Patents
Patents for B08B 7 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass (12,806)
02/2004
02/19/2004WO2004014604A1 Post-cmp cleaning of semiconductor wafer surfaces using a combination of aqueous and cryogenic cleaning techniques
02/19/2004WO2004014589A1 Milling machine having magnetic belt conveyor for steel plate processing
02/19/2004WO2003075098A3 Prevention of contamination of optical elements and cleaning said elements
02/19/2004US20040033311 Method for removing coating from power unit components and device for carrying out the method
02/19/2004US20040031504 Tool for gathering materials including particles and hairs
02/19/2004DE10236493A1 Alternative dry cleaning medium with diverse applications, contains carbon dioxide and nitrous oxide in fifty-fifty proportions
02/19/2004DE10236491A1 Alternative dry cleaning medium with diverse applications, contains carbon dioxide and nitrous oxide in fifty-fifty proportions
02/19/2004DE10236485A1 Alternative dry cleaning medium with diverse applications, contains carbon dioxide and nitrous oxide in fifty-fifty proportions
02/17/2004US6693255 Laser ablation cleaning
02/13/2004CA2405666A1 Tool for gathering materials including particles and hairs
02/12/2004WO2004012877A1 Method and apparatus for removing substances from solid matrix with energy saving
02/12/2004WO2004012621A1 Enhanced dental hygiene system with direct uva photoexcitation
02/12/2004US20040029494 Post-CMP cleaning of semiconductor wafer surfaces using a combination of aqueous and CO2 based cryogenic cleaning techniques
02/12/2004US20040029381 Reduction of metal (copper) oxides by vaporation of carboxylic acid from storage tank using a carburetor; uniform electrodes and wirings; cleaning
02/12/2004US20040029235 Comprises exposing the pin head or other implement to ultraviolet (UV) and preferably also infrared (IR) radiation between handling different samples in order to suppress cross-contamination by non-specific amplification
02/12/2004US20040025908 Supercritical fluid delivery system for semiconductor wafer processing
02/12/2004US20040025903 Method of in-situ chamber cleaning
02/12/2004US20040025902 Electroconductive means in contact with segments of cleaning target; grounding means
02/11/2004EP1388376A2 Cleaning using CO2 and N2O
02/10/2004US6689699 Wherein gas is introduced into a vacuum chamber for treating a substrate to be processed
02/10/2004US6689521 Preventing plasma induced electrical charge damage
02/10/2004US6689284 Surface treating method
02/10/2004US6688257 Pet dog washing apparatus
02/10/2004US6688020 Substrate processing apparatus
02/05/2004WO2004011181A2 Method and apparatus for removing minute particle(s) from a surface
02/05/2004US20040020905 Method and apparatus for cleaning surfaces
02/05/2004US20040020898 Contaminant removal by laser-accelerated fluid
02/05/2004US20040020518 Providing enclosed pressure vessel containing supercritical carbon dioxide; adding a second fluid to vessel, forming an interface between supercritical fluid and second fluid; displacing supercritical fluid from vessel with pressure
02/05/2004US20040020513 Methods of thinning a silicon wafer using HF and ozone
02/05/2004US20040020510 Material being placed in a pressure-tight chamber partly filled with the carbon dioxide; pressure in the chamber is lowered in an intermittent, rapid way by opening of a valve between the chamber and an evacuated adjacent container
02/05/2004US20040020427 Device and process for liquid treatment of wafer-shaped articles
02/05/2004US20040019990 Enhanced dental hygiene system with direct UVA photoexcitation
02/05/2004US20040019986 Flexible contact cleaning roller
02/05/2004DE10234374A1 Process for handling workpieces comprises transporting the workpieces on a rotating coupling wheel and transferring the workpieces between a retaining element and a reference station at different times
02/04/2004EP1386674A1 Structure cleaning method and anticorrosion method; and structure using them
02/04/2004EP1385642A1 Megazone system
02/03/2004US6684523 Particle removal apparatus
01/2004
01/29/2004WO2004009258A1 Method and apparatus for removing target material from a substrate
01/29/2004WO2004009255A1 An air-driven low frequency sound generator and a method for regulating the piston in such a generator
01/29/2004US20040018803 Methods for resist stripping and cleaning surfaces substantially free of contaminants
01/29/2004US20040018452 Prepassivation before cleaning
01/29/2004US20040016450 Method for reducing the formation of contaminants during supercritical carbon dioxide processes
01/29/2004US20040016441 Plasma cleaning gas and plasma cleaning method
01/29/2004DE10229178A1 Strahlvorrichtung Beam device
01/29/2004DE10219108A1 Hocheffizienter Fernreinigungsprozess für Prozesskammern in Abscheideanlagen Highly efficient cleaning process for remote process chambers in separation systems
01/29/2004CA2492334A1 Method and apparatus for removing target material from a substrate
01/28/2004EP1383951A1 Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
01/28/2004EP0998985B1 Device for cleaning air conduits
01/28/2004CN1136468C Optical fiber connector using fiber spring force and alignment groove
01/27/2004US6683312 Ultraviolet cleaning apparatus of a substrate and the method thereof
01/27/2004US6681663 Hand tool having a vibration device
01/27/2004CA2280885C System for cryogenically removing residue from containers
01/22/2004US20040014327 Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materials
01/22/2004US20040013858 Contacting silica dielectric film with plasma comprising at least one surface modification agent, at a concentration, and for a time period, effective to render the silica dielectric film hydrophobic
01/22/2004US20040012130 Apparatus for removing dust accretions from a smelting furnace
01/22/2004US20040011764 Apparatus for producing and sustaining a glow discharge plasma under atmospheric conditions
01/22/2004US20040011658 Surface of a member is subjected to degreasing or oxide film removing treatment using pressurized carbon dioxide is dissolved in a predetermined quantity of water to prepare an oxide film removing solution having a predetermined acidity
01/22/2004US20040011381 Method for removing carbon contamination from optic surfaces
01/22/2004US20040011380 Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materials
01/22/2004US20040011379 Silicon oxyfluoride film is formed on a wafer using a plasma vapor deposition method; film remaining inside chamber is cleaned up using a gas containing nitrogen trifluoride
01/22/2004US20040011378 Surface cleaning and modification processes, methods and apparatus using physicochemically modified dense fluid sprays
01/22/2004DE10230790A1 Vorrichtung zum Reinigen von Gummituchzylindern oder Zylindern einer Offsetdruckmaschine Apparatus for cleaning blanket cylinders or cylinders of an offset printing machine
01/21/2004EP1383359A2 Method and arrangement for treating a substrate with an atmospheric pressure glow plasma (APG)
01/21/2004EP1382716A2 Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materials
01/21/2004EP1381728A1 Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
01/21/2004CN1135605C Substrate cleaning method and apparatus
01/21/2004CN1135360C Ultrosonic cleaning method
01/20/2004US6679950 Cleaning method and cleaner
01/20/2004CA2267898C Method and apparatus for a powder metallurgical process
01/15/2004WO2004006317A1 Method of cleaning substrate treatment apparatus
01/15/2004WO2004005029A1 Device for cleaning the surface of a rotating body driven in rotation
01/15/2004US20040007252 Label sheet for cleaning and conveying member having cleaning function
01/15/2004US20040007248 Preparing an etching and a deposition apparatus each using chlorine series gas, generating a plasma containing hydrogen and nitrogen to remove by-products
01/15/2004US20040007246 In-situ cleaning of light source collector optics
01/15/2004DE10227637A1 Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken Method and apparatus for plasma treatment of workpieces
01/14/2004EP1380435A2 Conveyor cleaner and ink-jet printing apparatus including it
01/14/2004CN1134251C Liquid cleansing composition comprising soluble, lamellar phase inducing structurant
01/13/2004US6677711 Plasma processor method and apparatus
01/13/2004US6676800 Particle contamination cleaning from substrates using plasmas, reactive gases, and mechanical agitation
01/13/2004US6676766 Method for cleaning a substrate using a sherbet-like composition
01/13/2004US6676764 Method for cleaning a substrate in selective epitaxial growth process
01/13/2004US6676762 Method for cleaning a finished and polished surface of a metal automotive wheel
01/13/2004US6675425 Photocatalytic apparatus and method for activating photocatalytic material
01/13/2004US6675423 Two roll turret with positive nip web cleaner
01/08/2004WO2004003983A1 Cvd apparatus having means for cleaning with fluorine gas and method of cleaning cvd apparatus with fluorine gas
01/08/2004WO2004003260A1 Electrochemical method for cleaning the surfaces of metallic work pieces and cleaning electrode
01/08/2004WO2004002683A1 Jet device
01/08/2004US20040003831 Soaking in a pressure vessel at a supercritical temperature and a higher of two supercritical pressures; rapidly decompressing to a lower of two supercritical pressures; and flushing said pressure vessel with said process fluid.
01/08/2004US20040003828 Selective cleaning, drying, and modifying substrate surfaces and depositing thin films thereon using a dense phase gas solvent and admixtures within a first created supercritical fluid antisolvent.
01/07/2004EP1377394A1 Label sheet for cleaning and conveying member having cleaning function
01/02/2004EP1374276A2 Plasma surface treatment method and device for carrying out said method
12/2003
12/30/2003US6669785 Methods and compositions for etch cleaning microelectronic substrates in carbon dioxide
12/30/2003CA2216547C Method to clean ink and coating from contact cleaning rolls
12/24/2003WO2003107396A2 Substrate processing apparatus and related systems and methods
12/24/2003WO2003106060A2 Device for cleaning the surface of a component
12/24/2003WO2003106059A1 Machine and method for thermal cleaning and separation of metal parts
12/24/2003WO2003105655A1 Adhesive peeling and removing device
12/24/2003CN1131738C Cleaning method for power plant installation set
12/23/2003US6666997 Method for removing cleaning compound flash from mold vents
12/18/2003WO2003103861A2 Low cost material recycling apparatus using laser stripping of coatings such as paint and glue