Patents
Patents for H05G 2 - Apparatus or processes specially adapted for producing x-rays, not involving x-ray tubes, e.g. involving generation of a plasma (2,426)
02/2003
02/26/2003EP1285560A1 Method and device for generating euv radiation
02/13/2003WO2003013197A1 Method and apparatus for generating x-ray
02/13/2003CA2452815A1 Method and apparatus for generating x-rays
02/04/2003US6516048 X-ray generator
01/2003
01/30/2003US20030020890 Debris removing system for use in X-ray light source
01/14/2003US6507641 X-ray-generation devices, X-ray microlithography apparatus comprising same, and microelectronic-device fabrication methods utilizing same
01/09/2003US20030006708 Microwave ion source
01/09/2003US20030006383 Plasma focus light source with improved pulse power system
01/08/2003EP1274287A1 Debris removing system for use in X-ray source
01/08/2003CN1390435A Method for obtaining an extraeme ultraviolet radiation source, radiation source and use in lithography
01/08/2003CN1390360A Plasma focus light source with improved pulse power system
01/07/2003US6504900 Optical sample X-ray testing apparatus and method for testing optical sample with X-rays
12/2002
12/24/2002US6498832 Electrode configuration for extreme-UV electrical discharge source
12/19/2002WO2002102122A1 Star pinch x-ray and extreme ultraviolet photon source
12/12/2002US20020186815 Star pinch plasma source of photons or neutrons
12/12/2002US20020186814 Star pinch X-ray and extreme ultraviolet photon source
12/10/2002US6493423 Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
12/10/2002US6493421 Apparatus and method for generating a high intensity X-ray beam with a selectable shape and wavelength
12/05/2002WO2002098189A2 Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays
12/05/2002DE10151080C1 Device for producing extreme ultraviolet radiation used in the semiconductor industry comprises a discharge chamber surrounded by electrode housings through which an operating gas flows under a predetermined pressure
11/2002
11/26/2002US6487003 Optical interaction device
11/21/2002WO2002075910A3 Vacuum arc method, system, and apparatus
11/21/2002US20020172235 Producing energetic, tunable, coherent X-rays with long wavelength light
11/21/2002US20020171817 Lithography device wich uses a source of radiation in the extreme ultraviolet range and multi-layered mirrors with a broad spectral band in this range
11/14/2002WO2002091808A1 Producing energetic, tunable, coherent x-rays with long wavelength light
11/14/2002WO2002091807A1 High flux, high energy photon source
11/14/2002US20020168049 Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays
11/13/2002EP1072174B1 Z-pinch soft x-ray source using diluent gas
11/13/2002CN1379968A Production of dense mist of micrometric droplets in particular for extreme UV lithography
11/07/2002US20020163793 EUV-transparent interface structure
11/07/2002US20020163313 Pulse power system for extreme ultraviolet and x-ray sources
11/07/2002US20020162975 High output extreme ultraviolet source
11/07/2002US20020162974 High temperature EUV source nozzle
11/06/2002EP1255426A1 High temperature EUV source nozzle
11/06/2002EP1255163A2 High output extreme ultraviolet source
10/2002
10/31/2002US20020159568 Electrode configuration for extreme-uv electrical discharge source
10/25/2002EP0968409A4 Soft x-ray microfluoroscope
10/24/2002WO2002085080A1 Method and device for generating extreme ultraviolet radiation in particular for lithography
10/24/2002WO2002084406A1 Euv-transparent interface structure
10/24/2002US20020154738 X-ray generator
10/22/2002US6469310 Radiation source for extreme ultraviolet radiation, e.g. for use in lithographic projection apparatus
10/17/2002WO2002082872A1 Method and device for producing extreme ultraviolet radiation and soft x-radiation
10/17/2002WO2002082871A1 Method and device for the generation of far ultraviolet or soft x-ray radiation
10/17/2002DE10139677A1 Verfahren und Vorrichtung zum Erzeugen von extrem ultravioletter Strahlung und weicher Röntgenstrahlung Method and device for generating extreme ultraviolet radiation and soft x-rays
10/17/2002DE10134033A1 Verfahren und Vorrichtung zum Erzeugen von Extrem-Ultraviolettstrahlung/weicher Röntgenstrahlung Method and device for generating extreme ultraviolet radiation / soft x-ray
10/10/2002US20020146091 Ultrabright multikilovolt x-ray source: saturated amplification on noble gas transition arrays from hollow atom states
10/09/2002EP1248499A1 Method and apparatus for production of extreme ultraviolet radiation
10/08/2002US6463123 Target for production of x-rays
10/03/2002US20020141537 Laser plasma generation method and system
10/03/2002US20020141536 EUV, XUV, and X-ray wavelength sources created from laser plasma produced from liquid metal solutions, and nano-size particles in solutions
10/02/2002DE10113064A1 Verfahren und Einrichtung zur Erzeugung von UV-Strahlung, insbesondere von EUV-Strahlung Method and device for generating ultraviolet radiation, in particular EUV radiation
10/01/2002US6459766 Photon generator
09/2002
09/26/2002WO2002076157A1 X-ray method, system, and apparatus
09/26/2002WO2002076156A1 Method and device for generating euv radiation
09/26/2002WO2002075910A2 Vacuum arc method, system, and apparatus
09/19/2002WO2002074022A1 Electrode configuration for extreme-uv electrical discharge source
09/19/2002WO2002074021A1 Method for generating photons by sonoluminescence
09/19/2002US20020131555 Apparatus for producing vacuum arc discharges
09/19/2002US20020131554 Efficiency fluorescent x-ray source
09/18/2002EP1240551A2 Lithography device which uses a source of radiation in the extreme ultraviolet range and multi-layered mirrors with a broad spectral band in this range
09/17/2002US6452199 Plasma focus high energy photon source with blast shield
09/17/2002US6452194 Radiation source for use in lithographic projection apparatus
09/10/2002US6449338 X-ray source and use in radiography
09/06/2002WO2002069677A1 Extreme ultraviolet generating device, exposure device using the generating device, and semiconductor manufacturing method
08/2002
08/22/2002WO2002039792A3 Target for production of x-rays
08/21/2002EP1232517A1 Plasma focus light source with improved pulse power system
08/21/2002EP1232516A1 Method and radiation generating system using microtargets
08/20/2002US6437349 Fluid nozzle system and method in an emitted energy system for photolithography
08/14/2002EP1230828A1 Method for obtaining an extreme ultraviolet radiation source and its use in lithography
08/14/2002CN1364048A Laser plasma X-ray source
08/08/2002WO2002061407A1 High-energy x-ray imaging device and method therefor
08/01/2002US20020100882 Plasma focus high energy photon source with blast shield
07/2002
07/18/2002US20020094063 Laser plasma EUV light source apparatus and target used therefor
07/17/2002EP1222842A1 Production of a dense mist of micrometric droplets in particular for extreme uv lithography
07/16/2002US6421421 Extreme ultraviolet based on colliding neutral beams
07/11/2002US20020090054 Apparatus and method for containing debris from laser plasma radiation sources
07/02/2002US6414438 Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it
06/2002
06/27/2002WO2002008787A3 Method and apparatus for the production of so called 'fractional hydrogen' and associated production of photon energy
06/18/2002US6408052 Z-pinch plasma X-ray source using surface discharge preionization
06/13/2002WO2002046839A2 Laser plasma from metals and nano-size particles
06/13/2002US20020070353 EUV, XUV, and X-Ray wavelength sources created from laser plasma produced from liquid metal solutions
06/05/2002EP1211918A1 Method of stopping ions and small debris in extreme-ultraviolet and soft x-rays plasma sources by using krypton
06/04/2002US6400089 High electric field, high pressure light source
05/2002
05/30/2002US20020064253 Apparatus and method for generating a high intensity X-ray beam with a selectable shape and wavelength
05/29/2002EP1209956A1 System and method for producing pulsed monochromatic X-rays
05/23/2002US20020060299 Methods and apparatus for providing a broadband tunable source of coherent millimeter, sub-millimeter and infrared radiation utilizing a non-relativistic electron beam
05/16/2002WO2002039792A2 Target for production of x-rays
05/16/2002US20020057760 System and method for producing pulsed monochromatic X-rays
05/16/2002DE10055134A1 Generation of X ray emissions high voltage field applied to an electrode with a sharp needle point form
05/14/2002US6389106 Method and device for producing extreme ultraviolet and soft X-rays from a gaseous discharge
05/14/2002US6389101 Parallel x-ray nanotomography
05/02/2002US20020051358 System and method for providing a lithographic light source for a semiconductor manufacturing process
05/02/2002EP1202117A1 Exposure method and exposure apparatus
04/2002
04/23/2002US6377651 Laser plasma source for extreme ultraviolet lithography using a water droplet target
04/18/2002WO2002032197A1 Method and apparatus for generating x-ray or euv radiation
04/18/2002US20020044629 Method and apparatus for generating X-ray or EUV radiation
04/17/2002EP1197127A1 Device for producing an extreme ultraviolet and soft x radiation from a gaseous discharge
04/03/2002EP1077019B1 X-ray source and its use in radiography
03/2002
03/28/2002WO2002026003A1 Method for converting laser radiation into x-radiation, in particular, into extreme ultraviolet (euv) radiation using a plasma generated by the laser radiation
03/28/2002WO2001091523A3 Extreme ultraviolet source based on colliding neutral beams
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