Patents
Patents for B08B 7 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass (12,806)
04/2005
04/20/2005CN2693362Y Poly frequency sound wave soot blower
04/20/2005CN1607651A Methods for cleaning processing chambers
04/20/2005CN1607637A Method of manufacturing a semiconductor device
04/20/2005CN1607041A Solid and gas combined fluid jet cleaner
04/19/2005US6881914 Apparatus and method for handling, storing and reloading carriers for disk-shaped items, such as semiconductor wafers or CDs
04/19/2005US6881687 Method for laser cleaning of a substrate surface using a solid sacrificial film
04/19/2005US6880561 Molecular fluorine is decomposed in a plasma to produce atomic fluorine; air pollution control; global warming prevention
04/19/2005US6880560 Producing sonic energy perpendicularly to substrate inside of processing chamber using sonic box comprising transducer coupled to membrane; dense phase gases such as supercritical fluids can be used in combination with sonic energy
04/19/2005US6880402 Deposition monitoring system
04/14/2005WO2004110209A3 System for preserving paintbrush bristles
04/14/2005US20050079800 Cleaning tool and method
04/14/2005US20050076935 Method of cleaning semiconductor surfaces
04/14/2005US20050076934 Method of cleaning substrate
04/13/2005EP1105223A4 Cleaning of flat-panel display with fluid typically at high pressure
04/12/2005US6878636 Method for enhancing substrate processing
04/07/2005WO2005031800A2 Processing chamber including a circulation loop integrally formed in a chamber housing
04/07/2005WO2005031757A1 Strippable pva coatings and methods of making and using the same
04/07/2005WO2005031457A1 Motion picture camera having a film magazine and means for cleaning the film
04/07/2005WO2005030407A1 Ultrasonic cleaning device
04/07/2005WO2005030406A1 Ultrasonic cleaning device
04/07/2005WO2003107396A8 Substrate processing apparatus and related systems and methods
04/07/2005US20050074983 Substrate processing apparatus and substrate processing method, high speed rotary valve, and cleaning method
04/07/2005US20050074572 Debris removal tape and method of using same
04/07/2005US20050072446 Removing a coating, especially a photoresist, from, e.g., a semiconductive wafer, heating the workpiece at or above ambient pressure, adding water vapor, and diffusing O3 through the liquid layer and oxidizing a contaminant or film on the workpiece.
04/07/2005US20050072445 Aqueous solutions of silicon metal and methods of making and using same
04/07/2005US20050072444 Method for processing plasma processing apparatus
04/06/2005EP1519837A1 Device for cleaning the surface of a rotating body driven in rotation
04/06/2005EP1358729A4 Apparatus, method, and system for accessing digital rights management information
04/06/2005CN1604882A Recycle for supercritical carbon dioxide
04/06/2005CN1604811A Central carbon dioxide purifier
04/05/2005US6875303 Method of bonding a window to a substrate without a primer
04/05/2005US6875286 Solid CO2 cleaning
04/05/2005US6875285 System and method for dampening high pressure impact on porous materials
04/05/2005US6874513 High pressure processing apparatus
04/05/2005US6874511 Gas containing depositable constituents in the exhaust area is intermittently pumped out of a vacuum chamber connected to a vacuum pump via a gas line, and a reactive gas that removes deposits is intermittently added; etching silicon
04/05/2005US6874510 Method to use a laser to perform the edge clean operation on a semiconductor wafer
03/2005
03/31/2005WO2005029553A2 Methods for cleaning a set of structures comprising yttrium oxide in a plasma processing system
03/31/2005US20050067740 Wafer defect reduction by short pulse laser ablation
03/31/2005US20050067002 Processing chamber including a circulation loop integrally formed in a chamber housing
03/31/2005US20050066999 Method of controlling the revolutions of the drum of program controlled laundry machine
03/31/2005US20050066994 metal etching substrates in IC manufacturing; oxygen-containing gas during the dechuck process
03/31/2005US20050066993 Thin film forming apparatus and method of cleaning the same
03/31/2005US20050066896 Apparatus for treating the outer surface of a metal wire
03/31/2005US20050066562 Self-erecting device with debris collecting feature
03/31/2005US20050066522 For integrating display panel by bonding electronic part; adhesive tapes; efficiency
03/30/2005EP1518008A1 Electrochemical method for cleaning the surfaces of metallic work pieces and cleaning electrode
03/30/2005EP1364277A4 Apparatus, method and system for effecting information access in a peer environment
03/30/2005EP1358543A4 Apparatus method and system for registration effecting information access
03/30/2005CN1602652A Substrate cleaner
03/30/2005CN1601715A Assembling apparatus, assembling method and terminal cleaning apparatus
03/30/2005CN1600454A Dust-extraction unit, desk of coating device by vaporization and method for cleaning shade
03/29/2005US6872323 In situ plasma process to remove fluorine residues from the interior surfaces of a CVD reactor
03/24/2005WO2005027202A1 Semiconductor wafer immersion systems and treatments using modulated acoustic energy
03/24/2005WO2005026408A2 Methods of treating components of a deposition apparatus to form particle traps, and such components having particle traps thereon
03/24/2005WO2005026309A1 Detergent composition and method of cleaning
03/24/2005WO2005025880A2 Card cleaning assembly for card printing devices
03/24/2005US20050061783 Systems and methods for laser-assisted plasma processing
03/24/2005US20050061444 Plasma cleaning device
03/24/2005US20050061357 Strippable PVA coatings and methods of making and using the same
03/24/2005US20050061182 Method and apparatus for cleaning printing press
03/24/2005DE10115394B4 Maschinenbauteil und/oder verfahrenstechnische Anlage mit einem Hohlraum und Reinigungsverfahren hierfür Machine component and / or process plant having a cavity and cleaning method therefor
03/23/2005EP1516730A1 Method and apparatus for cleaning printing press
03/23/2005CN1599807A High pressure processing chamber for multiple semiconductor substrates
03/23/2005CN1597319A Method and apparatus for cleaning printing press
03/22/2005US6869499 Substrate processing method and substrate processing apparatus
03/22/2005US6869487 Process and apparatus for treating a workpiece such as a semiconductor wafer
03/22/2005US6868856 Local and remote gas dissociators coupled to a semiconductor processing chamber
03/17/2005US20050058836 Sublimating process for cleaning and protecting lithography masks
03/17/2005US20050057734 Lithographic apparatus, device manufacturing method and device manufactured thereby
03/17/2005US20050056306 Gas stream ejection through nozzle; forming recesses, apertures; oxidation; controlling pressure
03/17/2005US20050056304 Parts washing system
03/17/2005DE10135658B4 Verfahren und Vorrichtung zur Reinigung der Oberfläche eines Rotationskörpers Method and apparatus for cleaning the surface of a body of revolution
03/16/2005EP1513626A1 Machine and method for thermal cleaning and separation of metal parts
03/16/2005EP1513625A2 Method and device for treating the outer surface of a metal wire, particularly for carrying out a coating pretreatment
03/16/2005CN1596297A Cleaning agent and cleaning method for ridding titanium and titanium alloy building materials of discoloration
03/16/2005CN1593796A Cleaning technology for stainless steel bracelet
03/16/2005CN1593795A Plasma washing equipment
03/10/2005US20050052491 Card-cleaning assembly for card printing devices
03/10/2005US20050051194 Contacting with high pressure fluids; depressurization; controlling temperature by adiabatic expansion
03/09/2005EP1511582A2 Device for cleaning the surface of a component
03/09/2005EP1511414A2 Method, apparatus and system for treating biofilms associated with catheters
03/09/2005CN1592723A Method of bonding a window to a substrate without a primer
03/09/2005CN1592660A Cleaning roller device with vertical movement mechanism
03/09/2005CN1591777A Unit cleaning method and substrate treater for depressurizing chamber
03/09/2005CN1589980A Cleaning sheet, carrying member with a cleaning function and method of cleaning substrate processing equipment
03/08/2005US6864458 Iced film substrate cleaning
03/08/2005US6863079 Semiconductor wafer washing system and method of supplying chemicals to the washing tanks of the system
03/08/2005US6863077 Method and apparatus for enhanced chamber cleaning
03/08/2005US6863019 Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas
03/03/2005WO2005019490A2 Process and system for cleaning surfaces of semiconductor wafers
03/03/2005WO2005018879A1 Flexible formed sheets for treating surfaces
03/03/2005WO2004114376A3 Automated dense phase fluid cleaning system
03/03/2005US20050048241 Cleaning sheet and process for cleaning substrate treatment device using same
03/03/2005US20050048219 Surface silanization
03/03/2005US20050045272 Laser removal of adhesive
03/03/2005US20050045213 Deposition tool cleaning process having a moving plasma zone
03/03/2005US20050045206 Post-etch clean process for porous low dielectric constant materials
03/03/2005US20050044653 Cleaning apparatus and cleaning method
03/03/2005DE10336390A1 Process for removing impurities adhering to a workpiece comprises placing workpiece in a workpiece holder and vibrating workpiece using pulse transmitter with impulse-like change in direction
03/03/2005DE10336178A1 Arrangement for breaking up hot masses in flue pipes etc has hollow profiled sleeve with metal foils and explosive charge with ignition wire leading to detonator
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