Patents for B24B 37 - Lapping machines or devices; Accessories (20,836)
11/1996
11/13/1996CN1135397A Chip-polishing device
11/12/1996US5573448 Method of polishing wafers, a backing pad used therein, and method of making the backing pad
11/06/1996EP0665817A4 Oxide particles and method for producing them.
11/05/1996US5571373 Method of rough polishing semiconductor wafers to reduce surface roughness
11/05/1996US5571044 Wafer holder for semiconductor wafer polishing machine
10/1996
10/31/1996WO1996033842A1 A polishing cloth and a method for attaching/detaching the polishing cloth to/from a base plate of a polishing machine
10/30/1996EP0739687A2 Polishing apparatus and polishing method
10/30/1996EP0739686A2 Method and apparatus for polishing metal-soluble materials such as diamond
10/29/1996US5569062 Apparatus for polishing a workpiece
10/26/1996CA2169392A1 Method and apparatus for polishing metal-soluble materials such as diamond
10/24/1996WO1996033047A1 Lapping machine
10/23/1996EP0738561A1 Apparatus and method for in-situ endpoint detection and monitoring for chemical mechanical polishing operations
10/16/1996EP0737547A1 Polishing pad structure and composition and method of fabricating a polishing pad for chemical-mechanical polishing and method of polishing a semiconductor substrate surface
10/16/1996EP0737546A2 Apparatus for holding substrate to be polished and apparatus and method for polishing substrate
10/15/1996US5564965 Polishing member and wafer polishing apparatus
10/11/1996CA2173639A1 Apparatus for holding substrate to be polished and apparatus and method for polishing substrate
10/10/1996WO1996031316A1 Method and apparatus for reconditioning digital recording discs
10/09/1996CN2236925Y 不锈钢磨花抛光装置 Polished stainless spent grinding device
10/09/1996CN1132676A Apparatus for polishing dielectric layer formed on substrate
10/08/1996US5562530 Pulsed-force chemical mechanical polishing
10/08/1996US5562529 Apparatus and method for uniformly polishing a wafer
10/08/1996US5562524 Polishing apparatus
10/03/1996WO1996030163A1 A wafer retainer for retaining a wafer to be polished and a method for attaching/detaching the wafer retainer to/from a base plate of a polishing machine
10/02/1996EP0734883A1 Method for treating surface of an aluminum support for printing plate
09/1996
09/26/1996WO1996024839A3 Method and apparatus for predicting process characteristics of polyurethane pads
09/25/1996EP0733436A1 Lap structure of a lapping tool
09/24/1996US5558568 Wafer polishing machine with fluid bearings
09/24/1996US5558563 Method and apparatus for uniform polishing of a substrate
09/24/1996US5558111 Apparatus and method for carrier backing film reconditioning
09/17/1996US5556323 Insertion a distal end of waveguides into ferrule and polishing
09/10/1996US5554065 For polishing wafers
09/10/1996US5554064 Orbital motion chemical-mechanical polishing apparatus and method of fabrication
09/03/1996US5552996 Method and system using the design pattern of IC chips in the processing thereof
09/03/1996US5551907 System for ultrasonic lap grinding and polishing
09/03/1996US5551136 Pad removal device
08/1996
08/28/1996EP0728055A1 Grinding/polishing cover sheet for placing on a rotatable grinding/polishing disc
08/28/1996CN1129743A Cylinder liner comprising a supereutectic aluminium/silicon alloy for sealing into a crankcase of a reciprocating piston engine and method of producing such a cylinder liner
08/27/1996US5549511 Variable travel carrier device and method for planarizing semiconductor wafers
08/27/1996US5549502 Polishing apparatus
08/22/1996WO1996025270A1 Abrasive-free selective chemo-mechanical polish for tungsten
08/21/1996CN2233302Y Automatic gem and jade lapper
08/20/1996US5547417 Method and apparatus for conditioning a semiconductor polishing pad
08/20/1996US5547415 Method and apparatus for wafer chamfer polishing
08/15/1996WO1996024839A2 Method and apparatus for predicting process characteristics of polyurethane pads
08/15/1996WO1996024467A1 Chemical-mechanical polishing using curved carriers
08/15/1996WO1996024466A1 Chemical-mechanical polishing of thin materials using a pulse polishing technique
08/06/1996US5542874 Wafer polishing apparatus
07/1996
07/31/1996EP0723653A1 Polishing device with specimen-holder
07/30/1996US5540973 Magnetic recording medium and a method for manufacturing such medium
07/30/1996US5540810 Integrated circuit semiconductors with multilayered substrate from slurries
07/24/1996CN1127426A Chemical-mechanical polisher and a process for polishing
07/23/1996US5538465 Elastic foamed sheet and wafer-polishing jig using the sheet
07/17/1996CN1127006A Fluororesin foam and process for producing the same
07/16/1996US5536202 Semiconductor substrate conditioning head having a plurality of geometries formed in a surface thereof for pad conditioning during chemical-mechanical polish
07/10/1996CN1126455A Improved polishing pads and methods for their use
07/09/1996US5534106 Apparatus for processing semiconductor wafers
07/09/1996US5533924 Polishing apparatus, a polishing wafer carrier apparatus, a replacable component for a particular polishing apparatus and a process of polishing wafers
07/09/1996US5533923 Chemical-mechanical polishing pad providing polishing unformity
06/1996
06/20/1996DE4444721A1 IC engine with crankcase
06/18/1996US5527424 Plate composed of rigid and chemically neutral polymer having three intersecting ridges on surface that extend radially outward from center
06/18/1996US5527423 Chemical mechanical polishing slurry for metal layers
06/18/1996US5527215 Foam buffing pad having a finishing surface with a splash reducing configuration
06/18/1996US5527209 Wafer polisher head adapted for easy removal of wafers
06/13/1996WO1996017711A1 Polishing apparatus with indexing wafer processing stations
06/12/1996CN1124504A Improved compositions and methods for polishing
06/11/1996US5525191 Process for polishing a semiconductor substrate
06/06/1996WO1996016769A1 Method of aligning a diamond during cutting and a device for carrying out said method (variants)
06/05/1996DE19540626A1 Mirror polishing device for semiconductor wafers
06/05/1996CN1123728A Continuously grinding method for thin stone plate
06/04/1996US5522965 Semiconductors
05/1996
05/30/1996WO1996015887A1 Polishing pads and methods for their manufacture
05/30/1996DE19543867A1 Anfas-Schleifanlage für einen Wafer und Verfahren zum Anfas-Schleifen hierfür Chamfering grinding system for a wafer and method for chamfering grinding this
05/29/1996EP0713897A1 Fluororesin foam and process for producing the same
05/28/1996US5520573 Spherical member polishing apparatus
05/14/1996US5516400 Techniques for assembling polishing pads for chemical-mechanical polishing of silicon wafers
05/07/1996US5514245 Method for chemical planarization (CMP) of a semiconductor wafer to provide a planar surface free of microscratches
05/02/1996DE4438550A1 Zylinderlaufbüchse aus einer übereutektischen Aluminium/Silizium-Legierung zum Eingießen in ein Kurbelgehäuse einer Hubkolbenmaschine und Verfahren zur Herstellung einer solchen Zylinderlaufbüchse Cylinder liner from a hypereutectic aluminum / silicon alloy for casting into a crankcase of a reciprocating engine and method of producing such a cylinder liner
05/02/1996DE19538991A1 Mirror polishing device for semiconductor wafer surface
05/01/1996EP0709166A1 Chemical-mechanical polisher and a process for polishing
04/1996
04/24/1996EP0708160A2 Chemical mechanical polishing slurry for metal layers
04/23/1996US5510175 Nonwoven cloth of polyvinyl alcohol filaments bonded with microporous aromatic polysulfone; nonclogging, wear resistance
04/18/1996WO1996011082A1 Chemical mechanical polishing slurry for metal layers
04/17/1996EP0706857A1 Wafer polishing machine
04/17/1996EP0706856A1 Polishing pad cluster for polishing a semiconductor wafer
04/17/1996EP0706855A2 Wafer polishing machine
04/17/1996EP0706854A1 Wafer holder for semiconductor wafer polishing machine
04/17/1996EP0706582A1 Improved compositions and methods for polishing
04/11/1996WO1996010463A1 Process and device for thoroughly cleaning surfaces
04/11/1996DE19522525A1 Verfahren und Vorrichtung zum Feinstreinigen von Oberflächen Method and apparatus for Feinstreinigen of surfaces
04/10/1996CN2224063Y Portable valve-grinding machine
04/03/1996EP0703847A1 Magnetorheological polishing devices and methods
04/02/1996US5503592 Gemstone working apparatus
03/1996
03/28/1996WO1996002319A3 Chemical slurry mixing apparatus and method
03/27/1996CN1119339A In situ monitoring technique and apparatus for chemical/mechanical planarization endpoint detection
03/20/1996EP0701499A1 Improved polishing pads and methods for their use
03/14/1996WO1996007508A1 Grinding/polishing cover sheet for placing on a rotatable grinding/polishing disc
03/12/1996US5498199 Wafer polishing method and apparatus
03/12/1996US5498196 Computer controlled apparatus for polishing a surface of a thin material
03/06/1996EP0699504A1 Method and apparatus for surface-grinding of workpiece
03/05/1996US5496387 Binder precursor dispersion method of making abrasive articles made from reduced viscosity slurries, and method of reducing sedimentation rate of mineral particles