Patents
Sitemap › B08 - Cleaning › B08B - Cleaning in general; Prevention of fouling in general › B08B 7 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass
Patents for B08B 7 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass (12,806)
04/2003
04/17/2003US20030070690 Method for treating an object using ultra-violet light
04/16/2003EP1301289A1 Edge bead removal for spin-on materials using carbon-dioxide cleaning
04/16/2003EP1301288A1 Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them
04/16/2003CN1411398A Substrate with photocatalytic and/or hydrophilic coating
04/16/2003CN1410174A Method and apparatus for washing substrate and member mounting method
04/15/2003US6546938 Holding and rotating a chuck as pressure plasma jet rinses predetermined areas; another nozzle dries with nitrogen gas; integrated circuits; semiconductors
04/15/2003CA2360877A1 Compressed air snow removal from road vehicles
04/10/2003WO2003030219A2 High pressure processing chamber for multiple semiconductor substrates
04/10/2003WO2003028940A1 Utrashort pulsed laser micromachining/submicromachining using an acoustooptic scanning device with dispersion compensation
04/10/2003WO2003028909A1 Dense-phase fluid cleaning system utilizing ultrasonic transducers
04/10/2003US20030068448 Method for reducing contaminants in a CVD chamber
04/10/2003US20030066975 Photocatalytic layer; decomposing impurities by exposure toradiation
04/10/2003US20030066549 Substrate processing method, and apparatus therefor
04/10/2003US20030066545 Controlled heating; heat exchanging; vaporization of acidicresidues
04/10/2003US20030066544 Apparatus and process for supercritical carbon dioxide phase processing
04/10/2003US20030066543 Flexible web cleaning process
04/10/2003US20030066542 Process for removing dopant ions from a substrate
04/10/2003US20030066541 Etching; cleaning gas mixture containing fluoropolymer
04/10/2003CA2462429A1 High pressure processing chamber for multiple semiconductor substrates
04/09/2003EP1299183A2 Apparatus and method for continuous surface modification of substrates
04/09/2003EP0839023B1 Liquid cleansing composition comprising soluble, lamellar phase inducing structurant
04/08/2003US6545245 Method for dry cleaning metal etching chamber
04/08/2003US6544914 Synthetic quartz glass for optical member, process for producing the same, and method of using the same
04/08/2003US6544347 Methods for using a ring-vortex
04/08/2003US6544345 Etching, removal deposits
04/08/2003US6543462 Apparatus for cleaning surfaces substantially free of contaminants
04/08/2003US6543460 Etching surfaces of seeds while tumbling; uniformity
04/08/2003US6543156 Method and apparatus for high-pressure wafer processing and drying
04/03/2003US20030062642 Leadframe and method for removing cleaning compound flash from mold vents
04/03/2003US20030062603 Leadframe and method for removing cleaning compound flash from mold vents
04/03/2003US20030062347 Method and apparatus for deflashing of integrated circuit packages
04/03/2003US20030062071 Dense-phase fluid cleaning system utilizing ultrasonic transducers
04/03/2003US20030062070 Method and apparatus for removing polymeric coatings from optical fiber
04/03/2003US20030062065 Systems and methods for conditioning ultra high purity gas bulk containers
04/02/2003EP1297906A1 Method of manufacturing an anti vibration device for vehicle comprising a metal insert adhered with an elastomer
04/02/2003EP1297223A1 Thoroughfare marking removal
04/02/2003CN2542351Y Cylindrical adhesive dust-remover
04/02/2003CN1407931A Device and method for removal of rust and paint
03/2003
03/27/2003WO2003025971A2 Plasma processing apparatus with coil magnet system
03/27/2003WO2003024630A1 Method and apparatus for cleaning substrates using liquid carbon dioxide
03/27/2003US20030056813 Multiple heating, cooling, and/or cleaning zones; jet flow provides more effective contaminant removal without the need for a pump or compressor.
03/27/2003US20030056808 Cleaner strip for rollers of cartridge loader
03/26/2003EP1295076A1 Apparatus for removing dust accretions from a smelting furnace
03/26/2003EP1294518A2 Implementation system for continuous welding, method, and products for implementation of the system and/or method
03/26/2003EP0800424B1 Ultra-low particle semiconductor cleaner
03/25/2003US6537916 Removal of CMP residue from semiconductor substrate using supercritical carbon dioxide process
03/25/2003US6536135 Carbon-enhanced fluoride ion cleaning
03/25/2003US6536061 Method and apparatus for cleaning oil absorbent materials
03/25/2003US6536059 Pumpless carbon dioxide dry cleaning system
03/20/2003WO2003023840A2 Methods and apparatus for cleaning and/or treating a substrate using co¿2?
03/20/2003WO2003023828A1 Guard heater and pressure chamber assembly including the same
03/20/2003WO2003023827A1 Pressure chamber assembly including drive means
03/20/2003WO2002061811A3 Laser cleaning process for semiconductor material
03/20/2003WO2002012587A3 Processing apparatus and cleaning method
03/20/2003WO2001096645A9 Method and system for optimizing performance of consumer appliances
03/20/2003US20030052101 Method for cleaning debris off UV laser ablated polymer, method for producing a polymer nozzle member using the same and nozzle member produced thereby
03/20/2003US20030051792 Use of a cleaning process, a cleaning process, a connection process and a workpiece pair
03/20/2003US20030051741 Method and apparatus for cleaning substrates using liquid carbon dioxide
03/20/2003US20030051739 Apparatus for in situ cleaning of carbon contaminated surfaces
03/20/2003US20030051738 Exposing said integrated circuit to a plasma said plasma being a physical plasma.
03/19/2003EP1292973A2 Method to restore hydrophobicity in dielectric films and materials
03/19/2003EP1292457A1 Apparatus and method for thermally removing coatings and/or impurities
03/18/2003US6534921 Method for removing residual metal-containing polymer material and ion implanted photoresist in atmospheric downstream plasma jet system
03/18/2003US6533952 Mitigation of radiation induced surface contamination
03/18/2003US6533902 Ultraviolet processing apparatus and ultraviolet processing method
03/18/2003US6532974 Process tank with pressurized mist generation
03/18/2003US6532684 System for cleaning pressurized containers
03/13/2003WO2003021653A1 Plasma cleaning gas and plasma cleaning method
03/13/2003WO2002029860A3 Wafer cleaning module and method for cleaning the surface of a substrate
03/13/2003US20030047551 Guard heater and pressure chamber assembly including the same
03/13/2003US20030047202 Pressure chamber assembly including drive means
03/13/2003US20030047195 Placing the substrate in a pressure chamber; circulating fluid including dense phase carbon dioxide (CO2) through the chamber such that fluid contacts the substrate; cyclically modulating the phase of the CO2 during circulation
03/13/2003US20030047191 Method and apparatus for plasma cleaning of workpieces
03/12/2003EP1290260A2 Method and system for optimizing performance of consumer appliances
03/12/2003CN2539950Y Oil pipe scaler
03/11/2003US6530823 Methods for cleaning surfaces substantially free of contaminants
03/06/2003WO2003019633A1 Method of surface-processing components of vacuum processing device
03/06/2003WO2002071438A3 Capillary discharge plasma apparatus and method for surface treatment using the same
03/06/2003US20030045117 Contacting an etched precision surface with a liquid or supercritical carbon dioxide and an acid having a pKa of less than about 4 under thermodynamic conditions consistent with the retention of said liquid or supercritical CO2
03/05/2003EP1286792A1 Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them
03/04/2003US6528427 Methods for reducing contamination of semiconductor substrates
03/04/2003US6527870 Wafer cleaning module and method for cleaning the surface of a substrate
03/04/2003US6526997 Dry cleaning method for the manufacture of integrated circuits
02/2003
02/27/2003WO2002080213A3 Irradiation system and method
02/27/2003US20030040193 Method for enhancing substrate processing
02/27/2003US20030039087 Substrate support apparatus to facilitate particle removal
02/27/2003US20030037877 Delabelling method and device for carrying out said method
02/27/2003US20030037808 Comprises self-centered (via three-point grip on perimeter) spindle on the end of the cylindrically shaped cartridge filter wherein pressurized stream of air or water rotates and flings debris via centrifugal force
02/27/2003US20030037803 Via imparting broadband impulse; vacuum chucking; for semiconductors and integrated circuits
02/27/2003US20030037801 Via imparting broadband impulse and determining if particles are in the exhaust line; semiconductors
02/27/2003US20030037800 Method for removing contamination particles from substrate processing chambers
02/27/2003US20030037457 Particle removal apparatus
02/27/2003US20030037456 Processing platform with integrated particle removal system
02/27/2003US20030037400 Factory interface particle removal platform
02/27/2003DE20219644U1 Device for continuously drying contaminated aluminum swarf comprises a rotating drum heated using a burner and having a first end at which the swarf is continuously introduced and a second end at which the dried swarf is ejected
02/26/2003CN2537484Y Improved glue removing wheel
02/25/2003USRE38001 Cleaning with liquid gases
02/25/2003US6524394 Blasting with pressurized air
02/25/2003US6524393 Oil absorption and reclamation methods therefrom
02/25/2003US6523208 Flexible web cleaning system
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