| Patents for B24B 57 - Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents (2,579) |
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| 01/29/2003 | EP1149051B1 Sludge-free treatment of copper cmp wastes |
| 01/28/2003 | US6511368 Spherical drive assembly for chemical mechanical planarization |
| 01/23/2003 | WO2002018101A3 Chemical mechanical polishing (cmp) head, apparatus, and method and planarized semiconductor wafer produced thereby |
| 01/23/2003 | US20030017791 Grinding water tank unit for use in processing eyeglass lens, device for separating processing debris, and eyeglass lens processing apparatus having the tank unit or device |
| 01/23/2003 | US20030017784 Method for improving thickness uniformity on a semiconductor wafer during chemical mechanical polishing |
| 01/21/2003 | US6508695 Polishing a semiconductor wafer, |
| 01/16/2003 | US20030013391 Polishing apparatus |
| 01/16/2003 | US20030013385 Nitride CMP slurry having selectivity to nitride |
| 01/15/2003 | EP1274540A1 Polishing method using a rehydrated dry particulate polishing composition |
| 01/15/2003 | CN1098746C Chemical mechanical polishing apparatus and method of chemical mechanical polishing |
| 01/14/2003 | US6506098 Self-cleaning slurry arm on a CMP tool |
| 01/09/2003 | WO2003002302A1 Method and apparatus for distributing fluid to a polishing surface during chemical mechanical polishing |
| 01/09/2003 | US20030008603 Grinding water tank unit for use in processing eyeglass lens, device for separating processing debris, and eyeglass lens processing apparatus having the tank unit or device |
| 01/08/2003 | EP1273391A1 Eyeglass lens processing apparatus |
| 01/08/2003 | EP1272311A1 Integrated chemical-mechanical polishing |
| 01/08/2003 | CN1390248A Composition and method for planarizing surfaces |
| 01/07/2003 | US6503418 Ta barrier slurry containing an organic additive |
| 01/07/2003 | US6503129 Activated slurry CMP system and methods for implementing the same |
| 01/03/2003 | WO2003000460A1 Method of making light transmitting optical fluoride crystals |
| 01/02/2003 | US20030004085 Comprises a component for rendering a water-insoluble compound containing a metal atom or its ion separated from a surface to be polished water-soluble |
| 01/02/2003 | US20030003857 Polishing pad, and method and apparatus for polishing |
| 01/02/2003 | US20030003851 Method and apparatus for recycling slurry |
| 01/02/2003 | US20030003850 Method and apparatus for distributing fluid to a polishing surface during chemical mechanical polishing |
| 01/02/2003 | US20030003747 Slurry of ceric ammonium nitrate ((NH4)2Ce(NO3)6) providing improved polishing speed under low pressure in one step; deposited as a barrier film for a capacitor using barium strontium titanate as a dielectric layer; semiconductors |
| 01/02/2003 | EP1268681A2 Method for repairing and lustering defects on hydrophilic coat surface |
| 01/02/2003 | EP1268132A1 Method and apparatus for fixed-abrasive substrate manufacturing and wafer polishing in a single process path |
| 12/31/2002 | US6500058 Clogging-free drain system installed in a cutting apparatus |
| 12/31/2002 | US6500049 Lapping oil composition for finish-grinding |
| 12/27/2002 | WO2002102919A1 Polishing slurry for use in texturing surface of glass substrate and method |
| 12/27/2002 | WO2001074537A9 Method and apparatus for fixed-abrasive substrate manufacturing and wafer polishing in a single process path |
| 12/26/2002 | US20020197937 Method to increase removal rate of oxide using fixed-abrasive |
| 12/25/2002 | CN1387556A Use of CsOH in dielectric CMP slurry |
| 12/19/2002 | US20020193051 Apparatus and method for producing substrate with electrical wire thereon |
| 12/19/2002 | US20020189813 Flow completion system |
| 12/18/2002 | EP1266956A1 Composition for washing a polishing pad and method for washing a polishing pad |
| 12/17/2002 | US6494257 Flow completion system |
| 12/12/2002 | US20020187735 Polishing apparatus |
| 12/12/2002 | US20020187731 In-situ pad and wafer cleaning during chemical mechanical polishing |
| 12/12/2002 | US20020187728 Polishing device and method |
| 12/12/2002 | US20020186613 Apparatus and method for supplying chemicals |
| 12/12/2002 | US20020185628 Composition and method of formation and use therefor in chemical-mechanical polishing |
| 12/11/2002 | EP1263906A1 Polishing composition |
| 12/11/2002 | CN1384860A Ta barrier slurry containing organic additive |
| 12/11/2002 | CN1384061A Abrasive recovering apparatus |
| 12/05/2002 | WO2002096611A1 Method for treating an exhausted glycol-based slurry |
| 12/05/2002 | US20020182868 Reduction of surface roughness during chemical mechanical planarization (CMP) |
| 12/04/2002 | EP1261453A1 Polishing method for soft acrylic articles |
| 12/03/2002 | US6488566 System for real-time control of semiconductor wafer polishing |
| 12/03/2002 | US6488039 State of the art constant flow device |
| 11/28/2002 | WO2002094503A1 Delivery system for magnetorheological fluid |
| 11/28/2002 | US20020177392 Delivery system for magnetorheological fluid |
| 11/26/2002 | US6485355 Method to increase removal rate of oxide using fixed-abrasive |
| 11/21/2002 | US20020173253 Wafer carrier structure for chemical-mechanical polisher |
| 11/21/2002 | US20020173249 Dynamic slurry distribution control for cmp |
| 11/21/2002 | US20020173239 Polishing-washing method |
| 11/21/2002 | US20020173233 Modular controlled platen preparation system and method |
| 11/21/2002 | US20020173232 Multizone slurry delivery for chemical mechanical polishing tool |
| 11/20/2002 | EP1257511A1 FUSED Al 2?O 3?-RARE EARTH OXIDE EUTECTIC ABRASIVE PARTICLES, ABRASIVE ARTICLES, AND METHODS OF MAKING AND USING THE SAME |
| 11/19/2002 | US6482325 Apparatus and process for separation and recovery of liquid and slurry abrasives used for polishing |
| 11/19/2002 | US6482290 Sweeping slurry dispenser for chemical mechanical polishing |
| 11/14/2002 | WO2002089951A1 Process for regenerating a filtration cartridge for filtering a slurry |
| 11/14/2002 | US20020168926 Apparatus and process for recovering abrasive |
| 11/13/2002 | CN1379803A Improved CMP products |
| 11/06/2002 | EP0790101B1 Shape control method and nc machine using the method |
| 11/05/2002 | US6475071 Cross flow slurry filtration apparatus and method |
| 11/05/2002 | US6475066 Random-orbit head with concentric lock-up feature |
| 10/31/2002 | US20020160698 Electro-chemical machining apparatus |
| 10/30/2002 | EP1252651A2 Chemical-mechanical polishing method |
| 10/30/2002 | EP1252248A1 Polishing compositions for noble metals |
| 10/30/2002 | EP1252247A1 Polishing compositions for semiconductor substrates |
| 10/24/2002 | US20020155720 Fluid flow variations; rotation; calibration |
| 10/24/2002 | US20020155650 Reducing defects by polishing with aqueous solvents |
| 10/23/2002 | EP1250982A2 Polishing-washing method |
| 10/23/2002 | EP1250390A1 Composition and method for planarizing surfaces |
| 10/22/2002 | US6468134 Method and apparatus for slurry distribution |
| 10/17/2002 | US20020151259 Polishing apparatus |
| 10/17/2002 | DE10160174A1 Chemical/mechanical polishing slurry, used in producing shallow trench insulation in silicon wafer with oxide and nitride coatings, comprises abrasive particles in aqueous solution containing two different passivating agents |
| 10/16/2002 | CN1092544C Apparatus for dispensing slurry |
| 10/15/2002 | US6464741 CMP polishing slurry dewatering and reconstitution |
| 10/15/2002 | US6464566 Apparatus and method for linearly planarizing a surface of a semiconductor wafer |
| 10/15/2002 | US6464564 System for real-time control of semiconductor wafer polishing |
| 10/15/2002 | US6464562 System and method for in-situ monitoring slurry flow rate during a chemical mechanical polishing process |
| 10/15/2002 | US6464561 System for real-time control of semiconductor wafer polishing |
| 10/15/2002 | US6464560 System for real-time control of semiconductor wafer polishing |
| 10/10/2002 | US20020146908 Apparatus and process for polishing a workpiece |
| 10/10/2002 | US20020146907 Method and apparatuses for making and using bi-modal abrasive slurries for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies |
| 10/09/2002 | EP1246879A1 A ta barrier slurry containing an organic additive |
| 10/08/2002 | US6461230 Chemical-mechanical polishing method |
| 10/03/2002 | WO2002060643A3 Spherical drive assembly for chemical mechanical planarization |
| 10/03/2002 | US20020142708 Method and apparatus for polishing an aluminum vehicle wheel |
| 10/01/2002 | US6458020 Slurry recirculation in chemical mechanical polishing |
| 10/01/2002 | US6458012 Polishing apparatus |
| 10/01/2002 | US6457852 Apparatus and method for supplying chemicals |
| 09/25/2002 | EP1242557A1 Method of polishing or planarizing a substrate |
| 09/24/2002 | US6454637 Edge instability suppressing device and system |
| 09/24/2002 | US6454636 Method and apparatus for supplying coolant in a grinding machine |
| 09/19/2002 | WO2002053273A3 Process and apparatus for blending and distributing a slurry solution |
| 09/19/2002 | US20020132567 Apparatus and system of chemical mechanical polishing |
| 09/18/2002 | CN1370209A Polishing system with stopping compound and method of its use |
| 09/18/2002 | CN1370208A Chemical mechanical polishing systems and methods for their use |