Patents
Sitemap › H05 - Electric techniques not otherwise provided for › H05G - X-ray technique › H05G 2 - Apparatus or processes specially adapted for producing x-rays, not involving x-ray tubes, e.g. involving generation of a plasma
Patents for H05G 2 - Apparatus or processes specially adapted for producing x-rays, not involving x-ray tubes, e.g. involving generation of a plasma (2,426)
01/2004
01/21/2004EP1381919A1 Euv-transparent interface structure
01/21/2004EP1332651B1 Target for production of x-rays
01/21/2004EP0792530B1 Low cost, high average power, high brightness solid state laser
01/15/2004US20040007990 Light generation apparatus, exposure apparatus, and device manufacturing method
01/13/2004US6677600 EUV radiation source
01/08/2004US20040004701 Radiation generating apparatus, radiation generating method, exposure apparatus, and exposure method
01/07/2004EP1378266A1 Charged particle beam apparatus
01/07/2004EP1378265A1 Charged particle beam apparatus
01/07/2004CN1466860A Method and apparatus for generating X-ray or EUV radiation
01/07/2004CN1134043C Discharge lamp source appts and method
01/02/2004EP1374650A1 Method and device for producing extreme ultraviolet radiation and soft x-radiation
12/2003
12/23/2003US6667484 Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby
12/18/2003WO2003087867A3 Extreme ultraviolet light source
12/10/2003EP1368999A1 Method for generating photons by sonoluminescence
12/10/2003CN1461426A EUV-transparent interface structure
12/09/2003US6661018 Shroud nozzle for gas jet control in an extreme ultraviolet light source
12/04/2003WO2003100929A1 Method and arrangement for generating amplified spontaneous emission of coherent short-wave radiation
12/04/2003US20030223546 Gasdynamically-controlled droplets as the target in a laser-plasma extreme ultraviolet light source
12/04/2003US20030223544 High-luminosity EUV-source devices for use in extreme ultraviolet (soft X-ray) lithography systems and other EUV optical systems
12/04/2003US20030223543 Linear filament array sheet for EUV production
12/04/2003US20030223542 Droplet target delivery method for high pulse-rate laser-plasma extreme ultraviolet light source
12/04/2003US20030223541 Target steering system for EUV droplet generators
12/03/2003EP1367867A1 Target steering system for a droplet generator in a EUV plasma source
12/03/2003EP1367866A1 Droplet target delivery method for high pulse-rate laser-plasma extreme ultraviolet light source
12/03/2003EP1367445A1 Linear filament array sheet for EUV production
12/03/2003EP1367441A2 Gasdynamically-controlled droplets as the target in a laser-plasma extreme ultraviolet light source
12/02/2003US6657370 Microcavity discharge device
12/02/2003US6657367 Dielectric barrier discharge lamp device
12/02/2003US6657213 High temperature EUV source nozzle
11/2003
11/27/2003US20030219097 X-ray microscope having an X-ray source for soft X-ray
11/26/2003EP1365636A1 Extreme ultraviolet generating device, exposure device using the generating device, and semiconductor manufacturing method
11/26/2003EP1365635A1 Method and arrangement for producing radiation
11/25/2003US6654446 Capillary discharge source
11/20/2003WO2003096764A1 Method and arrangement for producing radiation
11/13/2003WO2003094581A1 Method of generating extreme ultraviolet radiation
11/13/2003WO2003092466A2 A source of penetrating electromagnetic radiation
11/13/2003DE19962160C2 Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung Means for generating extreme ultraviolet and soft X-rays from a gas discharge
11/11/2003US6647088 Production of a dense mist of micrometric droplets in particular for extreme UV lithography
11/11/2003US6647086 X-ray exposure apparatus
10/2003
10/30/2003WO2002046839A3 Laser plasma from metals and nano-size particles
10/30/2003US20030202546 Femtosecond laser-electron x-ray source
10/30/2003US20030201737 Method for the stabilization of the radiation output of a gas discharge-coupled radiation source in pulsed operation
10/23/2003WO2003087867A2 Extreme ultraviolet light source
10/16/2003WO2003085707A1 Extreme ultraviolet light source
10/16/2003WO2003034153A3 Lithographic apparatus and device manufacturing method
10/16/2003US20030194055 Laser plasma generation method and structure thereof
10/15/2003CN1448790A Lithographic apparatus and device manufacturing method
10/14/2003US6633048 High output extreme ultraviolet source
10/09/2003US20030190012 Arrangement for the suppression of particle emission in the generation of radiation based on hot plasma
10/09/2003US20030189176 Method and device for generating euv radiation
10/07/2003US6630799 Resonant power supply and apparatus for producing vacuum arc discharges
10/02/2003US20030185255 Multistage synchronization of pulsed radiation sources
10/02/2003US20030183787 EUV radiation source
10/01/2003EP1349010A1 Lithographic apparatus and device manufacturing method
10/01/2003EP1349008A1 Lithographic apparatus and device manufacturing method
09/2003
09/18/2003WO2003077277A1 A device for generating x-rays having a liquid metal anode
09/18/2003WO2003077276A1 A device for generating x-rays having a liquid metal anode
08/2003
08/13/2003EP1335640A2 Plasma-type X-ray source encased in vacuum chamber exhibiting reduced heating of interior components, and microlithography systems comprising same
08/07/2003US20030147499 Plasma-type X-ray generators encased in vacuum chambers exhibiting reduced heating of interior components, and microlithography systems comprising same
08/07/2003US20030146398 Method for generating extreme ultraviolet radiation based on a radiation-emitting plasma
08/06/2003EP1332651A2 Target for production of x-rays
08/06/2003EP1332649A1 Method and apparatus for generating x-ray or euv radiation
07/2003
07/30/2003CN1433531A Lithography device which uses source of radiation in the extreme ultraviolet range and multi-layered mirrors with broad spectral band in this range
07/23/2003EP0981936A4 Plasma focus high energy photon source
07/16/2003EP1015161A4 Plasma gun and methods for the use thereof
07/16/2003CN1430865A Extreme ultraviolet source based on colliding neutral beams
07/15/2003US6594334 Exposure method and exposure apparatus
07/08/2003US6590959 High-intensity sources of short-wavelength electromagnetic radiation for microlithography and other uses
07/02/2003EP1322547A2 Method and apparatus for the production of so called "fractional hydrogen" and associated production of photon energy
07/01/2003US6586757 Plasma focus light source with active and buffer gas control
06/2003
06/18/2003EP1319988A2 High luminosity source for EUV lithography
06/10/2003US6576917 Adjustable bore capillary discharge
06/04/2003EP1316245A1 Electromagnetic radiation generation using a laser produced plasma
06/04/2003EP0895706B1 Method and apparatus for generating x-ray or euv radiation
05/2003
05/20/2003US6567499 Star pinch X-ray and extreme ultraviolet photon source
05/20/2003US6566668 Plasma focus light source with tandem ellipsoidal mirror units
05/20/2003US6566667 Plasma focus light source with improved pulse power system
05/13/2003US6563907 Radiation source with shaped emission
05/07/2003EP1309234A2 Method and apparatus for elimination of high energy ions from EUV radiating device
05/02/2003EP1305985A2 Z-pinch plasma x-ray source using surface discharge preionization
05/02/2003EP1305984A1 Method and apparatus for generating x-ray or euv radiation
05/02/2003EP1305813A1 Plasma focus light source with active and buffer gas control
05/01/2003US20030080302 Method and apparatus for elimination of high energy ion from EUV radiating device
04/2003
04/24/2003WO2003034153A2 Lithographic apparatus and device manufacturing method
04/22/2003US6552350 System and method for providing a lithographic light source for a semiconductor manufacturing process
04/17/2003US20030071979 Lithographic apparatus and device manufacturing method
04/10/2003US20030068012 Arrangement for generating extreme ultraviolet (EUV) radiation based on a gas discharge
04/09/2003EP1300056A2 Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it
04/02/2003EP1298965A2 Radiation-generating devices utilizing multiple plasma-discharge sources and microlithography apparatus and methods utilizing the same
04/02/2003EP1222842B1 Production of a dense mist of micrometric droplets in particular for extreme uv lithography
04/01/2003US6541786 Plasma pinch high energy with debris collector
03/2003
03/27/2003WO2003026363A1 Discharge source with gas curtain for protecting optics from particles
03/25/2003US6538257 Method of generating extremely short-wave radiation, and extremely short-wave radiation source unit
03/20/2003WO2002098189A3 Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays
03/20/2003US20030053594 Discharge source with gas curtain for protecting optics from particles
03/20/2003US20030053593 Capillary discharge source
03/20/2003US20030053588 Radiation-generating devices utilizing multiple plasma-discharge sources and microlithography apparatus and methods utilizing the same
03/12/2003EP1290925A2 Extreme ultraviolet source based on colliding neutral beams
03/12/2003EP1232516A4 Method and radiation generating system using microtargets
02/2003
02/27/2003US20030038255 Fluid jet electric discharge source
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