| Patents for B08B 7 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass (12,806) |
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| 04/29/2004 | US20040079396 Apparatus and method for treating surfaces of semiconductor wafers using ozone |
| 04/29/2004 | US20040079395 Nozzle for ejection of gas streams; rotation drive; controlling pressure |
| 04/29/2004 | US20040079388 Using supercritical carbon dioxide |
| 04/29/2004 | US20040079385 Method for removing particles from a semiconductor processing tool |
| 04/28/2004 | EP1412190A1 Method and device for cleaning using ultrasound |
| 04/28/2004 | CN1147751C Receptacle for electro-optical device |
| 04/27/2004 | US6727464 Method of manufacturing a motor vehicle antivibration device comprising a metal insert for bonding to elastomer |
| 04/27/2004 | US6726886 Apparatus for cleaning semiconductor device |
| 04/27/2004 | US6726777 Cleaning lower side of semiconductor wafer, held perpendicular to direction of gravity, by spraying cleaning fluid comprising aerosol containing argon particles upwards from below wafer, accelerating aerosol by fluid ejected from separate nozzle |
| 04/27/2004 | US6725564 Multistage semiconductor processing tool |
| 04/22/2004 | WO2004034757A1 Substrate cleaner |
| 04/22/2004 | US20040077162 Thermal activation of fluorine for use in a semiconductor chamber |
| 04/22/2004 | US20040074883 Method and apparatus for cleaning generator and turbine components |
| 04/22/2004 | US20040074029 Substrate cleaning apparatus and cleaning member |
| 04/21/2004 | EP1411388A1 A method of cleaning by removing particles from surfaces, a cleaning apparatus and a lithographic projection apparatus |
| 04/21/2004 | EP1410852A1 Method and apparatus for the removal of a polymer-based layer of paint |
| 04/21/2004 | EP1409992A2 Method and apparatus for improved process control in combustion applications |
| 04/21/2004 | EP1409169A1 Method and device for producing an aluminium film from an aluminium material |
| 04/20/2004 | US6723955 Cleaning system for welding torches which effects cleaning by means of cold temperature |
| 04/15/2004 | WO2004032200A2 Systems and methods for improved gas delivery |
| 04/15/2004 | WO2004031333A1 Cleaning agent and cleaning method for ridding titanium and titanium alloy building materials of discoloration |
| 04/15/2004 | WO2003023840A3 Methods and apparatus for cleaning and/or treating a substrate using co¿2? |
| 04/15/2004 | WO2002080213A9 Irradiation system and method |
| 04/15/2004 | US20040072706 Placing an object onto a support within a pressure chamber, pressurizing the chamber, cleaning, decompressing and venting |
| 04/15/2004 | US20040069610 System for in-situ generation of fluorine radicals and/or fluorine-containing interhalogen (XFn) compounds for use in cleaning semiconductor processing chambers |
| 04/15/2004 | US20040069320 Rotating articles within a chamber; applying a heated aqueous liquid; introducing ozone gas and carbon dioxide gas; introducing ozone gas and carbon dioxide gas into the chamber to effect cleaning |
| 04/13/2004 | US6719613 Methods for cleaning surfaces substantially free of contaminants utilizing filtered carbon dioxide |
| 04/13/2004 | CA2388913C Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent |
| 04/08/2004 | WO2004030037A2 System for in-situ generation of fluorine radicals and/or fluorine-containing interhalogen (xfn) compounds for use in cleaning semiconductor processing chambers |
| 04/08/2004 | WO2004029990A2 Surface treatment of concrete |
| 04/08/2004 | WO2004028713A1 Surface treatment of concrete |
| 04/08/2004 | WO2004028712A1 Surface treatment of concrete |
| 04/08/2004 | US20040065357 System for cleaning the interior of a concrete mixing drum |
| 04/08/2004 | US20040065345 Method for cleaning substrate |
| 04/08/2004 | US20040065344 Processing apparatus and cleaning method |
| 04/08/2004 | US20040065343 Sponge; low and frequency transducers contacting sponge surface; bubbling, vaporization |
| 04/08/2004 | US20040065256 Systems and methods for improved gas delivery |
| 04/07/2004 | EP1405662A2 CO2 recovery process for supercritical extraction |
| 04/07/2004 | EP1385642A4 Megazone system |
| 04/06/2004 | US6715498 For processing wafers in a hybrid supercritical fluid processing vessel |
| 04/06/2004 | US6715497 Treatment to eliminate polysilicon defects induced by metallic contaminants |
| 04/01/2004 | WO2004027810A2 System and method for removal of materials from an article |
| 04/01/2004 | WO2003106060A3 Device for cleaning the surface of a component |
| 04/01/2004 | US20040060579 Cleaning solution and method for cleaning ceramic parts using the same |
| 03/31/2004 | EP1402963A2 Processing of semiconductor components with dense processing fluids and ultrasonic energy |
| 03/31/2004 | CN1485150A Substrate processing device and rinsing apparatus |
| 03/30/2004 | US6712081 Pressure processing device |
| 03/30/2004 | US6712078 Apparatus for cleaning semiconductor wafer and method for cleaning wafer using the same |
| 03/30/2004 | US6711773 Dry cleaning detergent formulation consists of an organic cosolvent, low water content, and liquid carbon dioxide; turbulent conditions |
| 03/30/2004 | CA2388500C Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent |
| 03/25/2004 | WO2004025175A1 Uv-ray irradiator |
| 03/25/2004 | WO2004024025A1 Multi-motion stainbrush |
| 03/25/2004 | WO2003097259A3 Method and devices for cold plasma cleaning of the surface of a metal, ceramic or polymer workpiece |
| 03/25/2004 | US20040058622 Polish cleaning apparatus and method in manufacture of HGA |
| 03/25/2004 | US20040055708 Apparatus and method for in-situ cleaning of borosilicate (BSG) and borophosphosilicate (BPSG) films from CVD chambers |
| 03/25/2004 | US20040055624 Contactor article with high density fluid in sealed enclosure; supercritical extraction |
| 03/25/2004 | US20040055621 Separate sealed pressurized vessels; using critical fluid |
| 03/25/2004 | DE10036809B4 Vorrichtung und Verfahren zur Reinigung und/oder Behandlung von Oberflächen Apparatus and method for cleaning and / or treatment of surfaces |
| 03/24/2004 | EP1212252B1 Web guidance system |
| 03/23/2004 | US6710285 Laser system for slag removal |
| 03/23/2004 | US6708701 Capillary ring |
| 03/23/2004 | US6708700 Cleaning of semiconductor processing chambers |
| 03/23/2004 | US6708617 Traversing contact cleaning roller system |
| 03/17/2004 | EP1216391B1 Device, system and method for on-line explosive deslagging |
| 03/11/2004 | WO2004020694A1 Substrate processor and method of cleaning the same |
| 03/11/2004 | WO2003103726A3 Denaturing of a biochemical agent using an activated cleaning fluid mist |
| 03/11/2004 | WO2003062166A3 Treatment of organic pollution on an inorganic substrate |
| 03/11/2004 | US20040046260 Plasma treatment for copper oxide reduction |
| 03/11/2004 | US20040046131 System and method for reducing charged particle contamination |
| 03/11/2004 | US20040045806 Method and device for treating the surfaces of items |
| 03/11/2004 | US20040045802 Systems and methods for conditioning ultra high purity gas bulk containers |
| 03/11/2004 | US20040045667 Laser-driven cleaning using reactive gases |
| 03/11/2004 | US20040045588 Methods and compositions for etch cleaning microelectronic substrates in carbon dioxide |
| 03/11/2004 | US20040045579 Surface purification apparatus and surface purification method |
| 03/11/2004 | US20040045578 Selective preparation (cleaning and modification) of a critical substrate surface prior to, during, or following manufacturing and assembly operations such as coating, bonding, patterning, sealing, dicing, cutting, drilling, |
| 03/11/2004 | US20040045576 Plasma cleaning gas with lower global warming potential than SF6 |
| 03/11/2004 | US20040045575 Apparatus and method for processing a substrate |
| 03/11/2004 | DE29624481U1 Preliminary surface treatment of workpieces prior to lacquering etc. - with a stream of a reactive medium produced by plasma discharge combined with supply of a working gas |
| 03/10/2004 | CN1481580A Appts for cleaning edges of wafers |
| 03/09/2004 | US6701942 Method of and apparatus for removing contaminants from surface of a substrate |
| 03/09/2004 | US6701941 Method for treating the surface of a workpiece |
| 03/09/2004 | CA2139952C Liquid/supercritical cleaning with decreased polymer damage |
| 03/04/2004 | WO2004019343A1 Method for cleaning a steam generating device of a compressed water reactor |
| 03/04/2004 | WO2003100121A3 Multistation coating device and method for plasma coating |
| 03/04/2004 | US20040040660 High pressure processing chamber for multiple semiconductor substrates |
| 03/04/2004 | US20040040583 Semiconductor wafers; vertical stacked modules; ozone generator |
| 03/04/2004 | US20040040496 Excimer uv photo reactor |
| 03/04/2004 | DE10238730A1 Verfahren zur Reinigung des Dampferzeugers eines Druckwasserreaktors Methods for cleaning up of the steam generator of a pressurized water reactor |
| 03/02/2004 | US6700202 Reducing the oxidized interface with a hydrogen containing plasma and introducing second-layer-forming compounds |
| 02/26/2004 | WO2003103861A3 Material recycling apparatus using laser stripping of coatings |
| 02/26/2004 | WO2003054247A3 Cleaning gas composition for semiconductor production equipment and cleaning method using the gas |
| 02/26/2004 | US20040037339 Laser discharge chamber passivation by plasma |
| 02/26/2004 | US20040036397 Capillary discharge plasma apparatus and method for surface treatment using the same |
| 02/26/2004 | US20040035450 Apparatus for cleaning the edges of wafers |
| 02/26/2004 | US20040035444 Universal cleaning apparatus |
| 02/26/2004 | US20040034961 Hi-flow air fan filter cleaner machine |
| 02/25/2004 | EP1391243A1 Method of cleaning an implement during handling a plurality of samples |
| 02/25/2004 | EP1390201A1 Automatic waste-area removal method and apparatus |
| 02/25/2004 | CN1476983A Transfer body cleaning device and ink-jet recorder with said cleaning device |
| 02/24/2004 | CA2090524C Containment of removed waste asbestos and like material |