B08B 7 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass

Patents for B08B 7 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass (12,806)
11/2002
11/28/2002	US20020174885 Method and apparatus for enhanced chamber cleaning
11/28/2002	DE10124895A1 Extractive cleaning process used e.g. for cleaning textiles and plastic parts comprises conveying, circulating and recovering liquefied gas by adsorption and desorption on adsorbent with condensation
11/27/2002	EP1260868A2 Method for removing resist material
11/27/2002	EP1259953A2 Delabelling method and device for carrying out said method
11/27/2002	EP1259333A1 Contact lens treatment apparatus and methods
11/26/2002	US6485655 Method and apparatus for retaining an internal coating during article repair
11/26/2002	US6485576 Method for removing coating bead at wafer flat edge
11/21/2002	US20020173151 Removal photoresist; applying pressure sensitive adhesive; releasing
11/21/2002	US20020170897 Methods for preparing ball grid array substrates via use of a laser
11/21/2002	US20020170892 Dry surface cleaning apparatus using a laser
11/21/2002	US20020170586 Method of and apparatus for removing contaminants from surface of a substrate
11/21/2002	US20020170577 High pressure processing apparatus and method
11/19/2002	US6482746 Computer readable medium for controlling a method of cleaning a process chamber
11/19/2002	US6481350 Self-cleaning web-threading apparatus for a web-fed printing press
11/19/2002	US6481247 Cleaning method and apparatus with dense phase fluid
11/14/2002	WO2002091453A1 High pressure wafer-less auto clean for etch applications
11/14/2002	WO2002090624A2 A process and apparatus for cleaning and/or coating metal surfaces
11/14/2002	WO2002090615A1 Duo-step plasma cleaning of chamber residues
11/14/2002	WO2002090008A1 Structure cleaning method and anticorrosion method, and structure using them
11/14/2002	WO2002080233A3 Process and apparatus for removing residues from the microstructure of an object
11/14/2002	US20020168880 Cleaning solid or granular polysilicon with an aqueous solution of dissolved ozone, and then cleaning with hydrofluoric acid to remove organic impurities adsorb on the surface of the polysilicon
11/14/2002	US20020168879 Generating and accelerating the ions by means of an electric field and radiating an ion flow onto an edge part of semiconductor substrate to clean the edge part of the substrate
11/14/2002	US20020166577 Method for cleaning polysilicon
11/13/2002	EP1255621A1 Device and method for the precision cleaning of objects
11/13/2002	EP0764042B1 Fluid extraction
11/13/2002	CN2520222Y Dualpurpose magnetic sink-float brush
11/07/2002	US20020164873 Process and apparatus for removing residues from the microstructure of an object
11/07/2002	US20020162971 Irradiation system and method
11/07/2002	US20020162880 Apparatus and method for removing interconnections
11/07/2002	US20020162827 Method for dry cleaning metal etching chamber
11/07/2002	US20020162578 Wet dip method for photoresist and polymer stripping without buffer treatment step
11/07/2002	US20020162569 Method of rapid prevention of particle pollution in pre-clean chambers
11/06/2002	EP1255287A1 Substrate processing method, and apparatus therefor
11/05/2002	US6476342 Method of surface preparation using plasma in air
11/05/2002	US6476341 Cleaning device with deeply reaching plasma and assisting electrodes
11/05/2002	US6474349 Ultrasonic cleanout tool and method of use thereof
10/2002
10/31/2002	WO2002086223A1 Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
10/31/2002	WO2002086222A1 Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
10/31/2002	US20020160606 Method for material removal from an in-process microelectronic substrate
10/31/2002	US20020160157 Tack cloth and associated manufacturing process
10/31/2002	US20020157688 Method for cleaning a substrate in selective epitaxial growth process
10/31/2002	US20020157686 Process and apparatus for treating a workpiece such as a semiconductor wafer
10/31/2002	US20020157277 Carbon-enhanced fluoride ion cleaning
10/31/2002	DE10120317A1 Tilt and rotating pressurized drum process to clean precision components, semiconductors and textile fibers with liquid gas comprises agitating vessel by rotation action and tilt action
10/31/2002	CA2647080A1 Cleaning system utilzing an organic cleaning solvent and a pressurized fluid solvent
10/29/2002	US6471920 Apparatus and method for treatment of electrically conductive continuous material
10/24/2002	WO2002084193A1 Method for cleaning combustion devices
10/24/2002	WO2002083332A1 Label sheet for cleaning and conveying member having cleaning function
10/24/2002	US20020155792 Method and apparatus for creating an open cell micro-environment for treating a substrate with an impingement spray
10/24/2002	US20020153140 Device for eliminating gas or paraffin hydrate deposits that form in well drilling equipment or in hydrocarbon production or transportation equipment
10/24/2002	US20020153028 Metal halide lamp fabrication
10/24/2002	US20020153024 Electrostatic chuck cleaning method
10/24/2002	US20020153023 Method for cleaning out silicon-rich oxide in a pre-clean chamber
10/24/2002	US20020153022 Method for preventing particles in a pre-clean chamber
10/24/2002	US20020152909 Traversing contact cleaning roller system
10/23/2002	CN1093008C Method and apparatus for powder metallurgical process
10/22/2002	US6468601 Ammonium silicon hexafluoride white powder byproduct from reaction of silane and ammonia and nf3 nitrogen fluoride; flowing plasma cleaning gas into process chamber to react with said white powder
10/22/2002	US6468360 Method for cleaning ductwork
10/22/2002	US6468358 Confined underwater cryogenic surface preparation
10/22/2002	US6468356 Method for removing molding residues in the fabrication of plastic packages for semiconductor devices
10/17/2002	WO2002081106A1 Megazone system
10/17/2002	WO2002060112A3 Apparatus, method and system for multiple resolution affecting information access
10/17/2002	US20020151186 Apparatus and method for detecting an end point of chamber cleaning in semiconductor equipment
10/17/2002	US20020150783 Deformable coated wick liquid spilled material transfer
10/17/2002	US20020148981 Optical element for use in exposure apparatus and rinsing method therefor
10/17/2002	US20020148492 High-pressure processing apparatus
10/17/2002	US20020148489 Device and process for liquid treatment of wafer-shaped articles
10/16/2002	EP0824402B1 System for cleaning particles from a surface
10/16/2002	CN1374890A Method and system for in situ cleaning of semiconductor manufacturing equipment using combination chemistries
10/15/2002	US6465706 Encapsulation method for maintaining biodecontamination activity
10/15/2002	US6464891 Method for repetitive ion beam processing with a carbon containing ion beam
10/15/2002	US6464797 Method of separating electrophotographic carrier compositions and recycling the compositions
10/15/2002	US6463942 Apparatus for confined underwater cryogenic surface preparation
10/10/2002	WO2002080233A2 Process and apparatus for removing residues from the microstructure of an object
10/10/2002	WO2002080213A2 Irradiation system and method
10/10/2002	WO2002079705A2 Nozzle design for generating fluid streams useful in the manufacture of microelectronic devices
10/10/2002	WO2002059724A3 Apparatus, method and system for tracking information access
10/10/2002	US20020144708 Megazone system
10/10/2002	DE19932105C2 Säuberungsgerät für Autoteppiche Cleaning equipment for car mats
10/10/2002	DE10115394A1 Maschinenbauteil und/oder verfahrenstechnische Anlage mit einem Hohlraum und Reinigungsverfahren hierfür Machine component and / or process plant having a cavity and cleaning method therefor
10/10/2002	DE10113494A1 Surface layers removal device for masts has divergence at laser output dimensioned so that radiation can be coupled into light conductor with core diameter not greater than four hundred microns
10/10/2002	CA2443150A1 Irradiation system and method
10/09/2002	EP1248156A2 Process for the removal of resist material
10/03/2002	WO2002076511A2 Plasma surface treatment method and device for carrying out said method
10/03/2002	US20020139395 Using dry ice blasting system adapted to blast debris from interior surfaces of ventilation ducts
10/03/2002	US20020139388 Methods for reducing contamination of semiconductor substrates
10/03/2002	US20020139125 Nozzle design for generating fluid streams useful in the manufacture of microelectronic devices
10/02/2002	EP1245299A1 Card cleaning device
10/02/2002	EP0973460B1 Cleaning system and surface cleaning method
10/02/2002	DE10110823A1 Verfahren zum Abtragen von Materialablagerungen, die bei einer Laserbearbeitung entstehen A method for removing material deposits formed at a laser machining
10/01/2002	US6457482 Portable power-cleaning device for use with commonly available containers
10/01/2002	US6457480 Process and apparatus for cleaning filters
10/01/2002	US6457478 Method for treating an object using ultra-violet light
10/01/2002	US6457200 Pressure-sensitive cleaning sheet, image-forming material having cleaning part, and method of cleaning image-forming apparatus
10/01/2002	US6457199 Substrate processing in an immersion, scrub and dry system
09/2002
09/26/2002	WO2002058453A3 Apparatus, method and system for effecting information access in a peer environment
09/26/2002	US20020136674 Low RF power electrode for plasma generation of oxygen radicals from air
09/26/2002	US20020134770 Laser ablation cleaning
09/26/2002	US20020134403 Holding and rotating a chuck as pressure plasma jet rinses predetermined areas; another nozzle dries with nitrogen gas; integrated circuits; semiconductors
09/25/2002	EP1242666A1 Method for cleaning of porous materials of carbon dioxide and arrangement for-carrying out said method

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