Patents for B08B 7 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass (12,806) |
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10/14/2004 | US20040200498 Method and apparatus for cleaning a substrate processing chamber |
10/14/2004 | US20040200415 Substrate processing apparatus |
10/13/2004 | EP1311369B1 Method and device for removing metallic impurities |
10/13/2004 | CN2647456Y Electrohydraulic pipe scale cleaning device |
10/13/2004 | CN1171288C Removal of photoresist and residue from substrate using supercritical carbon dioxide process |
10/12/2004 | US6802961 Dense fluid cleaning centrifugal phase shifting separation process and apparatus |
10/12/2004 | US6802907 Without thermally and/or mechanically damaging the substrate and with reduced production of volatile matter |
10/12/2004 | US6802099 Cleaning member and cylindrical cleaning element |
10/07/2004 | WO2004085491A2 Removal of cmp and post-cmp residue from semiconductors using supercritical carbon dioxide process |
10/07/2004 | WO2004062818A3 Automatic board eraser cleaning machine |
10/07/2004 | US20040198627 Process and apparatus for removing residues from the microstructure of an object |
10/07/2004 | US20040198622 Non-fluoride containing supercritical fluid composition for removal of ion-implant photoresist |
10/07/2004 | US20040198189 Methods for cleaning surfaces substantially free of contaminants utilizing filtered carbon dioxide |
10/07/2004 | US20040198066 Using supercritical fluids and/or dense fluids in semiconductor applications |
10/07/2004 | US20040197433 Film removing apparatus, film removing method and substrate processing system |
10/07/2004 | US20040195153 Method for the removal and recovery of the oily component from drill cuttings with liquid CO2 |
10/07/2004 | US20040194886 Microelectronic device manufacturing in coordinated carbon dioxide processing chambers |
10/07/2004 | US20040194842 High pressure processing apparatus and high pressure processing method |
10/07/2004 | US20040194817 Method and apparatus for rotation of a workpiece in supercritical fluid solutions for removing photo resist, residues and particles therefrom |
10/07/2004 | US20040194813 Process for removing dopant ions from a substrate |
10/07/2004 | US20040194799 Efficient control of ultraviolet light and ozone; uniformity, reducing processing time |
10/07/2004 | US20040194798 Dirt removed by irradiating the substrate with ultraviolet rays in an oxygen-containing atmosphere in advance of wet cleaning with pure water; wet cleaning time and the amount of pure water can be reduced; liquid crystal device glass substrates |
10/07/2004 | DE10311552A1 Method for cleaning workpieces of liquid and/or solid impurities esp. during metal cutting, involves vibration cleaning followed by plasma cleaning with air carried past workpiece in plasma-type state |
10/06/2004 | EP1464413A2 Installation for degreasing kitchen extractor hoods |
10/06/2004 | EP1464411A1 Method of coating fluorocarbon resin |
10/06/2004 | CN1534381A Cleaning method of photoetching projection device component element surface photo etching projection device, device manufacturing method and cleaning system |
10/06/2004 | CN1533846A Washing material and washing method using the same |
10/05/2004 | US6800142 Method for removing photoresist and post-etch residue using activated peroxide followed by supercritical fluid treatment |
10/05/2004 | US6799587 Apparatus for contaminant removal using natural convection flow and changes in solubility concentrations by temperature |
09/30/2004 | WO2004082899A2 Robot vacuum |
09/30/2004 | WO2004082858A1 Parts cleaning |
09/30/2004 | US20040192572 comprises carbon dioxide, additive (tetramethylammoniumfluoride) for removing residues, inhibitor (ethylene glycol) of residues, and co-solvent for dissolving additive and inhibitor in carbon dioxide at pressurized fluid conditions; for removal of photoresists during semiconductor processing |
09/30/2004 | US20040192567 includes particles of gelatin or animal glue, containing water to impart viscosity and elasticity, with stick-free fragments held on surface of each body, maintaining viscosity and elasticity by retaining water as cleaning agent captures and removes foreign material adhering to surface; magnetic force |
09/30/2004 | US20040191712 Method and apparatus for improved process control in combustion applications |
09/30/2004 | US20040187899 Chamber for wafer cleaning and method for making the same |
09/30/2004 | DE10312023B3 Cleaning arrangement for workpieces has rotary driven wheel with peripheral workpiece compartments that pass through head(s) in which workpieces are vibrated, fouling is simultaneously sucked away |
09/29/2004 | EP1462185A1 Detergent injection system |
09/29/2004 | EP1461296A1 Recycle for supercritical carbon dioxide |
09/29/2004 | CN2644030Y Headgear cleaner |
09/28/2004 | US6797918 Rail cleaning method and apparatus |
09/28/2004 | US6797229 Apparatus for removing dust accretions from a smelting furnace |
09/28/2004 | US6797103 Automatic waste-area removal method and apparatus |
09/28/2004 | US6796882 Appliqué film and paint treatment removal tool |
09/28/2004 | US6796664 Method and device for decontaminating optical surfaces |
09/28/2004 | US6796314 Using hydrogen gas in a post-etch radio frequency-plasma contact cleaning process |
09/28/2004 | CA2232768C Method for using high density compressed liquefied gases in cleaning applications |
09/23/2004 | WO2004081258A2 Apparatus and method for non-contact cleaning of a surface |
09/23/2004 | WO2004042794B1 Removal of particle contamination on patterned slilicon/silicon dioxide using supercritical carbon dioxide/chemical formulations |
09/23/2004 | US20040185409 Method and apparatus to aid in the delubrification of parts |
09/23/2004 | US20040182423 Gas flow of fluorine cleaning gas so as to flow from upstream toward an outlet port in a reaction chamber; flowing protective gas which reacts with the fluorine from vicinity of outlet port |
09/23/2004 | US20040182420 Device for removing residues from surfaces and a method for accomplishing the same |
09/23/2004 | US20040182419 High-pressure processing apparatus and high-pressure processing method |
09/23/2004 | US20040182418 Removing foreign matter adhering to tip of a probe needle of a probe card comprising a cleaning layer containing a polyurethane and a vinyl polymer; wear resistance |
09/23/2004 | US20040182416 Method and apparatus for removing minute particle(s) from a surface |
09/23/2004 | US20040182415 Cleaning method of apparatus for manufacturing semiconductor device |
09/23/2004 | DE10311278A1 Verfahren zum Entfernen von Lackbeschichtungen auf einer Metallkonstruktion A method of removing paint coatings on a metal structure |
09/23/2004 | DE10259132B4 Verfahren zur Strahlreinigung von Werkstoffoberflächen A method for blasting of material surfaces |
09/22/2004 | EP1460678A1 Method and apparatus for cleaning and method and apparatus for etching |
09/22/2004 | EP1460047A1 Method for adhering transparent articles and quartz glass plate prepared through adhesion and device using the same |
09/22/2004 | EP1459812A1 Parts cleaning |
09/22/2004 | EP1458450A2 Denaturing of a biochemical agent using an activated cleaning fluid mist |
09/22/2004 | CN1167517C Microbiological parts washing system, washing apparatus, controller and conversion reagent box |
09/21/2004 | US6794622 Device and method for removal of rust and paint |
09/21/2004 | US6794602 Method and apparatus for cleaning generator and turbine components |
09/21/2004 | US6793740 Method for cleaning pressurized containers containing moisture sensitive chemicals |
09/16/2004 | US20040177867 Tetra-organic ammonium fluoride and HF in supercritical fluid for photoresist and residue removal |
09/15/2004 | EP1457550A2 Composition for removing residues from the microstructure of an object |
09/15/2004 | EP1457271A1 Process for the removal of a paint coating from a metallic structure |
09/15/2004 | EP1456342A1 Cleaning sheet and process for cleaning substrate treatment device |
09/15/2004 | EP1183417B1 Cleaning device and method for cleaning, using liquid and/or supercritical gases |
09/14/2004 | US6790289 Cleaning a deposit by processing with fluorine; chemical cleaning; physical cleaning by blasting with a cleaning media |
09/10/2004 | WO2004077529A2 Edge bead removal for spin-on materials containing low volatility solvents using carbon dioxide cleaning |
09/10/2004 | WO2004076080A1 Method and apparatus for eliminating gooey waste |
09/10/2004 | WO2004065526A3 Method of immobilising hydrocarbons inside submerged containers or of transporting said hydrocarbon to the surface, using the properties of supercritical fluids at a great depth |
09/09/2004 | US20040175301 Freewire system for suppression of particulate deposition and accumulation on processing chamber walls |
09/09/2004 | US20040173580 Apparatus for non-contact cleaning of a surface |
09/09/2004 | US20040173579 Apparatus and method for non-contact cleaning of a surface |
09/09/2004 | US20040173569 Cleaning gas and etching gas |
09/09/2004 | US20040173246 Cleaning solvent for substrates, compression of solvents, evaporation with hot air. |
09/09/2004 | US20040173237 System for cleaning substrates of flat panel display devices and method of cleaning using the same |
09/09/2004 | US20040173236 Chamber with support and wafer on rotating chucks, fixing the nozzles for spraying cleaning solutions, heating and cooling |
09/09/2004 | DE10309117A1 Extractor hood for large kitchens and gastronomic/food processing operations has an internal source of light, a UV projector/plasma beam source and a washing device to clean the source of the rays |
09/09/2004 | DE102004007192A1 Verfahren und Vorrichtung zur Unterstützung der Entfettung von Teilen Method and apparatus for assist the degreasing of parts |
09/08/2004 | EP1454678A1 Method of coating fluorocarbon resin and sliding member and gas compressor using the same |
09/08/2004 | EP1453618A1 An apparatus and method for cleaning glass substrates using a cool hydrogen flame |
09/08/2004 | CN1528011A Wafer cleaning module and method for cleaning the surface of a substrate |
09/08/2004 | CN1527364A Wafer cleaning method and apparatus |
09/07/2004 | US6786222 Method for removing particles from a semiconductor processing tool |
09/02/2004 | WO2003093526A3 Method and device for treating the outer surface of a metal wire, particularly for carrying out a coating pretreatment. |
09/02/2004 | US20040170915 Laser etching to roughen the surface of substrate for better adhesion; encapsulation in mold; semiconductors |
09/02/2004 | US20040169024 Methods for preparing ball grid array substrates via use of a laser |
09/02/2004 | US20040169012 Cleaning of semiconductor wafers by contaminate encapsulation |
09/02/2004 | US20040168771 Layout of electromagnets positioning on edges of plasma enclosure; impacting particles; controlling distribution of current signals |
09/02/2004 | US20040168766 Monitoring, controlling gas supply ; evacuated enclosure; controlling circulation ratio |
09/02/2004 | US20040168709 Process control, monitoring and end point detection for semiconductor wafers processed with supercritical fluids |
09/02/2004 | US20040168262 Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent |
09/01/2004 | EP1453080A1 Process and composition for removing residues from the microstructure of an object |
09/01/2004 | EP1452813A2 Device, system and method for on-line explosive deslagging |
09/01/2004 | EP1451123A1 Method of bonding a window to a substrate without a primer |
09/01/2004 | EP1169145B1 Method and device for cleaning substrates |