| Patents for B08B 7 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass (12,806) |
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| 08/24/2005 | EP1566256A1 Method and apparatus for cleaning a blowing head for plastic films |
| 08/24/2005 | EP1566250A1 Scrub washing method, scrub washing device, lens forming die drying method, lens forming die drying device, and plastic lens manufacturing method |
| 08/24/2005 | EP1565656A2 High-pressure device for closing a container in a clean room |
| 08/24/2005 | EP1565592A2 Method for cleaning a process chamber |
| 08/24/2005 | EP1421609A4 Process and apparatus for treating a workpiece such as a semiconductor wafer |
| 08/23/2005 | US6933464 Laser-driven cleaning using reactive gases |
| 08/23/2005 | US6932092 power is applied to gas distribution manifold within chamber which comprises parallel plate electrodes |
| 08/18/2005 | WO2005075118A1 Cleaning device of board and cleaning method, flat display panel, mounting equipment of electronic parts and mounting method |
| 08/18/2005 | WO2005000363A3 Atmospheric pressure non-thermal plasma device to clean and sterilize the surface of probes, cannulas, pin tools, pipettes and spray heads |
| 08/18/2005 | US20050178977 Irradiation system and method |
| 08/18/2005 | US20050178407 Method and device for cleaning a blowing head for plastic films |
| 08/18/2005 | US20050178404 Edge cleaner device for coating process |
| 08/18/2005 | US20050178332 System for in-situ generation of fluorine radicals and/or fluorine-containing interhalogen (XFn) compounds for use in cleaning semiconductor processing chambers |
| 08/17/2005 | EP1562714A2 Apparatus and method for cleaning surfaces of semiconductor wafers using ozone |
| 08/17/2005 | EP1212151A4 Process and apparatus for treating a workpiece such as a semiconductor wafer |
| 08/17/2005 | CN2717546Y Portable pollution cleaning device |
| 08/17/2005 | CN1656250A Rotary machine for CVD coatings |
| 08/17/2005 | CN1656249A Multistation coating device and method for plasma coating |
| 08/17/2005 | CN1656246A Multistation coating device and method for plasma coating |
| 08/17/2005 | CN1656245A Multistation coating device and method for plasma coating |
| 08/17/2005 | CN1655883A Washing method and washing device |
| 08/16/2005 | US6929901 Method for reworking a lithographic process to provide an undamaged and residue free arc layer |
| 08/11/2005 | WO2005074016A1 Method for cleaning process chamber of substrate processing apparatus, substrate processing apparatus, and method for processing substrate |
| 08/11/2005 | WO2005072884A1 Method for removing a layer |
| 08/11/2005 | WO2005072497A2 Cleaning composition for disposable cleaning head |
| 08/11/2005 | WO2005072486A2 Cleaning system and method using ultrasonic vibrations and a fluid stream |
| 08/11/2005 | WO2005072116A2 Multilayer cleaning pad |
| 08/11/2005 | US20050174693 Cleaner for optical information processing device, and optical information processing device |
| 08/11/2005 | US20050172985 method to strip cured paint from low temperature threshold plastic substrates; in addition, this novel method can be utilized to strip wood, steel, aluminum, brass, magnesium and non-ferrous substrates. A paint stripping composition based on a boron methoxide mixture |
| 08/11/2005 | US20050172984 Cleaning of chamber components |
| 08/11/2005 | DE202005007911U1 Magnetic surface cleaner has magnet holder in which are mounted magnets, whereby by rotation or displacement of magnet carrier the magnetic area on outer face of housing shifts and metal swarf follows magnetic field as far as stripper |
| 08/11/2005 | DE10359721B3 Process for removing micro- and nano-particles from surfaces to be cleaned comprises preparing a cleaning material in a volume comprising a compressed gas and a cleaning agent dissolved in it, and further processing |
| 08/10/2005 | EP1561841A2 Cleaning CVD Chambers following deposition of porogen-containing materials |
| 08/10/2005 | CN1653012A Methods and compositions for etch cleaning microelectronic substrates in carbon dioxide |
| 08/10/2005 | CN1651159A Cleaning CVD chambers following deposition of porogen-containing materials |
| 08/10/2005 | CN1651158A Dust collector |
| 08/09/2005 | US6926776 Method for cleaning pressurized containers containing chlorine gas or sulfur dioxide gas |
| 08/09/2005 | US6926014 inner wall of plasma chamber is cleaned by plasma etching using oxygen as process gas, top and bottom electrode plates are cleaned by plasma etching using chlorine and boron chloride, inner wall is cleaned again using sulfur hexafluoride and oxygen |
| 08/09/2005 | US6926011 Post etching treatment process for high density oxide etcher |
| 08/04/2005 | WO2005070573A1 Film peeling method and film peeling device for display panel |
| 08/04/2005 | WO2005070571A1 Cleaning and sanitizing system |
| 08/04/2005 | WO2005019490A3 Process and system for cleaning surfaces of semiconductor wafers |
| 08/04/2005 | US20050170658 Methods for preparing ball grid array substrates via use of a laser |
| 08/04/2005 | US20050170306 Method and apparatus for purging seals in a thermal reactor |
| 08/04/2005 | US20050170196 Substrate having catalyst layer thereon and method of cleaning reaction chamber using the same |
| 08/04/2005 | DE202005006049U1 Floor mop cleaning machine has perforated drum, in which soiled mops are placed, motor fitted with belt drive rotating drum alternately in clockwise and anti-clockwise directions |
| 08/03/2005 | EP1559485A1 Method for removing a layer |
| 08/03/2005 | EP1559484A1 Process for removing a corrosion product |
| 08/03/2005 | EP1559132A2 Removal of particle contamination on patterned slilicon/silicon dioxide using supercritical carbon dioxide/chemical formulations |
| 08/03/2005 | EP1558779A1 Method and device for descaling and/or cleaning a metal casting |
| 08/03/2005 | CN2714177Y Two-phase flow shock wave highly effective surface treatment device |
| 08/03/2005 | CN1647745A Apparatus and method for controlling the water level in a residential dishwasher |
| 08/02/2005 | US6924456 Method and apparatus for particle removal |
| 08/02/2005 | US6923870 Method for cleaning internal components of electronic equipment |
| 08/02/2005 | US6923869 Device for deposition with chamber cleaner and method for cleaning the chamber |
| 08/02/2005 | US6923189 Cleaning of CVD chambers using remote source with cxfyoz based chemistry |
| 07/28/2005 | WO2005068137A1 Self-cleaning adhesive structure and methods |
| 07/28/2005 | WO2005068096A1 System and method for automated used oil filter cleaning |
| 07/28/2005 | WO2005068095A1 Cleaning pad with functional properties |
| 07/28/2005 | WO2005026408A3 Methods of treating components of a deposition apparatus to form particle traps, and such components having particle traps thereon |
| 07/28/2005 | US20050163994 Multilayer polymer film, process for preparing it, and process for protecting and cleaning a surface using this film |
| 07/28/2005 | US20050162461 Wiping apparatus and imaging apparatus provided therewith, method of manufacturing electro-optical device, electro-optical device, and electronic apparatus |
| 07/28/2005 | US20050161433 Method for the plasma cleaning of the surface of a material coated with an organic substance and the installation for carrying out said method |
| 07/28/2005 | US20050161379 Descaling method and descaling apparatus |
| 07/28/2005 | US20050161063 Apparatus and method for controlling the water level in a residential dishwasher |
| 07/28/2005 | US20050161061 Methods for cleaning a set of structures comprising yttrium oxide in a plasma processing system |
| 07/28/2005 | US20050161060 Including a proton donor (e.g., a hydrogen plasma step) to react with the porogen, then reacting with a fluorine donor, the plasma enhanced chemical vapor deposition (PECVD) chamber is more effectively cleaned following a porous interlayer dielectric (ILD) deposition |
| 07/28/2005 | US20050161059 Megasonic cleaning using supersaturated cleaning solution |
| 07/28/2005 | US20050160552 Cleaning apparatus |
| 07/27/2005 | CN2712632Y Conveying body cleaning device and ink-jet recording device with the same |
| 07/27/2005 | CN1646990A Method of treatment of porous dielectric films to reduce damage during cleaning |
| 07/27/2005 | CN1646375A Method and installation for decontaminating preform necks |
| 07/27/2005 | CN1644377A Wiping apparatus and imaging apparatus provided therewith, method of manufacturing electro-optical device, electro-optical device, and electronic apparatus |
| 07/27/2005 | CN1644251A Chamber cleaning method |
| 07/27/2005 | CN1212648C High pressure treating device and method |
| 07/27/2005 | CN1212643C Cleaning device of on-line laser wafer bearing |
| 07/26/2005 | US6921721 Post plasma clean process for a hardmask |
| 07/26/2005 | US6921494 Concurrent cleaning , etching; supplying fluid to backing of wafer |
| 07/21/2005 | WO2005066387A1 Method for cleaning film-forming apparatuses |
| 07/21/2005 | WO2005065849A1 Core for washing sponge roller |
| 07/21/2005 | WO2005029553A3 Methods for cleaning a set of structures comprising yttrium oxide in a plasma processing system |
| 07/21/2005 | WO2004038731A3 Radioactive decontamination and translocation method |
| 07/21/2005 | US20050158473 Proximity substrate preparation sequence, and method, apparatus, and system for implementing the same |
| 07/21/2005 | US20050158472 Methods of treating polymeric subtrates |
| 07/21/2005 | US20050155631 Cleaning pad controls soap release to enable extended cleaning efficacy; has wet flexibility for a variety of surfaces; disposable |
| 07/21/2005 | US20050155630 Multilayer cleaning pad |
| 07/21/2005 | US20050155628 Cleaning composition for disposable cleaning head |
| 07/21/2005 | US20050155625 Chamber cleaning method |
| 07/21/2005 | US20050155622 Cleaning system and method using ultrasonic vibrations and a fluid stream |
| 07/21/2005 | DE10360063A1 Removal of protective coating from gas turbine blades involves heating to point where particles can be sucked or blown off |
| 07/21/2005 | DE10358275A1 Vorrichtung und Verfahren zum Reinigen wenigstens einer Prozesskammer zum Beschichten wenigstens eines Substrats Device and method for cleaning at least a process chamber for coating at least one substrate |
| 07/20/2005 | EP1554128A1 In-situ thermal chamber cleaning |
| 07/20/2005 | EP1554081A1 Post-cmp cleaning of semiconductor wafer surfaces using a combination of aqueous and cryogenic cleaning techniques |
| 07/20/2005 | EP1263538B1 Method for locally removing a coat applied on a translucent or transparent substrate |
| 07/20/2005 | EP1237824A4 A method and apparatus for treating a substrate with an ozone-solvent solution |
| 07/20/2005 | CN1643668A Substrate processing apparatus and substrate processing method, high speed rotary valve, and cleaning method |
| 07/20/2005 | CN1643065A Apparatus and method for cleaning test probes |
| 07/20/2005 | CN1642665A Removal of contaminants using supercritical processing |
| 07/20/2005 | CN1640356A Device for the metered delivery of a liquid washing or rinsing agent, for a washing machine |
| 07/19/2005 | US6918964 Comprises robotic sprayers; resembles humans; for decoration/ entertainment |