WO2004014607A1 A method of polishing a wafer of material |
| 02/18/2004 | EP1389506A1 Automatic metallographic polishing apparatus |
| 02/18/2004 | EP1389152A1 Delivery system for magnetorheological fluid |
| 02/18/2004 | CN1139106C Equipment and method for transporting substrate mechanical polishing and grinding suspension |
| 02/17/2004 | US6692339 Combined chemical mechanical planarization and cleaning |
| 02/12/2004 | DE10235017A1 Vorrichtung zum Polieren von digitalen Speicherscheiben An apparatus for polishing digital storage discs |
| 02/12/2004 | DE10010287B4 Verfahren zur Herstellung von flüssigen Gemischen für das chemisch-mechanische Polieren von Wafern Process for the preparation of liquid mixtures for chemical mechanical polishing of wafers |
| 02/10/2004 | US6688953 Barrel polishing apparatus |
| 02/05/2004 | WO2003068405A3 Granular material recovery system |
| 02/05/2004 | US20040023605 Device for polishing digital storage discs |
| 02/03/2004 | US6685796 CMP uniformity |
| 02/03/2004 | US6685543 Compensating chemical mechanical wafer polishing apparatus and method |
| 01/29/2004 | US20040018801 Lens stocking device and lens processing system having the same |
| 01/28/2004 | EP1250390B1 Composition and method for planarizing surfaces |
| 01/28/2004 | EP1234009B1 Composition and method for planarizing surfaces |
| 01/27/2004 | US6682409 Wafer carrier structure for chemical-mechanical polisher |
| 01/27/2004 | US6681850 Flow completion system |
| 01/22/2004 | WO2003034804A3 Preparation of high performance silica slurry using a centrifuge |
| 01/22/2004 | WO2003022519A3 Slurry distributor for chemical mechanical polishing apparatus and method of using the same |
| 01/22/2004 | US20040014403 CMP point of use filtration |
| 01/22/2004 | US20040014319 Prevention of precipitation defects on copper interconnects during cpm by use of solutions containing organic compounds with silica adsorption and copper corrosion inhibiting properties |
| 01/22/2004 | US20040011462 Method and apparatus for applying differential removal rates to a surface of a substrate |
| 01/22/2004 | DE10230146A1 Verfahren zum Bearbeiten eines scheibenförmigen Werkstückes A method for processing a disk-shaped workpiece |
| 01/21/2004 | CN1469794A Methods, apparatus and slurries for chemical mechanical planarization |
| 01/21/2004 | CN1468685A Method for processing disc-shaped workpieces |
| 01/20/2004 | US6679765 Slurry supply system disposed above the rotating platen of a chemical mechanical polishing apparatus |
| 01/20/2004 | US6679764 Supply system for chemicals and its use |
| 01/15/2004 | WO2002053273A8 Process and apparatus for blending and distributing a slurry solution |
| 01/15/2004 | US20040007592 Precision liquid mixing apparatus and method |
| 01/13/2004 | US6676496 Apparatus for processing semiconductor wafers |
| 01/08/2004 | WO2004003987A1 Contamination remover |
| 01/08/2004 | WO2004003986A1 Method and apparatus for applying differential removal rates to a surface of a substrate |
| 01/08/2004 | US20040005845 Polishing method and apparatus |
| 01/07/2004 | CN1133510C Regenerating treater for waste liquid of inorganic abradant |
| 01/06/2004 | US6672946 Methods and apparatuses for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies on planarizing pads |
| 01/06/2004 | US6672940 Surface polishing slurry cooling system |
| 01/02/2004 | EP1375065A1 Lens stocking device and lens processing system having the same |
| 01/01/2004 | US20040002292 Polishing apparatus, polishing method and method of manufacturing semiconductor device |
| 01/01/2004 | US20040002171 Method and apparatus for real time metal film thickness measurement |
| 12/30/2003 | US6669536 Method of making optical fluoride laser crystal components |
| 12/30/2003 | US6669534 Surface treatment of oxidizing materials |
| 12/25/2003 | US20030236056 Polishing station of a chemical mechanical polishing apparatus |
| 12/24/2003 | WO2003107408A1 Polisher |
| 12/23/2003 | US6666748 Machining center and method of changing tools thereof |
| 12/17/2003 | EP1370392A1 Random-orbit head with lock-up feature |
| 12/17/2003 | CN1462064A Chemical-mechanical machine for grinding chip material, and abrasive material supply equipment installed on the machine |
| 12/16/2003 | US6663474 Apparatus and system of chemical mechanical polishing |
| 12/16/2003 | US6663472 Multiple step CMP polishing |
| 12/11/2003 | US20030228830 System for manufacturing a semiconductor device, polishing slurry feeder and method for manufacturing a semiconductor device |
| 12/11/2003 | US20030226378 Slurry for and method of texturing surface of glass substrate |
| 12/10/2003 | CN1460574A Slurry cyclic method |
| 12/09/2003 | US6659849 Platen with debris control for chemical mechanical planarization |
| 12/09/2003 | US6659848 Slurry dispenser that outputs a filtered slurry to a chemical-mechanical polisher at a constant flow rate over the lifetime of the filter |
| 12/09/2003 | US6659634 Chemical solution feeding apparatus and method for preparing slurry |
| 12/04/2003 | US20030224706 Foam buffing/polishing pad |
| 12/03/2003 | EP1366859A1 Polishing apparatus and method |
| 12/03/2003 | EP1366856A2 Apparatus for processing a lens and a process for processing a lens |
| 12/02/2003 | US6657726 In situ measurement of slurry distribution |
| 12/02/2003 | US6656359 Slurry effluent agglomerated grains are crushed using a mill, ultrasonic oscillation, or pressurized circulation |
| 12/02/2003 | US6656020 Polishing apparatus and polishing method |
| 12/02/2003 | US6655455 Flow completion system |
| 11/27/2003 | US20030220055 Slurry recycling method |
| 11/27/2003 | US20030217518 Abrasive, a method of polishing with the abrasive, and a method of washing a polished object |
| 11/25/2003 | US6652366 Dynamic slurry distribution control for CMP |
| 11/25/2003 | US6652365 Methods and apparatuses for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies on planarizing pads |
| 11/25/2003 | US6652364 Methods and apparatuses for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies on planarizing pads |
| 11/20/2003 | US20030216112 Cleaning device and method for cleaning polishing cloths used for polishing semiconductor wafers |
| 11/20/2003 | US20030213558 Chemical mechanical polishing endpoint detection |
| 11/18/2003 | US6648738 Grinding fluid supply device of lens grinding apparatus |
| 11/18/2003 | US6648736 Methods and apparatuses for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies on planarizing pads |
| 11/13/2003 | US20030211743 Method for avoiding slurry sedimentation in CMP slurry delivery systems |
| 11/13/2003 | US20030209523 Planarization by chemical polishing for ULSI applications |
| 11/06/2003 | US20030207656 Slurry homogenizer and supply system |
| 11/06/2003 | US20030207654 Polishing device and polishing method for semiconductor wafer |
| 11/06/2003 | US20030207582 Use of low-high slurry flow to eliminate copper line damages |
| 11/06/2003 | US20030205484 Electrochemical/ mechanical polishing |
| 11/05/2003 | EP1358045A1 Pressure vessel systems and methods for dispensing liquid chemical compositions |
| 11/04/2003 | US6641631 Controlling pH of an aqueous polishing composition having abrasive particles of a metal oxide that provides ions upon dissolution; equilibrium concentration of said ions at said pH, which avoids drift of said pH |
| 11/04/2003 | US6641468 Slurry distributor |
| 11/04/2003 | US6641462 Method and apparatus for distributing fluid to a polishing surface during chemical mechanical polishing |
| 10/30/2003 | WO2002018101A9 Chemical mechanical polishing (cmp) head, apparatus, and method and planarized semiconductor wafer produced thereby |
| 10/28/2003 | US6638148 Methods and apparatuses for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies on planarizing pads |
| 10/23/2003 | US20030199229 Flexible polishing fluid delivery system |
| 10/23/2003 | US20030199227 Methods of preparing semiconductor workpiece process fluid and semiconductor workpiece processing methods |
| 10/22/2003 | EP1210395B1 Compositions for insulator and metal cmp and methods relating thereto |