| Patents for B24B 57 - Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents (2,579) |
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| 05/10/2006 | CN1771586A Material for purification of semiconductor polishing slurry, module for purification of semiconductor polishing slurry and process for producing semiconductor polishing slurry |
| 05/09/2006 | US7041599 High through-put Cu CMP with significantly reduced erosion and dishing |
| 05/09/2006 | US7040967 Multi-step, in-situ pad conditioning system and method for chemical mechanical planarization |
| 05/03/2006 | CN1254518C Cerium-based polishing material slurry and method for manufacturing the same |
| 05/02/2006 | CA2403860C Tubing head seal assembly |
| 04/13/2006 | US20060079156 Method for processing a substrate using multiple fluid distributions on a polishing surface |
| 04/13/2006 | DE10160174B4 Chemisch/mechanische Polieraufschlämmung und chemisch/mechanischer Polierprozeß und Seichtgraben-Isolationsprozeß unter Verwendung des Polierprozesses Chemical / mechanical polishing slurry and chemical / mechanical polishing process and shallow trench isolation process using the polishing process |
| 04/12/2006 | CN2770876Y Automatic abrasive-cleaning device for grinding-polishing machine |
| 04/11/2006 | US7025662 Arrangement of a chemical-mechanical polishing tool and method of chemical-mechanical polishing using such a chemical-mechanical polishing tool |
| 03/30/2006 | US20060068684 Polishing method and polishing system |
| 03/29/2006 | EP1638734A1 Apparatus and method for controlling the film thickness on a polishing pad |
| 03/28/2006 | US7018274 Polishing pad having slurry utilization enhancing grooves |
| 03/15/2006 | EP1633527A2 Vacuum-assisted pad conditioning system and method utilizing an apertured conditioning disk |
| 03/09/2006 | DE10308064B4 Poliermittelzuführung bei CMP-Prozessen Slurry supplying in CMP processes |
| 03/02/2006 | WO2006022414A1 Method of polishing the inner peripheral end surfaces of substrates for a recording medium using a brush |
| 02/22/2006 | EP1626838A1 Exposing substance, exposing method, and exposing device |
| 02/22/2006 | CN2759686Y Slime rough grinding equipment |
| 02/16/2006 | US20060035562 System and a method for polishing optical connectors |
| 02/16/2006 | US20060032148 Method of manufacturing polishing slurry for use in precise polishing process |
| 02/16/2006 | DE19937784B4 Zweischeiben-Feinschleifmaschine Two slices of fine grinding |
| 02/08/2006 | CN2756388Y Polishing liquid supply controller |
| 02/08/2006 | CN1731567A IC copper interconnect one-step chemical machinery burnishing technics and relevant nanometer burnishing liquid |
| 02/08/2006 | CN1240802C Cerium based abrasive material and method for preparation thereof |
| 02/07/2006 | US6995091 Process for chemically mechanically polishing wafers |
| 02/07/2006 | US6994613 Grinding apparatus with splash protector and improved fluid delivery system |
| 02/02/2006 | US20060025051 Wire sawing apparatus |
| 02/01/2006 | EP1621595A1 Method of manufacturing polishing slurry for use in precise polishing process |
| 02/01/2006 | EP1620238A1 Method for cleaning sic particles |
| 02/01/2006 | EP1242557B8 Method of polishing or planarizing a substrate |
| 02/01/2006 | CN1729082A 流动控制系统 Flow control system |
| 02/01/2006 | CN1727167A Wire sawing apparatus |
| 02/01/2006 | CN1727116A Non-contact type hydrojet grinding head in use for digital controlled polishing |
| 02/01/2006 | CN1727033A Oil separating structure and its system using the same |
| 02/01/2006 | CN1239665C Polishing compound and method for preparation thereof, and polishing method |
| 02/01/2006 | CN1239243C Process and apparatus for blending and distributing a slurry solution |
| 01/31/2006 | US6991515 Ultra fine particle film forming method and apparatus |
| 01/24/2006 | US6988942 Conductive polishing article for electrochemical mechanical polishing |
| 01/19/2006 | US20060014479 Arrangement of a chemical-mechanical polishing tool and method of chemical-mechanical polishing using such a chemical-mechanical polishing tool |
| 01/19/2006 | US20060011585 Method for controlling ph during planarization and cleaning of microelectronic substrates |
| 01/18/2006 | CN2751971Y Automatic supplying liquid polisher |
| 01/18/2006 | CN2751970Y Two-station polishing machine |
| 01/11/2006 | EP1614505A1 Polishing device and method |
| 01/10/2006 | US6984166 Zone polishing using variable slurry solid content |
| 01/05/2006 | US20060002283 Method for producing glass substrate for information recording medium, polishing apparatus and glass substrate for information recording medium |
| 01/05/2006 | DE102005007368A1 Schmierend wirkende Polymer-Wasser-Mischung Lubricating acting polymer-water mixture |
| 12/29/2005 | WO2005123888A1 Matrix liquid for producing a chip removal suspension, and used as a lubricating or machining liquid |
| 12/29/2005 | US20050287930 Uninterrupted abrasive fluid supply |
| 12/28/2005 | EP1610365A1 Material for purification of semiconductor polishing slurry, module for purification of semiconductor polishing slurry and process for producing semiconductor polishing slurry |
| 12/28/2005 | CN1713967A Chemical-solution supplying apparatus |
| 12/28/2005 | CN1713941A Transmitter for wireless control |
| 12/27/2005 | US6979650 Fabrication method of semiconductor integrated circuit device |
| 12/27/2005 | US6979251 Method and apparatus to add slurry to a polishing system |
| 12/27/2005 | CA2403866C Tubing hanger with annulus bore |
| 12/22/2005 | WO2004078412A3 Grinding apparatus with splash protector and improved fluid delivery system |
| 12/22/2005 | US20050282472 CMP apparatus and method for polishing multiple semiconductor wafers on a single polishing pad using multiple slurry delivery lines |
| 12/21/2005 | CN1711153A Glass substrate for information recording medium and making method thereof |
| 12/21/2005 | CN1232383C Abrasive liquid feeder of lens abrasive working apparatus |
| 12/15/2005 | US20050277372 Zone polishing using variable slurry solid content |
| 12/13/2005 | US6974364 Methods and apparatuses for analyzing and controlling performance parameters in mechanical and chemical-mechanical planarization of microelectronic substrates |
| 12/08/2005 | US20050272352 Slurry delivery arm |
| 12/07/2005 | EP1602444A2 Polishing method |
| 12/07/2005 | CN1705725A Corrosion retarding polishing slurry for the chemical mechanical polishing of copper surfaces |
| 12/07/2005 | CN1230481C Polishing composition of magnetic disk substrate and polishing method using said composition |
| 12/01/2005 | WO2005113194A1 Method and apparatus for measuring and controlling solids composition of a magnetorheological fluid |
| 11/16/2005 | CN1227073C Transfer apparatus |
| 11/15/2005 | US6964602 Methods and apparatuses for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies on planarizing pads |
| 11/10/2005 | WO2005069951A3 Scratch removal tool and system |
| 11/10/2005 | US20050250419 High selectivity slurry delivery system |
| 11/02/2005 | CN1225408C Abrasive recovering apparatus |
| 10/26/2005 | EP1242557B1 Method of polishing or planarizing a substrate |
| 10/25/2005 | US6958005 Polishing pad conditioning system |
| 10/18/2005 | US6955764 Method and apparatus for preparing slurry for CMP apparatus |
| 10/18/2005 | US6955589 Delivery system for magnetorheological fluid |
| 10/13/2005 | US20050227597 Mobile pavement marking removal apparatus |
| 10/13/2005 | US20050226746 Dispensing apparatus for a fluid |
| 10/12/2005 | EP1584365A1 Transmitter for wireless control |
| 10/11/2005 | US6953750 Methods and systems for controlling belt surface temperature and slurry temperature in linear chemical mechanical planarization |
| 10/11/2005 | US6953391 Methods for reducing slurry usage in a linear chemical mechanical planarization system |
| 10/11/2005 | US6953388 Polishing pad, and method and apparatus for polishing |
| 10/11/2005 | US6953385 System, method, and apparatus for non-traditional kinematics/tooling for efficient charging of lapping plates |
| 10/06/2005 | US20050221731 Polishing pad conditioning system |
| 10/06/2005 | US20050221724 Polishing apparatus and method of polishing a subject |
| 10/04/2005 | US6951597 Dynamic polishing fluid delivery system for a rotational polishing apparatus |
| 10/04/2005 | US6951512 Chemical mechanical polishing apparatus and method of chemical mechanical polishing |
| 09/29/2005 | WO2005090001A1 Liquid supplying apparatus, polishing apparatus and semiconductor device manufacturing method |
| 09/28/2005 | EP1579956A2 Polishing apparatus and polishing method |
| 09/28/2005 | CN1672876A Polishing apparatus and method of polishing a subject |
| 09/28/2005 | CN1220742C Use of CsOH in dielectric CMP slurry |
| 09/27/2005 | US6949466 CMP apparatus and method for polishing multiple semiconductor wafers on a single polishing pad using multiple slurry delivery lines |
| 09/22/2005 | US20050205207 Polishing apparatus and method for manufacturing semiconductor device |
| 09/21/2005 | CN1219628C Scroll saw and its cutting method |
| 09/20/2005 | US6947862 Method for simulating slurry flow for a grooved polishing pad |
| 09/20/2005 | US6945854 Semiconductor device fabrication method and apparatus |
| 09/20/2005 | US6945521 Fluid mixing device and cutting device |
| 09/07/2005 | CN1666321A Method and apparatus for applying differential removal rates to a surface of a substrate |
| 09/07/2005 | CN1665641A Novel finishing pad design for multidirectional use |
| 09/07/2005 | CN1217767C Activated slurry CMP system and methods for implementing the same |
| 09/06/2005 | US6939210 Slurry delivery arm |
| 09/06/2005 | US6939204 feeding an amount of slurry and preventing a work piece from sticking on an upper abrasive plate |
| 08/31/2005 | EP1567606A1 A corrosion retarding polishing slurry for the chemical mechanical polishing of copper surfaces |