Patents
Patents for B08B 7 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass (12,806)
09/2003
09/02/2003US6613157 Methods for removing particles from microelectronic structures
09/02/2003US6612317 Supercritical fluid delivery and recovery system for semiconductor wafer processing
08/2003
08/28/2003WO2003071004A2 Method for the plasma cleaning of the surface of a material coated with an organic substance and the installation for carrying out said method
08/28/2003WO2003070390A2 Cleaning apparatus using atmospheric pressure plasma
08/28/2003US20030162035 Substrate with photocatalytic and /or hydrophilic coating
08/28/2003US20030161780 Recycle for supercritical carbon dioxide
08/28/2003US20030159716 Supplying fluid at high temperature
08/28/2003US20030159710 Cleaning apparatus and method
08/28/2003DE20308788U1 Surface treatment unit for e.g. cleaning or excavation, combines high energy laser beam, high velocity dry ice jet and suction connection in portable unit
08/27/2003EP1337281A1 Method and device for treating the surfaces of items
08/27/2003EP0693001B1 Cleaning and finishing a ceramic mold
08/27/2003CN1439089A Apparatus for removing dust accretions from a smelting furance
08/26/2003US6610611 Method of removing diamond coating and method of manufacturing diamond-coated body
08/26/2003US6610257 Low RF power electrode for plasma generation of oxygen radicals from air
08/26/2003US6610168 Resist film removal apparatus and resist film removal method
08/21/2003WO2003069659A1 Cleaning gas and etching gas
08/21/2003WO2003068846A1 Methods of treating polymeric substrates
08/21/2003WO2003068502A1 Method of making window unit
08/21/2003WO2003068380A1 Distributor bottom for the distribution of a gas charged with fine solid particles
08/21/2003US20030157786 Treatment to eliminate polysilicon defects induced by metallic contaminants
08/21/2003US20030155065 Method of making window unit
08/21/2003CA2472720A1 Distributor base for distributing a gas which is laden with fine solids particles
08/20/2003EP1335801A1 AN i IN SITU /i MODULE FOR PARTICLE REMOVAL FROM SOLID-STATE SURFACES
08/20/2003EP1095180B1 Cleaning apparatus with dense phase fluid
08/20/2003EP1044077B1 Apparatus for cleaning surfaces with a cleaning roller assembly
08/20/2003CN1437534A Apparatus and method for thermally removing coating and/or impurities
08/19/2003US6607608 Translatable fiber stripper
08/14/2003US20030150475 Method and apparatus for sanitizing reusable articles
08/13/2003EP1039977A4 A method for removing surface contaminants on moulds used in semiconductor packaging tools
08/12/2003US6604468 Device, system and method for on-line explosive deslagging
08/07/2003WO2003064065A1 Method for reducing the formation of contaminants during supercritical carbon dioxide processes
08/07/2003WO2002031861A3 Substrate processing in an immersion, scrub and dry system
08/07/2003US20030145876 Pressure sensing method for determining gas clean end point
08/07/2003US20030145875 Using cleaning compound and ozone vapors ; impregnating semiconductor wafer; removal
08/07/2003US20030145482 Apparatus and method thermally removing coatings and/or impurities
08/06/2003EP1123166A4 Method of removing organic materials from substrates
08/06/2003EP0932460B1 Method and apparatus for a powder metallurgical process
08/05/2003US6603091 Cleaning device with deeply reaching plasma and assisting electrodes
08/05/2003US6602560 Method for removing residual fluorine in HDP-CVD chamber
08/05/2003US6602542 Device for cleaning an article
08/05/2003US6602351 Remove water, entrained solvents and solid particles using high density carbon dioxide
08/05/2003US6602349 Supercritical fluid cleaning process for precision surfaces
08/05/2003US6601594 Apparatus and method for delivering a treatment liquid and ozone to treat the surface of a workpiece
07/2003
07/31/2003WO2003062322A1 Apparatus and method for cleaning test probes
07/31/2003WO2003062166A2 Treatment of organic pollution on an inorganic substrate
07/31/2003WO2003061861A1 Laser-based cleaning method and system
07/31/2003WO2003061860A1 Supercritical fluid processes with megasonics
07/31/2003US20030143846 Gas compositions for cleaning the interiors of reactors as well as for etching films of silicon- containing compounds
07/31/2003US20030141815 Method for removing impurities of plasma display panel
07/31/2003US20030141016 Exhaust system for processing apparatus
07/31/2003US20030140950 Cryogenic methods for removing lead based paints from large steel structure
07/31/2003CA2473888A1 Laser-based cleaning method and system
07/30/2003CN1433342A Label sheel for cleaning conveying member having cleaning function
07/30/2003CN1433341A Cleaning sheet conveying member using the same and substrate processing equipment cleaning method using them
07/30/2003CN1433053A Semiconductor device manufacturing process and equipment
07/29/2003US6599618 Wavelength selective photocatalytic dielectric elements on polytetrafluoroethylene (PTFE) refractors having indices of refraction greater than 2.0
07/24/2003WO2003059542A1 Method for neutralizing or recycling carrier materials for film-like coatings
07/24/2003WO2003059535A1 Cleaning roller device with vertical movement mechanism
07/24/2003US20030138644 Apparatus and method for cleaning test probes
07/24/2003US20030136769 Laser ablation technique using in IC etching process
07/24/2003US20030136714 Vapor transferring apparatus for purification
07/24/2003US20030136430 Laminated three-dimensional sheet
07/24/2003US20030136429 Vapor cleaning and liquid rinsing process vessel
07/24/2003US20030136423 Semiconductor device production method and semiconductor device production apparatus
07/23/2003EP0958068B1 Novel cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants
07/23/2003CN1431056A Dynamic cleaning device of environmental protection and its cleaning methods
07/22/2003US6596093 Using carbon dioxide for removing water and solutes from semiconductor substrates
07/17/2003WO2003057811A1 Supercritical fluid cleaning of semiconductor substrates
07/17/2003WO2003057377A1 Method for cleaning an article
07/17/2003US20030133864 Method and apparatus for supplying carbon dioxide to a plurality of applications, as in the processing of integrated circuits
07/17/2003CA2472478A1 Method for cleaning an article
07/16/2003EP1326720A1 Labeling method and corresponding device
07/16/2003CN1430243A Cleaning device of on-line laser wafer bearing
07/15/2003US6592676 Chemical solution and method for reducing the metal contamination on the surface of a semiconductor substrate
07/15/2003US6591845 Apparatus and method for processing the surface of a workpiece with ozone
07/10/2003WO2003055820A1 Method for adhering transparent articles and quartz glass plate prepared through adhesion and device using the same
07/10/2003US20030129835 Efficient cleaning by secondary in-situ activation of etch precursor from remote plasma source
07/10/2003US20030129103 Method of separating electrophotographic carrier compositions and recycling the compositions
07/10/2003US20030127115 Contacting a printed circuit board or silicon wafer with supercritical 1,1,1,3,3-pentafluoropropane fluid
07/09/2003EP0959991A4 Process and apparatus for cryogenically cleaning residue from containers and intermediate bulk containers designed for cryogenic cleaning
07/08/2003US6589592 Utilize liquid carbon dioxide (CO2) as a cleaning solvent
07/08/2003US6589357 Process and apparatus for removing impurities from surfaces contaminated with liquid
07/08/2003US6589355 1,1,1,3,3-pentafluoropropane as a supercritical fluid; printed circuit board
07/08/2003US6589353 Oxidizing gas employed is ozone and the surface is irradiated with ultraviolet light; removing material from a protective coating that has been applied to the surface
07/08/2003US6588122 Minimal distance between ultraviolet radiator and substrate while irradiating in translational or rotational movement achieves intense and uniform illumination
07/03/2003WO2003054247A2 Cleaning gas composition for semiconductor production equipment and cleaning method using the gas
07/03/2003WO2003053601A1 Method for cleaning, roughening and stripping surfaces
07/03/2003WO2003011599A8 Method and device for cleaning using ultrasound
07/03/2003WO2002091453A9 High pressure wafer-less auto clean for etch applications
07/03/2003US20030125225 Chemical formulations and methods for removing unwanted material, such as unexposed photoresist, metal oxides, CMP residue, and the like, from semiconductor wafers or other substrates. The formulations utilize a supercritical
07/03/2003US20030123324 Fluid driven agitator used in densified gas cleaning system
07/03/2003US20030121896 Apparatus for on-line cleaning a wafer chuck with laser
07/03/2003US20030121171 Method and apparatus for performing multiple cleaning and vacuum drying operations in enclosed vessels
07/02/2003EP1323187A2 Wafer cleaning module and method for cleaning the surface of a substrate
07/02/2003EP1124653A4 Method for continuous removal of oxides from metal
07/02/2003CN1426817A Container cleaner
07/01/2003US6584987 Method for improved cleaning in HDP-CVD process with reduced NF3 usage
06/2003
06/26/2003WO2003052805A1 Film removing device, film removing method, and substrate processing system
06/26/2003WO2003052216A2 Device for removing jointing material
06/26/2003WO2003052166A1 Method and device for removing adhesions, especially oily or fatty adhesions that are present on the surface of metal parts