Patents
Patents for B08B 7 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass (12,806)
01/2005
01/12/2005EP1495813A1 Washing plant for mechanical components
01/12/2005EP1495366A1 Method of treatment of porous dielectric films to reduce damage during cleaning
01/12/2005EP1494821A1 Fluid assisted cryogenic cleaning
01/12/2005CN2670018Y Cleaner with water sparying, wiping and air drying function
01/12/2005CN1565046A CVD device with cleaning mechanism using fluorine gas and method of cleaning CVD device with fluorine gas
01/12/2005CN1563315A Composition for removing residues from the microstructure
01/11/2005US6841141 Fluorine source; Cl2, Br2 or I2 source; processing chamber; and energy source; especially for preparing
01/11/2005US6840374 A cleaning apparatus comprising a tacky gel layer polysiloxane, an endcapped homo- or copolymer; tip used to test semiconductors dies
01/06/2005WO2005001920A1 Method for generating plasma, method for cleaning and method for treating substrate
01/06/2005WO2005000363A2 Atmospheric pressure non-thermal plasma device to clean and sterilize the surface of probes, cannulas, pin tools, pipettes and spray heads
01/06/2005WO2004093166A3 Chamber and associated methods for wafer processing
01/06/2005WO2003103861A8 Material recycling apparatus using laser stripping of coatings
01/06/2005US20050000656 Apparatus for atmospheric pressure reactive atom plasma processing for surface modification
01/06/2005US20050000543 Robot vacuum with internal mapping system
01/06/2005US20050000540 comprises beams of electromagnetic energy conducted through laser/optical arm
01/06/2005US20050000443 Apparatus for processing a substrate using plasma
01/06/2005US20050000244 Venting gases from wastes; separation into three streams- hydrocarbons, carbon dioxide and residues; condensation; generating power sources
01/06/2005CA2528194A1 Atmospheric pressure non-thermal plasma device to clean and sterilize the surface of probes, cannulas, pin tools, pipettes and spray heads
01/05/2005DE20320640U1 Siliconkautschukartikel Silicone rubber products
01/05/2005DE102004026389A1 Hood cleaning method involves spraying liquid detergent under pressure into processing areas inside hood and sucking impurities from processing areas, while external walls and cross walls of hood are sealed with sealing materials
01/05/2005CN1183590C Heat sink with improved heat exchanger
01/05/2005CN1182924C Coating removal system of solid particle nozzle and associated method
01/04/2005US6838637 Method and apparatus for deflashing of integrated circuit packages
01/04/2005US6838015 Contacting an etched precision surface with a liquid or supercritical carbon dioxide and an acid having a pKa of less than about 4 under thermodynamic conditions consistent with the retention of said liquid or supercritical CO2
01/04/2005US6837963 Generating and accelerating the ions by means of an electric field and radiating an ion flow onto an edge part of semiconductor substrate to clean the edge part of the substrate
01/04/2005US6837943 Method and apparatus for cleaning a semiconductor substrate
01/04/2005US6837611 Fluid driven agitator used in densified gas cleaning system
01/04/2005US6837252 Apparatus for treating a workpiece with steam and ozone
12/2004
12/30/2004US20040265594 cleaners comprising sheets or layers of polymers having tensile strength, used for cleaning substrates such as semiconductors, flat panel displays or printed circuits
12/30/2004US20040261816 Exposing a semiconductor wafer to bidentate chelating ligands; andremoving metal complexes formed by those chelating ligands
12/30/2004US20040261815 Three-step chamber cleaning process for deposition tools
12/30/2004US20040261814 Methods for resist stripping and cleaning surfaces substantially free of contaminants
12/30/2004DE202004015543U1 Assembly removes self-adhesive labels from recycled containers by exposure to radiant heat and air blow action
12/30/2004DE102004025959A1 Processing a substrate by pressurizing processing chamber before, after, and/or simultaneous with application of radiation to heat substrate and/or processing chemistry contained in processing chamber
12/29/2004WO2004114376A2 Automated dense phase fluid cleaning system
12/29/2004WO2004114357A1 Method and device for removing layers in some areas of glass plates
12/29/2004WO2004101181A3 System and method for cleaning of workpieces using supercritical carbon dioxide
12/29/2004WO2004040370A3 Apparatus and method for cleaning surfaces of semiconductor wafers using ozone
12/29/2004EP1491266A1 Cleaning member and cleaning method
12/29/2004EP1491265A2 Method and cleaning material for cleaning perforated disks of food processing machines
12/29/2004EP1490265A1 Method and installation for decontaminating preform necks
12/29/2004EP1175229B1 Cleaning particulate matter and chemical contaminants from hands
12/28/2004US6835661 Method for manufacturing optical element
12/28/2004US6834656 During etching, from semiconductors/wafers; dielectrics; integrated circuits
12/23/2004WO2004110209A2 System for preserving paintbrush bristles
12/23/2004US20040258737 Method for neutralizing or recycling carrier materials for film-like coatings
12/23/2004US20040255984 Liquid-assisted cryogenic cleaning
12/23/2004US20040255978 Automated dense phase fluid cleaning system
12/23/2004US20040255973 Method for cleaning semiconductor wafers
12/23/2004CA2566581A1 System for preserving paintbrush bristles
12/23/2004CA2528984A1 Automatic combustion air port cleaner with air/oil indexing mechanism
12/22/2004EP1489651A1 Substrate processing device and substrate processing method, fast rotary valves, cleaning method
12/22/2004EP1488897A1 Process for the decontamination of objects
12/16/2004US20040251235 Method of and apparatus for processing substrates
12/16/2004US20040250844 Ultrasonic cleaner
12/16/2004US20040250840 System for preserving paintbrush bristles
12/16/2004US20040250397 Automated tinting film remover for vehicle window glass
12/16/2004DE10324739A1 Oscillating drum for conveying and cleaning goods e.g. cast parts, bricks, has pipe divided into pipe sections of different diameters, each pipe section bent relative to goods conveyance direction
12/16/2004DE10001488B4 Verfahren und Vorrichtung zum prozesssicheren Fügen ölverschmutzter Werkstücke, insbesondere Blechteile Method and apparatus for process-safe oil contaminated Add workpieces, especially sheet metal parts
12/14/2004US6830628 Methods for cleaning semiconductor surfaces
12/09/2004WO2004107427A1 Substrate cleaning apparatus and method
12/09/2004WO2004107425A1 Surface treating method using ion beam and surface treating device
12/09/2004WO2004107056A1 Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof
12/09/2004WO2004106825A2 System for use land fills and recyclable materials
12/09/2004WO2004105972A1 Cleaning a component of a process chamber
12/09/2004WO2004105971A1 Improved flushing for refrigeration system components
12/09/2004WO2004105918A1 Cleaning filter components
12/09/2004WO2004066359A3 Apparatus and method for treating surfaces of semiconductor wafers using ozone
12/09/2004US20040244818 System and method for cleaning of workpieces using supercritical carbon dioxide
12/09/2004US20040244816 Cleaning machine and method for cleaning printed circuit board supporting trays
12/09/2004US20040244138 Robot vacuum
12/09/2004CA2526622A1 Improved flushing for refrigeration system components
12/09/2004CA2517609A1 System for use land fills and recyclable materials
12/08/2004EP1483064A2 Anti-infection and toxin elimination device
12/08/2004EP1483063A1 Method and device for the decontamination of optical surfaces
12/08/2004CN1179012C Method for cleaning sheet and removing matter containing solvent
12/08/2004CN1178802C Apparauts and method for thermally removing coating and/or impurities
12/07/2004US6828241 Efficient cleaning by secondary in-situ activation of etch precursor from remote plasma source
12/07/2004US6827816 In situ module for particle removal from solid-state surfaces
12/07/2004US6827791 Method for removing paint from a substrate
12/02/2004WO2004105093A2 Tetra-organic ammonium fluoride and hf in supercritical fluid for photoresist and residue removal
12/02/2004WO2004104707A2 Method and device for cleaning at least one optical component
12/02/2004WO2004104697A2 Decontamination of supercritical wafer processing equipment
12/02/2004US20040238002 Method of producing a glass substrate for a magnetic disk and method of producing a magnetic disk
12/02/2004US20040238001 Carpet kicker head cover
12/02/2004US20040237997 Method for removal of residue from a substrate
12/02/2004DE10321889A1 Surface treatment method e.g. for flat substrates and circuit-boards, involves treating surface with air-ionization by electrical discharge at high-voltage
12/02/2004DE10320476A1 Device for cleaning workpieces has nozzles at side of channel through which workpieces are moved and sprayed with cleaning medium at angle to direction of movement
12/02/2004DE10320472A1 Plasmabehandlung zur Reinigung von Kupfer oder Nickel Plasma treatment for the purification of copper or nickel
12/01/2004EP1482345A1 Digital camera having piezo-driven vibrating dust-off glass plate
12/01/2004EP1482344A1 Optical apparatus having photoelectric conversion element and vibrating dust-off glass plate
12/01/2004EP1481741A2 Process and apparatus for treating a workpiece such as a semiconductor wafer
12/01/2004EP1481287A2 Device, euv-lithographic device and method for preventing and cleaning contamination on optical elements
12/01/2004EP1481112A2 Method for the plasma cleaning of the surface of a material coated with an organic substance and the installation for carrying out said method
12/01/2004EP1480765A1 Capillary drying of substrates
12/01/2004EP1480764A1 LASER−BASED CLEANING METHOD AND SYSTEM
12/01/2004CN1551296A Cleaning apparatus
12/01/2004CN1177705C Device and method for removal of rust and paint
11/2004
11/30/2004US6823880 High pressure processing apparatus and high pressure processing method
11/25/2004WO2004101181A2 System and method for cleaning of workpieces using supercritical carbon dioxide
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