Patents
Patents for B08B 7 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass (12,806)
07/2002
07/17/2002CN1358580A Washing method and equipment, object being washed and material feeding bucket
07/16/2002US6420891 Wafer prober for in-line cleaning probe card
07/11/2002WO2002053300A1 Method and apparatus for critical flow particle removal
07/11/2002WO2001066365A3 Coating removal system having a solid particle nozzle with a detector for detecting particle flow and associated method
07/11/2002US20020088482 Apparatus for confined underwater cryogenic surface preparation
07/11/2002US20020088477 Process for removing chemical mechanical polishing residual slurry
07/11/2002DE10163301A1 Surface preparation process for grinding tool involves focusing laser jet, applying it to tool surface for sampling, and removing layer of worked material between particles
07/10/2002EP1221282A1 A device for and a method of cleaning a milking machine, and a milking machine
07/10/2002EP1007279B1 A shot-blasting machine for cleaning a linear metal element
07/10/2002CN1357417A Dry ice cleaning method and apparatus
07/10/2002CN1357416A Dry ice cleaning method and apparatus and dry ice cleaned parts or equipment
07/09/2002US6417028 Method and apparatus for removing contaminants on electronic devices
07/09/2002US6416589 Cleaning oxides from metal surfaces
07/08/2002CA2364803A1 A device for and a method of cleaning a milking machine, and a milking machine
07/04/2002WO2002052347A1 Mitigation of radiation induced surface contamination
07/04/2002US20020086537 Removal of CMP residue from semiconductor substrate using supercritical carbon dioxide process
07/04/2002US20020086105 Used for applying a liquid to a substrate
07/04/2002US20020083962 Apparatus and method for sequential removal of oxides from steel
07/04/2002DE10061245A1 Method for detaching/removing adhesive labels from a label support comprises placing the front side of a wear-resistant, sealable band on the free visible face of the label facing away from the label support
07/02/2002US6413574 Cleaning substrates, particularly metal substrates, and useful for polymerization processes, coatings, extractions, and the manufacture and treatment of particles.
06/2002
06/27/2002US20020082179 Pneumatically feeding a carrier gas to the blast nozzle which blasts a target with dry ice pellets charging the gas (air) to destaticize and prevent fusion of the dry ice; cleaning appliances, televisions, copiers, printers, and computers
06/27/2002US20020081856 Reducing the oxidized interface with a hydrogen containing plasma and introducing second-layer-forming compounds
06/27/2002US20020079300 Implementation system for continuous welding, method, and products for the implementation of the system and/or method
06/27/2002US20020079089 Apparatus for enhancing condensation and boiling of a fluid
06/26/2002EP1216391A1 Device, system and method for on-line explosive deslagging
06/26/2002EP1216109A1 METHOD AND SYSTEM FOR i IN SITU /i CLEANING OF SEMICONDUCTOR MANUFACTURING EQUIPMENT USING COMBINATION CHEMISTRIES
06/26/2002EP0784518B1 Microbiological parts washer
06/26/2002CN1355917A Polish cleaning apparatus and method in manufacture of HGA.
06/26/2002CN1086610C Sand-blast medium and method for cleaning electronic hardware components
06/25/2002US6410883 Cleaning device and method for cleaning resin sealing metal mold
06/25/2002US6409842 Method for treating surfaces of substrates and apparatus
06/20/2002WO2002049085A1 Apparatus for cleaning the edges of wafers
06/20/2002WO2002007926A8 Method and apparatus for removing minute particles from a surface
06/20/2002US20020074022 Method and device for the cleaning of objects using a compressed cleaning fluid
06/20/2002US20020074019 Parts washing system
06/20/2002US20020074015 Placing the substrate (with coating) in a closed chamber, contacting color filter array coating with dry ozone to remove acrylic polymer coating from the substrate and washing the substrate with ultrapure water to reuse it
06/20/2002US20020074014 Using waterless auto cleaning first, followed by an Argon purge for further removal of residual deposition in the chamber
06/19/2002EP1214173A1 Method and device for releasing metallic workpieces from clamped chips or the like
06/18/2002US6408151 Card cleaning device
06/18/2002US6407385 Methods and apparatus for removing particulate foreign matter from the surface of a sample
06/18/2002US6406550 Surface oxides are reduced by directing reducing gases at them in a forceful and turbulent manner
06/13/2002WO2002009161A3 Process for cleaning ceramic articles
06/13/2002US20020070204 Method for making holes in a substrate
06/13/2002US20020069896 Contact lens treatment apparatus
06/12/2002EP1212252A1 Web guidance system
06/12/2002EP1212151A1 Process and apparatus for treating a workpiece such as a semiconductor wafer
06/11/2002US6403544 Semiconductor wafers or chips; supercritical co2 gas as a dense phase fluid and modifier selected from the group consisting of propylene carbonate, ethylene carbonate, butylene carbonate, propylene glycol methyl ether acetate
06/11/2002US6402854 Method of cleaning the inside surface of ducts
06/11/2002US6402853 Computer controlled heating, cooling cycles
06/11/2002US6402852 Apparatus and method for continuous removal of oxides from metal
06/11/2002US6401287 System for cleaning a web substrate
06/06/2002WO2002043781A1 Method and device for treating the surfaces of items
06/06/2002WO2002016051A3 Surface cleaning and modification processes, methods and apparatus using physicochemically modified dense fluid sprays
06/06/2002US20020068511 Dry ice cleaning method, dry ice cleaning apparatus, and part or unit cleaned by dry ice
06/06/2002US20020068510 Dry ice cleaning method and dry ice cleaning apparatus
06/06/2002US20020066470 Apparatus and process to clean and strip coatings from hardware
06/06/2002US20020066464 Gas/liquid interface moves across the wafer surface while the bath of heated aqueous solution is energized with sonic energy in the presence of an ozone environment
06/06/2002DE10121188A1 Verfahren zum Entfernen eines restlichen Metall enthaltenden Polymermaterials und von ionenimplantiertem Photoresistmaterial in einem stromabwärtigen atmosphärischen Plasmabearbeitungssystem A method of removing a residual polymeric material containing metal and ion-implanted photoresist material in a downstream atmospheric plasma processing system
06/06/2002DE10047822C1 Spüleinrichtung für ein Dichtsystem und Verfahren zur Anwendung derselben Flushing device for a sealing system and method of using same
05/2002
05/30/2002WO2002042013A1 An in situ module for particle removal from solid-state surfaces
05/30/2002US20020063114 Device for cleaning an article
05/28/2002US6395192 Method and apparatus for removing native oxide layers from silicon wafers
05/28/2002US6395100 Method of improving vacuum quality in semiconductor processing chambers
05/28/2002US6394105 Disk surfaces; removal impurities
05/23/2002WO2002040189A1 Method and device for producing an aluminium film from an aluminium material
05/23/2002DE10057293C1 Production of an aluminum foil used as pharmaceutical blister packaging comprises cold rolling the foil using a roll stand, and plasma treating the metallic surface of the foil in a treating station before being coiled
05/22/2002EP1206979A1 Process and apparatus for cleaning articles with a compressed cleaning fluid
05/21/2002US6391117 Method of washing substrate with UV radiation and ultrasonic cleaning
05/16/2002DE10051631A1 Method for detaching/removing adhesive labels from a label support comprises placing the front side of a wear-resistant, sealable band on the free visible face of the label facing away from the label support
05/14/2002US6386949 Method for cleansing/scraping and apparatus therefor
05/14/2002CA2172388C Disposable mop heads
05/10/2002WO2002036259A1 Excimer uv photo reactor
05/10/2002WO2001028950A9 A method and apparatus for treating a substrate with an ozone-solvent solution
05/09/2002US20020053353 Methods and apparatus for cleaning an object using an electron beam, and device-fabrication apparatus comprising same
05/08/2002DE10055127A1 Cleaning process based on compressed cleaning fluid involves using fluid decompressed at pressure producing gas volume which is multiple of compressed volume
05/07/2002US6384370 Method of removing a coating film with a laser beam
05/07/2002US6383329 Apparatus and method for removing a label from a surface with a chilled medium
05/07/2002US6383289 Apparatus for liquid carbon dioxide systems
05/02/2002US20020051652 Card cleaning device
05/02/2002US20020050279 Introducing a heated liquid including hydrogen fluoride onto the surface of a silicon wafer, diffusing ozone through the liquid,controlling the thickness of the liquid on the surface of the wafer, to maintain a desired level of etch uniformity
05/02/2002EP1200789A1 An ultrasonic cleaning method
05/02/2002DE10044870A1 Verfahren und Vorrichtung zur Reinigung von benutzten Schüttgut-Textilcontainern oder dergleichen Method and device for cleaning used bulk containers or the like textile
04/2002
04/30/2002US6379575 Treatment of etching chambers using activated cleaning gas
04/30/2002US6378154 Web cleaning system
04/25/2002WO2002033684A2 Delabelling method and device for carrying out said method
04/25/2002WO2002032593A1 Method, device and installation for cleaning contaminated parts, with a dense pressurised fluid
04/25/2002WO2001096645A3 Method and system for optimizing performance of consumer appliances
04/25/2002US20020048629 Carbon dioxide cleaning and separation systems
04/25/2002US20020046434 Cleaning member, cylindrical cleaning element of cleaning member, methods for producing cleaning member and cylindrical cleaning element, and tool for enlarging diameter of cylindrical cleaning element
04/25/2002DE10051122A1 Device for cleaning surfaces using supercritical CO-2 has several parallel adsorbers for dissolved contaminants in CO-2 circuits
04/25/2002DE10046594A1 Entetikettierverfahren und zugehörige Vorrichtung Entetikettierverfahren and associated apparatus
04/24/2002EP1198306A1 Encapsulation method for maintaining biodecontamination activity
04/23/2002US6374835 Parts washing system
04/23/2002US6374454 Device for cleaning air conduits
04/18/2002WO2002032200A1 Substrate cleaning
04/18/2002WO2002031861A2 Substrate processing in an immersion, scrub and dry system
04/18/2002WO2002012585A3 Processing apparatus and cleaning method
04/18/2002US20020045966 Chemical vapor deposition process and apparatus for performing the same
04/18/2002US20020043331 Method for manufacturing a group III nitride compound semiconductor device
04/18/2002US20020043272 Immersing a wafer in water, the wafer has front and back faces, and an edge, includes a particle free environment adjacent to front face and back face as liquid is being removed