| Patents for B08B 7 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass (12,806) |
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| 03/02/2005 | EP1179099B1 Detergent injection systems for carbon dioxide cleaning apparatus |
| 03/02/2005 | EP1148968B1 Method and apparatus for removal of mold flash |
| 03/02/2005 | CN1589183A An apparatus and method for cleaning glass substrates using a cool hydrogen flame |
| 03/01/2005 | US6860275 Post etching treatment process for high density oxide etcher |
| 02/24/2005 | WO2005016565A1 Cryogenic descaling process |
| 02/24/2005 | WO2005016563A1 Methods of thinning a silicon wafer using hf and ozone |
| 02/24/2005 | WO2004098259A3 Plasma treatment for purifying copper or nickel |
| 02/24/2005 | US20050042958 Comprises thermoset resin layer having porosity and pressure-sensitive adhesive layer comprising a thermoplastic resin; tack-free |
| 02/24/2005 | US20050042886 System for ultraviolet atmospheric seed layer remediation |
| 02/24/2005 | US20050039775 Process and system for cleaning surfaces of semiconductor wafers |
| 02/23/2005 | EP1508385A1 System for ultraviolet cleaning |
| 02/23/2005 | EP1507895A1 Rotary machine for cvd coatings |
| 02/23/2005 | EP1507894A1 Coating device comprising a conveying device |
| 02/23/2005 | EP1507893A1 Method and device for the plasma treatment of workpieces |
| 02/23/2005 | EP1507891A1 Method and device for the plasma treatment of work pieces |
| 02/23/2005 | EP1507890A1 Method and device for plasma treating workpieces |
| 02/23/2005 | EP1507889A1 Method and device for plasma treating workpieces |
| 02/23/2005 | EP1507887A2 Multistation coating device and method for plasma coating |
| 02/23/2005 | EP1507886A1 Method and device for plasma treating workpieces |
| 02/23/2005 | EP1507885A1 Method and device for plasma treatment of work pieces |
| 02/23/2005 | EP1507884A1 Method and device for plasma treating workpieces |
| 02/23/2005 | EP1507723A1 Method and device for handling workpieces |
| 02/23/2005 | CN1586003A Methods and apparatus for cleaning and/or treating a substrate using CO2 |
| 02/23/2005 | CN1585999A Pressure chamber assembly including drive means |
| 02/22/2005 | US6858092 Device and process for liquid treatment of wafer-shaped articles |
| 02/22/2005 | US6858089 Forming a sacrificial film on the surface of the wafer and then removing it by supercritical fluid cleaning |
| 02/22/2005 | US6857437 Automated dense phase fluid cleaning system |
| 02/17/2005 | WO2005014910A1 Beating apparatus for carpets and beating method |
| 02/17/2005 | WO2005014478A2 Aqueous solutions of silicon metal and methods of making and using same |
| 02/17/2005 | WO2004107056B1 Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof |
| 02/17/2005 | WO2004059383A3 Fluoride in supercritical fluid for photoresist and residue removal |
| 02/17/2005 | US20050035096 Method and apparatus for cleaning generator, turbine and boiler components |
| 02/17/2005 | US20050035085 Apparatus and method for reducing metal oxides on superalloy articles |
| 02/17/2005 | US20050034745 Processing a workpiece with ozone and a halogenated additive |
| 02/17/2005 | US20050034742 Cleaning method and cleaning apparatus |
| 02/17/2005 | CA2578281A1 Aqueous solutions of silicon metal and methods of making and using same |
| 02/15/2005 | US6855576 Method for cleaning a ceramic member for use in a system for producing semiconductors, a cleaning agent and a combination of cleaning agents |
| 02/15/2005 | US6855207 Apparatus and system for eliminating contaminants on a substrate surface |
| 02/10/2005 | WO2005013327A2 Regulation of flow of processing chemistry only into a processing chamber |
| 02/10/2005 | WO2005013002A2 Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing |
| 02/10/2005 | WO2005011883A1 Surface cleaning apparatus |
| 02/10/2005 | US20050028928 Substrate processing apparatus and substrate processing method |
| 02/10/2005 | US20050028927 Supercritical fluid technology for cleaning processing chambers and systems |
| 02/10/2005 | US20050028848 Contact lens cleansing unit |
| 02/10/2005 | DE102004026674B3 Process and assembly to remove adhesive residues from the otherwise bare surface of a competition table tennis bat |
| 02/09/2005 | EP1503968A1 Methods and compositions for etch cleaning microelectronic substrates in carbon dioxide |
| 02/09/2005 | EP1021822A4 Method and apparatus for cleaning electronic test contacts |
| 02/09/2005 | CN1577757A Cleaning member and cleaning method |
| 02/09/2005 | CN1575872A A cleaning device and cleaning method |
| 02/08/2005 | US6852242 Cleaning of multicompositional etchant residues |
| 02/08/2005 | US6852195 Method and apparatus for low energy electron enhanced etching of substrates in an AC or DC plasma environment |
| 02/08/2005 | US6852173 Use of high vapor pressure liquid with cryogenic cleaning to aid in removal of foreign materials from semiconductor surfaces |
| 02/08/2005 | US6852171 Method and apparatus for deicing mirrors or windows |
| 02/08/2005 | US6852170 Applying mouse and ball of mouse to cleaning surface containing adhesive, moving mouse in rotational pattern on mouse cleaning surface, removing mouse, washing cleaning surface |
| 02/08/2005 | US6851152 Substrate cleaning apparatus |
| 02/03/2005 | WO2005009634A1 Device of a descaler head |
| 02/03/2005 | WO2005009633A1 System and method of dry contract cleaning for removing particles from semiconductor wafers |
| 02/03/2005 | US20050026435 Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing |
| 02/03/2005 | US20050022850 Regulation of flow of processing chemistry only into a processing chamber |
| 02/02/2005 | EP1503401A1 Method and apparatus for cleaning a substrate by using a supercritical fluid |
| 02/02/2005 | EP1502665A1 Die cleaning method |
| 02/02/2005 | EP1501961A2 High pressure processing chamber for multiple semiconductor substrates |
| 02/02/2005 | CN1574244A Semiconductor manufacturing equipment |
| 02/02/2005 | CN1574203A Method for removal of residue from a substrate |
| 02/02/2005 | CN1572901A Multistation coating device and method for plasma coating |
| 02/02/2005 | CN1572383A Cleansing device |
| 02/01/2005 | US6849192 Surface treating method |
| 02/01/2005 | US6848458 Apparatus and methods for processing semiconductor substrates using supercritical fluids |
| 02/01/2005 | US6848455 Comprises simultaneous application of ultraviolet radiation and hydrogen peroxide and dissolved ozone |
| 01/27/2005 | WO2004064121A3 A supercritical fluid cleaning system and method |
| 01/27/2005 | US20050019969 Method for manufacturing thin film transistor array panel |
| 01/27/2005 | US20050016568 Apparatus and method for cleaning of semiconductor device manufacturing equipment |
| 01/27/2005 | DE10329122A1 Verfahren und Reinigungsmasse zur Reinigung von Lebensmittel verarbeitenden Maschinen Methods and cleaning composition for cleaning of food processing machinery |
| 01/26/2005 | CN1572015A Film removing apparatus, film removing method and substrate processing system |
| 01/26/2005 | CN1571122A Cleaning method |
| 01/25/2005 | US6846789 Removing photoresist materials from electronic components. The composition is a mixture of at least one dense phase fluid and at least one dense phase fluid modifier. The method includes exposing a substrate to at least one pulse of |
| 01/25/2005 | US6846380 Substrate processing apparatus and related systems and methods |
| 01/20/2005 | WO2005006396A2 Megasonic cleaning using supersaturated cleaning solution |
| 01/20/2005 | WO2005006028A1 Removal and replacement of antisoiling coatings |
| 01/20/2005 | WO2005005065A1 Laser removal of layer or coating from a substrate |
| 01/20/2005 | WO2005005064A1 Jet spray tool |
| 01/20/2005 | WO2005005035A1 Purification and recovery of fluids |
| 01/20/2005 | WO2004106825A3 System for use land fills and recyclable materials |
| 01/20/2005 | WO2004070776A3 Methods for transferring supercritical fluids in microelectronic and other industrial processes |
| 01/20/2005 | US20050014375 Method for cleaning substrate surface |
| 01/20/2005 | US20050011445 Apparatus and method for in-situ cleaning of a throttle valve in a CVD system |
| 01/20/2005 | CA2531672A1 Jet spray tool |
| 01/19/2005 | EP1498512A1 Method for activating surface of parent material and its activating system |
| 01/19/2005 | EP0801606B1 Method for treating a surface |
| 01/18/2005 | US6843881 Detecting chemiluminescent radiation in the cleaning of a substrate processing chamber |
| 01/18/2005 | US6843858 Method of cleaning a semiconductor processing chamber |
| 01/18/2005 | US6843857 Rotating articles within chamber, applying heated liquid comprising water onto rotating articles, introducing ozone gas and carbon dioxide gas into chamber, ozone oxidizing contaminants on articles, cleaning articles |
| 01/18/2005 | US6843260 Vibrating abrasive cleaning apparatus and method |
| 01/18/2005 | US6842933 Substrate cleaning apparatus and cleaning member |
| 01/13/2005 | WO2005003273A1 Method, process, chemistry and apparatus for treating a substrate |
| 01/13/2005 | US20050008784 Removal and replacement of antisoiling coatings |
| 01/13/2005 | US20050006345 Laser removal of layer or coating from a substrate |
| 01/13/2005 | US20050006310 Purification and recovery of fluids in processing applications |
| 01/13/2005 | US20050005957 Cleaning apparatus for cleaning objects to be treated with use of cleaning composition |
| 01/13/2005 | US20050005948 Atmospheric pressure non-thermal plasma device to clean and sterilize the surfaces of probes, cannulas, pin tools, pipettes and spray heads |