| Patents for B08B 7 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass (12,806) |
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| 07/01/2004 | DE10261875A1 Cleaning system for removing contamination from surface of component in lithographic projection apparatus that is used in manufacture of integrated circuits, comprises cleaning particle provider with electric field generator |
| 06/30/2004 | EP1433198A2 Methods and apparatus for cleaning and/or treating a substrate using co2 |
| 06/30/2004 | CN1508848A Method and apparauts for removing residual material from substrate of electronic device |
| 06/29/2004 | US6756021 Device for eliminating gas or paraffin hydrate deposits that form in well drilling equipment or in hydrocarbon production or transportation equipment |
| 06/29/2004 | US6755871 Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent |
| 06/29/2004 | US6755156 Device, system and method for on-line explosive deslagging |
| 06/24/2004 | WO2004053185A1 Method for the conservation of metal surfaces |
| 06/24/2004 | US20040121269 exposing the process surface to a supercritical CO2 containing medium - |
| 06/24/2004 | US20040118810 Treatment to eliminate polysilicon defects induced by metallic contaminants |
| 06/24/2004 | US20040118430 Pressure processing apparatus with improved heating and closure system |
| 06/24/2004 | US20040118281 CO2 recovery process for supercritical extraction |
| 06/23/2004 | EP1431830A2 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/23/2004 | EP1431828A1 Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system |
| 06/23/2004 | EP1429875A1 Dense-phase fluid cleaning system utilizing ultrasonic transducers |
| 06/23/2004 | CN1507502A Duo-step plasma cleaning of chamber residues |
| 06/23/2004 | CN1506766A Method for producing optical etching equipment and devices |
| 06/22/2004 | US6752192 Label release and separation system |
| 06/17/2004 | WO2004050936A2 Method for cleaning a process chamber |
| 06/17/2004 | WO2003107396A3 Substrate processing apparatus and related systems and methods |
| 06/17/2004 | WO2003043751A8 An apparatus and method for cleaning glass substrates using a cool hydrogen flame |
| 06/17/2004 | US20040114019 Conveyor cleaner and ink-jet printing apparatus including it |
| 06/17/2004 | US20040112409 Cleaning solution; controlling fluoride concentration; rsupercritical solution; emoval residues afteretching of semiconductor |
| 06/17/2004 | US20040112406 Solid CO2 cleaning |
| 06/17/2004 | US20040112405 Method and apparatus for cleaning a semiconductor substrate |
| 06/17/2004 | US20040112403 Microwave absorber on substrates; damaging coating; removal |
| 06/17/2004 | US20040112402 Surface cleaning; heat exchanging; holding semiconductor; heating, cooling cycles |
| 06/17/2004 | US20040112306 Method for cleaning combustion devices |
| 06/17/2004 | DE10255988A1 Verfahren zum Reinigen einer Prozesskammer A method of cleaning a process chamber |
| 06/17/2004 | DE10255889A1 Manufacture of an electrostatic holding body containing a pedestal, carrying a film system useful in the semiconductor industry |
| 06/16/2004 | EP1429189A1 Lithographic apparatus and device manufacturing method |
| 06/16/2004 | EP1428907A1 Thermal activation of gas for use in a semiconductor process chamber |
| 06/16/2004 | EP1237734B1 Coating removal system having a solid particle nozzle with a detector for detecting particle flow and associated method |
| 06/16/2004 | EP1200789B1 An ultrasonic cleaning method |
| 06/10/2004 | WO2004049419A1 Plasma processing method and apparatus |
| 06/10/2004 | WO2004048783A2 High-pressure device for closing a container |
| 06/10/2004 | US20040109852 Contacting with acylases and a carrier to degrade a lactone such as an N-acyl-L-homoserine lactone produced by one or more microorganisms |
| 06/10/2004 | US20040108059 System and method for removal of materials from an article |
| 06/10/2004 | US20040107905 Surface silanization |
| 06/10/2004 | US20040107858 Device, System and Method for On-Line Explosive Deslagging |
| 06/09/2004 | EP1426719A2 Device, system and method for on-line explosive deslagging |
| 06/09/2004 | EP1425780A1 Pressure chamber assembly including drive means |
| 06/09/2004 | EP1425115A1 Supercritical fluid delivery and recovery system for semiconductor wafer processing |
| 06/09/2004 | DE10255231A1 Hochdruckvorrichtung und -verfahren zum hydraulischen Krafthub und Behälterverschluss im Reinraum High pressure apparatus and method for hydraulic power stroke and container closure in the clean room |
| 06/08/2004 | US6747243 Spot cleaning of particles after inspection |
| 06/08/2004 | US6746974 Tack pad having opposite major surfaces and thickness of at least 5 mm comprising non-woven cross-laid carded web having needle-tacked and bonded multilayer structure, at least one major surface of which is impregnated with acrylic tackifier |
| 06/08/2004 | US6745494 Method and apparatus for processing wafers under pressure |
| 06/03/2004 | WO2004046423A1 An apparatus and process for the dry removal of the scale found on the surface of metal products |
| 06/03/2004 | WO2004045783A2 Method for cleaning cookware and tableware with film forming liquid dishwashing compositions |
| 06/03/2004 | WO2004045739A2 Substrate processing apparatus for processing substrates using dense phase gas and sonic waves |
| 06/03/2004 | WO2004029990A3 Surface treatment of concrete |
| 06/03/2004 | US20040104206 Methods for preparing ball grid array substrates via use of a laser |
| 06/03/2004 | US20040103922 Method of high pressure treatment |
| 06/03/2004 | US20040103919 Single wafer cleaning with ozone |
| 06/03/2004 | US20040103917 Method of cleaning by removing particles from surfaces, a cleaning apparatus and a lithographic projection apparatus |
| 06/03/2004 | US20040103914 Method for cleaning a plasma chamber |
| 06/03/2004 | US20040103913 Apparatus for washing glass substrates and process for producing a liquid crystal device |
| 06/02/2004 | EP1423491A1 Method and composition to decrease iron sulfide deposits in pipe lines |
| 06/02/2004 | EP1259333A4 Contact lens treatment apparatus and methods |
| 06/02/2004 | CN1502122A Method to restore hydrophobicity in dielectric films and materials |
| 06/02/2004 | CN1501846A Edge bead removal for spin-on materials using carbon-dioxide cleaning |
| 06/01/2004 | US6744592 Cleaner strip for rollers of cartridge loader |
| 05/27/2004 | WO2004044257A1 Method and device for descaling and/or cleaning a metal casting |
| 05/27/2004 | WO2002101784B1 Plasma processor |
| 05/27/2004 | US20040099284 Spraying steam on the surfaces photoresists using nozzles, then peeling |
| 05/27/2004 | US20040099281 Method for cleaning plasma enhanced chemical vapor deposition chamber using very high frequency energy |
| 05/27/2004 | DE10252178A1 Process for descaling and/or cleaning a metal strand, especially a hot-rolled strip made from normal steel or a stainless steel, comprises feeding the strand with a high degree of planarity through a plasma descaling and/or cleaning device |
| 05/26/2004 | EP1422316A1 Method for cleaning reaction container and film deposition system |
| 05/26/2004 | EP1422026A2 Method for cleaning/scraping and apparatus therefor |
| 05/26/2004 | EP1421609A1 Process and apparatus for treating a workpiece such as a semiconductor wafer |
| 05/26/2004 | CN1498698A Substrate processor |
| 05/25/2004 | US6739347 System for spin-cleaning closed-end filter cartridges |
| 05/25/2004 | US6739346 Apparatus for cleaning filters |
| 05/25/2004 | US6739073 Method and apparatus for performing multiple cleaning and vacuum drying operations in enclosed vessels |
| 05/21/2004 | WO2004042810A1 Method for cleaning microstructure |
| 05/21/2004 | WO2004042794A2 Removal of particle contamination on patterned slilicon/silicon dioxide using supercritical carbon dioxide/chemical formulations |
| 05/21/2004 | WO2004041658A2 Substrate process tank with acoustical source transmission and method of processing substrates |
| 05/21/2004 | WO2004030037A3 System for in-situ generation of fluorine radicals and/or fluorine-containing interhalogen (xfn) compounds for use in cleaning semiconductor processing chambers |
| 05/20/2004 | US20040094508 Surface treating method |
| 05/20/2004 | US20040094183 Dense phase gases such as supercritical fluids can be used in combination with sonic energy (e.g., megasonic acoustic waves) to process substrates such as semiconductor wafers |
| 05/19/2004 | CN2616312Y Viscos dust-cleaning device |
| 05/19/2004 | CN1497667A High-Pressure processing method and high-pressure processing device |
| 05/19/2004 | CN1497666A Fluoration thermal active for semiconductor working chamber |
| 05/18/2004 | US6736906 Workpiece holder includes cylindrically shaped rotator having an exterior wall having fluid guide |
| 05/18/2004 | US6736859 Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent |
| 05/13/2004 | WO2004040370A2 Apparatus and method for cleaning surfaces of semiconductor wafers using ozone |
| 05/13/2004 | WO2004011181A3 Method and apparatus for removing minute particle(s) from a surface |
| 05/13/2004 | US20040089322 Cleaning system and a method of cleaning |
| 05/12/2004 | CN1495285A Chemical vapour phase deposition coating coating equipment |
| 05/12/2004 | CN1494956A Cleaning method for removing particles from surface, cleaning equipment and photo-engraving projection equipment |
| 05/12/2004 | CN1494954A Method and composition for removing residue from microstructure of body |
| 05/11/2004 | US6734444 Substrate treatment device using a dielectric barrier discharge lamp |
| 05/11/2004 | US6734388 Dry surface cleaning apparatus |
| 05/11/2004 | US6734102 Plasma treatment for copper oxide reduction |
| 05/06/2004 | WO2004038731A2 Radioactive decontamination and translocation method |
| 05/06/2004 | WO2004037506A1 Scrub washing method, scrub washing device, lens forming die drying method, lens forming die drying device, and plastic lens manufacturing method |
| 05/06/2004 | US20040087456 enables damage-free, residue-free cleaning of substrates having particulate contamination on Si/SiO2 substrates |
| 05/06/2004 | US20040084063 Multi-motion stainbrush |
| 05/05/2004 | CN1494733A High-pressure treatment method |
| 04/29/2004 | WO2003100118A3 Method and device for treating workpieces |
| 04/29/2004 | US20040082186 Method for cleaning plasma etching apparatus, method for plasma etching, and method for manufacturing semiconductor device |