Patents
Sitemap › B08 - Cleaning › B08B - Cleaning in general; Prevention of fouling in general › B08B 7 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass
Patents for B08B 7 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass (12,806)
11/2003
11/06/2003US20030205251 Cleaning of semiconductor processing chambers
11/06/2003US20030205244 Cleaner strip for rollers of cartridge loader
11/06/2003US20030205240 For cleaning of semiconductor wafers
11/05/2003EP1358729A2 Apparatus, method, and system for accessing digital rights management information
11/05/2003EP1358670A2 Process and apparatus for removing residues from the microstructure of an object
11/05/2003EP1358543A1 Apparatus method and system for registration effecting information access
11/05/2003CN1454392A Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process
11/04/2003US6642153 Method for avoiding unetched polymer residue in anisotropically etched semiconductor features
11/04/2003US6641678 Methods for cleaning microelectronic structures with aqueous carbon dioxide systems
11/04/2003US6641676 A length of flexible tubing composed of rubber or plastic. One or more scouring members, such as bristles or tines, extend outward from the tubing. These scouring members are molded or tooled as integral parts of the tubing, may be configured in
10/2003
10/30/2003US20030200988 Vertical packages; applying sound waves; rotation
10/30/2003US20030200985 Method and apparatus for removal of surface contaminants from substrates in vacuum applications
10/30/2003US20030200984 Highly efficient remote clean process for process chambers in deposition tools
10/29/2003EP1356726A1 Pet dog washing apparatus and method for controlling the same
10/29/2003CN1451491A Method and device for cleaning LCD using plasma
10/28/2003US6639178 Method for locally removing a coat applied on a translucent or transparent substrate
10/28/2003US6638864 Removal photoresist; applying pressure sensitive adhesive; releasing
10/28/2003US6637446 Integrated substrate processing system
10/23/2003WO2003087936A1 Method of treatment of porous dielectric films to reduce damage during cleaning
10/23/2003WO2003086668A1 Fluid assisted cryogenic cleaning
10/23/2003WO2003059535B1 Cleaning roller device with vertical movement mechanism
10/23/2003US20030199241 Anticontamination hoods are described, that provide a very high level of protection of either personnel, in the case of a hazardous material handling hood, or the process contained in the hood in the case of an anticontamination hood.
10/23/2003US20030196681 Stripping away polymers created in etching with a wet stripping; stripping away residual polymers with a dry stripping; rinsing wafer
10/23/2003US20030196679 For cleaning of semiconductor wafers, masks
10/23/2003US20030196608 Pet dog washing apparatus and method for controlling the same
10/22/2003EP1354337A2 Substrate processing in an immersion, scrub and dry system
10/22/2003EP1214173B1 Method and device for releasing metallic workpieces from clamped chips or the like
10/22/2003CN1450939A Cleaning processes using hydrofluorocarbon and/or hydrochlorofluorocarbon compounds
10/21/2003US6635845 Dry surface cleaning apparatus using a laser
10/21/2003US6635844 Apparatus for on-line cleaning a wafer chuck with laser
10/21/2003US6635390 Photomask used in lithographic printing; dislodge the particulate matter on the photomask surface and cause it to be directed toward the adhesive surface of the interior wall and adhere thereto; semiconductor wafer
10/21/2003US6635144 Apparatus and method for detecting an end point of chamber cleaning in semiconductor equipment
10/16/2003WO2003085161A1 Surface silanization
10/16/2003WO2003084818A1 Method and installation for decontaminating preform necks
10/16/2003WO2003052216A3 Device for removing jointing material
10/16/2003US20030192575 Turbine part mount for supercritical fluid processor
10/16/2003US20030192569 Fluorine process for cleaning semiconductor process chamber
10/16/2003US20030192568 Striking a plasma; flowing helium or argon; delivering radio frequency (RF) power
10/16/2003CA2480785A1 Method and installation for decontaminating preform necks
10/15/2003CN1449303A Excimer uv photo reactor
10/14/2003US6631726 Dielectric barrier discharge lamp irradiates substrate with ultraviolet light; moistened inert gas supplied to space; splitting into reducing and oxidizing members; semiconductors
10/09/2003WO2003082487A1 Ferrule cleaning method
10/09/2003WO2003082486A1 Removal of contaminants using supercritical processing
10/09/2003US20030190870 Cleaning ceramic surfaces
10/09/2003US20030188766 Use of high vapor pressure liquid with cryogenic cleaning to aid in removal of foreign materials from semiconductor surfaces
10/09/2003US20030188763 Use of reactive gas or vapor of reactive liquid, with or without a free radical generator, and either simultaneously or sequentially, with cryogenic cleaning to aid in removal of foreign materials from semiconductor surfaces
10/07/2003US6630032 Generating gas borne shock waves in the vicinity of a vessel, thereby to expose a deposit on a surface to separation forces causing atleast partial separation of the deposit from the surface, causing removal of separated particles (deposits)
10/07/2003US6630031 Apparatus comprising means for generating superheated or saturated steam, means for spraying steam onto surface of substrates, and means for irradiating with ultraviolet rays
10/07/2003US6629538 Method for cleaning semiconductor wafers in a vacuum environment
10/02/2003WO2003081659A1 Substrate processing device and substrate processing method, fast rotary valves, cleaning method
10/02/2003WO2003080261A1 Method of cleaning containers and piping systems which are contaminated with organic substances through the application of vapour-phase solvents
10/02/2003US20030185966 Detecting chemiluminescent radiation in the cleaning of a substrate processing chamber
10/02/2003US20030183245 Surface silanization
10/02/2003US20030183244 Method of cleaning a semiconductor processing chamber
10/02/2003US20030183243 Cleaning residues from surfaces in a chamber by sputtering sacrificial substrates
10/02/2003US20030182731 Cleaning apparatus having multiple wash tanks for carbon dioxide dry cleaning and methods of using same
10/01/2003EP1348483A1 Excimer uv photo reactor
10/01/2003EP1347840A1 Method, device and installation for cleaning contaminated parts, with a dense pressurised fluid
10/01/2003CN1445826A Method for cleaning plasma processing device
10/01/2003CN1445029A Method for clearing away dirty spots of chewing gums
09/2003
09/30/2003US6628078 Dielectric barrier discharge lamp and dry cleaning device using the same
09/30/2003US6627846 Laser-driven cleaning using reactive gases
09/30/2003US6627843 Casing for laser device, production method and cleaning method of the same
09/30/2003US6627002 To remove the first end flange and coating of adhesive material from the interior surface of roll; electrostatography
09/30/2003US6626189 Method of processing substrates using pressurized mist generation
09/30/2003US6626188 Introducing hydrogen gas into chamber; generating a reactive plasma of hydrogen gas in chamber; introducing mixture of hydrogen gas and nitrogen gas into chamber; generating reactive plasma of mixture of hydrogen gas and nitrogen gas
09/25/2003WO2003078692A1 Method of cleaning the surface of a material coated with an organic substance and a generator and device for carrying out said method
09/25/2003WO2003078571A2 Anti-infection and toxin elimination device
09/25/2003US20030181343 Composition and method for removing photoresist materials from electronic components
09/25/2003US20030180999 Edge bead removal for spin-on materials containing low volatility solvents using carbon dioxide cleaning
09/25/2003US20030180532 Cleaning sheet , conveying member using the same, and substrate processing equipment cleaning method using them
09/25/2003DE10219197C1 Assembly to prepare metal wire surface for coating has electrode within dielectric shrouding, connected to AC HV generator to produce discharge for removing any grease residue
09/23/2003US6624428 Process and device for treatment by dielectric barrier discharge lamps
09/23/2003US6623201 Cleaning device and method of use
09/18/2003WO2003076086A1 Method and device for the decontamination of optical surfaces
09/18/2003US20030175626 Using supercritical fluids; separation
09/18/2003US20030175421 Process for reducing contaminants on surfaces of die cast components
09/18/2003US20030172959 Treatment with a wetting agent and an active agent that is a complex N-abietyl-, hydroabietyl-, or dehydroabietyl ketomethyl amine
09/18/2003US20030172953 Of a vacuum apparatus, especially one that forms films on the surface of an optical element for use in a semiconductor exposure system, etc.
09/18/2003US20030172952 Method of cleaning a plasma processing apparatus
09/17/2003EP1344591A2 Process for reducing contaminants on surfaces of die cast component
09/17/2003EP1344110A1 Mitigation of radiation induced surface contamination
09/17/2003EP1089833B1 Method for stripping and sanitizing a container inner surface and implementing device
09/17/2003CN1442617A Method of coating fluorocarbon resin and sliding part and gas compressor using said method
09/16/2003US6620251 Substrate processing method and substrate processing apparatus
09/16/2003US6619304 Pressure chamber assembly including non-mechanical drive means
09/16/2003US6618890 Card-like cleaning strip for computer peripheral devices, e.g., printers, smart card readers, magnetic readers; cleans rollers and heads
09/12/2003WO2003075098A2 Prevention of contamination of optical elements and cleaning said elements
09/12/2003WO2003074202A1 Apparatus for contaminant temoval using natural convection flow and changes in solubility concentrations by temperature
09/11/2003US20030170402 Method of cleaning CVD equipment processing chamber
09/10/2003EP1342510A2 Process for stripping of engine elements and device for process execution
09/10/2003EP0909352B1 Solvent resupply method for use with a carbon dioxide cleaning system
09/09/2003US6616773 Substrate treatment method
09/09/2003US6616769 Condensed liquid drips or flows back to the conditioning quantity of the liquified gas, washes or removes contaminants, e.g., particles, metal and moisture, from the interior surface of the container.
09/09/2003US6615435 Cleaner strip for rollers of cartridge loader
09/09/2003CA2057956C Method and apparatus for cleaning a mixer
09/03/2003EP1340556A2 A method and device for cleaning surfaces using temporarily coincidental laser pulses of two different wavelengths
09/03/2003CN1440322A Process for cleaning ceramic articles
09/03/2003CN1440314A Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them
09/03/2003CN1440307A Apparatus and method for continuous surface modification of substrates
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