| Patents for B24B 37 - Lapping machines or devices; Accessories (20,836) |
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| 07/18/1995 | US5433650 Method for polishing a substrate |
| 07/13/1995 | WO1995018697A1 Device for conditioning polishing pads |
| 06/28/1995 | EP0660377A1 Method for applying a wafer to a mount plate |
| 06/28/1995 | CN2202010Y Grinding head with steel handle for finishing |
| 06/21/1995 | EP0658401A1 Polishing member and wafer polishing apparatus |
| 06/14/1995 | EP0521102B1 Apparatus for interlayer planarization of semiconductor material |
| 06/13/1995 | US5424133 Process for the preparation of substrate surfaces for adhesive bonding |
| 06/13/1995 | US5423558 Semiconductor wafer carrier and method |
| 06/07/1995 | EP0656031A1 Polymeric substrate with polymeric microelements |
| 06/06/1995 | US5422316 Semiconductor wafer polisher and method |
| 06/06/1995 | US5421770 Device for guiding a workpiece or tool in the machining of toric or spherical surfaces of optical lenses on grinding or polishing machines |
| 06/06/1995 | US5421769 Apparatus for planarizing semiconductor wafers, and a polishing pad for a planarization apparatus |
| 05/31/1995 | EP0655772A2 Method and apparatus for scrubbing substrate |
| 05/31/1995 | CN2199008Y Lapping machine for arc stone material |
| 05/31/1995 | CN1028670C In situ monitoring technique and apparatus for chemical/mechanical planarization endpoint detection |
| 05/24/1995 | CN2198070Y Device for grinding small punching head of coreless grinder |
| 05/23/1995 | US5417346 Process and apparatus for electronic control of the transfer and delivery of high purity chemicals |
| 05/17/1995 | EP0653270A1 Method of polishing semiconductor wafers and apparatus therefor |
| 05/17/1995 | CN2197168Y Aligning and rotating unit of centreless grinder |
| 05/09/1995 | US5413941 Optical end point detection methods in semiconductor planarizing polishing processes |
| 05/03/1995 | EP0650806A1 Polishing apparatus of semiconductor wafer |
| 05/03/1995 | EP0650803A1 Method for the polishing and finishing of optical lenses |
| 04/30/1995 | CA2133259A1 Method for the polishing and finishing of optical lenses |
| 04/27/1995 | DE4336441A1 Lapping machine for spheres (balls) |
| 04/25/1995 | US5409770 Elastic foamed sheet and wafer-polishing jig using the sheet |
| 04/19/1995 | EP0648575A1 Polishing apparatus |
| 04/18/1995 | US5407526 Chemical mechanical polishing slurry delivery and mixing system |
| 04/11/1995 | US5404680 Method for polishing slight area of surface of workpiece and tool therefor |
| 04/04/1995 | US5403228 Techniques for assembling polishing pads for silicon wafer polishing |
| 04/04/1995 | CA2036102C In situ monitoring technique and apparatus for chemical/mechanical planarization endpoint detection |
| 03/28/1995 | US5400548 Process for manufacturing semiconductor wafers having deformation ground in a defined way |
| 03/28/1995 | US5400547 Polishing machine and method of dissipating heat therefrom |
| 03/21/1995 | US5398459 Method and apparatus for polishing a workpiece |
| 03/15/1995 | CN2191746Y Grinding roller of lapper |
| 03/09/1995 | WO1995006544A1 Backing pad for machining operations |
| 03/08/1995 | CN2191063Y Special-shaped button grinding sticking rod |
| 03/07/1995 | US5394655 Semiconductor polishing pad |
| 02/21/1995 | US5391258 Compositions and methods for polishing |
| 02/15/1995 | EP0638391A1 Polishing pad and a process for polishing |
| 02/14/1995 | US5389579 Method for single sided polishing of a semiconductor wafer |
| 02/14/1995 | US5389352 Oxide particles and method for producing them |
| 02/08/1995 | EP0637619A1 An abrasive composition with an electrolytic water and a polishing process with the use of said abrasive composition |
| 02/07/1995 | US5386666 Automated system for controlling taper length during the lapping of air bearing surface of magnetic heads |
| 02/02/1995 | WO1995003252A1 Oxide particles and method for producing them |
| 02/01/1995 | EP0636671A1 Polishing material |
| 01/31/1995 | US5384986 Polishing apparatus |
| 01/17/1995 | US5381807 Method of stripping resists from substrates using hydroxylamine and alkanolamine |
| 01/05/1995 | WO1995000291A1 Ultra-precision lapping apparatus |
| 01/03/1995 | US5377451 Wafer polishing apparatus and method |
| 12/28/1994 | CN2186136Y Two-purpose machine for valve abrading |
| 12/28/1994 | CN1096898A Lapping fixture for disk sliders |
| 12/22/1994 | WO1994029077A1 Magnetorheological polishing devices and methods |
| 12/21/1994 | EP0629471A1 Method and apparatus for enhancing surface treatment of perforated materials |
| 12/08/1994 | WO1994028194A1 Improved compositions and methods for polishing |
| 12/06/1994 | US5370269 Process and apparatus for precise volumetric diluting/mixing of chemicals |
| 11/29/1994 | US5368619 Reduced viscosity slurries, abrasive articles made therefrom and methods of making said articles |
| 11/24/1994 | DE4316754A1 Method for the defined abrasive surface-treatment of bodies |
| 11/22/1994 | US5366542 Polishing composition |
| 11/22/1994 | US5365700 Apparatus and method for producing magnetic head sliders |
| 11/15/1994 | US5364655 Magnetic disk substrates |
| 11/09/1994 | EP0623423A1 Method for polishing a substrate |
| 11/08/1994 | US5361547 Ultimate inductive head integrated lapping system |
| 11/08/1994 | US5361545 Polishing machine |
| 11/02/1994 | EP0622155A1 Polishing pad and a method of polishing a semiconductor substrate |
| 10/26/1994 | CN2180405Y Semi-automatic moveable polishing decoration machine |
| 10/19/1994 | EP0620585A1 Apparatus and method for flattening an insulating layer by etching in a semiconductor device |
| 10/04/1994 | US5351360 Cleaning device for a wafer mount plate |
| 09/29/1994 | WO1994021551A1 Process and apparatus for precise volumetric diluting/mixing of chemicals |
| 09/29/1994 | DE4410787A1 Polishing method and polishing device |
| 09/21/1994 | EP0616362A2 Method for polishing work piece and apparatus therefor |
| 09/21/1994 | CN1092381A Platey alumina |
| 09/20/1994 | US5348615 Smoothing surface by compression against frozen layer of etchant; semiconductors |
| 09/07/1994 | EP0613933A2 Method of preparing substrate surfaces in order to bond, and abrasive material adapted to this use |
| 09/01/1994 | WO1994019153A1 Wafer polishing apparatus and method |
| 09/01/1994 | DE4306160A1 Vorrichtung zum Be- und Entladen von Zweischeiben-Läpp- und Honmaschinen Apparatus for loading and unloading of two-disc lapping and honing machines |
| 08/31/1994 | CN2175666Y Lapping disc for eccentric circle channel |
| 08/31/1994 | CN2175665Y Electric driven scrapping machine |
| 08/24/1994 | CN2175064Y Universal lapping machine for measuring tools |
| 08/23/1994 | CA1331521C Method and composition for polishing metal surfaces |
| 08/18/1994 | WO1994017957A1 Apparatus and method for polishing |
| 08/18/1994 | WO1994017956A1 Process for machining components made of brittle materials and a device for carrying out the same |
| 08/18/1994 | CA2155946A1 Process for machining components made of brittle materials and a device for carrying out the same |
| 08/17/1994 | CN2174296Y Electric double-side synchronous rubbing machine |
| 08/17/1994 | CN2174295Y Quick-acting finishing machine |
| 08/09/1994 | US5337015 In-situ endpoint detection method and apparatus for chemical-mechanical polishing using low amplitude input voltage |
| 08/09/1994 | US5335458 Processing of magnetic head flexures with slider elements |
| 08/09/1994 | US5335457 Method of chucking semiconductor wafers |
| 08/09/1994 | US5335453 Polishing machine having a taut microabrasive strip and an improved wafer support head |
| 08/03/1994 | EP0608730A1 Method of finely polishing planar optical elements |
| 08/03/1994 | CN2173138Y Pneumatic elastic finishing device |
| 08/02/1994 | US5334332 Mixture of hydroxylamine, alkanolamine and chelate compound |
| 08/02/1994 | US5333413 Automatic wafer lapping apparatus |
| 07/30/1994 | CA2111010A1 Method of finely polishing planar optical elements |
| 07/28/1994 | DE4307036C1 Accommodation device for workpieces to be finely machined |
| 07/19/1994 | US5330072 Process and apparatus for electronic control of the transfer and delivery of high purity chemicals |
| 07/19/1994 | US5329734 Polishing pads used to chemical-mechanical polish a semiconductor substrate |
| 07/19/1994 | US5329732 Wafer polishing method and apparatus |
| 07/12/1994 | US5328550 And metalllic impurities that lower the melting point and |
| 06/29/1994 | CN2170181Y Finishing machine |
| 06/28/1994 | US5324690 Semiconductor device having a ternary boron nitride film and a method for forming the same |