Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2014
12/02/2014US8901623 Super junction semiconductor device with overcompensation zones
12/02/2014US8901619 Asymmetric FinFET devices
12/02/2014US8901616 Gate stack including a high-K gate dielectric that is optimized for low voltage applications
12/02/2014US8901614 Location-related adjustment of the operating temperature distribution or power distribution of a semiconductor power component, and component for carrying out said method
12/02/2014US8901612 Thin-film heterostructure thermoelectrics in a group IIa and IV-VI materials system
12/02/2014US8901611 Bipolar field effect transistor structures and methods of forming the same
12/02/2014US8901610 Compound semiconductor device
12/02/2014US8901585 Multiple component solid state white light
12/02/2014US8901580 Package for mounting electronic components, electronic apparatus, and method for manufacturing the package
12/02/2014US8901577 Organic light-emitting display device and method of manufacturing the same
12/02/2014US8901576 Silicon photonics wafer using standard silicon-on-insulator processes through substrate removal or transfer
12/02/2014US8901573 Silicon carbide semiconductor device and method of manufacturing the same
12/02/2014US8901572 Semiconductor device and method for fabricating the same
12/02/2014US8901570 Epitaxial silicon carbide single crystal substrate and process for producing the same
12/02/2014US8901566 High performance stress-enhanced MOSFETs using Si:C and SiGe epitaxial source/drain and method of manufacture
12/02/2014US8901561 Method for manufacturing display device
12/02/2014US8901556 Insulating film, method for manufacturing semiconductor device, and semiconductor device
12/02/2014US8901555 Light sensing device
12/02/2014US8901554 Semiconductor device including channel formation region including oxide semiconductor
12/02/2014US8901553 Semiconductor device and manufacturing method thereof
12/02/2014US8901552 Top gate thin film transistor with multiple oxide semiconductor layers
12/02/2014US8901538 Nano resonator and manufacturing method thereof
12/02/2014US8901537 Transistors with high concentration of boron doped germanium
12/02/2014US8901533 Semiconductor devices and methods of manufacturing the same
12/02/2014US8901470 Microwave heating apparatus
12/02/2014US8901460 Heat treatment method and heat treatment apparatus for heating substrate by irradiating substrate with light
12/02/2014US8901459 Substrate supporting units and substrate treating apparatuses including the same
12/02/2014US8901268 Compositions, layers and films for optoelectronic devices, methods of production and uses thereof
12/02/2014US8901024 Ozone-treated carbon electrodes
12/02/2014US8901016 Method of forming metal oxide hardmask
12/02/2014US8901015 Method for depositing an inorganic encapsulating film
12/02/2014US8901014 Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus and non-transitory computer readable recording medium
12/02/2014US8901013 Substrate processing apparatus, method of processing substrate and method of manufacturing semiconductor device
12/02/2014US8901012 Semiconductor manufacturing apparatus and method for manufacturing semiconductor device
12/02/2014US8901011 Substrate processing apparatus and semiconductor device producing method
12/02/2014US8901010 Methods for improving solar cell lifetime and efficiency
12/02/2014US8901008 Substrate plasma-processing apparatus
12/02/2014US8901007 Addition of carboxyl groups plasma during etching for interconnect reliability enhancement
12/02/2014US8901006 ARC residue-free etching
12/02/2014US8901005 Method for simultaneously forming features of different depths in a semiconductor substrate
12/02/2014US8901004 Plasma etch method to reduce micro-loading
12/02/2014US8901003 Polishing method of semiconductor structure
12/02/2014US8901002 Polishing slurry for metal films and polishing method
12/02/2014US8901001 Slurry composition and method of fabricating damascene structure using the same
12/02/2014US8901000 Aqueous acidic solution and etching solution and method for texturizing the surface of single crystal and polycrystal silicon substrates
12/02/2014US8900999 Low temperature high pressure high H2/WF6 ratio W process for 3D NAND application
12/02/2014US8900998 Process for electroless deposition of gold and gold alloys on silicon
12/02/2014US8900997 Method for forming a dual damascene structure of a semiconductor device, and a semiconductor device therewith
12/02/2014US8900995 Semiconductor device and manufacturing method thereof
12/02/2014US8900994 Method for producing a protective structure
12/02/2014US8900993 Semiconductor device sealed in a resin section and method for manufacturing the same
12/02/2014US8900992 Methods of forming a ruthenium material, methods of forming a capacitor, and related electronic systems
12/02/2014US8900991 Film forming method and storage medium
12/02/2014US8900990 System and method of combining damascenes and subtract metal etch for advanced back end of line interconnections
12/02/2014US8900989 Method of fabricating an air gap using a damascene process and structure of same
12/02/2014US8900988 Method for forming self-aligned airgap interconnect structures
12/02/2014US8900987 Method for removing bumps from incomplete and defective interposer dies for stacked silicon interconnect technology (SSIT) devices
12/02/2014US8900986 Method to realize flux free indium bumping
12/02/2014US8900985 Self-doped ohmic contacts for compound semiconductor devices
12/02/2014US8900982 Techniques for processing a substrate
12/02/2014US8900981 Method for doping a semiconductor material
12/02/2014US8900980 Defect-free SiGe source/drain formation by epitaxy-free process
12/02/2014US8900979 Pretreatment method for reduction and/or elimination of basal plane dislocations close to epilayer/substrate interface in growth of SiC epitaxial films
12/02/2014US8900978 Methods for making a semiconductor device with shaped source and drain recesses and related devices
12/02/2014US8900977 Method for making epitaxial structure
12/02/2014US8900976 Organic layer deposition apparatus, organic light-emitting display apparatus, and method of manufacturing the organic light-emitting display apparatus
12/02/2014US8900975 Nanopore sensor device
12/02/2014US8900974 High yield substrate assembly
12/02/2014US8900973 Method to enable compressively strained pFET channel in a FinFET structure by implant and thermal diffusion
12/02/2014US8900972 Systems and methods for producing seed bricks
12/02/2014US8900971 Bonded substrate and manufacturing method thereof
12/02/2014US8900970 Method for manufacturing a semiconductor device using a flexible substrate
12/02/2014US8900968 Method for manufacturing a semiconductor device
12/02/2014US8900967 Method for fabricating semiconductor device having buried gate
12/02/2014US8900966 Alignment for backside illumination sensor
12/02/2014US8900964 Inductors and wiring structures fabricated with limited wiring material
12/02/2014US8900963 Methods of forming semiconductor device structures, and related structures
12/02/2014US8900962 Method for manufacturing semiconductor device
12/02/2014US8900961 Selective deposition of germanium spacers on nitride
12/02/2014US8900960 Integrated circuit device with well controlled surface proximity and method of manufacturing same
12/02/2014US8900959 Non-replacement gate nanomesh field effect transistor with pad regions
12/02/2014US8900958 Epitaxial formation mechanisms of source and drain regions
12/02/2014US8900957 Method of dual epi process for semiconductor device
12/02/2014US8900956 Method of dual EPI process for semiconductor device
12/02/2014US8900955 Thin film transistor device with accurately aligned electrode patterns
12/02/2014US8900954 Blanket short channel roll-up implant with non-angled long channel compensating implant through patterned opening
12/02/2014US8900953 Crystal manufacturing apparatus, semiconductor device manufactured using the same, and method of manufacturing semiconductor device using the same
12/02/2014US8900952 Gate stack including a high-k gate dielectric that is optimized for low voltage applications
12/02/2014US8900951 Gate-all-around nanowire MOSFET and method of formation
12/02/2014US8900950 Trench power MOSFET structure with high cell density and fabrication method thereof
12/02/2014US8900948 Method for fabricating non-volatile memory device
12/02/2014US8900947 Semiconductor devices including conductive plugs and methods of manufacturing the same
12/02/2014US8900946 Method of forming layers using atomic layer deposition
12/02/2014US8900945 Method of forming a memory device
12/02/2014US8900944 Methods of manufacturing a semiconductor device
12/02/2014US8900943 Vertical power MOSFET and IGBT fabrication process with two fewer photomasks
12/02/2014US8900942 Semiconductor devices and methods of fabricating the same
12/02/2014US8900941 Methods of forming spacers on FinFETs and other semiconductor devices
12/02/2014US8900940 Reducing gate height variance during semiconductor device formation
12/02/2014US8900939 Transistor with enhanced channel charge inducing material layer and threshold voltage control
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