| Patents for B08B 7 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass (12,806) |
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| 09/01/2004 | CN1526159A 等离子体清洗气体和等离子体清洁方法 Plasma cleaning gas and plasma cleaning method |
| 08/31/2004 | US6783599 Applying a fluid to the surface; lowering the temperature of the fluid so as to form a solid layer of the fluid over the surface and entrapping impurities within the layer, applying sonic energy which separates layer including impurities |
| 08/31/2004 | US6782900 Methods and apparatus for cleaning and/or treating a substrate using CO2 |
| 08/26/2004 | WO2004073363A1 Plasma generating apparatus, plasma generating method, and remote plasma processing apparatus |
| 08/26/2004 | WO2004073056A1 Method for cleaning substrate processing apparatus and substrate processing apparatus |
| 08/26/2004 | WO2004071694A1 Cleaning and heating of iron liners for casting aluminium cylinder blocks |
| 08/26/2004 | WO2004050936A3 Method for cleaning a process chamber |
| 08/26/2004 | US20040165160 Lithographic apparatus and device manufacturing method |
| 08/26/2004 | US20040163763 Method and apparatus for low energy electron enhanced etching of substrates in an AC or DC plasma environment |
| 08/24/2004 | US6779226 Factory interface particle removal platform |
| 08/19/2004 | WO2004070776A2 Methods for transferring supercritical fluids in microelectronic and other industrial processes |
| 08/19/2004 | WO2004069760A1 Method for removing foreign matter on surface of glass substrate |
| 08/19/2004 | WO2004041658A3 Substrate process tank with acoustical source transmission and method of processing substrates |
| 08/19/2004 | US20040159335 Radiation in the radio or microwave portion of the electromagnetic spectrum is applied to a substrate housed within a pressurized processing chamber to promote desirable chemical reactions involving the substrate; e.g., stripping doped photoresists |
| 08/19/2004 | US20040159332 especially for cleaning bathroom fixtures; reservoir in hollow handle for storing cleaning solution, with cap connected to one end and base preferably attached to brush or sponge connected to the other; controlling rate of fluid dispensed |
| 08/18/2004 | CN1520939A Serially using type cleaning supplies |
| 08/18/2004 | CN1162894C Device for irradiating ultraviolet ray |
| 08/17/2004 | US6777642 Method and apparatus for cleaning surfaces |
| 08/17/2004 | US6777223 Methods for eliminating the formation of biofilm |
| 08/17/2004 | US6776171 Applying a sacrificial coating of a material to a substrate surface to encapsulate and suspend undesirable particles; fluidizing applying energy to substrate to dislodge particles; removing particulate containing sacrificial material coating |
| 08/17/2004 | US6776170 Method and apparatus for plasma cleaning of workpieces |
| 08/12/2004 | WO2004067196A1 Cleaning with liquid carbon dioxide |
| 08/12/2004 | WO2003107396B1 Substrate processing apparatus and related systems and methods |
| 08/12/2004 | US20040154641 Substrate processing apparatus and method |
| 08/12/2004 | US20040154638 Method to use a laser to perform the edge clean operation on a semiconductor wafer |
| 08/12/2004 | CA2514601A1 Cleaning with liquid carbon dioxide |
| 08/11/2004 | EP1445040A1 Method for removing at least one brittle layer from a substrate |
| 08/11/2004 | CN2631409Y Scraps binder |
| 08/11/2004 | CN1520609A High pressure wafer-less auto clean for etch applications |
| 08/11/2004 | CN1519893A Wetting processing appts. |
| 08/11/2004 | CN1519889A Cleaning method for mfg. appts. of semiconductor device |
| 08/11/2004 | CN1519060A Method for rinsing surface of silicon and technique for manufacturing thin film transistory by using the rinsing method |
| 08/10/2004 | US6772776 In a vacuum chamber, generating activated gaseous species that react with the carbon contaminants to form carbon containing gaseous byproducts; especially activating the gas using electrons |
| 08/05/2004 | WO2004066365A2 Cleaning of cvd chambers using remote source with cxfyoz based chemistry |
| 08/05/2004 | WO2004066359A2 Apparatus and method for treating surfaces of semiconductor wafers using ozone |
| 08/05/2004 | WO2004065526A2 Method of immobilising hydrocarbons inside submerged containers or of transporting said hydrocarbon to the surface, using the properties of supercritical fluids at a great depth |
| 08/05/2004 | WO2004065027A1 Iced film substrate cleaning |
| 08/05/2004 | WO2004064874A2 Underside disinfection of workpieces on a conveyor belt |
| 08/05/2004 | WO2004048783A3 High-pressure device for closing a container |
| 08/05/2004 | US20040149317 Apparatus and process for supercritical carbon dioxide phase processing |
| 08/05/2004 | US20040149311 Spraying on polymer, plasticizer, active agents and carrier, allowing to set and peeling off soil containing film; no scrubbing or rinsing; nondamaging; heavy soil removal |
| 08/05/2004 | US20040149308 Layered stack is constructed is to reduce differences in acoustical impedance between consecutive layers; efficiency in cleaning or photoresist stripping; integrated circuits, semiconductors |
| 08/05/2004 | CA2514171A1 Method of immobilising hydrocarbons inside submerged containers or of transporting said hydrocarbon to the surface, using the properties of supercritical fluids at a great depth |
| 08/04/2004 | EP1442802A1 Cleaning with liquid carbon dioxide |
| 08/04/2004 | EP1441836A1 Central carbon dioxide purifier |
| 08/04/2004 | EP1261453B1 Polishing method for soft acrylic articles |
| 07/29/2004 | WO2004064244A2 Method for releasing and drying moveable elements of micro-electronic mechanical structures with organic thin film sacrificial layers |
| 07/29/2004 | WO2004064129A1 Substrate processing method and substrate processing apparatus |
| 07/29/2004 | WO2004064121A2 A supercritical fluid cleaning system and method |
| 07/29/2004 | WO2004062818A2 Automatic board eraser cleaning machine |
| 07/29/2004 | WO2004062477A2 Improved surface for use on implantable device |
| 07/29/2004 | US20040144401 Method of and apparatus for removing contaminants from surface of a substrate |
| 07/29/2004 | US20040144399 Processing of semiconductor components with dense processing fluids and ultrasonic energy |
| 07/29/2004 | US20040144320 Method for cleaning reaction container and film deposition system |
| 07/29/2004 | DE10230790B4 Vorrichtung zum Reinigen von Rotationskörpern von Druckmaschinen oder Zylindern einer Offsetdruckmaschine Device for cleaning printing machines or rotary bodies of cylinders of an offset printing machine |
| 07/29/2004 | CA2512954A1 Improved surface for use on implantable device |
| 07/28/2004 | CN1516892A Cleaning gas and etching gas |
| 07/27/2004 | US6766813 Apparatus and method for cleaning a wafer |
| 07/27/2004 | US6766810 Methods and apparatus to control pressure in a supercritical fluid reactor |
| 07/22/2004 | WO2004045739A3 Substrate processing apparatus for processing substrates using dense phase gas and sonic waves |
| 07/22/2004 | WO2003103861A9 Material recycling apparatus using laser stripping of coatings |
| 07/22/2004 | US20040142564 Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process |
| 07/22/2004 | US20040140298 Iced film substrate cleaning |
| 07/22/2004 | US20040139987 Method for releasing and drying moveable elements of micro-electronic mechanical structures with organic thin film sacrificial layers |
| 07/22/2004 | US20040139986 Imparting turbulence; increasing circulation of supercritical fluid; pressure chamber with rotable impeller and drive shaft |
| 07/22/2004 | US20040139983 Cleaning of CVD chambers using remote source with CXFYOZ based chemistry |
| 07/22/2004 | DE10334434A1 Verfahren und Gerät zum Reinigen eines Halbleitersubstrats Method and apparatus for cleaning a semiconductor substrate |
| 07/22/2004 | DE10300439A1 Assembly to treat material surface, e.g. degrease metal foil, has electrodes tightly against surface to give homogenous surface discharge |
| 07/21/2004 | EP1438144A1 A method of automatically treating of a surface |
| 07/21/2004 | CN1515018A Plasma processor |
| 07/21/2004 | CN1514925A Method and device for cleaning combustion devices |
| 07/21/2004 | CN1158145C Spin coating method and apparatus for liquid carbon dioxide systems |
| 07/20/2004 | US6764552 Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials |
| 07/20/2004 | US6764551 Process for removing dopant ions from a substrate |
| 07/20/2004 | US6764385 Methods for resist stripping and cleaning surfaces substantially free of contaminants |
| 07/20/2004 | US6763840 Method and apparatus for cleaning substrates using liquid carbon dioxide |
| 07/15/2004 | WO2004059383A2 Fluoride in supercritical fluid for photoresist and residue removal |
| 07/15/2004 | WO2004042794A3 Removal of particle contamination on patterned slilicon/silicon dioxide using supercritical carbon dioxide/chemical formulations |
| 07/15/2004 | US20040137741 Methods for reducing contamination of semiconductor substrates |
| 07/15/2004 | US20040134886 Surface for use on implantable device |
| 07/15/2004 | US20040134885 Etching and cleaning of semiconductors using supercritical carbon dioxide |
| 07/15/2004 | US20040134515 providing a semiconductor wafer comprising patterns for electronic circuitry and contaminant particles on a surface of the wafer and forming a solid sacrificial film on the surface of the wafer then performing supercritical fluid cleaning |
| 07/15/2004 | DE10259132A1 Jet cleaning process for material surfaces involves using liquid carbon dioxide to form jet |
| 07/14/2004 | EP1437768A1 Plasma cleaning gas and plasma cleaning method |
| 07/08/2004 | WO2004045783A3 Method for cleaning cookware and tableware with film forming liquid dishwashing compositions |
| 07/08/2004 | US20040132384 Method for post-chemical mechanical polishing cleaning |
| 07/08/2004 | US20040131783 Semiconductor wafer cleaning; size adaptability, minimizing decomposition time;, higher reacting velocity |
| 07/08/2004 | US20040129671 Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materials |
| 07/08/2004 | US20040129294 Surface layer that contains a radiocatalyst is provided on the surface of a structure, a contaminating substance adhered on surface layer is decomposed, and/or adhesion of a contaminating substance onto surface layer is inhibited by irradiating |
| 07/08/2004 | DE10257344A1 Verfahren zur Konservierung von Metalloberflächen Process for the preservation of metal surfaces |
| 07/07/2004 | CN1511333A Plasma surface treatment method and device for carrying out said method |
| 07/07/2004 | CN1510518A Photoetching device, manufacturing method for the component, and component therefrom |
| 07/06/2004 | US6759627 Method and apparatus for cleaning generator and turbine components |
| 07/06/2004 | US6759336 Methods for reducing contamination of semiconductor substrates |
| 07/06/2004 | US6758913 Injecting quantity of heated nitrogen gas into pressurized container containing anhydrous ammonia to form anhydrous ammonia/nitrogen mixture, venting mixture to flare, repeating until concentration of ammonia equals 10,000 ppm or less |
| 07/01/2004 | WO2004055879A1 Ozone-processing apparatus |
| 07/01/2004 | WO2004055878A1 Ozone-processing apparatus |
| 07/01/2004 | US20040124230 Application of acoustic and vibrational energy for fabricating bumped IC die and assembly of PCA's |
| 07/01/2004 | US20040123879 Reacting a metal with one gas; forming oxides; decompsoition with second gas |
| 07/01/2004 | US20040123484 High pressure processing method and apparatus |