| Patents for B08B 7 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass (12,806) |
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| 02/20/2003 | WO2003015146A1 Process and apparatus for treating a workpiece such as a semiconductor wafer |
| 02/20/2003 | US20030036272 Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas |
| 02/20/2003 | US20030035754 Mist generator; activation |
| 02/20/2003 | US20030035728 Apparatus for retaining an internal coating during article repair |
| 02/20/2003 | US20030033676 Dry cleaning; process control |
| 02/19/2003 | EP1284011A1 Device and method for treating, storing and loading supports for disk-shaped articles |
| 02/13/2003 | WO2003011599A1 Method and device for cleaning using ultrasound |
| 02/13/2003 | WO2003011485A2 Method of cleaning steam and water pipes inside combustion ovens |
| 02/13/2003 | US20030029476 Methods for using a ring vortex |
| 02/13/2003 | US20030029475 Multistep remote plasma clean process |
| 02/13/2003 | US20030029473 Chamber cleaning via rapid thermal process during a cleaning period |
| 02/11/2003 | US6517638 Method of and device for cleaning a slip ring |
| 02/11/2003 | US6516814 Method of rapid prevention of particle pollution in pre-clean chambers |
| 02/06/2003 | US20030024917 Cleaning system for welding torches which effects cleaning by means of cold temperature |
| 02/05/2003 | CN1395515A In situ module for particle removal from solid state surface |
| 02/05/2003 | CN1395514A Method for locally removing coat applied on translucent or transparent substrate |
| 02/04/2003 | US6513538 Containing hydrogen peroxide, chelate compound, hydrogen and fluorine gases |
| 01/30/2003 | WO2003008123A1 Method for the removal of contaminants adhering to a moving strip-like workpiece and device for carrying out said method |
| 01/30/2003 | WO2002060110A3 Apparatus, method, and system for accessing digital rights management information |
| 01/30/2003 | US20030022509 Plasma treatment for copper oxide reduction |
| 01/30/2003 | US20030019506 Method of avoiding or eliminating deposits in the exhaust area of a vacuum system |
| 01/29/2003 | EP1064105B1 Device and method for cleaning working parts |
| 01/28/2003 | US6511575 Treatment apparatus and method utilizing negative hydrogen ion |
| 01/23/2003 | US20030015227 Shock wave generating apparatus and apparatus for removing foreign objects on solid body surface using shock wave |
| 01/23/2003 | US20030015217 Method of cleaning contaminants from the surface of a substrate |
| 01/22/2003 | CN2531892Y Dust adhering roller |
| 01/21/2003 | US6509547 Method for laser stripping of optical fiber and flat cable |
| 01/21/2003 | US6508990 In situ monitoring and controlling removal of contaminants from semiconductor surface using infrared radiation |
| 01/21/2003 | CA2111395C Nail polish remover with gelatin |
| 01/16/2003 | WO2003004722A1 Method for cleaning reaction container and film deposition system |
| 01/16/2003 | US20030010363 New water-dispersible or water-soluble sulphonated polyesters with a number molecular mass lower than 20000, exhibiting a sulphur weight content of the order of 0.5 to 10% and a hydroxyl functional group content, expressed as OH |
| 01/16/2003 | US20030010355 Local and remote gas dissociators coupled to a semiconductor processing chamber |
| 01/16/2003 | US20030010354 Fluorine process for cleaning semiconductor process chamber |
| 01/16/2003 | DE20113516U1 Apparatus for cleaning pipelines, heat exchangers, condensers and catalysts comprises using carbon dioxide in the liquid and/or super-critical state |
| 01/15/2003 | EP1275925A1 Method and apparatus for destroying locally compact materials in hot thermal installations |
| 01/15/2003 | EP1274963A1 Method and apparatus for high-pressure wafer processing and drying |
| 01/15/2003 | EP1274520A1 An apparatus for cleaning of surfaces from small lumps and use of such an apparatus |
| 01/14/2003 | US6507031 Liquid crystal display from semiconductor |
| 01/14/2003 | US6506259 Carbon dioxide cleaning and separation systems |
| 01/14/2003 | CA2258041C Solvent resupply method for use with a carbon dioxide cleaning system |
| 01/09/2003 | US20030008503 Introducing organic gas comprising halogen into chamber, wherein organic gas forms adhesive polymers with particles and depositing polymers onto wall of chamber |
| 01/09/2003 | US20030005949 Such as for silicon wafers; adjusting the state of the solvent which contacts the workpiece to be cleaned by controlling a distance between the nozzle and the workpiece to be cleaned to a predetermined value |
| 01/09/2003 | US20030005943 Introducing a fluorine containing gaseous mixture into a processing chamber, creating plasma, and pressurizing the chamber to a threshold ion energy to clean the inner surfaces of the chamber without leaving a residue |
| 01/07/2003 | US6503464 Ultraviolet processing apparatus and ultraviolet processing method |
| 01/07/2003 | US6503351 Use of a cleaning process, a cleaning process, a connection process and a workpiece pair |
| 01/02/2003 | US20030000556 Apparatus for cleaning filters |
| 01/02/2003 | US20030000547 Applying a sacrificial coating of a material to a substrate surface to encapsulate and suspend undesirable particles; fluidizing applying energy to substrate to dislodge particles; removing particulate containing sacrificial material coating |
| 01/02/2003 | US20030000546 Plasma cleaning of deposition chamber residues using duo-step wafer-less auto clean method |
| 01/02/2003 | US20030000545 Method for cleaning and preconditioning a chemical vapor deposition chamber dome |
| 01/02/2003 | EP1270095A2 Method of monitoring a pretreatment with a plasma jet |
| 01/02/2003 | EP1268222A1 Device and method for removal of rust and paint |
| 01/01/2003 | CN1097491C Plasma processing method and method for cleaning plasma processing system |
| 12/31/2002 | US6500605 Removal of photoresist and residue from substrate using supercritical carbon dioxide process |
| 12/31/2002 | US6500273 Spin cleaning methods |
| 12/31/2002 | US6500269 Subjecting portion of component having deposit of crust-like debris to sufficient laser shock peening to cause deposited debris on the surface thereof to be loosened therefrom so that loosened debris can be removed from the component |
| 12/31/2002 | US6500268 Dry cleaning method |
| 12/31/2002 | US6499322 Detergent injection systems for carbon dioxide cleaning apparatus |
| 12/27/2002 | WO2002103770A1 Apparatus and method for cleaning the surface of a substrate |
| 12/27/2002 | WO2002090615A9 Duo-step plasma cleaning of chamber residues |
| 12/26/2002 | US20020195124 Cleaning apparatus of a high density plasma chemical vapor deposition chamber and cleaning method thereof |
| 12/26/2002 | US20020194688 Two roll turret with positive nip web cleaner |
| 12/26/2002 | US20020194681 Dry cleaning detergent formulation consists of an organic cosolvent, low water content, and liquid carbon dioxide; turbulent conditions |
| 12/25/2002 | CN1387236A High pressure treating device and method |
| 12/25/2002 | CN1387090A Method for removing anticorrosive additive material |
| 12/24/2002 | US6497768 Process for treating a workpiece with hydrofluoric acid and ozone |
| 12/24/2002 | US6497357 Apparatus and method for removing interconnections |
| 12/19/2002 | WO2002101784A1 Plasma processor |
| 12/19/2002 | WO2002086223B1 Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent |
| 12/19/2002 | US20020192803 Encapsulation of microorganism; obtain encapsulation material, incubate with microorganism, encapsulate, recover encapsulated microorganism |
| 12/19/2002 | US20020192391 Method and apparatus for treating surface of substrate plate |
| 12/19/2002 | US20020189636 Introducing a halogen containing cleaning gas to the process chamber via a section connected to the process chamber; and applying a high power density light beam, which assists dissociation of cleaning gas to acheive cleaning activity |
| 12/19/2002 | US20020189632 Method of removing deposits of material formed in laser machining |
| 12/19/2002 | US20020189026 Wash, working, and vapor vessels, and a compressor; overpressurization of air |
| 12/18/2002 | EP1265733A1 Method for recycling wood with a plastic coating |
| 12/18/2002 | EP1265715A1 Method and device for cleaning liquefied gases |
| 12/18/2002 | CN1096313C Method and device for selective removal of material by irradiation |
| 12/17/2002 | US6495099 Wet processing methods for the manufacture of electronic components |
| 12/17/2002 | US6494217 Laser cleaning process for semiconductor material and the like |
| 12/12/2002 | WO2002059724A9 Apparatus, method and system for tracking information access |
| 12/12/2002 | US20020185227 Plasma processor method and apparatus |
| 12/12/2002 | US20020185225 Substrate processing method and substrate processing apparatus |
| 12/12/2002 | US20020185151 Plasma process for removing polymer and residues from substrates |
| 12/12/2002 | US20020185150 Ultrasonic cleaning method |
| 12/12/2002 | US20020185067 Apparatus and method for in-situ cleaning of a throttle valve in a CVD system |
| 12/12/2002 | US20020184720 Integrated substrate processing system |
| 12/11/2002 | EP1263538A1 Method for locally removing a coat applied on a translucent or transparent substrate |
| 12/11/2002 | CN1384972A Removal of photoresist and residue from substrate using supercritical carbon dioxide process |
| 12/11/2002 | CN1095980C Thermal treatment device |
| 12/10/2002 | US6491043 Ultra-low particle semiconductor cleaner |
| 12/10/2002 | US6491042 Post etching treatment process for high density oxide etcher |
| 12/05/2002 | US20020179129 Localized acidic underwater surface cleaning apparatus |
| 12/05/2002 | US20020179126 Remove water, entrained solvents and solid particles using high density carbon dioxide |
| 12/05/2002 | US20020179114 Agitation, rotation |
| 12/05/2002 | US20020178957 Device, system and method for on-line explosive deslagging |
| 12/04/2002 | EP1261453A1 Polishing method for soft acrylic articles |
| 12/04/2002 | EP1261439A1 Substrate with photocatalytic and/or hydrophilic coating |
| 12/04/2002 | CN1383191A High voltage processing appts. |
| 12/03/2002 | US6488779 Semiconductor wafer cleaning |
| 11/28/2002 | WO2002094455A1 Process for plasma treatment and apparatus |
| 11/28/2002 | WO2002079705A3 Nozzle design for generating fluid streams useful in the manufacture of microelectronic devices |