Patents
Patents for B08B 7 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass (12,806)
09/2002
09/25/2002EP0972088B1 Process for treating a material containing metal and organic matter, including metal separation
09/24/2002US6455456 Method for the in-situ cleaning of the catalytically active surfaces of SCR substrate
09/24/2002US6454869 Liquid or supercritical carbon dioxide
09/19/2002WO2002072351A1 Automatic waste-area removal method and apparatus
09/19/2002WO2002072286A1 Combined plasma/liquid cleaning of substrates
09/19/2002WO2002055628A3 Oil absorption and reclamation methods
09/19/2002US20020129833 Exposing a contaminant on the surface to continuous or pulsed ultraviolet light to volatilize the organic material and thereby clean the surface without damaging the finished material surface
09/19/2002US20020129832 Method for treatment of surfaces to remove mold release agents with continuous ultraviolet cleaning light
09/19/2002CA2478070A1 Automatic waste-area removal method and apparatus
09/19/2002CA2440254A1 Combined plasma/liquid cleaning of substrates
09/17/2002US6451125 Decompositing wastes; multilayer sink structure; replaceable filter
09/12/2002WO2002071438A2 Capillary discharge plasma apparatus and method for surface treatment using the same
09/12/2002WO2002033684A3 Delabelling method and device for carrying out said method
09/12/2002US20020125257 Method and apparatus for treating the internal surface of a gas bottle
09/12/2002US20020124948 Automatic waste-area removal method and apparatus
09/12/2002US20020124867 Apparatus and method for surface cleaning using plasma
09/12/2002DE10131554C1 Device for degreasing metallic material, especially light metal chips produced during the processing of die cast parts, comprises a process chamber with a vacuum pump, capacitors
09/11/2002EP1237824A1 A method and apparatus for treating a substrate with an ozone-solvent solution
09/11/2002EP1237734A2 Coating removal system having a solid particle nozzle with a detector for detecting particle flow and associated method
09/11/2002CN1369053A Ultrosonic cleaning method
09/10/2002US6449521 Decontamination of a plasma reactor using a plasma after a chamber clean
09/06/2002WO2002068712A2 Removal of etchant residues
09/05/2002US20020122896 Capillary discharge plasma apparatus and method for surface treatment using the same
09/05/2002US20020122742 Pulsed radiation produced by an intense optical source is applied to the inner surface of a wooden container having a surface layer of organic and/or mineral deposit to bring about sublimation of the surface layer
09/05/2002DE10150594C1 Vibration drying and cleaning device for workpieces, uses excentral stopper surface to rotate workpiece about its length axis
09/03/2002US6444097 Radioactive decontamination
08/2002
08/29/2002WO2002067310A1 Method and device for cleaning ceramics member
08/29/2002WO2002066176A1 Methods for cleaning microelectronic structures
08/29/2002WO2000014378A9 Gas impulse device and method of use thereof
08/29/2002US20020117480 Cleaning device with deeply reaching plasma and assisting electrodes
08/29/2002US20020117472 Cleaning of multicompositional etchant residues
08/28/2002EP0762918B1 Fluid extraction of metals and/or metalloids
08/27/2002US6440864 Substrate cleaning process
08/27/2002US6440226 Parts washing system
08/22/2002US20020115383 Method of removing coating film
08/22/2002US20020113216 Substrate treatment device using a dielectric barrier discharge lamp
08/22/2002US20020112747 Methods for cleaning microelectronic structures with cyclical phase modulation
08/22/2002US20020112746 Methods for removing particles from microelectronic structures
08/22/2002US20020112740 For photoresist-coated semiconductor/integrated circuits or an electrooptic device
08/22/2002US20020112739 Minimal distance between ultraviolet radiator and substrate while irradiating in translational or rotational movement achieves intense and uniform illumination
08/22/2002US20020112638 Device, system and method for online explosive deslagging
08/22/2002US20020112300 Universal cleaning apparatus
08/22/2002DE10107200A1 Verfahren und Vorrichtung zum Abziehen von Haftetiketten Method and device for withdrawing adhesive labels
08/21/2002CN1365408A Detergent injection systems for carbon dioxide cleaning apparatus
08/20/2002US6437326 Permanent optical sensor downhole fluid analysis systems
08/20/2002US6437285 Method and apparatus for treating interior cylindrical surfaces and ablating surface material thereon
08/20/2002US6436198 Depressurizing and heating to volatilize portion of coating causing it to burst away from fibers; clean glass surface without use of chemicals; nondeforming
08/20/2002US6435200 Device and process for liquid treatment of wafer-shaped articles
08/20/2002US6435197 Method of cleaning a semiconductor fabricating apparatus
08/15/2002WO2002063661A2 Method and apparatus for removal of surface contaminants from substrates in vacuum applications
08/15/2002WO2002063066A1 Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge
08/15/2002US20020108930 Apparatus for removing native oxide layers from silicon wafers
08/15/2002CA2437322A1 Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge
08/14/2002EP1230989A2 Optical element for use in exposure apparatus and method for rinsing said optical element
08/14/2002DE10103214A1 Verfahren und Vorrichtung zur Reinigung von Oberflächen in Hohlräumen Method and device for cleaning surfaces in cavities
08/14/2002CN2505193Y Velveteen cleaning drum
08/13/2002US6432255 Method and apparatus for enhancing chamber cleaning
08/13/2002US6432212 Scrubbing films and substrates with water for cleaning for semiconductors
08/13/2002US6431073 Device, system and method for on-line explosive deslagging
08/08/2002WO2002062111A2 Apparatus and method for atmospheric pressure reactive atom plasma processing for surface modification
08/08/2002WO2002061811A2 Laser cleaning process for semiconductor material
08/08/2002WO2002001190A3 Method and apparatus for improved process control in combustion applications
08/07/2002EP0557453B1 Protective coating and method of using such coating
08/06/2002US6428395 Method of polishing at least one surface of a silicon-based part
08/01/2002WO2002060112A2 Apparatus, method and system for multiple resolution affecting information access
08/01/2002WO2002060110A2 Apparatus, method, and system for accessing digital rights management information
08/01/2002WO2002059797A1 Apparatus, method and system for directory quality assurance
08/01/2002WO2002059739A1 Apparatus method and system for registration effecting information access
08/01/2002WO2002059724A2 Apparatus, method and system for tracking information access
08/01/2002WO2002058857A1 Cleaning apparatus
08/01/2002WO2002058453A2 Apparatus, method and system for effecting information access in a peer environment
08/01/2002WO2001003858A9 Method and system for in situ cleaning of semiconductor manufacturing equipment using combination chemistries
08/01/2002US20020100751 Apparatus and method for atmospheric pressure reactive atom plasma processing for surface modification
08/01/2002US20020100492 Method of cleaning turbine component using laser shock peening
08/01/2002US20020100124 Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
07/2002
07/31/2002EP1226881A2 Method and device for cleaning surfaces in cavities
07/31/2002EP1226603A2 Removal of photoresist and residue from substrate using supercritical carbon dioxide process
07/31/2002EP1226311A1 Rail cleaning method and apparatus
07/30/2002US6425957 Heating in sealable furnace
07/30/2002US6425956 Process for removing chemical mechanical polishing residual slurry
07/30/2002US6425953 Heating, injecting cleaning gas
07/25/2002US20020096195 Pump for gas flow into tube or slot in juxtaposition with first end and surface to be cleaned, so gas flow forms shock wave to dislodge particles from surface of semiconductor wafers, reticles
07/25/2002US20020095816 Method and apparatus for high-pressure wafer processing and drying
07/24/2002EP1224352A1 Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
07/24/2002EP1224351A1 Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
07/24/2002EP1224041A2 Cleaning processes using hydrofluorocarbons and/or hydrochlorofluorocarbon compounds
07/24/2002CN1360383A Equipment with charging function and able to output more voltages
07/23/2002US6423275 Regenerative devices and methods
07/23/2002US6422925 Carbon electrode cleaning system and method
07/18/2002WO2002055628A2 Oil absorption and reclamation methods
07/18/2002WO2002055224A1 Optical treatment device
07/18/2002US20020094664 Method and apparatus for removal of surface contaminants from substrates in vacuum applications
07/18/2002US20020092547 Semiconductor wafer washing system includes washing solution supply section that stores each of various chemicals needed for washing and controls the flow rate of chemicals, washing tank for receiving the chemicals, and a circulation section
07/18/2002US20020092544 Substrate cleaning apparatus and substrate cleaning method
07/18/2002US20020092542 Apparatus for cleaning semiconductor wafer and method for cleaning wafer using the same
07/18/2002US20020092541 Each of the pads is approached to each of the front surface and the rear surface of a semiconductor wafer, a cleaning gas is injected into fine clearance formed between both of them to generate a high speed gas flow to clean particles left
07/18/2002US20020092474 Device for and a method of cleaning a milking machine, and a milking machine
07/18/2002US20020092121 Dry cleaning apparatus
07/17/2002EP1222038A1 Device and method for mechanically removing surface coatings by means of coldness
07/17/2002CN1359316A Method of removing organic materials from substrates