| Patents for B08B 7 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass (12,806) |
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| 10/12/2005 | CN1682074A UV-ray irradiator |
| 10/12/2005 | CN1681453A Multiple moving stain-removal brush |
| 10/11/2005 | US6953654 Using supercritical fluids; separation |
| 10/11/2005 | US6953042 Apparatus and process for supercritical carbon dioxide phase processing |
| 10/06/2005 | WO2005092525A1 Dust remover for printing or processing sheet |
| 10/06/2005 | US20050218116 Process for reducing particle formation during etching |
| 10/06/2005 | US20050217706 Fluid assisted cryogenic cleaning |
| 10/06/2005 | US20050217702 Method and apparatus for generating gas pulses |
| 10/05/2005 | CN1222019C High-pressure treatment method |
| 10/05/2005 | CN1221331C Multi-functional cleaning module and cleaning apparatus using the module |
| 10/04/2005 | US6951710 Mixtures of amines and/or ammonium compounds, hydroxylamine, corrosion inhibitors, diluents and optionally water used for cleaning substrates |
| 10/04/2005 | US6951220 Method of decontaminating equipment |
| 09/29/2005 | WO2005091687A1 Micro plasma jet generator |
| 09/29/2005 | WO2005090638A2 Remote chamber methods for removing surface deposits |
| 09/29/2005 | WO2004090339A3 Method and apparatus for rotation of a workpiece in supercritical fluid solutions for removing photo resist, residues and particles therefrom |
| 09/29/2005 | WO2004048783A8 High-pressure device for closing a container |
| 09/29/2005 | WO2004027810A3 System and method for removal of materials from an article |
| 09/29/2005 | US20050215445 comprises a nonwoven three-dimensional layer comprising an open, lofty web of crimped synthetic fibers that are adhesively bonded substantially at points of mutual contact with a binder material, the binder material comprising a plurality of abrasive particles |
| 09/29/2005 | US20050214454 Chamber cleaning method |
| 09/29/2005 | US20050211703 Ceramic susceptor and a method of cleaning the same |
| 09/29/2005 | US20050211384 Thermally sprayed member, electrode and plasma processing apparatus using the electrode |
| 09/29/2005 | US20050211279 supplying cleaning gases into the enclosure through nozzles at the sidewalls of the enclosure, to fill the space between an upper and lower electrodes, then projecting and controlling gas amount, in response to the thickness of polymer deposits on the walls |
| 09/29/2005 | US20050211271 Cleaning device and method of use |
| 09/29/2005 | US20050211269 Apparatus and method for rapid thermal control of a workpiece in liquid or dense phase fluid |
| 09/29/2005 | US20050211265 Method for cleaning a process chamber |
| 09/29/2005 | US20050211264 Method and processing system for plasma-enhanced cleaning of system components |
| 09/28/2005 | EP1579036A1 An apparatus and process for the dry removal of the scale found on the surface of metal products |
| 09/28/2005 | EP1501961A4 High pressure processing chamber for multiple semiconductor substrates |
| 09/28/2005 | CN1675401A Substrate processing apparatus and related systems and methods |
| 09/28/2005 | CN1675028A Post-CMP cleaning of semiconductor wafer surfaces using a combination of aqueous and cryogenic cleaning techniques |
| 09/28/2005 | CN1672819A Electric crystal cleaner |
| 09/28/2005 | CN1220557C Method for locally removing coating applied on translucent or transparent substrate |
| 09/27/2005 | US6949147 comprises beams of electromagnetic energy conducted through laser/optical arm |
| 09/27/2005 | US6949145 Use of reactive gas or vapor of reactive liquid, with or without a free radical generator, and either simultaneously or sequentially, with cryogenic cleaning to aid in removal of foreign materials from semiconductor surfaces |
| 09/22/2005 | WO2005087434A1 Finishing processes for improving fatigue life of metal components |
| 09/22/2005 | WO2005086572A2 Vibrating debris remover |
| 09/22/2005 | US20050209123 Degreasing mixture contains a petroleum distillate, a soluble glycol ether and a C1 C4 ester; low vapor pressure; forming an aqueous emulsified cleaning composition; dissolve and remove grease, oil |
| 09/22/2005 | US20050205417 Filling the sputtering chamber with argon, adjusting the radio frequency operating power, maintaining for 10 to 20 minutes, powering down and discharging the gas; complete removal of oxidative contaminants |
| 09/22/2005 | US20050205206 Apparatus for materials processing by stimulated light emission and method of its utilization |
| 09/22/2005 | US20050205115 After a resist stripping solution of sulfuric acid and a hydrogen peroxide is supplied to the surface of the substrate which is being rotated at a first rotational speed, the rotational speed of the substrate is reduced to form a liquid film on the surface; paddling to maintain the liquid film |
| 09/22/2005 | US20050205108 Method and system for immersion lithography lens cleaning |
| 09/21/2005 | CN1671500A Milling machines with magnetic power band conveyer for steel plate fabrication |
| 09/20/2005 | US6946401 Plasma treatment for copper oxide reduction |
| 09/20/2005 | US6946035 Dirt removed by irradiating the substrate with ultraviolet rays in an oxygen-containing atmosphere in advance of wet cleaning with pure water; wet cleaning time and the amount of pure water can be reduced; liquid crystal device glass substrates |
| 09/20/2005 | US6945853 Methods for cleaning utilizing multi-stage filtered carbon dioxide |
| 09/20/2005 | US6945262 Analysis equipment for determining physical properties of an organic solution |
| 09/15/2005 | WO2005086212A1 Semiconductor device cleaning member and manufacturing method thereof |
| 09/15/2005 | WO2005084831A1 Method of removing alkali-soluble photosensitive resin |
| 09/15/2005 | WO2005084830A1 Method for plasma cleaning of a component |
| 09/15/2005 | WO2005084241A2 Enhancement of silicon-containing particulate material removal using supercritical fluid-based compositions |
| 09/15/2005 | WO2005013327A3 Regulation of flow of processing chemistry only into a processing chamber |
| 09/15/2005 | WO2005006396A3 Megasonic cleaning using supersaturated cleaning solution |
| 09/15/2005 | US20050201747 Semiconductor wafer washing system and method of supplying chemicals to the washing tanks of the system |
| 09/15/2005 | US20050199743 Control of detonative cleaning apparatus |
| 09/15/2005 | US20050199340 processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge |
| 09/15/2005 | DE10346125A1 Endoscope optical instrument has ultrasonic end surface cleaning by vibration of components forming optics end surfaces |
| 09/14/2005 | EP1573771A2 System and method for removal of materials from an article |
| 09/14/2005 | EP1453618A4 An apparatus and method for cleaning glass substrates using a cool hydrogen flame |
| 09/14/2005 | CN2724866Y Apparatus for cleaning shuttle backtracking chain of gripper loom |
| 09/14/2005 | CN1669093A Method for cleaning a steam generating device of a compressed water reactor |
| 09/13/2005 | US6943139 Removal of particle contamination on patterned silicon/silicon dioxide using supercritical carbon dioxide/chemical formulations |
| 09/13/2005 | US6943062 Contaminant particle removal by optical tweezers |
| 09/13/2005 | US6941615 Rotating operating handle for vacuum cleaner |
| 09/09/2005 | WO2005083154A2 Cleaning of chamber components |
| 09/08/2005 | US20050194356 Removing photoresist from a workpiece using water and ozone and a photoresist penetrating additive |
| 09/08/2005 | US20050193507 Vibrating debris remover |
| 09/08/2005 | DE102004007929A1 Verfahren und Vorrichtung zur Reinigung eines Blaskopfes für Kunststofffolien Method and apparatus for cleaning a blowing head for plastic films |
| 09/07/2005 | EP1570921A1 Process for cleaning by plasma an object |
| 09/07/2005 | EP1570100A1 Method for the conservation of metal surfaces |
| 09/07/2005 | CN1665967A Electrochemical method for cleaning the surfaces of metallic work pieces and cleaning electrode |
| 09/07/2005 | CN1665609A Fluid assisted cryogenic cleaning |
| 09/07/2005 | CN1663690A Apparatus for bring liquid onto surface |
| 09/06/2005 | US6939082 Subea pipeline blockage remediation method |
| 09/06/2005 | US6938439 Gases are vented from a waste site, separated into three streams: hydrocarbon, carbon dioxide, and residue streams, condensing hydrocarbon/CO2 stream portions to liquid or supercritical liquid, also using hydrocarbon to generate energy |
| 09/06/2005 | US6938366 Self-erecting device with debris collecting feature |
| 09/01/2005 | WO2005081302A1 Method for cleaning treatment chamber in substrate treating apparatus and method for detecting endpoint of cleaning |
| 09/01/2005 | WO2005081289A2 Process and apparatus for removing residues from semiconductor substrates |
| 09/01/2005 | WO2005079253A2 Edge cleaner device for coating process |
| 09/01/2005 | US20050192193 Enhancement of silicon-containing particulate material removal using supercritical fluid-based compositions |
| 09/01/2005 | US20050191861 Using supercritical fluids and/or dense fluids in semiconductor applications |
| 09/01/2005 | US20050189075 Pre-clean chamber with wafer heating apparatus and method of use |
| 09/01/2005 | US20050189001 Method for cleaning substrates using supercritical fluids |
| 09/01/2005 | DE102004008300A1 Cleaning method for a motor vehicle's/car's raw bodywork carcass uses an optical image-capture system and a pattern-recognition device to scan for traces of adhesive and to detect impurities |
| 08/31/2005 | EP1567290A2 Substrate processing apparatus for processing substrates using dense phase gas and sonic waves |
| 08/31/2005 | EP1438144B1 A method of automatically treating of a surface |
| 08/31/2005 | EP1255621B1 Autoclave for the precision cleaning of objects and use of the autoclave |
| 08/31/2005 | CN1661790A Particle removing member of substrate processing equipment |
| 08/31/2005 | CN1660511A Jibtype equipment for automatic cleaning planar glazed window |
| 08/31/2005 | CN1216680C Excimer UV photo reactor |
| 08/30/2005 | US6936825 Process for the decontamination of microlithographic projection exposure devices |
| 08/30/2005 | US6935352 Adding energy to a cleaning process fluid for removing photo resist, residues and particles from semiconductor substrates, photo masks, reticles, disks and flat-panel displays |
| 08/30/2005 | US6935281 Method for cleaning combustion devices |
| 08/25/2005 | WO2005077556A1 Surface cleaning system |
| 08/25/2005 | WO2004064874A3 Underside disinfection of workpieces on a conveyor belt |
| 08/25/2005 | US20050186428 Particle removing member of substrate processing equipment |
| 08/25/2005 | US20050184133 Laser cleaning system for a wire bonding machine |
| 08/25/2005 | US20050183743 supercritical carbon dioxide solvent with additives; organo quaternary ammonium halides, acidic aluminum salts, methanol, ethanol, isopropanol, butanol; Computer contolled process chamber, sensors, pumps, mixers; precalculated mathematical model governing concentration of cosolvent; |
| 08/25/2005 | US20050183740 Chemical cleaning of silicon wafers, using a system of reactive reverse micelles or microemulsions in a densified carbon dioxide matrix; surfactants comprise alkyl acid phosphate, alkyl acid sulfonate, alkyl alcohol, alkyl fluoride, perfluoride, peroxide; chelates, pentanediones, phenanthrolines |
| 08/25/2005 | DE102004018133B3 Dry ice beam arrangement e.g. for cleaning of surfaces, has source for liquid CO2, nozzle jet with nozzle exit opening for dry ice particle jet as well as line for transfer of CO2 of source to nozzle jet |
| 08/25/2005 | DE102004015226B3 Plasma cleaning method suitable for interior surfaces of e.g. bulbs for discharge lamps, forms back pressure and ignites plasma only inside bulb |